@article{64825,
  abstract     = {{<jats:title>Abstract</jats:title>
                  <jats:p>
                    We investigate electrically induced, near-field coupled dipole resonant mode with a high-quality factor (
                    <jats:italic>Q</jats:italic>
                    ) in a terahertz (THz) meta-waveguide. The waveguide structure is composed of I-shaped aluminum metamaterial constituents, placed periodically on a copper-quartz bilayer substrate in the propagation direction of an incident THz beam. The electric field vector is set along a I-shape design in the transverse direction of the meta-waveguide, leading to the excitation of a strong dipole resonance around the I-shaped meta-atom. The dipole resonance is quite sharp with high
                    <jats:italic>Q</jats:italic>
                    values due to the strong interaction of propagating THz wave with the metamaterial design, unlike traditional terahertz metatareials. The THz transmission response of the waveguide is numerically analyzed to study the dipole resonance, which shows the existence of two resonances due to near-field coupling. Furthermore, the excitation of these dipole resonances and their coupling behavior are confirmed by the electric field distribution of the meta-waveguide. Notably, these dipole resonances can be tuned across a range of frequencies which are integrated with the coupling mechanism, offering a practical route for realizing next-generation photonic devices. We also employ a semi-analytical coupled harmonic oscillator theory to understand the underlying physical mechanisms of the dipole resonators in meta-waveguides and to corroborate our numerically obtained transmission results. The tunability of electrically induced high
                    <jats:italic>Q</jats:italic>
                    -dipole resonance leads to promising applications in highly sensitive sensors, storage devices, electromagnetically induced transparency, and on-chip photonic components.
                  </jats:p>}},
  author       = {{Swargiary, Usha Rani and Sharma, Prabhat and Hossain, Manoar and Islam, Maidul}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  number       = {{7}},
  publisher    = {{IOP Publishing}},
  title        = {{{Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide}}},
  doi          = {{10.1088/1361-6463/ae4240}},
  volume       = {{59}},
  year         = {{2026}},
}

@article{65108,
  abstract     = {{<jats:title>Abstract</jats:title>
                  <jats:p>Lithographic surface patterning is a cornerstone of modern materials and device fabrication. Although the available lithography techniques are constantly being advanced to push the feature sizes down to the few-nanometer scale, such developments are associated with many technological and economic challenges. Combining established top-down lithography with bottom-up self-assembly strategies has the potential to overcome those challenges and enable the manipulation of matter with molecular precision. One of the most exciting approaches in this regard is to harness the programmability of DNA self-assembly to create precise DNA nanostructure masks to be used in the lithographic patterning of diverse substrates. DNA nanotechnology has provided us with a versatile toolbox for the high-yield synthesis of 2D and 3D nanostructures with complex, user-defined shapes at unprecedented molecular accuracy. Consequently, the last decade has seen intense research efforts aimed at transferring such DNA nanostructure shapes into functional organic and inorganic materials and we have now arrived at a point where sophisticated molecular lithography approaches utilize DNA nanostructure masks for the fabrication of plasmonic surfaces for metamaterials and sensing applications. This review summarizes how the spatial information of such DNA nanostructure masks can be transferred into various organic and inorganic materials through selective etching and deposition steps. The review also discusses recent developments toward all-purpose molecular lithography schemes and highlights promising extensions of the discussed methods toward new materials systems and application fields.</jats:p>}},
  author       = {{Keller, Adrian Clemens and Linko, Veikko}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  publisher    = {{IOP Publishing}},
  title        = {{{Molecular lithography with DNA nanostructures: Methods and applications}}},
  doi          = {{10.1088/1361-6463/ae5667}},
  year         = {{2026}},
}

@article{23842,
  author       = {{Baron, Elias and Feneberg, Martin and Goldhahn, Rüdiger and Deppe, Michael and Tacken, Fabian and As, Donat Josef}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Optical evidence of many-body effects in the zincblende Al$_\mathrm{x}$Ga$_\mathrm{1-x}$N alloy system}}},
  doi          = {{10.1088/1361-6463/abb97a}},
  year         = {{2021}},
}

@article{22723,
  author       = {{Yoon, Gwanho and Tanaka, Takuo and Zentgraf, Thomas and Rho, Junsuk}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Recent progress on metasurfaces: applications and fabrication}}},
  doi          = {{10.1088/1361-6463/ac0faa}},
  volume       = {{54}},
  year         = {{2021}},
}

@article{34647,
  author       = {{Brögelmann, T and Bobzin, K and Grundmeier, Guido and de los Arcos, T and Kruppe, N C and Schwiderek, S and Carlet, M}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  keywords     = {{Surfaces, Coatings and Films, Acoustics and Ultrasonics, Condensed Matter Physics, Electronic, Optical and Magnetic Materials}},
  number       = {{3}},
  publisher    = {{IOP Publishing}},
  title        = {{{Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions}}},
  doi          = {{10.1088/1361-6463/ac2e31}},
  volume       = {{55}},
  year         = {{2021}},
}

@article{22824,
  author       = {{Hermanns, Patrick and Boeddeker, Simon and Bracht, Vera and Bibinov, Nikita and Grundmeier, Guido and Awakowicz, Peter}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation}}},
  doi          = {{10.1088/1361-6463/abbde4}},
  year         = {{2020}},
}

@article{22826,
  author       = {{Hermanns, Patrick and Boeddeker, Simon and Bracht, Vera and Bibinov, Nikita and Grundmeier, Guido and Awakowicz, Peter}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation}}},
  doi          = {{10.1088/1361-6463/abbde4}},
  year         = {{2020}},
}

@article{22537,
  author       = {{Hoppe, C and Mitschker, F and Butterling, M and Liedke, M O and de los Arcos de Pedro, Maria Teresa and Awakowicz, P and Wagner, A and Grundmeier, Guido}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Characterisation of micropores in plasma deposited SiO x  films by means of positron annihilation lifetime spectroscopy}}},
  doi          = {{10.1088/1361-6463/aba8ba}},
  year         = {{2020}},
}

@article{4356,
  author       = {{Guo, Zhongyi and Chen, Xianzhong and Zentgraf, Thomas}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  number       = {{15}},
  publisher    = {{IOP Publishing}},
  title        = {{{Editorial for the theories and applications of metasurfaces}}},
  doi          = {{10.1088/1361-6463/aab3b6}},
  volume       = {{51}},
  year         = {{2018}},
}

@article{22558,
  author       = {{Mitschker, F and Schücke, L and Hoppe, Ch and Jaritz, M and Dahlmann, R and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, Guido and Awakowicz, P}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)}}},
  doi          = {{10.1088/1361-6463/aac0ab}},
  year         = {{2018}},
}

@article{22559,
  author       = {{Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}}},
  doi          = {{10.1088/1361-6463/aab1dd}},
  year         = {{2018}},
}

@article{22849,
  author       = {{Hoppe, Christian and Mitschker, F and Giner, I and de los Arcos, T and Awakowicz, P and Grundmeier, Guido}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}}},
  doi          = {{10.1088/1361-6463/aa69e5}},
  year         = {{2017}},
}

@article{22571,
  author       = {{Mitschker, F and Steves, S and Gebhard, M and Rudolph, M and Schücke, L and Kirchheim, D and Jaritz, M and Brochhagen, M and Hoppe, Ch and Dahlmann, R and Böke, M and Benedikt, J and Giner, I and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, G and Devi, A and Awakowicz, P}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence}}},
  doi          = {{10.1088/1361-6463/aa6e28}},
  year         = {{2017}},
}

@article{22566,
  author       = {{Hoppe, C and Mitschker, F and Giner, I and de los Arcos de Pedro, Maria Teresa and Awakowicz, P and Grundmeier, G}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}}},
  doi          = {{10.1088/1361-6463/aa69e5}},
  year         = {{2017}},
}

@article{22576,
  author       = {{Corbella, Carles and Marcak, Adrian and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Revising secondary electron yields of ion-sputtered metal oxides}}},
  doi          = {{10.1088/0022-3727/49/16/16lt01}},
  year         = {{2016}},
}

@article{22583,
  author       = {{Schröder, Daniel and Burhenn, Sebastian and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, Volker}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge}}},
  doi          = {{10.1088/0022-3727/48/5/055206}},
  year         = {{2015}},
}

@article{22588,
  author       = {{Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}}},
  doi          = {{10.1088/0022-3727/47/47/475204}},
  year         = {{2014}},
}

@article{22594,
  author       = {{Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}}},
  doi          = {{10.1088/0022-3727/46/8/084009}},
  year         = {{2013}},
}

@article{22595,
  author       = {{Winter, J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von der Gathen, V}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity}}},
  doi          = {{10.1088/0022-3727/46/8/084007}},
  year         = {{2013}},
}

@article{8785,
  author       = {{Sander, D and Skomski, R and Enders, A and Schmidthals, C and Reuter, Dirk and Kirschner, J}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  pages        = {{663--670}},
  title        = {{{The correlation between mechanical stress and magnetic properties of ultrathin films}}},
  doi          = {{10.1088/0022-3727/31/6/014}},
  year         = {{2002}},
}