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Reuter, “Site-controlled droplet epitaxy of GaAs quantum dots by deposition through shadow masks,” <i>Journal of Vacuum Science &#38; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena</i>, vol. 36, no. 2, 2018.","chicago":"Zolatanosha, Viktoryia, and Dirk Reuter. “Site-Controlled Droplet Epitaxy of GaAs Quantum Dots by Deposition through Shadow Masks.” <i>Journal of Vacuum Science &#38; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena</i> 36, no. 2 (2018). <a href=\"https://doi.org/10.1116/1.5013650\">https://doi.org/10.1116/1.5013650</a>.","mla":"Zolatanosha, Viktoryia, and Dirk Reuter. “Site-Controlled Droplet Epitaxy of GaAs Quantum Dots by Deposition through Shadow Masks.” <i>Journal of Vacuum Science &#38; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena</i>, vol. 36, no. 2, 02D105, American Vacuum Society, 2018, doi:<a href=\"https://doi.org/10.1116/1.5013650\">10.1116/1.5013650</a>.","short":"V. Zolatanosha, D. Reuter, Journal of Vacuum Science &#38; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 36 (2018).","bibtex":"@article{Zolatanosha_Reuter_2018, title={Site-controlled droplet epitaxy of GaAs quantum dots by deposition through shadow masks}, volume={36}, DOI={<a href=\"https://doi.org/10.1116/1.5013650\">10.1116/1.5013650</a>}, number={202D105}, journal={Journal of Vacuum Science &#38; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Zolatanosha, Viktoryia and Reuter, Dirk}, year={2018} }","apa":"Zolatanosha, V., &#38; Reuter, D. (2018). 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