[{"publication":"Journal of Physics D: Applied Physics","type":"journal_article","abstract":[{"lang":"eng","text":"<jats:title>Abstract</jats:title>\r\n                  <jats:p>\r\n                    We investigate electrically induced, near-field coupled dipole resonant mode with a high-quality factor (\r\n                    <jats:italic>Q</jats:italic>\r\n                    ) in a terahertz (THz) meta-waveguide. The waveguide structure is composed of I-shaped aluminum metamaterial constituents, placed periodically on a copper-quartz bilayer substrate in the propagation direction of an incident THz beam. The electric field vector is set along a I-shape design in the transverse direction of the meta-waveguide, leading to the excitation of a strong dipole resonance around the I-shaped meta-atom. The dipole resonance is quite sharp with high\r\n                    <jats:italic>Q</jats:italic>\r\n                    values due to the strong interaction of propagating THz wave with the metamaterial design, unlike traditional terahertz metatareials. The THz transmission response of the waveguide is numerically analyzed to study the dipole resonance, which shows the existence of two resonances due to near-field coupling. Furthermore, the excitation of these dipole resonances and their coupling behavior are confirmed by the electric field distribution of the meta-waveguide. Notably, these dipole resonances can be tuned across a range of frequencies which are integrated with the coupling mechanism, offering a practical route for realizing next-generation photonic devices. We also employ a semi-analytical coupled harmonic oscillator theory to understand the underlying physical mechanisms of the dipole resonators in meta-waveguides and to corroborate our numerically obtained transmission results. The tunability of electrically induced high\r\n                    <jats:italic>Q</jats:italic>\r\n                    -dipole resonance leads to promising applications in highly sensitive sensors, storage devices, electromagnetically induced transparency, and on-chip photonic components.\r\n                  </jats:p>"}],"status":"public","_id":"64825","user_id":"114619","article_number":"075109","language":[{"iso":"eng"}],"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","issue":"7","year":"2026","intvolume":"        59","citation":{"ieee":"U. R. Swargiary, P. Sharma, M. Hossain, and M. Islam, “Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide,” <i>Journal of Physics D: Applied Physics</i>, vol. 59, no. 7, Art. no. 075109, 2026, doi: <a href=\"https://doi.org/10.1088/1361-6463/ae4240\">10.1088/1361-6463/ae4240</a>.","chicago":"Swargiary, Usha Rani, Prabhat Sharma, Manoar Hossain, and Maidul Islam. “Near-Field Coupled High                    <i>Q</i>                    Tunable Electrically Induced Dipole Resonance in Terahertz Meta-Waveguide.” <i>Journal of Physics D: Applied Physics</i> 59, no. 7 (2026). <a href=\"https://doi.org/10.1088/1361-6463/ae4240\">https://doi.org/10.1088/1361-6463/ae4240</a>.","ama":"Swargiary UR, Sharma P, Hossain M, Islam M. Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide. <i>Journal of Physics D: Applied Physics</i>. 2026;59(7). doi:<a href=\"https://doi.org/10.1088/1361-6463/ae4240\">10.1088/1361-6463/ae4240</a>","short":"U.R. Swargiary, P. Sharma, M. Hossain, M. Islam, Journal of Physics D: Applied Physics 59 (2026).","bibtex":"@article{Swargiary_Sharma_Hossain_Islam_2026, title={Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide}, volume={59}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/ae4240\">10.1088/1361-6463/ae4240</a>}, number={7075109}, journal={Journal of Physics D: Applied Physics}, publisher={IOP Publishing}, author={Swargiary, Usha Rani and Sharma, Prabhat and Hossain, Manoar and Islam, Maidul}, year={2026} }","mla":"Swargiary, Usha Rani, et al. “Near-Field Coupled High                    <i>Q</i>                    Tunable Electrically Induced Dipole Resonance in Terahertz Meta-Waveguide.” <i>Journal of Physics D: Applied Physics</i>, vol. 59, no. 7, 075109, IOP Publishing, 2026, doi:<a href=\"https://doi.org/10.1088/1361-6463/ae4240\">10.1088/1361-6463/ae4240</a>.","apa":"Swargiary, U. R., Sharma, P., Hossain, M., &#38; Islam, M. (2026). Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide. <i>Journal of Physics D: Applied Physics</i>, <i>59</i>(7), Article 075109. <a href=\"https://doi.org/10.1088/1361-6463/ae4240\">https://doi.org/10.1088/1361-6463/ae4240</a>"},"publisher":"IOP Publishing","date_updated":"2026-03-04T09:45:12Z","volume":59,"author":[{"first_name":"Usha Rani","last_name":"Swargiary","full_name":"Swargiary, Usha Rani"},{"last_name":"Sharma","full_name":"Sharma, Prabhat","first_name":"Prabhat"},{"last_name":"Hossain","full_name":"Hossain, Manoar","first_name":"Manoar"},{"last_name":"Islam","full_name":"Islam, Maidul","first_name":"Maidul"}],"date_created":"2026-03-04T09:44:33Z","title":"Near-field coupled high                    <i>Q</i>                    tunable electrically induced dipole resonance in terahertz meta-waveguide","doi":"10.1088/1361-6463/ae4240"},{"language":[{"iso":"eng"}],"_id":"65108","department":[{"_id":"302"}],"user_id":"48864","abstract":[{"text":"<jats:title>Abstract</jats:title>\r\n                  <jats:p>Lithographic surface patterning is a cornerstone of modern materials and device fabrication. Although the available lithography techniques are constantly being advanced to push the feature sizes down to the few-nanometer scale, such developments are associated with many technological and economic challenges. Combining established top-down lithography with bottom-up self-assembly strategies has the potential to overcome those challenges and enable the manipulation of matter with molecular precision. One of the most exciting approaches in this regard is to harness the programmability of DNA self-assembly to create precise DNA nanostructure masks to be used in the lithographic patterning of diverse substrates. DNA nanotechnology has provided us with a versatile toolbox for the high-yield synthesis of 2D and 3D nanostructures with complex, user-defined shapes at unprecedented molecular accuracy. Consequently, the last decade has seen intense research efforts aimed at transferring such DNA nanostructure shapes into functional organic and inorganic materials and we have now arrived at a point where sophisticated molecular lithography approaches utilize DNA nanostructure masks for the fabrication of plasmonic surfaces for metamaterials and sensing applications. This review summarizes how the spatial information of such DNA nanostructure masks can be transferred into various organic and inorganic materials through selective etching and deposition steps. The review also discusses recent developments toward all-purpose molecular lithography schemes and highlights promising extensions of the discussed methods toward new materials systems and application fields.</jats:p>","lang":"eng"}],"status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","title":"Molecular lithography with DNA nanostructures: Methods and applications","doi":"10.1088/1361-6463/ae5667","date_updated":"2026-03-25T07:44:52Z","publisher":"IOP Publishing","author":[{"orcid":"0000-0001-7139-3110","last_name":"Keller","id":"48864","full_name":"Keller, Adrian Clemens","first_name":"Adrian Clemens"},{"first_name":"Veikko","full_name":"Linko, Veikko","last_name":"Linko"}],"date_created":"2026-03-25T07:43:24Z","year":"2026","citation":{"apa":"Keller, A. C., &#38; Linko, V. (2026). Molecular lithography with DNA nanostructures: Methods and applications. <i>Journal of Physics D: Applied Physics</i>. <a href=\"https://doi.org/10.1088/1361-6463/ae5667\">https://doi.org/10.1088/1361-6463/ae5667</a>","mla":"Keller, Adrian Clemens, and Veikko Linko. “Molecular Lithography with DNA Nanostructures: Methods and Applications.” <i>Journal of Physics D: Applied Physics</i>, IOP Publishing, 2026, doi:<a href=\"https://doi.org/10.1088/1361-6463/ae5667\">10.1088/1361-6463/ae5667</a>.","bibtex":"@article{Keller_Linko_2026, title={Molecular lithography with DNA nanostructures: Methods and applications}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/ae5667\">10.1088/1361-6463/ae5667</a>}, journal={Journal of Physics D: Applied Physics}, publisher={IOP Publishing}, author={Keller, Adrian Clemens and Linko, Veikko}, year={2026} }","short":"A.C. Keller, V. Linko, Journal of Physics D: Applied Physics (2026).","chicago":"Keller, Adrian Clemens, and Veikko Linko. “Molecular Lithography with DNA Nanostructures: Methods and Applications.” <i>Journal of Physics D: Applied Physics</i>, 2026. <a href=\"https://doi.org/10.1088/1361-6463/ae5667\">https://doi.org/10.1088/1361-6463/ae5667</a>.","ieee":"A. C. Keller and V. Linko, “Molecular lithography with DNA nanostructures: Methods and applications,” <i>Journal of Physics D: Applied Physics</i>, 2026, doi: <a href=\"https://doi.org/10.1088/1361-6463/ae5667\">10.1088/1361-6463/ae5667</a>.","ama":"Keller AC, Linko V. Molecular lithography with DNA nanostructures: Methods and applications. <i>Journal of Physics D: Applied Physics</i>. Published online 2026. doi:<a href=\"https://doi.org/10.1088/1361-6463/ae5667\">10.1088/1361-6463/ae5667</a>"},"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published"},{"status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","language":[{"iso":"eng"}],"article_number":"025101","department":[{"_id":"230"},{"_id":"429"}],"user_id":"14","_id":"23842","citation":{"bibtex":"@article{Baron_Feneberg_Goldhahn_Deppe_Tacken_As_2021, title={Optical evidence of many-body effects in the zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-x}$N alloy system}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/abb97a\">10.1088/1361-6463/abb97a</a>}, number={025101}, journal={Journal of Physics D: Applied Physics}, author={Baron, Elias and Feneberg, Martin and Goldhahn, Rüdiger and Deppe, Michael and Tacken, Fabian and As, Donat Josef}, year={2021} }","mla":"Baron, Elias, et al. “Optical Evidence of Many-Body Effects in the Zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-X}$N Alloy System.” <i>Journal of Physics D: Applied Physics</i>, 025101, 2021, doi:<a href=\"https://doi.org/10.1088/1361-6463/abb97a\">10.1088/1361-6463/abb97a</a>.","short":"E. Baron, M. Feneberg, R. Goldhahn, M. Deppe, F. Tacken, D.J. As, Journal of Physics D: Applied Physics (2021).","apa":"Baron, E., Feneberg, M., Goldhahn, R., Deppe, M., Tacken, F., &#38; As, D. J. (2021). Optical evidence of many-body effects in the zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-x}$N alloy system. <i>Journal of Physics D: Applied Physics</i>. <a href=\"https://doi.org/10.1088/1361-6463/abb97a\">https://doi.org/10.1088/1361-6463/abb97a</a>","ama":"Baron E, Feneberg M, Goldhahn R, Deppe M, Tacken F, As DJ. Optical evidence of many-body effects in the zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-x}$N alloy system. <i>Journal of Physics D: Applied Physics</i>. 2021. doi:<a href=\"https://doi.org/10.1088/1361-6463/abb97a\">10.1088/1361-6463/abb97a</a>","chicago":"Baron, Elias, Martin Feneberg, Rüdiger Goldhahn, Michael Deppe, Fabian Tacken, and Donat Josef As. “Optical Evidence of Many-Body Effects in the Zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-X}$N Alloy System.” <i>Journal of Physics D: Applied Physics</i>, 2021. <a href=\"https://doi.org/10.1088/1361-6463/abb97a\">https://doi.org/10.1088/1361-6463/abb97a</a>.","ieee":"E. Baron, M. Feneberg, R. Goldhahn, M. Deppe, F. Tacken, and D. J. As, “Optical evidence of many-body effects in the zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-x}$N alloy system,” <i>Journal of Physics D: Applied Physics</i>, 2021."},"year":"2021","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","doi":"10.1088/1361-6463/abb97a","title":"Optical evidence of many-body effects in the zincblende Al$_\\mathrm{x}$Ga$_\\mathrm{1-x}$N alloy system","date_created":"2021-09-07T09:19:46Z","author":[{"first_name":"Elias","last_name":"Baron","full_name":"Baron, Elias"},{"first_name":"Martin","last_name":"Feneberg","full_name":"Feneberg, Martin"},{"first_name":"Rüdiger","last_name":"Goldhahn","full_name":"Goldhahn, Rüdiger"},{"first_name":"Michael","full_name":"Deppe, Michael","last_name":"Deppe"},{"full_name":"Tacken, Fabian","last_name":"Tacken","first_name":"Fabian"},{"first_name":"Donat Josef","id":"14","full_name":"As, Donat Josef","orcid":"0000-0003-1121-3565","last_name":"As"}],"date_updated":"2022-01-06T06:56:01Z"},{"date_created":"2021-07-14T06:21:07Z","author":[{"first_name":"Gwanho","last_name":"Yoon","full_name":"Yoon, Gwanho"},{"first_name":"Takuo","last_name":"Tanaka","full_name":"Tanaka, Takuo"},{"first_name":"Thomas","full_name":"Zentgraf, Thomas","id":"30525","last_name":"Zentgraf","orcid":"0000-0002-8662-1101"},{"first_name":"Junsuk","full_name":"Rho, Junsuk","last_name":"Rho"}],"volume":54,"date_updated":"2022-01-06T06:55:39Z","main_file_link":[{"url":"https://iopscience.iop.org/article/10.1088/1361-6463/ac0faa"}],"doi":"10.1088/1361-6463/ac0faa","title":"Recent progress on metasurfaces: applications and fabrication","publication_status":"published","quality_controlled":"1","publication_identifier":{"issn":["0022-3727","1361-6463"]},"citation":{"apa":"Yoon, G., Tanaka, T., Zentgraf, T., &#38; Rho, J. (2021). Recent progress on metasurfaces: applications and fabrication. <i>Journal of Physics D: Applied Physics</i>, <i>54</i>. <a href=\"https://doi.org/10.1088/1361-6463/ac0faa\">https://doi.org/10.1088/1361-6463/ac0faa</a>","bibtex":"@article{Yoon_Tanaka_Zentgraf_Rho_2021, title={Recent progress on metasurfaces: applications and fabrication}, volume={54}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/ac0faa\">10.1088/1361-6463/ac0faa</a>}, number={383002}, journal={Journal of Physics D: Applied Physics}, author={Yoon, Gwanho and Tanaka, Takuo and Zentgraf, Thomas and Rho, Junsuk}, year={2021} }","mla":"Yoon, Gwanho, et al. “Recent Progress on Metasurfaces: Applications and Fabrication.” <i>Journal of Physics D: Applied Physics</i>, vol. 54, 383002, 2021, doi:<a href=\"https://doi.org/10.1088/1361-6463/ac0faa\">10.1088/1361-6463/ac0faa</a>.","short":"G. Yoon, T. Tanaka, T. Zentgraf, J. Rho, Journal of Physics D: Applied Physics 54 (2021).","ama":"Yoon G, Tanaka T, Zentgraf T, Rho J. Recent progress on metasurfaces: applications and fabrication. <i>Journal of Physics D: Applied Physics</i>. 2021;54. doi:<a href=\"https://doi.org/10.1088/1361-6463/ac0faa\">10.1088/1361-6463/ac0faa</a>","chicago":"Yoon, Gwanho, Takuo Tanaka, Thomas Zentgraf, and Junsuk Rho. “Recent Progress on Metasurfaces: Applications and Fabrication.” <i>Journal of Physics D: Applied Physics</i> 54 (2021). <a href=\"https://doi.org/10.1088/1361-6463/ac0faa\">https://doi.org/10.1088/1361-6463/ac0faa</a>.","ieee":"G. Yoon, T. Tanaka, T. Zentgraf, and J. Rho, “Recent progress on metasurfaces: applications and fabrication,” <i>Journal of Physics D: Applied Physics</i>, vol. 54, 2021."},"intvolume":"        54","year":"2021","user_id":"30525","department":[{"_id":"15"},{"_id":"230"},{"_id":"289"}],"_id":"22723","language":[{"iso":"eng"}],"article_type":"review","article_number":"383002","type":"journal_article","publication":"Journal of Physics D: Applied Physics","status":"public"},{"_id":"34647","department":[{"_id":"302"}],"user_id":"48864","keyword":["Surfaces","Coatings and Films","Acoustics and Ultrasonics","Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"article_number":"035204","language":[{"iso":"eng"}],"publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public","date_updated":"2022-12-21T09:32:39Z","publisher":"IOP Publishing","volume":55,"author":[{"last_name":"Brögelmann","full_name":"Brögelmann, T","first_name":"T"},{"first_name":"K","last_name":"Bobzin","full_name":"Bobzin, K"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"T","last_name":"de los Arcos","full_name":"de los Arcos, T"},{"last_name":"Kruppe","full_name":"Kruppe, N C","first_name":"N C"},{"first_name":"S","last_name":"Schwiderek","full_name":"Schwiderek, S"},{"first_name":"M","last_name":"Carlet","full_name":"Carlet, M"}],"date_created":"2022-12-21T09:32:09Z","title":"Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions","doi":"10.1088/1361-6463/ac2e31","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","issue":"3","year":"2021","intvolume":"        55","citation":{"apa":"Brögelmann, T., Bobzin, K., Grundmeier, G., de los Arcos, T., Kruppe, N. C., Schwiderek, S., &#38; Carlet, M. (2021). Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions. <i>Journal of Physics D: Applied Physics</i>, <i>55</i>(3), Article 035204. <a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">https://doi.org/10.1088/1361-6463/ac2e31</a>","bibtex":"@article{Brögelmann_Bobzin_Grundmeier_de los Arcos_Kruppe_Schwiderek_Carlet_2021, title={Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions}, volume={55}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">10.1088/1361-6463/ac2e31</a>}, number={3035204}, journal={Journal of Physics D: Applied Physics}, publisher={IOP Publishing}, author={Brögelmann, T and Bobzin, K and Grundmeier, Guido and de los Arcos, T and Kruppe, N C and Schwiderek, S and Carlet, M}, year={2021} }","mla":"Brögelmann, T., et al. “Durability of Nanolayer Ti–Al–O–N Hard Coatings under Simulated Polycarbonate Melt Processing Conditions.” <i>Journal of Physics D: Applied Physics</i>, vol. 55, no. 3, 035204, IOP Publishing, 2021, doi:<a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">10.1088/1361-6463/ac2e31</a>.","short":"T. Brögelmann, K. Bobzin, G. Grundmeier, T. de los Arcos, N.C. Kruppe, S. Schwiderek, M. Carlet, Journal of Physics D: Applied Physics 55 (2021).","ama":"Brögelmann T, Bobzin K, Grundmeier G, et al. Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions. <i>Journal of Physics D: Applied Physics</i>. 2021;55(3). doi:<a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">10.1088/1361-6463/ac2e31</a>","chicago":"Brögelmann, T, K Bobzin, Guido Grundmeier, T de los Arcos, N C Kruppe, S Schwiderek, and M Carlet. “Durability of Nanolayer Ti–Al–O–N Hard Coatings under Simulated Polycarbonate Melt Processing Conditions.” <i>Journal of Physics D: Applied Physics</i> 55, no. 3 (2021). <a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">https://doi.org/10.1088/1361-6463/ac2e31</a>.","ieee":"T. Brögelmann <i>et al.</i>, “Durability of nanolayer Ti–Al–O–N hard coatings under simulated polycarbonate melt processing conditions,” <i>Journal of Physics D: Applied Physics</i>, vol. 55, no. 3, Art. no. 035204, 2021, doi: <a href=\"https://doi.org/10.1088/1361-6463/ac2e31\">10.1088/1361-6463/ac2e31</a>."}},{"citation":{"chicago":"Hermanns, Patrick, Simon Boeddeker, Vera Bracht, Nikita Bibinov, Guido Grundmeier, and Peter Awakowicz. “Investigation of the Frequency Dependent Spatio-Temporal Dynamics and Controllability of Microdischarges in Unipolar Pulsed Plasma Electrolytic Oxidation.” <i>Journal of Physics D: Applied Physics</i>, 2020. <a href=\"https://doi.org/10.1088/1361-6463/abbde4\">https://doi.org/10.1088/1361-6463/abbde4</a>.","ieee":"P. Hermanns, S. Boeddeker, V. Bracht, N. Bibinov, G. Grundmeier, and P. Awakowicz, “Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation,” <i>Journal of Physics D: Applied Physics</i>, 2020.","ama":"Hermanns P, Boeddeker S, Bracht V, Bibinov N, Grundmeier G, Awakowicz P. Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation. <i>Journal of Physics D: Applied Physics</i>. 2020. doi:<a href=\"https://doi.org/10.1088/1361-6463/abbde4\">10.1088/1361-6463/abbde4</a>","apa":"Hermanns, P., Boeddeker, S., Bracht, V., Bibinov, N., Grundmeier, G., &#38; Awakowicz, P. (2020). Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation. <i>Journal of Physics D: Applied Physics</i>. <a href=\"https://doi.org/10.1088/1361-6463/abbde4\">https://doi.org/10.1088/1361-6463/abbde4</a>","short":"P. Hermanns, S. Boeddeker, V. Bracht, N. Bibinov, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2020).","mla":"Hermanns, Patrick, et al. “Investigation of the Frequency Dependent Spatio-Temporal Dynamics and Controllability of Microdischarges in Unipolar Pulsed Plasma Electrolytic Oxidation.” <i>Journal of Physics D: Applied Physics</i>, 045205, 2020, doi:<a href=\"https://doi.org/10.1088/1361-6463/abbde4\">10.1088/1361-6463/abbde4</a>.","bibtex":"@article{Hermanns_Boeddeker_Bracht_Bibinov_Grundmeier_Awakowicz_2020, title={Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/abbde4\">10.1088/1361-6463/abbde4</a>}, number={045205}, journal={Journal of Physics D: Applied Physics}, author={Hermanns, Patrick and Boeddeker, Simon and Bracht, Vera and Bibinov, Nikita and Grundmeier, Guido and Awakowicz, Peter}, year={2020} }"},"year":"2020","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"doi":"10.1088/1361-6463/abbde4","title":"Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation","author":[{"first_name":"Patrick","last_name":"Hermanns","full_name":"Hermanns, Patrick"},{"full_name":"Boeddeker, Simon","last_name":"Boeddeker","first_name":"Simon"},{"full_name":"Bracht, Vera","last_name":"Bracht","first_name":"Vera"},{"first_name":"Nikita","last_name":"Bibinov","full_name":"Bibinov, Nikita"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"}],"date_created":"2021-07-27T14:03:08Z","date_updated":"2022-01-06T06:55:42Z","status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","language":[{"iso":"eng"}],"article_number":"045205","user_id":"194","_id":"22824"},{"language":[{"iso":"eng"}],"article_number":"045205","user_id":"194","_id":"22826","status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","doi":"10.1088/1361-6463/abbde4","title":"Investigation of the frequency dependent spatio-temporal dynamics and controllability of microdischarges in unipolar pulsed plasma electrolytic oxidation","author":[{"first_name":"Patrick","last_name":"Hermanns","full_name":"Hermanns, Patrick"},{"full_name":"Boeddeker, Simon","last_name":"Boeddeker","first_name":"Simon"},{"last_name":"Bracht","full_name":"Bracht, Vera","first_name":"Vera"},{"last_name":"Bibinov","full_name":"Bibinov, Nikita","first_name":"Nikita"},{"full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"}],"date_created":"2021-07-27T14:07:04Z","date_updated":"2022-01-06T06:55:42Z","citation":{"apa":"Hermanns, P., Boeddeker, S., Bracht, V., Bibinov, N., Grundmeier, G., &#38; Awakowicz, P. 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Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">https://doi.org/10.1088/1361-6463/aa6e28</a>"}},{"language":[{"iso":"eng"}],"article_number":"204002","department":[{"_id":"302"}],"user_id":"54556","_id":"22566","status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","doi":"10.1088/1361-6463/aa69e5","title":"Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms","date_created":"2021-07-07T09:08:02Z","author":[{"full_name":"Hoppe, C","last_name":"Hoppe","first_name":"C"},{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"last_name":"Giner","full_name":"Giner, I","first_name":"I"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"P","full_name":"Awakowicz, P","last_name":"Awakowicz"},{"first_name":"G","last_name":"Grundmeier","full_name":"Grundmeier, G"}],"date_updated":"2023-01-24T08:13:17Z","citation":{"short":"C. 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