---
_id: '58609'
abstract:
- lang: eng
text: Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary
field of low temperature plasma science.
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Marc
full_name: Böke, Marc
last_name: Böke
- first_name: Nils
full_name: Boysen, Nils
last_name: Boysen
- first_name: Ralf Peter
full_name: Brinkmann, Ralf Peter
last_name: Brinkmann
- first_name: Rainer
full_name: Dahlmann, Rainer
last_name: Dahlmann
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Denis
full_name: Eremin, Denis
last_name: Eremin
- first_name: Jonas
full_name: Franke, Jonas
last_name: Franke
- first_name: Tobias
full_name: Gergs, Tobias
last_name: Gergs
- first_name: Jonathan
full_name: Jenderny, Jonathan
last_name: Jenderny
- first_name: Efe
full_name: Kemaneci, Efe
last_name: Kemaneci
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Simon
full_name: Kusmierz, Simon
last_name: Kusmierz
- first_name: Thomas
full_name: Mussenbrock, Thomas
last_name: Mussenbrock
- first_name: Jens
full_name: Rubner, Jens
last_name: Rubner
- first_name: Jan
full_name: Trieschmann, Jan
last_name: Trieschmann
- first_name: Matthias
full_name: Wessling, Matthias
last_name: Wessling
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: David
full_name: Zanders, David
last_name: Zanders
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: 'de los Arcos de Pedro MT, Awakowicz P, Böke M, et al. PECVD and PEALD on polymer
substrates (part II): Understanding and tuning of barrier and membrane properties
of thin films. PLASMA PROCESSES AND POLYMERS. Published online 2023:e2300186.
doi:10.1002/ppap.202300186'
apa: 'de los Arcos de Pedro, M. T., Awakowicz, P., Böke, M., Boysen, N., Brinkmann,
R. P., Dahlmann, R., Devi, A., Eremin, D., Franke, J., Gergs, T., Jenderny, J.,
Kemaneci, E., Kühne, T. D., Kusmierz, S., Mussenbrock, T., Rubner, J., Trieschmann,
J., Wessling, M., Xie, X., … Grundmeier, G. (2023). PECVD and PEALD on polymer
substrates (part II): Understanding and tuning of barrier and membrane properties
of thin films. PLASMA PROCESSES AND POLYMERS, e2300186. https://doi.org/10.1002/ppap.202300186'
bibtex: '@article{de los Arcos de Pedro_Awakowicz_Böke_Boysen_Brinkmann_Dahlmann_Devi_Eremin_Franke_Gergs_et
al._2023, title={PECVD and PEALD on polymer substrates (part II): Understanding
and tuning of barrier and membrane properties of thin films}, DOI={10.1002/ppap.202300186},
journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria
Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf
Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas
and Gergs, Tobias and et al.}, year={2023}, pages={e2300186} }'
chicago: 'Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Marc Böke, Nils
Boysen, Ralf Peter Brinkmann, Rainer Dahlmann, Anjana Devi, et al. “PECVD and
PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and
Membrane Properties of Thin Films.” PLASMA PROCESSES AND POLYMERS, 2023,
e2300186. https://doi.org/10.1002/ppap.202300186.'
ieee: 'M. T. de los Arcos de Pedro et al., “PECVD and PEALD on polymer substrates
(part II): Understanding and tuning of barrier and membrane properties of thin
films,” PLASMA PROCESSES AND POLYMERS, p. e2300186, 2023, doi: 10.1002/ppap.202300186.'
mla: 'de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates
(Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin
Films.” PLASMA PROCESSES AND POLYMERS, 2023, p. e2300186, doi:10.1002/ppap.202300186.'
short: M.T. de los Arcos de Pedro, P. Awakowicz, M. Böke, N. Boysen, R.P. Brinkmann,
R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci,
T.D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling,
X. Xie, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023)
e2300186.
date_created: 2025-02-12T14:47:57Z
date_updated: 2025-02-12T14:54:12Z
department:
- _id: '302'
doi: 10.1002/ppap.202300186
language:
- iso: eng
page: e2300186
publication: PLASMA PROCESSES AND POLYMERS
publication_identifier:
issn:
- 1612-8850
status: public
title: 'PECVD and PEALD on polymer substrates (part II): Understanding and tuning
of barrier and membrane properties of thin films'
type: journal_article
user_id: '54556'
year: '2023'
...
---
_id: '58610'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
- first_name: Beatrix
full_name: Biskup, Beatrix
last_name: Biskup
- first_name: Marc
full_name: Böke, Marc
last_name: Böke
- first_name: Nils
full_name: Boysen, Nils
last_name: Boysen
- first_name: Rahel
full_name: Buschhaus, Rahel
last_name: Buschhaus
- first_name: Rainer
full_name: Dahlmann, Rainer
last_name: Dahlmann
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Tobias
full_name: Gergs, Tobias
last_name: Gergs
- first_name: Jonathan
full_name: Jenderny, Jonathan
last_name: Jenderny
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Simon
full_name: Kusmierz, Simon
last_name: Kusmierz
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Thomas
full_name: Mussenbrock, Thomas
last_name: Mussenbrock
- first_name: Jan
full_name: Trieschmann, Jan
last_name: Trieschmann
- first_name: David
full_name: Zanders, David
last_name: Zanders
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: 'de los Arcos de Pedro MT, Awakowicz P, Benedikt J, et al. PECVD and PEALD
on polymer substrates (part I): Fundamentals and analysis of plasma activation
and thin film growth. PLASMA PROCESSES AND POLYMERS. Published online 2023:e2300150.
doi:10.1002/ppap.202300150'
apa: 'de los Arcos de Pedro, M. T., Awakowicz, P., Benedikt, J., Biskup, B., Böke,
M., Boysen, N., Buschhaus, R., Dahlmann, R., Devi, A., Gergs, T., Jenderny, J.,
von Keudell, A., Kühne, T. D., Kusmierz, S., Müller, H., Mussenbrock, T., Trieschmann,
J., Zanders, D., Zysk, F., & Grundmeier, G. (2023). PECVD and PEALD on polymer
substrates (part I): Fundamentals and analysis of plasma activation and thin film
growth. PLASMA PROCESSES AND POLYMERS, e2300150. https://doi.org/10.1002/ppap.202300150'
bibtex: '@article{de los Arcos de Pedro_Awakowicz_Benedikt_Biskup_Böke_Boysen_Buschhaus_Dahlmann_Devi_Gergs_et
al._2023, title={PECVD and PEALD on polymer substrates (part I): Fundamentals
and analysis of plasma activation and thin film growth}, DOI={10.1002/ppap.202300150},
journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria
Teresa and Awakowicz, Peter and Benedikt, Jan and Biskup, Beatrix and Böke, Marc
and Boysen, Nils and Buschhaus, Rahel and Dahlmann, Rainer and Devi, Anjana and
Gergs, Tobias and et al.}, year={2023}, pages={e2300150} }'
chicago: 'Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Jan Benedikt, Beatrix
Biskup, Marc Böke, Nils Boysen, Rahel Buschhaus, et al. “PECVD and PEALD on Polymer
Substrates (Part I): Fundamentals and Analysis of Plasma Activation and Thin Film
Growth.” PLASMA PROCESSES AND POLYMERS, 2023, e2300150. https://doi.org/10.1002/ppap.202300150.'
ieee: 'M. T. de los Arcos de Pedro et al., “PECVD and PEALD on polymer substrates
(part I): Fundamentals and analysis of plasma activation and thin film growth,”
PLASMA PROCESSES AND POLYMERS, p. e2300150, 2023, doi: 10.1002/ppap.202300150.'
mla: 'de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates
(Part I): Fundamentals and Analysis of Plasma Activation and Thin Film Growth.”
PLASMA PROCESSES AND POLYMERS, 2023, p. e2300150, doi:10.1002/ppap.202300150.'
short: M.T. de los Arcos de Pedro, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke,
N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell,
T.D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders,
F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300150.
date_created: 2025-02-12T14:48:27Z
date_updated: 2025-02-12T14:54:43Z
department:
- _id: '302'
doi: 10.1002/ppap.202300150
language:
- iso: eng
page: e2300150
publication: PLASMA PROCESSES AND POLYMERS
publication_identifier:
issn:
- 1612-8850
status: public
title: 'PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis
of plasma activation and thin film growth'
type: journal_article
user_id: '54556'
year: '2023'
...
---
_id: '34648'
article_number: '2100174'
author:
- first_name: Christian
full_name: Hoppe, Christian
id: '27401'
last_name: Hoppe
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Lukas
full_name: Mai, Lukas
last_name: Mai
- first_name: Maciej Oskar
full_name: Liedke, Maciej Oskar
last_name: Liedke
- first_name: Teresa
full_name: Arcos, Teresa
last_name: Arcos
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Ahmed Gamal
full_name: Attallah, Ahmed Gamal
last_name: Attallah
- first_name: Maik
full_name: Butterling, Maik
last_name: Butterling
- first_name: Andreas
full_name: Wagner, Andreas
last_name: Wagner
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the
microporosity of PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers.
2022;19(4). doi:10.1002/ppap.202100174
apa: Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., Arcos, T., Awakowicz, P.,
Devi, A., Attallah, A. G., Butterling, M., Wagner, A., & Grundmeier, G. (2022).
Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO
x thin films
on PDMS. Plasma Processes and Polymers, 19(4), Article 2100174.
https://doi.org/10.1002/ppap.202100174
bibtex: '@article{Hoppe_Mitschker_Mai_Liedke_Arcos_Awakowicz_Devi_Attallah_Butterling_Wagner_et
al._2022, title={Influence of surface activation on the microporosity of PE‐CVD
and PE‐ALD SiO x
thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174},
number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej
Oskar and Arcos, Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed
Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }'
chicago: Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Teresa
Arcos, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on
the Microporosity of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers
19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.
ieee: 'C. Hoppe et al., “Influence of surface activation on the microporosity
of PE‐CVD and PE‐ALD SiO x
thin films on PDMS,” Plasma Processes and Polymers, vol. 19,
no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.'
mla: Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity
of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19,
no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.
short: C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi,
A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers
19 (2022).
date_created: 2022-12-21T09:32:52Z
date_updated: 2022-12-21T09:33:14Z
department:
- _id: '302'
doi: 10.1002/ppap.202100174
intvolume: ' 19'
issue: '4'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin
films on PDMS
type: journal_article
user_id: '48864'
volume: 19
year: '2022'
...
---
_id: '34650'
article_number: '2200052'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: Teresa
full_name: de los Arcos, Teresa
last_name: de los Arcos
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Xie X, de los Arcos T, Grundmeier G. Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation.
Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052
apa: Xie, X., de los Arcos, T., & Grundmeier, G. (2022). Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation. Plasma Processes and Polymers, 19(11),
Article 2200052. https://doi.org/10.1002/ppap.202200052
bibtex: '@article{Xie_de los Arcos_Grundmeier_2022, title={Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052},
number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Xie, Xiaofan and de los Arcos, Teresa and Grundmeier, Guido}, year={2022}
}'
chicago: Xie, Xiaofan, Teresa de los Arcos, and Guido Grundmeier. “Comparative Analysis
of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before
and after Plasma Oxidation.” Plasma Processes and Polymers 19, no. 11 (2022).
https://doi.org/10.1002/ppap.202200052.
ieee: 'X. Xie, T. de los Arcos, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,”
Plasma Processes and Polymers, vol. 19, no. 11, Art. no. 2200052, 2022,
doi: 10.1002/ppap.202200052.'
mla: Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane
Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes
and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052.
short: X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19
(2022).
date_created: 2022-12-21T09:33:54Z
date_updated: 2022-12-21T09:34:05Z
department:
- _id: '302'
doi: 10.1002/ppap.202200052
intvolume: ' 19'
issue: '11'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma
polymer thin films before and after plasma oxidation
type: journal_article
user_id: '48864'
volume: 19
year: '2022'
...
---
_id: '35977'
article_number: '2100174'
author:
- first_name: Christian
full_name: Hoppe, Christian
last_name: Hoppe
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Lukas
full_name: Mai, Lukas
last_name: Mai
- first_name: Maciej Oskar
full_name: Liedke, Maciej Oskar
last_name: Liedke
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Ahmed Gamal
full_name: Attallah, Ahmed Gamal
last_name: Attallah
- first_name: Maik
full_name: Butterling, Maik
last_name: Butterling
- first_name: Andreas
full_name: Wagner, Andreas
last_name: Wagner
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the
microporosity of PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers.
2022;19(4). doi:10.1002/ppap.202100174
apa: Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., de los Arcos de Pedro, M.
T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &
Grundmeier, G. (2022). Influence of surface activation on the microporosity of
PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers, 19(4),
Article 2100174. https://doi.org/10.1002/ppap.202100174
bibtex: '@article{Hoppe_Mitschker_Mai_Liedke_de los Arcos de Pedro_Awakowicz_Devi_Attallah_Butterling_Wagner_et
al._2022, title={Influence of surface activation on the microporosity of PE‐CVD
and PE‐ALD SiO x
thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174},
number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej
Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana
and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.},
year={2022} }'
chicago: Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Maria
Teresa de los Arcos de Pedro, Peter Awakowicz, Anjana Devi, et al. “Influence
of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO
x Thin Films on PDMS.”
Plasma Processes and Polymers 19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.
ieee: 'C. Hoppe et al., “Influence of surface activation on the microporosity
of PE‐CVD and PE‐ALD SiO x
thin films on PDMS,” Plasma Processes and Polymers, vol. 19,
no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.'
mla: Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity
of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19,
no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.
short: C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro,
P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier,
Plasma Processes and Polymers 19 (2022).
date_created: 2023-01-11T10:10:09Z
date_updated: 2023-01-24T08:07:46Z
department:
- _id: '302'
doi: 10.1002/ppap.202100174
intvolume: ' 19'
issue: '4'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin
films on PDMS
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '35974'
article_number: '2200052'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Xie X, de los Arcos de Pedro MT, Grundmeier G. Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation.
Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052
apa: Xie, X., de los Arcos de Pedro, M. T., & Grundmeier, G. (2022). Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation. Plasma Processes and Polymers,
19(11), Article 2200052. https://doi.org/10.1002/ppap.202200052
bibtex: '@article{Xie_de los Arcos de Pedro_Grundmeier_2022, title={Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052},
number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Xie, Xiaofan and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido},
year={2022} }'
chicago: Xie, Xiaofan, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier.
“Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma
Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes and
Polymers 19, no. 11 (2022). https://doi.org/10.1002/ppap.202200052.
ieee: 'X. Xie, M. T. de los Arcos de Pedro, and G. Grundmeier, “Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation,” Plasma Processes and Polymers, vol. 19, no.
11, Art. no. 2200052, 2022, doi: 10.1002/ppap.202200052.'
mla: Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane
Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes
and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052.
short: X. Xie, M.T. de los Arcos de Pedro, G. Grundmeier, Plasma Processes and Polymers
19 (2022).
date_created: 2023-01-11T10:08:25Z
date_updated: 2023-01-24T08:48:44Z
department:
- _id: '302'
doi: 10.1002/ppap.202200052
intvolume: ' 19'
issue: '11'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma
polymer thin films before and after plasma oxidation
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '22838'
article_number: '1700209'
author:
- first_name: Maximilian
full_name: Gebhard, Maximilian
last_name: Gebhard
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Christian
full_name: Hoppe, Christian
last_name: Hoppe
- first_name: Morteza
full_name: Aghaee, Morteza
last_name: Aghaee
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Mariadriana
full_name: Creatore, Mariadriana
last_name: Creatore
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: 'Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance
barrier properties of thin films on polymers: Seeding and capping of PECVD thin
films by PEALD. Plasma Processes and Polymers. 2018. doi:10.1002/ppap.201700209'
apa: 'Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore,
M., … Devi, A. (2018). A combinatorial approach to enhance barrier properties
of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma
Processes and Polymers. https://doi.org/10.1002/ppap.201700209'
bibtex: '@article{Gebhard_Mitschker_Hoppe_Aghaee_Rogalla_Creatore_Grundmeier_Awakowicz_Devi_2018,
title={A combinatorial approach to enhance barrier properties of thin films on
polymers: Seeding and capping of PECVD thin films by PEALD}, DOI={10.1002/ppap.201700209},
number={1700209}, journal={Plasma Processes and Polymers}, author={Gebhard, Maximilian
and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef
and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi,
Anjana}, year={2018} }'
chicago: 'Gebhard, Maximilian, Felix Mitschker, Christian Hoppe, Morteza Aghaee,
Detlef Rogalla, Mariadriana Creatore, Guido Grundmeier, Peter Awakowicz, and Anjana
Devi. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on
Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” Plasma Processes
and Polymers, 2018. https://doi.org/10.1002/ppap.201700209.'
ieee: 'M. Gebhard et al., “A combinatorial approach to enhance barrier properties
of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,”
Plasma Processes and Polymers, 2018.'
mla: 'Gebhard, Maximilian, et al. “A Combinatorial Approach to Enhance Barrier Properties
of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.”
Plasma Processes and Polymers, 1700209, 2018, doi:10.1002/ppap.201700209.'
short: M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G.
Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).
date_created: 2021-07-27T14:13:38Z
date_updated: 2022-01-06T06:55:42Z
doi: 10.1002/ppap.201700209
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: 'A combinatorial approach to enhance barrier properties of thin films on polymers:
Seeding and capping of PECVD thin films by PEALD'
type: journal_article
user_id: '194'
year: '2018'
...
---
_id: '22839'
article_number: '1700209'
author:
- first_name: Maximilian
full_name: Gebhard, Maximilian
last_name: Gebhard
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Christian
full_name: Hoppe, Christian
id: '27401'
last_name: Hoppe
- first_name: Morteza
full_name: Aghaee, Morteza
last_name: Aghaee
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Mariadriana
full_name: Creatore, Mariadriana
last_name: Creatore
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: 'Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance
barrier properties of thin films on polymers: Seeding and capping of PECVD thin
films by PEALD. Plasma Processes and Polymers. 2018. doi:10.1002/ppap.201700209'
apa: 'Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore,
M., … Devi, A. (2018). A combinatorial approach to enhance barrier properties
of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma
Processes and Polymers. https://doi.org/10.1002/ppap.201700209'
bibtex: '@article{Gebhard_Mitschker_Hoppe_Aghaee_Rogalla_Creatore_Grundmeier_Awakowicz_Devi_2018,
title={A combinatorial approach to enhance barrier properties of thin films on
polymers: Seeding and capping of PECVD thin films by PEALD}, DOI={10.1002/ppap.201700209},
number={1700209}, journal={Plasma Processes and Polymers}, author={Gebhard, Maximilian
and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef
and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi,
Anjana}, year={2018} }'
chicago: 'Gebhard, Maximilian, Felix Mitschker, Christian Hoppe, Morteza Aghaee,
Detlef Rogalla, Mariadriana Creatore, Guido Grundmeier, Peter Awakowicz, and Anjana
Devi. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on
Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” Plasma Processes
and Polymers, 2018. https://doi.org/10.1002/ppap.201700209.'
ieee: 'M. Gebhard et al., “A combinatorial approach to enhance barrier properties
of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,”
Plasma Processes and Polymers, 2018.'
mla: 'Gebhard, Maximilian, et al. “A Combinatorial Approach to Enhance Barrier Properties
of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.”
Plasma Processes and Polymers, 1700209, 2018, doi:10.1002/ppap.201700209.'
short: M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G.
Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).
date_created: 2021-07-27T14:13:58Z
date_updated: 2022-01-06T06:55:42Z
doi: 10.1002/ppap.201700209
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: 'A combinatorial approach to enhance barrier properties of thin films on polymers:
Seeding and capping of PECVD thin films by PEALD'
type: journal_article
user_id: '194'
year: '2018'
...
---
_id: '22547'
article_number: '1700230'
author:
- first_name: Maik
full_name: Budde, Maik
last_name: Budde
- first_name: Carles
full_name: Corbella, Carles
last_name: Corbella
- first_name: Simon
full_name: Große-Kreul, Simon
last_name: Große-Kreul
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
citation:
ama: Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G,
von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer
surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers.
Published online 2018. doi:10.1002/ppap.201700230
apa: Budde, M., Corbella, C., Große-Kreul, S., de los Arcos de Pedro, M. T., Grundmeier,
G., & von Keudell, A. (2018). Decoupling of ion- and photon-activation mechanisms
in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and
Polymers, Article 1700230. https://doi.org/10.1002/ppap.201700230
bibtex: '@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von
Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer
surfaces exposed to low-temperature plasmas}, DOI={10.1002/ppap.201700230},
number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik
and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa
and Grundmeier, Guido and von Keudell, Achim}, year={2018} }'
chicago: Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos
de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation
Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma
Processes and Polymers, 2018. https://doi.org/10.1002/ppap.201700230.
ieee: 'M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier,
and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer
surfaces exposed to low-temperature plasmas,” Plasma Processes and Polymers,
Art. no. 1700230, 2018, doi: 10.1002/ppap.201700230.'
mla: Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in
Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma Processes and
Polymers, 1700230, 2018, doi:10.1002/ppap.201700230.
short: M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier,
A. von Keudell, Plasma Processes and Polymers (2018).
date_created: 2021-07-07T08:50:38Z
date_updated: 2023-01-24T08:37:01Z
department:
- _id: '302'
doi: 10.1002/ppap.201700230
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed
to low-temperature plasmas
type: journal_article
user_id: '54556'
year: '2018'
...
---
_id: '22579'
author:
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
citation:
ama: Grundmeier G, von Keudell A, de los Arcos de Pedro MT. Fundamentals and Applications
of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials
Interfaces. Plasma Processes and Polymers. Published online 2015:926-940.
doi:10.1002/ppap.201500087
apa: Grundmeier, G., von Keudell, A., & de los Arcos de Pedro, M. T. (2015).
Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis
of Plasma Processes at Materials Interfaces. Plasma Processes and Polymers,
926–940. https://doi.org/10.1002/ppap.201500087
bibtex: '@article{Grundmeier_von Keudell_de los Arcos de Pedro_2015, title={Fundamentals
and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes
at Materials Interfaces}, DOI={10.1002/ppap.201500087},
journal={Plasma Processes and Polymers}, author={Grundmeier, Guido and von Keudell,
Achim and de los Arcos de Pedro, Maria Teresa}, year={2015}, pages={926–940} }'
chicago: Grundmeier, Guido, Achim von Keudell, and Maria Teresa de los Arcos de
Pedro. “Fundamentals and Applications of Reflection FTIR Spectroscopy for the
Analysis of Plasma Processes at Materials Interfaces.” Plasma Processes and
Polymers, 2015, 926–40. https://doi.org/10.1002/ppap.201500087.
ieee: 'G. Grundmeier, A. von Keudell, and M. T. de los Arcos de Pedro, “Fundamentals
and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes
at Materials Interfaces,” Plasma Processes and Polymers, pp. 926–940, 2015,
doi: 10.1002/ppap.201500087.'
mla: Grundmeier, Guido, et al. “Fundamentals and Applications of Reflection FTIR
Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces.” Plasma
Processes and Polymers, 2015, pp. 926–40, doi:10.1002/ppap.201500087.
short: G. Grundmeier, A. von Keudell, M.T. de los Arcos de Pedro, Plasma Processes
and Polymers (2015) 926–940.
date_created: 2021-07-07T09:13:51Z
date_updated: 2023-01-24T08:18:39Z
department:
- _id: '302'
doi: 10.1002/ppap.201500087
language:
- iso: eng
page: 926-940
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis
of Plasma Processes at Materials Interfaces
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22582'
author:
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Jan
full_name: Dietrich, Jan
last_name: Dietrich
- first_name: Berkem
full_name: Ozkaya, Berkem
last_name: Ozkaya
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Ignacio
full_name: Giner, Ignacio
last_name: Giner
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: Mitschker F, Dietrich J, Ozkaya B, et al. Spectroscopic and Microscopic Investigations
of Degradation Processes in Polymer Surface-Near Regions During the Deposition
of SiOx Films. Plasma Processes and Polymers. Published online 2015:1002-1009.
doi:10.1002/ppap.201500085
apa: Mitschker, F., Dietrich, J., Ozkaya, B., de los Arcos de Pedro, M. T., Giner,
I., Awakowicz, P., & Grundmeier, G. (2015). Spectroscopic and Microscopic
Investigations of Degradation Processes in Polymer Surface-Near Regions During
the Deposition of SiOx Films. Plasma Processes and Polymers, 1002–1009.
https://doi.org/10.1002/ppap.201500085
bibtex: '@article{Mitschker_Dietrich_Ozkaya_de los Arcos de Pedro_Giner_Awakowicz_Grundmeier_2015,
title={Spectroscopic and Microscopic Investigations of Degradation Processes in
Polymer Surface-Near Regions During the Deposition of SiOx Films}, DOI={10.1002/ppap.201500085},
journal={Plasma Processes and Polymers}, author={Mitschker, Felix and Dietrich,
Jan and Ozkaya, Berkem and de los Arcos de Pedro, Maria Teresa and Giner, Ignacio
and Awakowicz, Peter and Grundmeier, Guido}, year={2015}, pages={1002–1009} }'
chicago: Mitschker, Felix, Jan Dietrich, Berkem Ozkaya, Maria Teresa de los Arcos
de Pedro, Ignacio Giner, Peter Awakowicz, and Guido Grundmeier. “Spectroscopic
and Microscopic Investigations of Degradation Processes in Polymer Surface-Near
Regions During the Deposition of SiOx Films.” Plasma Processes and Polymers,
2015, 1002–9. https://doi.org/10.1002/ppap.201500085.
ieee: 'F. Mitschker et al., “Spectroscopic and Microscopic Investigations
of Degradation Processes in Polymer Surface-Near Regions During the Deposition
of SiOx Films,” Plasma Processes and Polymers, pp. 1002–1009, 2015, doi:
10.1002/ppap.201500085.'
mla: Mitschker, Felix, et al. “Spectroscopic and Microscopic Investigations of Degradation
Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films.”
Plasma Processes and Polymers, 2015, pp. 1002–09, doi:10.1002/ppap.201500085.
short: F. Mitschker, J. Dietrich, B. Ozkaya, M.T. de los Arcos de Pedro, I. Giner,
P. Awakowicz, G. Grundmeier, Plasma Processes and Polymers (2015) 1002–1009.
date_created: 2021-07-07T09:15:22Z
date_updated: 2023-01-24T08:19:38Z
department:
- _id: '302'
doi: 10.1002/ppap.201500085
language:
- iso: eng
page: 1002-1009
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer
Surface-Near Regions During the Deposition of SiOx Films
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22592'
author:
- first_name: Katja
full_name: Rügner, Katja
last_name: Rügner
- first_name: Rüdiger
full_name: Reuter, Rüdiger
last_name: Reuter
- first_name: Dirk
full_name: Ellerweg, Dirk
last_name: Ellerweg
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
citation:
ama: Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt
J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure.
Plasma Processes and Polymers. Published online 2013:1061-1073. doi:10.1002/ppap.201300059
apa: Rügner, K., Reuter, R., Ellerweg, D., de los Arcos de Pedro, M. T., von Keudell,
A., & Benedikt, J. (2013). Insight into the Reaction Scheme of SiO2 Film Deposition
at Atmospheric Pressure. Plasma Processes and Polymers, 1061–1073. https://doi.org/10.1002/ppap.201300059
bibtex: '@article{Rügner_Reuter_Ellerweg_de los Arcos de Pedro_von Keudell_Benedikt_2013,
title={Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric
Pressure}, DOI={10.1002/ppap.201300059},
journal={Plasma Processes and Polymers}, author={Rügner, Katja and Reuter, Rüdiger
and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim
and Benedikt, Jan}, year={2013}, pages={1061–1073} }'
chicago: Rügner, Katja, Rüdiger Reuter, Dirk Ellerweg, Maria Teresa de los Arcos
de Pedro, Achim von Keudell, and Jan Benedikt. “Insight into the Reaction Scheme
of SiO2 Film Deposition at Atmospheric Pressure.” Plasma Processes and Polymers,
2013, 1061–73. https://doi.org/10.1002/ppap.201300059.
ieee: 'K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell,
and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at
Atmospheric Pressure,” Plasma Processes and Polymers, pp. 1061–1073, 2013,
doi: 10.1002/ppap.201300059.'
mla: Rügner, Katja, et al. “Insight into the Reaction Scheme of SiO2 Film Deposition
at Atmospheric Pressure.” Plasma Processes and Polymers, 2013, pp. 1061–73,
doi:10.1002/ppap.201300059.
short: K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell,
J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.
date_created: 2021-07-07T11:13:20Z
date_updated: 2023-01-24T08:22:58Z
department:
- _id: '302'
doi: 10.1002/ppap.201300059
extern: '1'
language:
- iso: eng
page: 1061-1073
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22604'
author:
- first_name: Rüdiger
full_name: Reuter, Rüdiger
last_name: Reuter
- first_name: Katja
full_name: Rügner, Katja
last_name: Rügner
- first_name: Dirk
full_name: Ellerweg, Dirk
last_name: Ellerweg
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
citation:
ama: Reuter R, Rügner K, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt
J. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure. Plasma Processes and Polymers.
Published online 2012:1116-1124. doi:10.1002/ppap.201100146
apa: Reuter, R., Rügner, K., Ellerweg, D., de los Arcos de Pedro, M. T., von Keudell,
A., & Benedikt, J. (2012). The Role of Oxygen and Surface Reactions in the
Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure. Plasma
Processes and Polymers, 1116–1124. https://doi.org/10.1002/ppap.201100146
bibtex: '@article{Reuter_Rügner_Ellerweg_de los Arcos de Pedro_von Keudell_Benedikt_2012,
title={The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure}, DOI={10.1002/ppap.201100146},
journal={Plasma Processes and Polymers}, author={Reuter, Rüdiger and Rügner, Katja
and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim
and Benedikt, Jan}, year={2012}, pages={1116–1124} }'
chicago: Reuter, Rüdiger, Katja Rügner, Dirk Ellerweg, Maria Teresa de los Arcos
de Pedro, Achim von Keudell, and Jan Benedikt. “The Role of Oxygen and Surface
Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric
Pressure.” Plasma Processes and Polymers, 2012, 1116–24. https://doi.org/10.1002/ppap.201100146.
ieee: 'R. Reuter, K. Rügner, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell,
and J. Benedikt, “The Role of Oxygen and Surface Reactions in the Deposition of
Silicon Oxide like Films from HMDSO at Atmospheric Pressure,” Plasma Processes
and Polymers, pp. 1116–1124, 2012, doi: 10.1002/ppap.201100146.'
mla: Reuter, Rüdiger, et al. “The Role of Oxygen and Surface Reactions in the Deposition
of Silicon Oxide like Films from HMDSO at Atmospheric Pressure.” Plasma Processes
and Polymers, 2012, pp. 1116–24, doi:10.1002/ppap.201100146.
short: R. Reuter, K. Rügner, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell,
J. Benedikt, Plasma Processes and Polymers (2012) 1116–1124.
date_created: 2021-07-07T11:30:59Z
date_updated: 2023-01-24T08:26:12Z
department:
- _id: '302'
doi: 10.1002/ppap.201100146
extern: '1'
language:
- iso: eng
page: 1116-1124
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure
type: journal_article
user_id: '54556'
year: '2012'
...