@article{58609,
  abstract     = {{Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary field of low temperature plasma science.}},
  author       = {{de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas and Gergs, Tobias and Jenderny, Jonathan and Kemaneci, Efe and Kühne, Thomas D. and Kusmierz, Simon and Mussenbrock, Thomas and Rubner, Jens and Trieschmann, Jan and Wessling, Matthias and Xie, Xiaofan and Zanders, David and Zysk, Frederik and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{PLASMA PROCESSES AND POLYMERS}},
  pages        = {{e2300186}},
  title        = {{{PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films}}},
  doi          = {{10.1002/ppap.202300186}},
  year         = {{2023}},
}

@article{58610,
  author       = {{de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Benedikt, Jan and Biskup, Beatrix and Böke, Marc and Boysen, Nils and Buschhaus, Rahel and Dahlmann, Rainer and Devi, Anjana and Gergs, Tobias and Jenderny, Jonathan and von Keudell, Achim and Kühne, Thomas D. and Kusmierz, Simon and Müller, Hendrik and Mussenbrock, Thomas and Trieschmann, Jan and Zanders, David and Zysk, Frederik and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{PLASMA PROCESSES AND POLYMERS}},
  pages        = {{e2300150}},
  title        = {{{PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth}}},
  doi          = {{10.1002/ppap.202300150}},
  year         = {{2023}},
}

@article{34648,
  author       = {{Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and Arcos, Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{4}},
  publisher    = {{Wiley}},
  title        = {{{Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}}},
  doi          = {{10.1002/ppap.202100174}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{34650,
  author       = {{Xie, Xiaofan and de los Arcos, Teresa and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{11}},
  publisher    = {{Wiley}},
  title        = {{{Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation}}},
  doi          = {{10.1002/ppap.202200052}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{35977,
  author       = {{Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{4}},
  publisher    = {{Wiley}},
  title        = {{{Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}}},
  doi          = {{10.1002/ppap.202100174}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{35974,
  author       = {{Xie, Xiaofan and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{11}},
  publisher    = {{Wiley}},
  title        = {{{Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation}}},
  doi          = {{10.1002/ppap.202200052}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{22838,
  author       = {{Gebhard, Maximilian and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  title        = {{{A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD}}},
  doi          = {{10.1002/ppap.201700209}},
  year         = {{2018}},
}

@article{22839,
  author       = {{Gebhard, Maximilian and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  title        = {{{A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD}}},
  doi          = {{10.1002/ppap.201700209}},
  year         = {{2018}},
}

@article{22547,
  author       = {{Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  title        = {{{Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}}},
  doi          = {{10.1002/ppap.201700230}},
  year         = {{2018}},
}

@article{22579,
  author       = {{Grundmeier, Guido and von Keudell, Achim and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{926--940}},
  title        = {{{Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces}}},
  doi          = {{10.1002/ppap.201500087}},
  year         = {{2015}},
}

@article{22582,
  author       = {{Mitschker, Felix and Dietrich, Jan and Ozkaya, Berkem and de los Arcos de Pedro, Maria Teresa and Giner, Ignacio and Awakowicz, Peter and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1002--1009}},
  title        = {{{Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films}}},
  doi          = {{10.1002/ppap.201500085}},
  year         = {{2015}},
}

@article{22592,
  author       = {{Rügner, Katja and Reuter, Rüdiger and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim and Benedikt, Jan}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1061--1073}},
  title        = {{{Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure}}},
  doi          = {{10.1002/ppap.201300059}},
  year         = {{2013}},
}

@article{22604,
  author       = {{Reuter, Rüdiger and Rügner, Katja and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim and Benedikt, Jan}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1116--1124}},
  title        = {{{The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure}}},
  doi          = {{10.1002/ppap.201100146}},
  year         = {{2012}},
}