TY - JOUR AU - Hoppe, Christian AU - Mitschker, Felix AU - Mai, Lukas AU - Liedke, Maciej Oskar AU - Arcos, Teresa AU - Awakowicz, Peter AU - Devi, Anjana AU - Attallah, Ahmed Gamal AU - Butterling, Maik AU - Wagner, Andreas AU - Grundmeier, Guido ID - 34648 IS - 4 JF - Plasma Processes and Polymers KW - Polymers and Plastics KW - Condensed Matter Physics SN - 1612-8850 TI - Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS VL - 19 ER - TY - JOUR AU - Xie, Xiaofan AU - de los Arcos, Teresa AU - Grundmeier, Guido ID - 34650 IS - 11 JF - Plasma Processes and Polymers KW - Polymers and Plastics KW - Condensed Matter Physics SN - 1612-8850 TI - Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation VL - 19 ER - TY - JOUR AU - Hoppe, Christian AU - Mitschker, Felix AU - Mai, Lukas AU - Liedke, Maciej Oskar AU - de los Arcos de Pedro, Maria Teresa AU - Awakowicz, Peter AU - Devi, Anjana AU - Attallah, Ahmed Gamal AU - Butterling, Maik AU - Wagner, Andreas AU - Grundmeier, Guido ID - 35977 IS - 4 JF - Plasma Processes and Polymers KW - Polymers and Plastics KW - Condensed Matter Physics SN - 1612-8850 TI - Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS VL - 19 ER - TY - JOUR AU - Xie, Xiaofan AU - de los Arcos de Pedro, Maria Teresa AU - Grundmeier, Guido ID - 35974 IS - 11 JF - Plasma Processes and Polymers KW - Polymers and Plastics KW - Condensed Matter Physics SN - 1612-8850 TI - Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation VL - 19 ER - TY - JOUR AU - Gebhard, Maximilian AU - Mitschker, Felix AU - Hoppe, Christian AU - Aghaee, Morteza AU - Rogalla, Detlef AU - Creatore, Mariadriana AU - Grundmeier, Guido AU - Awakowicz, Peter AU - Devi, Anjana ID - 22838 JF - Plasma Processes and Polymers SN - 1612-8850 TI - A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD ER - TY - JOUR AU - Gebhard, Maximilian AU - Mitschker, Felix AU - Hoppe, Christian AU - Aghaee, Morteza AU - Rogalla, Detlef AU - Creatore, Mariadriana AU - Grundmeier, Guido AU - Awakowicz, Peter AU - Devi, Anjana ID - 22839 JF - Plasma Processes and Polymers SN - 1612-8850 TI - A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD ER - TY - JOUR AU - Budde, Maik AU - Corbella, Carles AU - Große-Kreul, Simon AU - de los Arcos de Pedro, Maria Teresa AU - Grundmeier, Guido AU - von Keudell, Achim ID - 22547 JF - Plasma Processes and Polymers SN - 1612-8850 TI - Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas ER - TY - JOUR AU - Grundmeier, Guido AU - von Keudell, Achim AU - de los Arcos de Pedro, Maria Teresa ID - 22579 JF - Plasma Processes and Polymers SN - 1612-8850 TI - Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces ER - TY - JOUR AU - Mitschker, Felix AU - Dietrich, Jan AU - Ozkaya, Berkem AU - de los Arcos de Pedro, Maria Teresa AU - Giner, Ignacio AU - Awakowicz, Peter AU - Grundmeier, Guido ID - 22582 JF - Plasma Processes and Polymers SN - 1612-8850 TI - Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films ER - TY - JOUR AU - Rügner, Katja AU - Reuter, Rüdiger AU - Ellerweg, Dirk AU - de los Arcos de Pedro, Maria Teresa AU - von Keudell, Achim AU - Benedikt, Jan ID - 22592 JF - Plasma Processes and Polymers SN - 1612-8850 TI - Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure ER - TY - JOUR AU - Reuter, Rüdiger AU - Rügner, Katja AU - Ellerweg, Dirk AU - de los Arcos de Pedro, Maria Teresa AU - von Keudell, Achim AU - Benedikt, Jan ID - 22604 JF - Plasma Processes and Polymers SN - 1612-8850 TI - The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure ER -