[{"article_number":" mrsf14-1748-ii11-25","_id":"4023","publisher":"Cambridge University Press (CUP)","language":[{"iso":"eng"}],"user_id":"55706","doi":"10.1557/opl.2015.77","volume":1748,"year":"2015","status":"public","title":"An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography","author":[{"id":"30380","last_name":"Brodehl","first_name":"Christoph","full_name":"Brodehl, Christoph"},{"first_name":"Siegmund","last_name":"Greulich-Weber","full_name":"Greulich-Weber, Siegmund"},{"id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner"}],"publication_identifier":{"issn":["1946-4274"]},"publication_status":"published","date_updated":"2022-01-06T07:00:07Z","intvolume":"      1748","date_created":"2018-08-21T13:03:44Z","type":"journal_article","department":[{"_id":"286"},{"_id":"15"}],"publication":"MRS Proceedings","citation":{"bibtex":"@article{Brodehl_Greulich-Weber_Lindner_2015, title={An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography}, volume={1748}, DOI={<a href=\"https://doi.org/10.1557/opl.2015.77\">10.1557/opl.2015.77</a>}, number={mrsf14-1748-ii11-25}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}, year={2015} }","ama":"Brodehl C, Greulich-Weber S, Lindner J. An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography. <i>MRS Proceedings</i>. 2015;1748. doi:<a href=\"https://doi.org/10.1557/opl.2015.77\">10.1557/opl.2015.77</a>","mla":"Brodehl, Christoph, et al. “An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography.” <i>MRS Proceedings</i>, vol. 1748, mrsf14-1748-ii11-25, Cambridge University Press (CUP), 2015, doi:<a href=\"https://doi.org/10.1557/opl.2015.77\">10.1557/opl.2015.77</a>.","short":"C. Brodehl, S. Greulich-Weber, J. Lindner, MRS Proceedings 1748 (2015).","chicago":"Brodehl, Christoph, Siegmund Greulich-Weber, and Jörg Lindner. “An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography.” <i>MRS Proceedings</i> 1748 (2015). <a href=\"https://doi.org/10.1557/opl.2015.77\">https://doi.org/10.1557/opl.2015.77</a>.","ieee":"C. Brodehl, S. Greulich-Weber, and J. Lindner, “An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography,” <i>MRS Proceedings</i>, vol. 1748, 2015.","apa":"Brodehl, C., Greulich-Weber, S., &#38; Lindner, J. (2015). An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography. <i>MRS Proceedings</i>, <i>1748</i>. <a href=\"https://doi.org/10.1557/opl.2015.77\">https://doi.org/10.1557/opl.2015.77</a>"}},{"citation":{"chicago":"As, D.J., R. Kemper, C. Mietze, T. Wecker, Jörg Lindner, P. Veit, A. Dempewolf, F. Bertram, and J. Christen. “Spatially Resolved Optical Emission of Cubic GaN/AlN Multi-Quantum Well Structures.” <i>MRS Proceedings</i> 1736 (2014). <a href=\"https://doi.org/10.1557/opl.2014.944\">https://doi.org/10.1557/opl.2014.944</a>.","short":"D.J. As, R. Kemper, C. Mietze, T. Wecker, J. Lindner, P. Veit, A. Dempewolf, F. Bertram, J. Christen, MRS Proceedings 1736 (2014).","ieee":"D. J. As <i>et al.</i>, “Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures,” <i>MRS Proceedings</i>, vol. 1736, 2014.","apa":"As, D. J., Kemper, R., Mietze, C., Wecker, T., Lindner, J., Veit, P., … Christen, J. (2014). Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures. <i>MRS Proceedings</i>, <i>1736</i>. <a href=\"https://doi.org/10.1557/opl.2014.944\">https://doi.org/10.1557/opl.2014.944</a>","bibtex":"@article{As_Kemper_Mietze_Wecker_Lindner_Veit_Dempewolf_Bertram_Christen_2014, title={Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures}, volume={1736}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.944\">10.1557/opl.2014.944</a>}, number={mrsf14-1736-t03-03}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={As, D.J. and Kemper, R. and Mietze, C. and Wecker, T. and Lindner, Jörg and Veit, P. and Dempewolf, A. and Bertram, F. and Christen, J.}, year={2014} }","ama":"As DJ, Kemper R, Mietze C, et al. Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures. <i>MRS Proceedings</i>. 2014;1736. doi:<a href=\"https://doi.org/10.1557/opl.2014.944\">10.1557/opl.2014.944</a>","mla":"As, D. J., et al. “Spatially Resolved Optical Emission of Cubic GaN/AlN Multi-Quantum Well Structures.” <i>MRS Proceedings</i>, vol. 1736, mrsf14-1736-t03-03, Cambridge University Press (CUP), 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.944\">10.1557/opl.2014.944</a>."},"volume":1736,"user_id":"55706","publisher":"Cambridge University Press (CUP)","_id":"4052","status":"public","department":[{"_id":"286"},{"_id":"15"}],"type":"journal_article","date_created":"2018-08-22T11:36:57Z","abstract":[{"lang":"eng","text":"In this contribution we report on the optical properties of cubic AlN/GaN asymmetric multi quantum wells (MQW) structures on 3C-SiC/Si (001) substrates grown by radio-frequency plasma-assisted molecular beam epitaxy (MBE). Scanning transmission electron microscopy (STEM) and spatially resolved cathodoluminescence (CL) at room temperature and at low temperature are used to characterize the optical properties of the cubic AlN/GaN MQW structures. An increasing CL emission intensity with increasing film thickness due to the improved crystal quality was observed. This correlation can be directly connected to the reduction of the linewidth of x-ray rocking curves with increasing film thickness of the c-GaN films. Defects like stacking faults (SFs) on the {111} planes, which also can be considered as hexagonal inclusions in the cubic crystal matrix, lead to a decrease of the CL emission intensity. With low temperature CL line scans also monolayer fluctuations of the QWs have been detected and the observed transition energies agree well with solutions calculated using a one-dimensional (1D) Schrödinger-Poisson simulator."}],"publication":"MRS Proceedings","doi":"10.1557/opl.2014.944","language":[{"iso":"eng"}],"article_number":"mrsf14-1736-t03-03","article_type":"original","intvolume":"      1736","publication_status":"published","date_updated":"2022-01-06T07:00:10Z","publication_identifier":{"issn":["1946-4274"]},"author":[{"full_name":"As, D.J.","last_name":"As","first_name":"D.J."},{"last_name":"Kemper","first_name":"R.","full_name":"Kemper, R."},{"full_name":"Mietze, C.","first_name":"C.","last_name":"Mietze"},{"full_name":"Wecker, T.","first_name":"T.","last_name":"Wecker"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"},{"full_name":"Veit, P.","first_name":"P.","last_name":"Veit"},{"last_name":"Dempewolf","first_name":"A.","full_name":"Dempewolf, A."},{"last_name":"Bertram","first_name":"F.","full_name":"Bertram, F."},{"first_name":"J.","last_name":"Christen","full_name":"Christen, J."}],"year":"2014","title":"Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures"},{"year":"2014","title":"A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips","publication_identifier":{"issn":["1946-4274"]},"author":[{"last_name":"Brassat","first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"date_updated":"2022-01-06T07:00:10Z","publication_status":"published","intvolume":"      1663","article_type":"original","article_number":"mrsf13-1663-ww04-09","doi":"10.1557/opl.2014.265","publication":"MRS Proceedings","abstract":[{"lang":"eng","text":"A novel process for the formation of pairs of opposing metallic nanotips within linear trenches on a silicon wafer is investigated in detail. The process is based on a spreading knife technique typically used in nanosphere lithography to generate monolayers of colloidal polystyrene beads. Here it is applied to initiate self-assembly of spheres in long linear trenches acting as a template for the sphere arrangement. The optimum blade velocity to deposit the spheres selectively and densely packed in the trench depends on the trench surface fraction and can be described by a modified Dimitrov model. It is demonstrated that the spheres can be used as a shadow mask to deposit metallic nanotips in a channel, which are electrically interconnected on each side of the trench, possibly enabling the control and manipulation of nanoobjects in the channel."}],"date_created":"2018-08-22T11:40:42Z","type":"journal_article","department":[{"_id":"15"},{"_id":"286"}],"status":"public","conference":{"end_date":"2013-12-06","name":"MRS Fall Meeting 2013","start_date":"2013-12-01","location":"Bosten (MA)"},"publisher":"Cambridge University Press (CUP)","_id":"4053","user_id":"55706","volume":1663,"citation":{"short":"K. Brassat, J. Lindner, MRS Proceedings 1663 (2014).","chicago":"Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.” <i>MRS Proceedings</i> 1663 (2014). <a href=\"https://doi.org/10.1557/opl.2014.265\">https://doi.org/10.1557/opl.2014.265</a>.","apa":"Brassat, K., &#38; Lindner, J. (2014). A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips. <i>MRS Proceedings</i>, <i>1663</i>. <a href=\"https://doi.org/10.1557/opl.2014.265\">https://doi.org/10.1557/opl.2014.265</a>","ieee":"K. Brassat and J. Lindner, “A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips,” <i>MRS Proceedings</i>, vol. 1663, 2014.","ama":"Brassat K, Lindner J. A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips. <i>MRS Proceedings</i>. 2014;1663. doi:<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>","bibtex":"@article{Brassat_Lindner_2014, title={A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips}, volume={1663}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>}, number={mrsf13-1663-ww04-09}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Brassat, Katharina and Lindner, Jörg}, year={2014} }","mla":"Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.” <i>MRS Proceedings</i>, vol. 1663, mrsf13-1663-ww04-09, Cambridge University Press (CUP), 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>."}},{"conference":{"name":"MRS Fall Meeting ","start_date":"2013-12-01","location":"Boston (USA)","end_date":"2013-12-06"},"status":"public","publisher":"Cambridge University Press (CUP)","_id":"4074","volume":1663,"user_id":"55706","citation":{"apa":"Riedl, T., Strake, M., Sievers, W., &#38; Lindner, J. (2014). Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers. <i>MRS Proceedings</i>, <i>1663</i>. <a href=\"https://doi.org/10.1557/opl.2014.312\">https://doi.org/10.1557/opl.2014.312</a>","mla":"Riedl, Thomas, et al. “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers.” <i>MRS Proceedings</i>, vol. 1663, mrsf13-1663-ww03-75, Cambridge University Press (CUP), 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>.","ieee":"T. Riedl, M. Strake, W. Sievers, and J. Lindner, “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers,” <i>MRS Proceedings</i>, vol. 1663, 2014.","short":"T. Riedl, M. Strake, W. Sievers, J. Lindner, MRS Proceedings 1663 (2014).","ama":"Riedl T, Strake M, Sievers W, Lindner J. Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers. <i>MRS Proceedings</i>. 2014;1663. doi:<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>","chicago":"Riedl, Thomas, Matthias Strake, Werner Sievers, and Jörg Lindner. “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers.” <i>MRS Proceedings</i> 1663 (2014). <a href=\"https://doi.org/10.1557/opl.2014.312\">https://doi.org/10.1557/opl.2014.312</a>.","bibtex":"@article{Riedl_Strake_Sievers_Lindner_2014, title={Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers}, volume={1663}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>}, number={mrsf13-1663-ww03-75}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Riedl, Thomas and Strake, Matthias and Sievers, Werner and Lindner, Jörg}, year={2014} }"},"publication_identifier":{"issn":["1946-4274"]},"author":[{"full_name":"Riedl, Thomas","last_name":"Riedl","first_name":"Thomas","id":"36950"},{"first_name":"Matthias","last_name":"Strake","full_name":"Strake, Matthias"},{"last_name":"Sievers","first_name":"Werner","full_name":"Sievers, Werner"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"year":"2014","title":"Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers","intvolume":"      1663","article_type":"original","date_updated":"2022-01-06T07:00:13Z","publication_status":"published","language":[{"iso":"eng"}],"article_number":"mrsf13-1663-ww03-75","doi":"10.1557/opl.2014.312","publication":"MRS Proceedings","abstract":[{"lang":"eng","text":"An experimental analysis of the morphology changes of hexagonally close packed polystyrene sphere monolayers induced by annealing in air is presented. The triangular interstices between each triple of spheres, which are frequently used as nanoscale mask openings in colloidal lithography, are observed to gradually shrink in size and change in shape upon annealing. Top view scanning electron microscopy images reveal that different stages are involved in the closure of monolayer interstices at annealing temperatures in the range between 110°C and 120°C. In the early stages shrinkage of the triangular interstices is dominated by material transport to and thus shortening of their corners, in the late stages interstice area reduction via displacement of the triangle edges becomes significant. At intermediate annealing times the rate of interstice area reduction displays a maximum before a stabilized state characterized by a rounded isosceles triangular shape forms."}],"date_created":"2018-08-22T12:34:02Z","department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article"},{"_id":"39523","publisher":"Springer Science and Business Media LLC","page":"97-102","volume":1490,"user_id":"20179","status":"public","citation":{"chicago":"Assion, Fabian, Marcel Schönhoff, and Ulrich Hilleringmann. “Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators.” <i>MRS Proceedings</i> 1490 (2013): 97–102. <a href=\"https://doi.org/10.1557/opl.2012.1557\">https://doi.org/10.1557/opl.2012.1557</a>.","short":"F. Assion, M. Schönhoff, U. Hilleringmann, MRS Proceedings 1490 (2013) 97–102.","ama":"Assion F, Schönhoff M, Hilleringmann U. Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators. <i>MRS Proceedings</i>. 2013;1490:97-102. doi:<a href=\"https://doi.org/10.1557/opl.2012.1557\">10.1557/opl.2012.1557</a>","bibtex":"@article{Assion_Schönhoff_Hilleringmann_2013, title={Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators}, volume={1490}, DOI={<a href=\"https://doi.org/10.1557/opl.2012.1557\">10.1557/opl.2012.1557</a>}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Assion, Fabian and Schönhoff, Marcel and Hilleringmann, Ulrich}, year={2013}, pages={97–102} }","mla":"Assion, Fabian, et al. “Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators.” <i>MRS Proceedings</i>, vol. 1490, Springer Science and Business Media LLC, 2013, pp. 97–102, doi:<a href=\"https://doi.org/10.1557/opl.2012.1557\">10.1557/opl.2012.1557</a>.","apa":"Assion, F., Schönhoff, M., &#38; Hilleringmann, U. (2013). Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators. <i>MRS Proceedings</i>, <i>1490</i>, 97–102. <a href=\"https://doi.org/10.1557/opl.2012.1557\">https://doi.org/10.1557/opl.2012.1557</a>","ieee":"F. Assion, M. Schönhoff, and U. Hilleringmann, “Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators,” <i>MRS Proceedings</i>, vol. 1490, pp. 97–102, 2013, doi: <a href=\"https://doi.org/10.1557/opl.2012.1557\">10.1557/opl.2012.1557</a>."},"language":[{"iso":"eng"}],"doi":"10.1557/opl.2012.1557","author":[{"last_name":"Assion","first_name":"Fabian","full_name":"Assion, Fabian"},{"full_name":"Schönhoff, Marcel","first_name":"Marcel","last_name":"Schönhoff"},{"id":"20179","full_name":"Hilleringmann, Ulrich","last_name":"Hilleringmann","first_name":"Ulrich"}],"publication_identifier":{"issn":["0272-9172","1946-4274"]},"year":"2013","title":"Formation and Properties of TiSi<sub>2</sub> as Contact Material for High-Temperature Thermoelectric Generators","intvolume":"      1490","date_updated":"2023-03-21T10:19:46Z","publication_status":"published","date_created":"2023-01-24T11:55:36Z","department":[{"_id":"59"}],"type":"journal_article","keyword":["General Engineering"],"publication":"MRS Proceedings","abstract":[{"lang":"eng","text":"<jats:title>ABSTRACT</jats:title><jats:p>Thermoelectric generators (TEG) are capable of transforming waste heat directly into electric power. With higher temperatures the yield of the devices rises which makes high-temperature contact materials important. The formation of titanium disilicide (TiSi<jats:sub>2</jats:sub>) and its properties were analyzed and optimized for the use in TEG. Depending on a direct or an indirect transformation into the C54 crystal structure the process forms a layer with a resistivity of 20-22 μΩcm. Process gases influence the resistivity and result in difference of 20 %. The growing rate of TiSi<jats:sub>2</jats:sub>on silicon dioxide was determined; it shows a strong dependence on the used atmosphere and temperature. A maximum overgrowing length of 30 μm was found.</jats:p>"}]},{"intvolume":"      1490","publication_status":"published","date_updated":"2026-02-24T19:12:07Z","publication_identifier":{"issn":["0272-9172","1946-4274"]},"author":[{"id":"8282","full_name":"Petrov, Dmitry","last_name":"Petrov","first_name":"Dmitry"},{"full_name":"Assion, Fabian","last_name":"Assion","first_name":"Fabian"},{"full_name":"Hilleringmann, Ulrich","first_name":"Ulrich","last_name":"Hilleringmann","id":"20179"}],"year":"2013","title":"Design and implementation of a measurement system for automatically measurement of electrical parameters of thermoelectric generators","doi":"10.1557/opl.2013.318","language":[{"iso":"eng"}],"abstract":[{"text":"<jats:title>ABSTRACT</jats:title><jats:p>The continues development of thermoelectric generators causes a permanent improvement of their characteristics. New types of thermoelectric generators can work at temperatures up to 1000 K. With this, special measurement equipment is needed to control the electrical parameters of the new developed specimens. The devices must be tested over the whole range of operating temperatures. For each temperature value a series of electrical measurements has to be performed. To establish the maximal output power of the thermoelectric generators, a load resistor with variable resistance has to be connected to the output of thermoelectric generator. The measurement system should measure the electrical current through the load resistor and the voltage over this resistor to determine the device parameters. A large amount of measurement data have to be collected and processed to evaluate the electrical characteristics of the specimen and to present them in graphical form, suitable for the comparison with others specimens.</jats:p>","lang":"eng"}],"publication":"MRS Proceedings","department":[{"_id":"59"},{"_id":"977"}],"keyword":["General Engineering"],"type":"journal_article","date_created":"2023-01-24T11:52:02Z","status":"public","volume":1490,"user_id":"8282","_id":"39514","publisher":"Springer Science and Business Media LLC","page":"191-196","citation":{"mla":"Petrov, Dmitry, et al. “Design and Implementation of a Measurement System for Automatically Measurement of Electrical Parameters of Thermoelectric Generators.” <i>MRS Proceedings</i>, vol. 1490, Springer Science and Business Media LLC, 2013, pp. 191–96, doi:<a href=\"https://doi.org/10.1557/opl.2013.318\">10.1557/opl.2013.318</a>.","ama":"Petrov D, Assion F, Hilleringmann U. Design and implementation of a measurement system for automatically measurement of electrical parameters of thermoelectric generators. <i>MRS Proceedings</i>. 2013;1490:191-196. doi:<a href=\"https://doi.org/10.1557/opl.2013.318\">10.1557/opl.2013.318</a>","bibtex":"@article{Petrov_Assion_Hilleringmann_2013, title={Design and implementation of a measurement system for automatically measurement of electrical parameters of thermoelectric generators}, volume={1490}, DOI={<a href=\"https://doi.org/10.1557/opl.2013.318\">10.1557/opl.2013.318</a>}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Petrov, Dmitry and Assion, Fabian and Hilleringmann, Ulrich}, year={2013}, pages={191–196} }","apa":"Petrov, D., Assion, F., &#38; Hilleringmann, U. (2013). Design and implementation of a measurement system for automatically measurement of electrical parameters of thermoelectric generators. <i>MRS Proceedings</i>, <i>1490</i>, 191–196. <a href=\"https://doi.org/10.1557/opl.2013.318\">https://doi.org/10.1557/opl.2013.318</a>","ieee":"D. Petrov, F. Assion, and U. Hilleringmann, “Design and implementation of a measurement system for automatically measurement of electrical parameters of thermoelectric generators,” <i>MRS Proceedings</i>, vol. 1490, pp. 191–196, 2013, doi: <a href=\"https://doi.org/10.1557/opl.2013.318\">10.1557/opl.2013.318</a>.","chicago":"Petrov, Dmitry, Fabian Assion, and Ulrich Hilleringmann. “Design and Implementation of a Measurement System for Automatically Measurement of Electrical Parameters of Thermoelectric Generators.” <i>MRS Proceedings</i> 1490 (2013): 191–96. <a href=\"https://doi.org/10.1557/opl.2013.318\">https://doi.org/10.1557/opl.2013.318</a>.","short":"D. Petrov, F. Assion, U. Hilleringmann, MRS Proceedings 1490 (2013) 191–196."}},{"language":[{"iso":"eng"}],"doi":"10.1557/opl.2012.491","year":"2012","title":"Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces","publication_identifier":{"issn":["1946-4274"]},"author":[{"last_name":"Achtelik","first_name":"Jörn","full_name":"Achtelik, Jörn"},{"full_name":"Kemper, Ricarda M.","last_name":"Kemper","first_name":"Ricarda M."},{"full_name":"Sievers, Werner","last_name":"Sievers","first_name":"Werner"},{"full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner"}],"publication_status":"published","date_updated":"2022-01-06T07:00:18Z","article_type":"original","intvolume":"      1389","date_created":"2018-08-23T13:29:50Z","type":"journal_article","department":[{"_id":"15"},{"_id":"286"}],"publication":"MRS Proceedings","abstract":[{"lang":"eng","text":"Two methods to create biomimetic anti-reflection nanostructures in ordinary glass microscope object slides are presented. One technique is based on a nanosphere lithography process combined with physical vapour deposition of nickel and reactive ion etching (RIE). The other uses plasma induced dewetting of a smooth nickel surface. The amount of reflected light was measured and a method to simulate the reflectivity from an atomic force microscopy (AFM) topography scan of the glass surface is presented. The reflectivity for visible light at normal incidence was reduced to 20-50 % of the original value with both methods and the simulation gives results in good agreement to the measurement."}],"publisher":"Cambridge University Press (CUP)","_id":"4114","user_id":"55706","volume":1389,"status":"public","conference":{"end_date":"2011-12-02","name":"MRS Fall Meeting 2011","start_date":"2011-11-28","location":"Boston (USA)"},"citation":{"apa":"Achtelik, J., Kemper, R. M., Sievers, W., &#38; Lindner, J. (2012). Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces. <i>MRS Proceedings</i>, <i>1389</i>. <a href=\"https://doi.org/10.1557/opl.2012.491\">https://doi.org/10.1557/opl.2012.491</a>","ieee":"J. Achtelik, R. M. Kemper, W. Sievers, and J. Lindner, “Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces,” <i>MRS Proceedings</i>, vol. 1389, 2012.","short":"J. Achtelik, R.M. Kemper, W. Sievers, J. Lindner, MRS Proceedings 1389 (2012).","chicago":"Achtelik, Jörn, Ricarda M. Kemper, Werner Sievers, and Jörg Lindner. “Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces.” <i>MRS Proceedings</i> 1389 (2012). <a href=\"https://doi.org/10.1557/opl.2012.491\">https://doi.org/10.1557/opl.2012.491</a>.","mla":"Achtelik, Jörn, et al. “Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces.” <i>MRS Proceedings</i>, vol. 1389, Cambridge University Press (CUP), 2012, doi:<a href=\"https://doi.org/10.1557/opl.2012.491\">10.1557/opl.2012.491</a>.","ama":"Achtelik J, Kemper RM, Sievers W, Lindner J. Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces. <i>MRS Proceedings</i>. 2012;1389. doi:<a href=\"https://doi.org/10.1557/opl.2012.491\">10.1557/opl.2012.491</a>","bibtex":"@article{Achtelik_Kemper_Sievers_Lindner_2012, title={Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces}, volume={1389}, DOI={<a href=\"https://doi.org/10.1557/opl.2012.491\">10.1557/opl.2012.491</a>}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Achtelik, Jörn and Kemper, Ricarda M. and Sievers, Werner and Lindner, Jörg}, year={2012} }"}},{"citation":{"apa":"Fischer, F. J. C., Weinl, M., Lindner, J., &#38; Stritzker, B. (2009). Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks. <i>MRS Proceedings</i>, <i>1181</i>. <a href=\"https://doi.org/10.1557/proc-1181-dd10-02\">https://doi.org/10.1557/proc-1181-dd10-02</a>","ieee":"F. J. C. Fischer, M. Weinl, J. Lindner, and B. Stritzker, “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks,” <i>MRS Proceedings</i>, vol. 1181, 2009.","chicago":"Fischer, Frederic J.C., Michael Weinl, Jörg Lindner, and Bernd Stritzker. “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks.” <i>MRS Proceedings</i> 1181 (2009). <a href=\"https://doi.org/10.1557/proc-1181-dd10-02\">https://doi.org/10.1557/proc-1181-dd10-02</a>.","short":"F.J.C. Fischer, M. Weinl, J. Lindner, B. Stritzker, MRS Proceedings 1181 (2009).","mla":"Fischer, Frederic J. C., et al. “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks.” <i>MRS Proceedings</i>, vol. 1181, 1181-DD10-02, Cambridge University Press (CUP), 2009, doi:<a href=\"https://doi.org/10.1557/proc-1181-dd10-02\">10.1557/proc-1181-dd10-02</a>.","ama":"Fischer FJC, Weinl M, Lindner J, Stritzker B. Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks. <i>MRS Proceedings</i>. 2009;1181. doi:<a href=\"https://doi.org/10.1557/proc-1181-dd10-02\">10.1557/proc-1181-dd10-02</a>","bibtex":"@article{Fischer_Weinl_Lindner_Stritzker_2009, title={Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks}, volume={1181}, DOI={<a href=\"https://doi.org/10.1557/proc-1181-dd10-02\">10.1557/proc-1181-dd10-02</a>}, number={1181-DD10-02}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Fischer, Frederic J.C. and Weinl, Michael and Lindner, Jörg and Stritzker, Bernd}, year={2009} }"},"status":"public","conference":{"end_date":"2009-04-17","location":"San Franicsco (USA)","name":"MRS Spring Meeting 2009","start_date":"2009-04-13"},"publisher":"Cambridge University Press (CUP)","_id":"4152","user_id":"55706","volume":1181,"publication":"MRS Proceedings","abstract":[{"lang":"eng","text":"A novel technique to form periodically nanostructured Si surface morphologies based on nanosphere lithography (NSL) and He ion implantation induced swelling is studied in detail. It is shown that by implantation of keV He ions through the nanometric openings of NSL masks regular arrays of hillocks and rings can be created on silicon surfaces. The shape and size of these surface features can be easily controlled by adjusting the ion dose and energy as well as the mask size. Feature heights of more than 100 nm can be obtained, while feature distances are typically 1.15 or 2 (hillock or ring) nanosphere radii, which are chosen to be between 100 and 500 nm in this study. Atomic force and scanning electron microscopy measurements of the surface morphology are supplemented by cross-sectional transmission electron microscopy, revealing the inner structure of hillocks to consist of a central cavity surrounded by a hierarchical arrangement of smaller voids. The surface morphologies developed here have the potential to be useful for fixing and separating nano-objects on a silicon surface."}],"date_created":"2018-08-27T13:21:44Z","type":"journal_article","department":[{"_id":"15"},{"_id":"286"}],"title":"Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks","year":"2009","publication_identifier":{"issn":["1946-4274"]},"author":[{"first_name":"Frederic J.C.","last_name":"Fischer","full_name":"Fischer, Frederic J.C."},{"last_name":"Weinl","first_name":"Michael","full_name":"Weinl, Michael"},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"},{"first_name":"Bernd","last_name":"Stritzker","full_name":"Stritzker, Bernd"}],"date_updated":"2022-01-06T07:00:26Z","publication_status":"published","intvolume":"      1181","article_type":"original","article_number":"1181-DD10-02","language":[{"iso":"eng"}],"doi":"10.1557/proc-1181-dd10-02"},{"type":"journal_article","department":[{"_id":"35"},{"_id":"2"},{"_id":"307"}],"date_created":"2021-10-09T10:12:51Z","extern":"1","quality_controlled":"1","abstract":[{"lang":"eng","text":"We report on the synthesis of lamellar mesostructured aluminophosphate composites which contain variable relative amounts of aluminium oxide species in the core regions of the lamellae; this is investigated quantitatively by Al K-edge XANES spectroscopy. Templating is achieved by the utilisation of monododecyl phosphate surfactant. If no phosphorous source (such as H3PO4) is used for the synthesis, the phosphate head groups of the surfactant become incorporated into the inorganic network to form similar lamellar aluminophosphate structures. Thus, the surfactant serves as both template and reactant."}],"publication":"MRS Proceedings","citation":{"mla":"Tiemann, Michael, et al. “Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates.” <i>MRS Proceedings</i>, 1999, doi:<a href=\"https://doi.org/10.1557/proc-547-87\">10.1557/proc-547-87</a>.","bibtex":"@article{Tiemann_Fröba_Wong_1999, title={Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates}, DOI={<a href=\"https://doi.org/10.1557/proc-547-87\">10.1557/proc-547-87</a>}, journal={MRS Proceedings}, author={Tiemann, Michael and Fröba, M. and Wong, J.}, year={1999} }","ama":"Tiemann M, Fröba M, Wong J. Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates. <i>MRS Proceedings</i>. Published online 1999. doi:<a href=\"https://doi.org/10.1557/proc-547-87\">10.1557/proc-547-87</a>","ieee":"M. Tiemann, M. Fröba, and J. Wong, “Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates,” <i>MRS Proceedings</i>, 1999, doi: <a href=\"https://doi.org/10.1557/proc-547-87\">10.1557/proc-547-87</a>.","apa":"Tiemann, M., Fröba, M., &#38; Wong, J. (1999). Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates. <i>MRS Proceedings</i>. <a href=\"https://doi.org/10.1557/proc-547-87\">https://doi.org/10.1557/proc-547-87</a>","short":"M. Tiemann, M. Fröba, J. Wong, MRS Proceedings (1999).","chicago":"Tiemann, Michael, M. Fröba, and J. Wong. “Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates.” <i>MRS Proceedings</i>, 1999. <a href=\"https://doi.org/10.1557/proc-547-87\">https://doi.org/10.1557/proc-547-87</a>."},"user_id":"23547","doi":"10.1557/proc-547-87","_id":"26007","language":[{"iso":"eng"}],"publication_status":"published","date_updated":"2023-03-09T09:08:01Z","article_type":"original","status":"public","title":"Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates","year":"1999","author":[{"full_name":"Tiemann, Michael","first_name":"Michael","last_name":"Tiemann","orcid":"0000-0003-1711-2722","id":"23547"},{"last_name":"Fröba","first_name":"M.","full_name":"Fröba, M."},{"full_name":"Wong, J.","last_name":"Wong","first_name":"J."}],"publication_identifier":{"issn":["0272-9172","1946-4274"]}}]