TY - JOUR
AU - Hoppe, Christian
AU - Mitschker, Felix
AU - Mai, Lukas
AU - Liedke, Maciej Oskar
AU - Arcos, Teresa
AU - Awakowicz, Peter
AU - Devi, Anjana
AU - Attallah, Ahmed Gamal
AU - Butterling, Maik
AU - Wagner, Andreas
AU - Grundmeier, Guido
ID - 34648
IS - 4
JF - Plasma Processes and Polymers
KW - Polymers and Plastics
KW - Condensed Matter Physics
SN - 1612-8850
TI - Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS
VL - 19
ER -
TY - JOUR
AU - Xie, Xiaofan
AU - de los Arcos, Teresa
AU - Grundmeier, Guido
ID - 34650
IS - 11
JF - Plasma Processes and Polymers
KW - Polymers and Plastics
KW - Condensed Matter Physics
SN - 1612-8850
TI - Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
VL - 19
ER -
TY - JOUR
AU - Hoppe, Christian
AU - Mitschker, Felix
AU - Mai, Lukas
AU - Liedke, Maciej Oskar
AU - de los Arcos de Pedro, Maria Teresa
AU - Awakowicz, Peter
AU - Devi, Anjana
AU - Attallah, Ahmed Gamal
AU - Butterling, Maik
AU - Wagner, Andreas
AU - Grundmeier, Guido
ID - 35977
IS - 4
JF - Plasma Processes and Polymers
KW - Polymers and Plastics
KW - Condensed Matter Physics
SN - 1612-8850
TI - Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS
VL - 19
ER -
TY - JOUR
AU - Xie, Xiaofan
AU - de los Arcos de Pedro, Maria Teresa
AU - Grundmeier, Guido
ID - 35974
IS - 11
JF - Plasma Processes and Polymers
KW - Polymers and Plastics
KW - Condensed Matter Physics
SN - 1612-8850
TI - Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
VL - 19
ER -
TY - JOUR
AU - Gebhard, Maximilian
AU - Mitschker, Felix
AU - Hoppe, Christian
AU - Aghaee, Morteza
AU - Rogalla, Detlef
AU - Creatore, Mariadriana
AU - Grundmeier, Guido
AU - Awakowicz, Peter
AU - Devi, Anjana
ID - 22838
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
ER -
TY - JOUR
AU - Gebhard, Maximilian
AU - Mitschker, Felix
AU - Hoppe, Christian
AU - Aghaee, Morteza
AU - Rogalla, Detlef
AU - Creatore, Mariadriana
AU - Grundmeier, Guido
AU - Awakowicz, Peter
AU - Devi, Anjana
ID - 22839
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
ER -
TY - JOUR
AU - Budde, Maik
AU - Corbella, Carles
AU - Große-Kreul, Simon
AU - de los Arcos de Pedro, Maria Teresa
AU - Grundmeier, Guido
AU - von Keudell, Achim
ID - 22547
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas
ER -
TY - JOUR
AU - Grundmeier, Guido
AU - von Keudell, Achim
AU - de los Arcos de Pedro, Maria Teresa
ID - 22579
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces
ER -
TY - JOUR
AU - Mitschker, Felix
AU - Dietrich, Jan
AU - Ozkaya, Berkem
AU - de los Arcos de Pedro, Maria Teresa
AU - Giner, Ignacio
AU - Awakowicz, Peter
AU - Grundmeier, Guido
ID - 22582
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films
ER -
TY - JOUR
AU - Rügner, Katja
AU - Reuter, Rüdiger
AU - Ellerweg, Dirk
AU - de los Arcos de Pedro, Maria Teresa
AU - von Keudell, Achim
AU - Benedikt, Jan
ID - 22592
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
ER -
TY - JOUR
AU - Reuter, Rüdiger
AU - Rügner, Katja
AU - Ellerweg, Dirk
AU - de los Arcos de Pedro, Maria Teresa
AU - von Keudell, Achim
AU - Benedikt, Jan
ID - 22604
JF - Plasma Processes and Polymers
SN - 1612-8850
TI - The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure
ER -