---
_id: '7497'
article_number: '2097'
author:
- first_name: M.
  full_name: Mehta, M.
  last_name: Mehta
- first_name: M.
  full_name: Ruth, M.
  last_name: Ruth
- first_name: K. A.
  full_name: Piegdon, K. A.
  last_name: Piegdon
- first_name: D.
  full_name: Krix, D.
  last_name: Krix
- first_name: H.
  full_name: Nienhaus, H.
  last_name: Nienhaus
- first_name: Cedrik
  full_name: Meier, Cedrik
  id: '20798'
  last_name: Meier
  orcid: https://orcid.org/0000-0002-3787-3572
citation:
  ama: 'Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C. Inductively coupled
    plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy
    grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures</i>. 2009;27(5). doi:<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a>'
  apa: 'Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., &#38; Meier,
    C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single
    crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science
    &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5).
    <a href="https://doi.org/10.1116/1.3186528">https://doi.org/10.1116/1.3186528</a>'
  bibtex: '@article{Mehta_Ruth_Piegdon_Krix_Nienhaus_Meier_2009, title={Inductively
    coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam
    epitaxy grown ZnO films}, volume={27}, DOI={<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a>},
    number={52097}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures}, publisher={American Vacuum Society}, author={Mehta,
    M. and Ruth, M. and Piegdon, K. A. and Krix, D. and Nienhaus, H. and Meier, Cedrik},
    year={2009} }'
  chicago: 'Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier.
    “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and
    Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures</i> 27, no. 5 (2009). <a href="https://doi.org/10.1116/1.3186528">https://doi.org/10.1116/1.3186528</a>.'
  ieee: 'M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively
    coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam
    epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures</i>, vol. 27, no. 5, 2009.'
  mla: 'Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk
    ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of
    Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>,
    vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a>.'
  short: 'M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal
    of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures
    27 (2009).'
date_created: 2019-02-04T14:44:44Z
date_updated: 2022-01-06T07:03:39Z
department:
- _id: '15'
- _id: '230'
- _id: '287'
- _id: '35'
doi: 10.1116/1.3186528
intvolume: '        27'
issue: '5'
language:
- iso: eng
publication: 'Journal of Vacuum Science & Technology B: Microelectronics and Nanometer
  Structures'
publication_identifier:
  issn:
  - 1071-1023
publication_status: published
publisher: American Vacuum Society
status: public
title: Inductively coupled plasma reactive ion etching of bulk ZnO single crystal
  and molecular beam epitaxy grown ZnO films
type: journal_article
user_id: '20798'
volume: 27
year: '2009'
...
---
_id: '7649'
article_number: '1156'
author:
- first_name: H.
  full_name: Nienhaus, H.
  last_name: Nienhaus
- first_name: V.
  full_name: Kravets, V.
  last_name: Kravets
- first_name: S.
  full_name: Koutouzov, S.
  last_name: Koutouzov
- first_name: Cedrik
  full_name: Meier, Cedrik
  id: '20798'
  last_name: Meier
  orcid: https://orcid.org/0000-0002-3787-3572
- first_name: A.
  full_name: Lorke, A.
  last_name: Lorke
- first_name: H.
  full_name: Wiggers, H.
  last_name: Wiggers
- first_name: M. K.
  full_name: Kennedy, M. K.
  last_name: Kennedy
- first_name: F. E.
  full_name: Kruis, F. E.
  last_name: Kruis
citation:
  ama: 'Nienhaus H, Kravets V, Koutouzov S, et al. Quantum size effect of valence
    band plasmon energies in Si and SnO[sub x] nanoparticles. <i>Journal of Vacuum
    Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2006;24(3).
    doi:<a href="https://doi.org/10.1116/1.2190658">10.1116/1.2190658</a>'
  apa: 'Nienhaus, H., Kravets, V., Koutouzov, S., Meier, C., Lorke, A., Wiggers, H.,
    … Kruis, F. E. (2006). Quantum size effect of valence band plasmon energies in
    Si and SnO[sub x] nanoparticles. <i>Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures</i>, <i>24</i>(3). <a href="https://doi.org/10.1116/1.2190658">https://doi.org/10.1116/1.2190658</a>'
  bibtex: '@article{Nienhaus_Kravets_Koutouzov_Meier_Lorke_Wiggers_Kennedy_Kruis_2006,
    title={Quantum size effect of valence band plasmon energies in Si and SnO[sub
    x] nanoparticles}, volume={24}, DOI={<a href="https://doi.org/10.1116/1.2190658">10.1116/1.2190658</a>},
    number={31156}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures}, publisher={American Vacuum Society}, author={Nienhaus,
    H. and Kravets, V. and Koutouzov, S. and Meier, Cedrik and Lorke, A. and Wiggers,
    H. and Kennedy, M. K. and Kruis, F. E.}, year={2006} }'
  chicago: 'Nienhaus, H., V. Kravets, S. Koutouzov, Cedrik Meier, A. Lorke, H. Wiggers,
    M. K. Kennedy, and F. E. Kruis. “Quantum Size Effect of Valence Band Plasmon Energies
    in Si and SnO[Sub x] Nanoparticles.” <i>Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures</i> 24, no. 3 (2006). <a href="https://doi.org/10.1116/1.2190658">https://doi.org/10.1116/1.2190658</a>.'
  ieee: 'H. Nienhaus <i>et al.</i>, “Quantum size effect of valence band plasmon energies
    in Si and SnO[sub x] nanoparticles,” <i>Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures</i>, vol. 24, no. 3, 2006.'
  mla: 'Nienhaus, H., et al. “Quantum Size Effect of Valence Band Plasmon Energies
    in Si and SnO[Sub x] Nanoparticles.” <i>Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures</i>, vol. 24, no. 3, 1156, American
    Vacuum Society, 2006, doi:<a href="https://doi.org/10.1116/1.2190658">10.1116/1.2190658</a>.'
  short: 'H. Nienhaus, V. Kravets, S. Koutouzov, C. Meier, A. Lorke, H. Wiggers, M.K.
    Kennedy, F.E. Kruis, Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures 24 (2006).'
date_created: 2019-02-13T11:39:01Z
date_updated: 2022-01-06T07:03:43Z
department:
- _id: '15'
doi: 10.1116/1.2190658
extern: '1'
intvolume: '        24'
issue: '3'
language:
- iso: eng
publication: 'Journal of Vacuum Science & Technology B: Microelectronics and Nanometer
  Structures'
publication_identifier:
  issn:
  - 1071-1023
publication_status: published
publisher: American Vacuum Society
status: public
title: Quantum size effect of valence band plasmon energies in Si and SnO[sub x] nanoparticles
type: journal_article
user_id: '20798'
volume: 24
year: '2006'
...
---
_id: '8657'
article_number: '1863'
author:
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: C.
  full_name: Riedesel, C.
  last_name: Riedesel
- first_name: A. D.
  full_name: Wieck, A. D.
  last_name: Wieck
citation:
  ama: 'Reuter D, Riedesel C, Wieck AD. Fabrication of submicrometer patterned two-dimensional
    electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As.
    <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer
    Structures</i>. 2006. doi:<a href="https://doi.org/10.1116/1.2217975">10.1116/1.2217975</a>'
  apa: 'Reuter, D., Riedesel, C., &#38; Wieck, A. D. (2006). Fabrication of submicrometer
    patterned two-dimensional electron gases by overgrowth of focused ion beam doped
    Al[sub x]Ga[sub 1−x]As. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures</i>. <a href="https://doi.org/10.1116/1.2217975">https://doi.org/10.1116/1.2217975</a>'
  bibtex: '@article{Reuter_Riedesel_Wieck_2006, title={Fabrication of submicrometer
    patterned two-dimensional electron gases by overgrowth of focused ion beam doped
    Al[sub x]Ga[sub 1−x]As}, DOI={<a href="https://doi.org/10.1116/1.2217975">10.1116/1.2217975</a>},
    number={1863}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures}, author={Reuter, Dirk and Riedesel, C. and Wieck, A.
    D.}, year={2006} }'
  chicago: 'Reuter, Dirk, C. Riedesel, and A. D. Wieck. “Fabrication of Submicrometer
    Patterned Two-Dimensional Electron Gases by Overgrowth of Focused Ion Beam Doped
    Al[Sub x]Ga[Sub 1−x]As.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures</i>, 2006. <a href="https://doi.org/10.1116/1.2217975">https://doi.org/10.1116/1.2217975</a>.'
  ieee: 'D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of submicrometer patterned
    two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub
    x]Ga[sub 1−x]As,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics
    and Nanometer Structures</i>, 2006.'
  mla: 'Reuter, Dirk, et al. “Fabrication of Submicrometer Patterned Two-Dimensional
    Electron Gases by Overgrowth of Focused Ion Beam Doped Al[Sub x]Ga[Sub 1−x]As.”
    <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer
    Structures</i>, 1863, 2006, doi:<a href="https://doi.org/10.1116/1.2217975">10.1116/1.2217975</a>.'
  short: 'D. Reuter, C. Riedesel, A.D. Wieck, Journal of Vacuum Science &#38; Technology
    B: Microelectronics and Nanometer Structures (2006).'
date_created: 2019-03-27T08:24:33Z
date_updated: 2022-01-06T07:03:58Z
department:
- _id: '15'
- _id: '230'
doi: 10.1116/1.2217975
language:
- iso: eng
publication: 'Journal of Vacuum Science & Technology B: Microelectronics and Nanometer
  Structures'
publication_identifier:
  issn:
  - 1071-1023
publication_status: published
status: public
title: Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth
  of focused ion beam doped Al[sub x]Ga[sub 1−x]As
type: journal_article
user_id: '42514'
year: '2006'
...