---
_id: '4023'
article_number: ' mrsf14-1748-ii11-25'
author:
- first_name: Christoph
full_name: Brodehl, Christoph
id: '30380'
last_name: Brodehl
- first_name: Siegmund
full_name: Greulich-Weber, Siegmund
last_name: Greulich-Weber
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
citation:
ama: Brodehl C, Greulich-Weber S, Lindner J. An Algorithm for Tailoring of Nanoparticles
by Double Angle Resolved Nanosphere Lithography. MRS Proceedings. 2015;1748.
doi:10.1557/opl.2015.77
apa: Brodehl, C., Greulich-Weber, S., & Lindner, J. (2015). An Algorithm for
Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography. MRS
Proceedings, 1748. https://doi.org/10.1557/opl.2015.77
bibtex: '@article{Brodehl_Greulich-Weber_Lindner_2015, title={An Algorithm for Tailoring
of Nanoparticles by Double Angle Resolved Nanosphere Lithography}, volume={1748},
DOI={10.1557/opl.2015.77}, number={mrsf14-1748-ii11-25},
journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Brodehl,
Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}, year={2015} }'
chicago: Brodehl, Christoph, Siegmund Greulich-Weber, and Jörg Lindner. “An Algorithm
for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography.”
MRS Proceedings 1748 (2015). https://doi.org/10.1557/opl.2015.77.
ieee: C. Brodehl, S. Greulich-Weber, and J. Lindner, “An Algorithm for Tailoring
of Nanoparticles by Double Angle Resolved Nanosphere Lithography,” MRS Proceedings,
vol. 1748, 2015.
mla: Brodehl, Christoph, et al. “An Algorithm for Tailoring of Nanoparticles by
Double Angle Resolved Nanosphere Lithography.” MRS Proceedings, vol. 1748,
mrsf14-1748-ii11-25, Cambridge University Press (CUP), 2015, doi:10.1557/opl.2015.77.
short: C. Brodehl, S. Greulich-Weber, J. Lindner, MRS Proceedings 1748 (2015).
date_created: 2018-08-21T13:03:44Z
date_updated: 2022-01-06T07:00:07Z
department:
- _id: '286'
- _id: '15'
doi: 10.1557/opl.2015.77
intvolume: ' 1748'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere
Lithography
type: journal_article
user_id: '55706'
volume: 1748
year: '2015'
...
---
_id: '4052'
abstract:
- lang: eng
text: In this contribution we report on the optical properties of cubic AlN/GaN
asymmetric multi quantum wells (MQW) structures on 3C-SiC/Si (001) substrates
grown by radio-frequency plasma-assisted molecular beam epitaxy (MBE). Scanning
transmission electron microscopy (STEM) and spatially resolved cathodoluminescence
(CL) at room temperature and at low temperature are used to characterize the optical
properties of the cubic AlN/GaN MQW structures. An increasing CL emission intensity
with increasing film thickness due to the improved crystal quality was observed.
This correlation can be directly connected to the reduction of the linewidth of
x-ray rocking curves with increasing film thickness of the c-GaN films. Defects
like stacking faults (SFs) on the {111} planes, which also can be considered as
hexagonal inclusions in the cubic crystal matrix, lead to a decrease of the CL
emission intensity. With low temperature CL line scans also monolayer fluctuations
of the QWs have been detected and the observed transition energies agree well
with solutions calculated using a one-dimensional (1D) Schrödinger-Poisson simulator.
article_number: mrsf14-1736-t03-03
article_type: original
author:
- first_name: D.J.
full_name: As, D.J.
last_name: As
- first_name: R.
full_name: Kemper, R.
last_name: Kemper
- first_name: C.
full_name: Mietze, C.
last_name: Mietze
- first_name: T.
full_name: Wecker, T.
last_name: Wecker
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
- first_name: P.
full_name: Veit, P.
last_name: Veit
- first_name: A.
full_name: Dempewolf, A.
last_name: Dempewolf
- first_name: F.
full_name: Bertram, F.
last_name: Bertram
- first_name: J.
full_name: Christen, J.
last_name: Christen
citation:
ama: As DJ, Kemper R, Mietze C, et al. Spatially resolved optical emission of cubic
GaN/AlN multi-quantum well structures. MRS Proceedings. 2014;1736. doi:10.1557/opl.2014.944
apa: As, D. J., Kemper, R., Mietze, C., Wecker, T., Lindner, J., Veit, P., … Christen,
J. (2014). Spatially resolved optical emission of cubic GaN/AlN multi-quantum
well structures. MRS Proceedings, 1736. https://doi.org/10.1557/opl.2014.944
bibtex: '@article{As_Kemper_Mietze_Wecker_Lindner_Veit_Dempewolf_Bertram_Christen_2014,
title={Spatially resolved optical emission of cubic GaN/AlN multi-quantum well
structures}, volume={1736}, DOI={10.1557/opl.2014.944},
number={mrsf14-1736-t03-03}, journal={MRS Proceedings}, publisher={Cambridge University
Press (CUP)}, author={As, D.J. and Kemper, R. and Mietze, C. and Wecker, T. and
Lindner, Jörg and Veit, P. and Dempewolf, A. and Bertram, F. and Christen, J.},
year={2014} }'
chicago: As, D.J., R. Kemper, C. Mietze, T. Wecker, Jörg Lindner, P. Veit, A. Dempewolf,
F. Bertram, and J. Christen. “Spatially Resolved Optical Emission of Cubic GaN/AlN
Multi-Quantum Well Structures.” MRS Proceedings 1736 (2014). https://doi.org/10.1557/opl.2014.944.
ieee: D. J. As et al., “Spatially resolved optical emission of cubic GaN/AlN
multi-quantum well structures,” MRS Proceedings, vol. 1736, 2014.
mla: As, D. J., et al. “Spatially Resolved Optical Emission of Cubic GaN/AlN Multi-Quantum
Well Structures.” MRS Proceedings, vol. 1736, mrsf14-1736-t03-03, Cambridge
University Press (CUP), 2014, doi:10.1557/opl.2014.944.
short: D.J. As, R. Kemper, C. Mietze, T. Wecker, J. Lindner, P. Veit, A. Dempewolf,
F. Bertram, J. Christen, MRS Proceedings 1736 (2014).
date_created: 2018-08-22T11:36:57Z
date_updated: 2022-01-06T07:00:10Z
department:
- _id: '286'
- _id: '15'
doi: 10.1557/opl.2014.944
intvolume: ' 1736'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: Spatially resolved optical emission of cubic GaN/AlN multi-quantum well structures
type: journal_article
user_id: '55706'
volume: 1736
year: '2014'
...
---
_id: '4053'
abstract:
- lang: eng
text: A novel process for the formation of pairs of opposing metallic nanotips within
linear trenches on a silicon wafer is investigated in detail. The process is based
on a spreading knife technique typically used in nanosphere lithography to generate
monolayers of colloidal polystyrene beads. Here it is applied to initiate self-assembly
of spheres in long linear trenches acting as a template for the sphere arrangement.
The optimum blade velocity to deposit the spheres selectively and densely packed
in the trench depends on the trench surface fraction and can be described by a
modified Dimitrov model. It is demonstrated that the spheres can be used as a
shadow mask to deposit metallic nanotips in a channel, which are electrically
interconnected on each side of the trench, possibly enabling the control and manipulation
of nanoobjects in the channel.
article_number: mrsf13-1663-ww04-09
article_type: original
author:
- first_name: Katharina
full_name: Brassat, Katharina
id: '11305'
last_name: Brassat
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
citation:
ama: Brassat K, Lindner J. A template-assisted self-organization process for the
formation of a linear arrangement of pairs of metallic tips. MRS Proceedings.
2014;1663. doi:10.1557/opl.2014.265
apa: Brassat, K., & Lindner, J. (2014). A template-assisted self-organization
process for the formation of a linear arrangement of pairs of metallic tips. MRS
Proceedings, 1663. https://doi.org/10.1557/opl.2014.265
bibtex: '@article{Brassat_Lindner_2014, title={A template-assisted self-organization
process for the formation of a linear arrangement of pairs of metallic tips},
volume={1663}, DOI={10.1557/opl.2014.265},
number={mrsf13-1663-ww04-09}, journal={MRS Proceedings}, publisher={Cambridge
University Press (CUP)}, author={Brassat, Katharina and Lindner, Jörg}, year={2014}
}'
chicago: Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization
Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.”
MRS Proceedings 1663 (2014). https://doi.org/10.1557/opl.2014.265.
ieee: K. Brassat and J. Lindner, “A template-assisted self-organization process
for the formation of a linear arrangement of pairs of metallic tips,” MRS Proceedings,
vol. 1663, 2014.
mla: Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization
Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.”
MRS Proceedings, vol. 1663, mrsf13-1663-ww04-09, Cambridge University Press
(CUP), 2014, doi:10.1557/opl.2014.265.
short: K. Brassat, J. Lindner, MRS Proceedings 1663 (2014).
conference:
end_date: 2013-12-06
location: Bosten (MA)
name: MRS Fall Meeting 2013
start_date: 2013-12-01
date_created: 2018-08-22T11:40:42Z
date_updated: 2022-01-06T07:00:10Z
department:
- _id: '15'
- _id: '286'
doi: 10.1557/opl.2014.265
intvolume: ' 1663'
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: A template-assisted self-organization process for the formation of a linear
arrangement of pairs of metallic tips
type: journal_article
user_id: '55706'
volume: 1663
year: '2014'
...
---
_id: '4074'
abstract:
- lang: eng
text: An experimental analysis of the morphology changes of hexagonally close packed
polystyrene sphere monolayers induced by annealing in air is presented. The triangular
interstices between each triple of spheres, which are frequently used as nanoscale
mask openings in colloidal lithography, are observed to gradually shrink in size
and change in shape upon annealing. Top view scanning electron microscopy images
reveal that different stages are involved in the closure of monolayer interstices
at annealing temperatures in the range between 110°C and 120°C. In the early stages
shrinkage of the triangular interstices is dominated by material transport to
and thus shortening of their corners, in the late stages interstice area reduction
via displacement of the triangle edges becomes significant. At intermediate annealing
times the rate of interstice area reduction displays a maximum before a stabilized
state characterized by a rounded isosceles triangular shape forms.
article_number: mrsf13-1663-ww03-75
article_type: original
author:
- first_name: Thomas
full_name: Riedl, Thomas
id: '36950'
last_name: Riedl
- first_name: Matthias
full_name: Strake, Matthias
last_name: Strake
- first_name: Werner
full_name: Sievers, Werner
last_name: Sievers
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
citation:
ama: Riedl T, Strake M, Sievers W, Lindner J. Thermal Modification of Nanoscale
Mask Openings in Polystyrene Sphere Layers. MRS Proceedings. 2014;1663.
doi:10.1557/opl.2014.312
apa: Riedl, T., Strake, M., Sievers, W., & Lindner, J. (2014). Thermal Modification
of Nanoscale Mask Openings in Polystyrene Sphere Layers. MRS Proceedings,
1663. https://doi.org/10.1557/opl.2014.312
bibtex: '@article{Riedl_Strake_Sievers_Lindner_2014, title={Thermal Modification
of Nanoscale Mask Openings in Polystyrene Sphere Layers}, volume={1663}, DOI={10.1557/opl.2014.312}, number={mrsf13-1663-ww03-75},
journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Riedl,
Thomas and Strake, Matthias and Sievers, Werner and Lindner, Jörg}, year={2014}
}'
chicago: Riedl, Thomas, Matthias Strake, Werner Sievers, and Jörg Lindner. “Thermal
Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers.” MRS
Proceedings 1663 (2014). https://doi.org/10.1557/opl.2014.312.
ieee: T. Riedl, M. Strake, W. Sievers, and J. Lindner, “Thermal Modification of
Nanoscale Mask Openings in Polystyrene Sphere Layers,” MRS Proceedings,
vol. 1663, 2014.
mla: Riedl, Thomas, et al. “Thermal Modification of Nanoscale Mask Openings in Polystyrene
Sphere Layers.” MRS Proceedings, vol. 1663, mrsf13-1663-ww03-75, Cambridge
University Press (CUP), 2014, doi:10.1557/opl.2014.312.
short: T. Riedl, M. Strake, W. Sievers, J. Lindner, MRS Proceedings 1663 (2014).
conference:
end_date: 2013-12-06
location: Boston (USA)
name: 'MRS Fall Meeting '
start_date: 2013-12-01
date_created: 2018-08-22T12:34:02Z
date_updated: 2022-01-06T07:00:13Z
department:
- _id: '15'
- _id: '286'
doi: 10.1557/opl.2014.312
intvolume: ' 1663'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers
type: journal_article
user_id: '55706'
volume: 1663
year: '2014'
...
---
_id: '39523'
abstract:
- lang: eng
text: ABSTRACTThermoelectric generators (TEG) are
capable of transforming waste heat directly into electric power. With higher temperatures
the yield of the devices rises which makes high-temperature contact materials
important. The formation of titanium disilicide (TiSi2) and
its properties were analyzed and optimized for the use in TEG. Depending on a
direct or an indirect transformation into the C54 crystal structure the process
forms a layer with a resistivity of 20-22 μΩcm. Process gases influence the resistivity
and result in difference of 20 %. The growing rate of TiSi2on
silicon dioxide was determined; it shows a strong dependence on the used atmosphere
and temperature. A maximum overgrowing length of 30 μm was found.
author:
- first_name: Fabian
full_name: Assion, Fabian
last_name: Assion
- first_name: Marcel
full_name: Schönhoff, Marcel
last_name: Schönhoff
- first_name: Ulrich
full_name: Hilleringmann, Ulrich
id: '20179'
last_name: Hilleringmann
citation:
ama: Assion F, Schönhoff M, Hilleringmann U. Formation and Properties of TiSi2
as Contact Material for High-Temperature Thermoelectric Generators. MRS Proceedings.
2013;1490:97-102. doi:10.1557/opl.2012.1557
apa: Assion, F., Schönhoff, M., & Hilleringmann, U. (2013). Formation and Properties
of TiSi2 as Contact Material for High-Temperature Thermoelectric Generators.
MRS Proceedings, 1490, 97–102. https://doi.org/10.1557/opl.2012.1557
bibtex: '@article{Assion_Schönhoff_Hilleringmann_2013, title={Formation and Properties
of TiSi2 as Contact Material for High-Temperature Thermoelectric Generators},
volume={1490}, DOI={10.1557/opl.2012.1557},
journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC},
author={Assion, Fabian and Schönhoff, Marcel and Hilleringmann, Ulrich}, year={2013},
pages={97–102} }'
chicago: 'Assion, Fabian, Marcel Schönhoff, and Ulrich Hilleringmann. “Formation
and Properties of TiSi2 as Contact Material for High-Temperature Thermoelectric
Generators.” MRS Proceedings 1490 (2013): 97–102. https://doi.org/10.1557/opl.2012.1557.'
ieee: 'F. Assion, M. Schönhoff, and U. Hilleringmann, “Formation and Properties
of TiSi2 as Contact Material for High-Temperature Thermoelectric Generators,”
MRS Proceedings, vol. 1490, pp. 97–102, 2013, doi: 10.1557/opl.2012.1557.'
mla: Assion, Fabian, et al. “Formation and Properties of TiSi2 as Contact
Material for High-Temperature Thermoelectric Generators.” MRS Proceedings,
vol. 1490, Springer Science and Business Media LLC, 2013, pp. 97–102, doi:10.1557/opl.2012.1557.
short: F. Assion, M. Schönhoff, U. Hilleringmann, MRS Proceedings 1490 (2013) 97–102.
date_created: 2023-01-24T11:55:36Z
date_updated: 2023-03-21T10:19:46Z
department:
- _id: '59'
doi: 10.1557/opl.2012.1557
intvolume: ' 1490'
keyword:
- General Engineering
language:
- iso: eng
page: 97-102
publication: MRS Proceedings
publication_identifier:
issn:
- 0272-9172
- 1946-4274
publication_status: published
publisher: Springer Science and Business Media LLC
status: public
title: Formation and Properties of TiSi2 as Contact Material for High-Temperature
Thermoelectric Generators
type: journal_article
user_id: '20179'
volume: 1490
year: '2013'
...
---
_id: '39514'
abstract:
- lang: eng
text: ABSTRACTThe continues development of thermoelectric
generators causes a permanent improvement of their characteristics. New types
of thermoelectric generators can work at temperatures up to 1000 K. With this,
special measurement equipment is needed to control the electrical parameters of
the new developed specimens. The devices must be tested over the whole range of
operating temperatures. For each temperature value a series of electrical measurements
has to be performed. To establish the maximal output power of the thermoelectric
generators, a load resistor with variable resistance has to be connected to the
output of thermoelectric generator. The measurement system should measure the
electrical current through the load resistor and the voltage over this resistor
to determine the device parameters. A large amount of measurement data have to
be collected and processed to evaluate the electrical characteristics of the specimen
and to present them in graphical form, suitable for the comparison with others
specimens.
author:
- first_name: Dmitry
full_name: Petrov, Dmitry
id: '8282'
last_name: Petrov
- first_name: Fabian
full_name: Assion, Fabian
last_name: Assion
- first_name: Ulrich
full_name: Hilleringmann, Ulrich
id: '20179'
last_name: Hilleringmann
citation:
ama: Petrov D, Assion F, Hilleringmann U. Design and implementation of a measurement
system for automatically measurement of electrical parameters of thermoelectric
generators. MRS Proceedings. 2013;1490:191-196. doi:10.1557/opl.2013.318
apa: Petrov, D., Assion, F., & Hilleringmann, U. (2013). Design and implementation
of a measurement system for automatically measurement of electrical parameters
of thermoelectric generators. MRS Proceedings, 1490, 191–196. https://doi.org/10.1557/opl.2013.318
bibtex: '@article{Petrov_Assion_Hilleringmann_2013, title={Design and implementation
of a measurement system for automatically measurement of electrical parameters
of thermoelectric generators}, volume={1490}, DOI={10.1557/opl.2013.318},
journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC},
author={Petrov, Dmitry and Assion, Fabian and Hilleringmann, Ulrich}, year={2013},
pages={191–196} }'
chicago: 'Petrov, Dmitry, Fabian Assion, and Ulrich Hilleringmann. “Design and Implementation
of a Measurement System for Automatically Measurement of Electrical Parameters
of Thermoelectric Generators.” MRS Proceedings 1490 (2013): 191–96. https://doi.org/10.1557/opl.2013.318.'
ieee: 'D. Petrov, F. Assion, and U. Hilleringmann, “Design and implementation of
a measurement system for automatically measurement of electrical parameters of
thermoelectric generators,” MRS Proceedings, vol. 1490, pp. 191–196, 2013,
doi: 10.1557/opl.2013.318.'
mla: Petrov, Dmitry, et al. “Design and Implementation of a Measurement System for
Automatically Measurement of Electrical Parameters of Thermoelectric Generators.”
MRS Proceedings, vol. 1490, Springer Science and Business Media LLC, 2013,
pp. 191–96, doi:10.1557/opl.2013.318.
short: D. Petrov, F. Assion, U. Hilleringmann, MRS Proceedings 1490 (2013) 191–196.
date_created: 2023-01-24T11:52:02Z
date_updated: 2026-02-24T19:12:07Z
department:
- _id: '59'
- _id: '977'
doi: 10.1557/opl.2013.318
intvolume: ' 1490'
keyword:
- General Engineering
language:
- iso: eng
page: 191-196
publication: MRS Proceedings
publication_identifier:
issn:
- 0272-9172
- 1946-4274
publication_status: published
publisher: Springer Science and Business Media LLC
status: public
title: Design and implementation of a measurement system for automatically measurement
of electrical parameters of thermoelectric generators
type: journal_article
user_id: '8282'
volume: 1490
year: '2013'
...
---
_id: '4114'
abstract:
- lang: eng
text: Two methods to create biomimetic anti-reflection nanostructures in ordinary
glass microscope object slides are presented. One technique is based on a nanosphere
lithography process combined with physical vapour deposition of nickel and reactive
ion etching (RIE). The other uses plasma induced dewetting of a smooth nickel
surface. The amount of reflected light was measured and a method to simulate the
reflectivity from an atomic force microscopy (AFM) topography scan of the glass
surface is presented. The reflectivity for visible light at normal incidence was
reduced to 20-50 % of the original value with both methods and the simulation
gives results in good agreement to the measurement.
article_type: original
author:
- first_name: Jörn
full_name: Achtelik, Jörn
last_name: Achtelik
- first_name: Ricarda M.
full_name: Kemper, Ricarda M.
last_name: Kemper
- first_name: Werner
full_name: Sievers, Werner
last_name: Sievers
- first_name: Jörg
full_name: Lindner, Jörg
last_name: Lindner
citation:
ama: Achtelik J, Kemper RM, Sievers W, Lindner J. Self-Organized Nanostructure Formation
for Anti-Reflection Glass Surfaces. MRS Proceedings. 2012;1389. doi:10.1557/opl.2012.491
apa: Achtelik, J., Kemper, R. M., Sievers, W., & Lindner, J. (2012). Self-Organized
Nanostructure Formation for Anti-Reflection Glass Surfaces. MRS Proceedings,
1389. https://doi.org/10.1557/opl.2012.491
bibtex: '@article{Achtelik_Kemper_Sievers_Lindner_2012, title={Self-Organized Nanostructure
Formation for Anti-Reflection Glass Surfaces}, volume={1389}, DOI={10.1557/opl.2012.491},
journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Achtelik,
Jörn and Kemper, Ricarda M. and Sievers, Werner and Lindner, Jörg}, year={2012}
}'
chicago: Achtelik, Jörn, Ricarda M. Kemper, Werner Sievers, and Jörg Lindner. “Self-Organized
Nanostructure Formation for Anti-Reflection Glass Surfaces.” MRS Proceedings
1389 (2012). https://doi.org/10.1557/opl.2012.491.
ieee: J. Achtelik, R. M. Kemper, W. Sievers, and J. Lindner, “Self-Organized Nanostructure
Formation for Anti-Reflection Glass Surfaces,” MRS Proceedings, vol. 1389,
2012.
mla: Achtelik, Jörn, et al. “Self-Organized Nanostructure Formation for Anti-Reflection
Glass Surfaces.” MRS Proceedings, vol. 1389, Cambridge University Press
(CUP), 2012, doi:10.1557/opl.2012.491.
short: J. Achtelik, R.M. Kemper, W. Sievers, J. Lindner, MRS Proceedings 1389 (2012).
conference:
end_date: 2011-12-02
location: Boston (USA)
name: MRS Fall Meeting 2011
start_date: 2011-11-28
date_created: 2018-08-23T13:29:50Z
date_updated: 2022-01-06T07:00:18Z
department:
- _id: '15'
- _id: '286'
doi: 10.1557/opl.2012.491
intvolume: ' 1389'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces
type: journal_article
user_id: '55706'
volume: 1389
year: '2012'
...
---
_id: '4152'
abstract:
- lang: eng
text: A novel technique to form periodically nanostructured Si surface morphologies
based on nanosphere lithography (NSL) and He ion implantation induced swelling
is studied in detail. It is shown that by implantation of keV He ions through
the nanometric openings of NSL masks regular arrays of hillocks and rings can
be created on silicon surfaces. The shape and size of these surface features can
be easily controlled by adjusting the ion dose and energy as well as the mask
size. Feature heights of more than 100 nm can be obtained, while feature distances
are typically 1.15 or 2 (hillock or ring) nanosphere radii, which are chosen to
be between 100 and 500 nm in this study. Atomic force and scanning electron microscopy
measurements of the surface morphology are supplemented by cross-sectional transmission
electron microscopy, revealing the inner structure of hillocks to consist of a
central cavity surrounded by a hierarchical arrangement of smaller voids. The
surface morphologies developed here have the potential to be useful for fixing
and separating nano-objects on a silicon surface.
article_number: 1181-DD10-02
article_type: original
author:
- first_name: Frederic J.C.
full_name: Fischer, Frederic J.C.
last_name: Fischer
- first_name: Michael
full_name: Weinl, Michael
last_name: Weinl
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
- first_name: Bernd
full_name: Stritzker, Bernd
last_name: Stritzker
citation:
ama: Fischer FJC, Weinl M, Lindner J, Stritzker B. Nanoscale Surface Patterning
of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks.
MRS Proceedings. 2009;1181. doi:10.1557/proc-1181-dd10-02
apa: Fischer, F. J. C., Weinl, M., Lindner, J., & Stritzker, B. (2009). Nanoscale
Surface Patterning of Silicon Using Local Swelling Induced by He Implantation
through NSL-Masks. MRS Proceedings, 1181. https://doi.org/10.1557/proc-1181-dd10-02
bibtex: '@article{Fischer_Weinl_Lindner_Stritzker_2009, title={Nanoscale Surface
Patterning of Silicon Using Local Swelling Induced by He Implantation through
NSL-Masks}, volume={1181}, DOI={10.1557/proc-1181-dd10-02},
number={1181-DD10-02}, journal={MRS Proceedings}, publisher={Cambridge University
Press (CUP)}, author={Fischer, Frederic J.C. and Weinl, Michael and Lindner, Jörg
and Stritzker, Bernd}, year={2009} }'
chicago: Fischer, Frederic J.C., Michael Weinl, Jörg Lindner, and Bernd Stritzker.
“Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation
through NSL-Masks.” MRS Proceedings 1181 (2009). https://doi.org/10.1557/proc-1181-dd10-02.
ieee: F. J. C. Fischer, M. Weinl, J. Lindner, and B. Stritzker, “Nanoscale Surface
Patterning of Silicon Using Local Swelling Induced by He Implantation through
NSL-Masks,” MRS Proceedings, vol. 1181, 2009.
mla: Fischer, Frederic J. C., et al. “Nanoscale Surface Patterning of Silicon Using
Local Swelling Induced by He Implantation through NSL-Masks.” MRS Proceedings,
vol. 1181, 1181-DD10-02, Cambridge University Press (CUP), 2009, doi:10.1557/proc-1181-dd10-02.
short: F.J.C. Fischer, M. Weinl, J. Lindner, B. Stritzker, MRS Proceedings 1181
(2009).
conference:
end_date: 2009-04-17
location: San Franicsco (USA)
name: MRS Spring Meeting 2009
start_date: 2009-04-13
date_created: 2018-08-27T13:21:44Z
date_updated: 2022-01-06T07:00:26Z
department:
- _id: '15'
- _id: '286'
doi: 10.1557/proc-1181-dd10-02
intvolume: ' 1181'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 1946-4274
publication_status: published
publisher: Cambridge University Press (CUP)
status: public
title: Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He
Implantation through NSL-Masks
type: journal_article
user_id: '55706'
volume: 1181
year: '2009'
...
---
_id: '26007'
abstract:
- lang: eng
text: We report on the synthesis of lamellar mesostructured aluminophosphate composites
which contain variable relative amounts of aluminium oxide species in the core
regions of the lamellae; this is investigated quantitatively by Al K-edge XANES
spectroscopy. Templating is achieved by the utilisation of monododecyl phosphate
surfactant. If no phosphorous source (such as H3PO4) is used for the synthesis,
the phosphate head groups of the surfactant become incorporated into the inorganic
network to form similar lamellar aluminophosphate structures. Thus, the surfactant
serves as both template and reactant.
article_type: original
author:
- first_name: Michael
full_name: Tiemann, Michael
id: '23547'
last_name: Tiemann
orcid: 0000-0003-1711-2722
- first_name: M.
full_name: Fröba, M.
last_name: Fröba
- first_name: J.
full_name: Wong, J.
last_name: Wong
citation:
ama: Tiemann M, Fröba M, Wong J. Synthesis and Al K-Edge Xanes Investigation of
Mesostructured Aluminophosphates. MRS Proceedings. Published online 1999.
doi:10.1557/proc-547-87
apa: Tiemann, M., Fröba, M., & Wong, J. (1999). Synthesis and Al K-Edge Xanes
Investigation of Mesostructured Aluminophosphates. MRS Proceedings. https://doi.org/10.1557/proc-547-87
bibtex: '@article{Tiemann_Fröba_Wong_1999, title={Synthesis and Al K-Edge Xanes
Investigation of Mesostructured Aluminophosphates}, DOI={10.1557/proc-547-87},
journal={MRS Proceedings}, author={Tiemann, Michael and Fröba, M. and Wong, J.},
year={1999} }'
chicago: Tiemann, Michael, M. Fröba, and J. Wong. “Synthesis and Al K-Edge Xanes
Investigation of Mesostructured Aluminophosphates.” MRS Proceedings, 1999.
https://doi.org/10.1557/proc-547-87.
ieee: 'M. Tiemann, M. Fröba, and J. Wong, “Synthesis and Al K-Edge Xanes Investigation
of Mesostructured Aluminophosphates,” MRS Proceedings, 1999, doi: 10.1557/proc-547-87.'
mla: Tiemann, Michael, et al. “Synthesis and Al K-Edge Xanes Investigation of Mesostructured
Aluminophosphates.” MRS Proceedings, 1999, doi:10.1557/proc-547-87.
short: M. Tiemann, M. Fröba, J. Wong, MRS Proceedings (1999).
date_created: 2021-10-09T10:12:51Z
date_updated: 2023-03-09T09:08:01Z
department:
- _id: '35'
- _id: '2'
- _id: '307'
doi: 10.1557/proc-547-87
extern: '1'
language:
- iso: eng
publication: MRS Proceedings
publication_identifier:
issn:
- 0272-9172
- 1946-4274
publication_status: published
quality_controlled: '1'
status: public
title: Synthesis and Al K-Edge Xanes Investigation of Mesostructured Aluminophosphates
type: journal_article
user_id: '23547'
year: '1999'
...