---
_id: '41279'
author:
- first_name: Jin-Ming
  full_name: Wu, Jin-Ming
  last_name: Wu
- first_name: Markus
  full_name: Antonietti, Markus
  last_name: Antonietti
- first_name: Silvia
  full_name: Gross, Silvia
  last_name: Gross
- first_name: Matthias
  full_name: Bauer, Matthias
  id: '47241'
  last_name: Bauer
  orcid: 0000-0002-9294-6076
- first_name: Bernd M.
  full_name: Smarsly, Bernd M.
  last_name: Smarsly
citation:
  ama: Wu J-M, Antonietti M, Gross S, Bauer M, Smarsly BM. Ordered Mesoporous Thin
    Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5. <i>ChemPhysChem</i>.
    2008;9(5):748-757. doi:<a href="https://doi.org/10.1002/cphc.200700679">10.1002/cphc.200700679</a>
  apa: Wu, J.-M., Antonietti, M., Gross, S., Bauer, M., &#38; Smarsly, B. M. (2008).
    Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous
    Ta2O5. <i>ChemPhysChem</i>, <i>9</i>(5), 748–757. <a href="https://doi.org/10.1002/cphc.200700679">https://doi.org/10.1002/cphc.200700679</a>
  bibtex: '@article{Wu_Antonietti_Gross_Bauer_Smarsly_2008, title={Ordered Mesoporous
    Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5}, volume={9},
    DOI={<a href="https://doi.org/10.1002/cphc.200700679">10.1002/cphc.200700679</a>},
    number={5}, journal={ChemPhysChem}, publisher={Wiley}, author={Wu, Jin-Ming and
    Antonietti, Markus and Gross, Silvia and Bauer, Matthias and Smarsly, Bernd M.},
    year={2008}, pages={748–757} }'
  chicago: 'Wu, Jin-Ming, Markus Antonietti, Silvia Gross, Matthias Bauer, and Bernd
    M. Smarsly. “Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with
    Amorphous Ta2O5.” <i>ChemPhysChem</i> 9, no. 5 (2008): 748–57. <a href="https://doi.org/10.1002/cphc.200700679">https://doi.org/10.1002/cphc.200700679</a>.'
  ieee: 'J.-M. Wu, M. Antonietti, S. Gross, M. Bauer, and B. M. Smarsly, “Ordered
    Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5,”
    <i>ChemPhysChem</i>, vol. 9, no. 5, pp. 748–757, 2008, doi: <a href="https://doi.org/10.1002/cphc.200700679">10.1002/cphc.200700679</a>.'
  mla: Wu, Jin-Ming, et al. “Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals
    Mixed with Amorphous Ta2O5.” <i>ChemPhysChem</i>, vol. 9, no. 5, Wiley, 2008,
    pp. 748–57, doi:<a href="https://doi.org/10.1002/cphc.200700679">10.1002/cphc.200700679</a>.
  short: J.-M. Wu, M. Antonietti, S. Gross, M. Bauer, B.M. Smarsly, ChemPhysChem 9
    (2008) 748–757.
date_created: 2023-01-31T15:08:54Z
date_updated: 2023-01-31T15:09:05Z
department:
- _id: '306'
doi: 10.1002/cphc.200700679
intvolume: '         9'
issue: '5'
keyword:
- Physical and Theoretical Chemistry
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 748-757
publication: ChemPhysChem
publication_identifier:
  issn:
  - 1439-4235
publication_status: published
publisher: Wiley
status: public
title: Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous
  Ta2O5
type: journal_article
user_id: '48467'
volume: 9
year: '2008'
...
---
_id: '39978'
author:
- first_name: Heinrich
  full_name: Matthias, Heinrich
  last_name: Matthias
- first_name: Stefan L
  full_name: Schweizer, Stefan L
  last_name: Schweizer
- first_name: Ralf B
  full_name: Wehrspohn, Ralf B
  last_name: Wehrspohn
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
citation:
  ama: 'Matthias H, Schweizer SL, Wehrspohn RB, Kitzerow H-S. Liquid crystal director
    fields in micropores of photonic crystals. <i>Journal of Optics A: Pure and Applied
    Optics</i>. 2007;9(9):S389-S395. doi:<a href="https://doi.org/10.1088/1464-4258/9/9/s18">10.1088/1464-4258/9/9/s18</a>'
  apa: 'Matthias, H., Schweizer, S. L., Wehrspohn, R. B., &#38; Kitzerow, H.-S. (2007).
    Liquid crystal director fields in micropores of photonic crystals. <i>Journal
    of Optics A: Pure and Applied Optics</i>, <i>9</i>(9), S389–S395. <a href="https://doi.org/10.1088/1464-4258/9/9/s18">https://doi.org/10.1088/1464-4258/9/9/s18</a>'
  bibtex: '@article{Matthias_Schweizer_Wehrspohn_Kitzerow_2007, title={Liquid crystal
    director fields in micropores of photonic crystals}, volume={9}, DOI={<a href="https://doi.org/10.1088/1464-4258/9/9/s18">10.1088/1464-4258/9/9/s18</a>},
    number={9}, journal={Journal of Optics A: Pure and Applied Optics}, publisher={IOP
    Publishing}, author={Matthias, Heinrich and Schweizer, Stefan L and Wehrspohn,
    Ralf B and Kitzerow, Heinz-Siegfried}, year={2007}, pages={S389–S395} }'
  chicago: 'Matthias, Heinrich, Stefan L Schweizer, Ralf B Wehrspohn, and Heinz-Siegfried
    Kitzerow. “Liquid Crystal Director Fields in Micropores of Photonic Crystals.”
    <i>Journal of Optics A: Pure and Applied Optics</i> 9, no. 9 (2007): S389–95.
    <a href="https://doi.org/10.1088/1464-4258/9/9/s18">https://doi.org/10.1088/1464-4258/9/9/s18</a>.'
  ieee: 'H. Matthias, S. L. Schweizer, R. B. Wehrspohn, and H.-S. Kitzerow, “Liquid
    crystal director fields in micropores of photonic crystals,” <i>Journal of Optics
    A: Pure and Applied Optics</i>, vol. 9, no. 9, pp. S389–S395, 2007, doi: <a href="https://doi.org/10.1088/1464-4258/9/9/s18">10.1088/1464-4258/9/9/s18</a>.'
  mla: 'Matthias, Heinrich, et al. “Liquid Crystal Director Fields in Micropores of
    Photonic Crystals.” <i>Journal of Optics A: Pure and Applied Optics</i>, vol.
    9, no. 9, IOP Publishing, 2007, pp. S389–95, doi:<a href="https://doi.org/10.1088/1464-4258/9/9/s18">10.1088/1464-4258/9/9/s18</a>.'
  short: 'H. Matthias, S.L. Schweizer, R.B. Wehrspohn, H.-S. Kitzerow, Journal of
    Optics A: Pure and Applied Optics 9 (2007) S389–S395.'
date_created: 2023-01-25T11:49:23Z
date_updated: 2023-01-25T16:15:11Z
department:
- _id: '313'
- _id: '230'
- _id: '638'
doi: 10.1088/1464-4258/9/9/s18
intvolume: '         9'
issue: '9'
keyword:
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: S389-S395
publication: 'Journal of Optics A: Pure and Applied Optics'
publication_identifier:
  issn:
  - 1464-4258
  - 1741-3567
publication_status: published
publisher: IOP Publishing
status: public
title: Liquid crystal director fields in micropores of photonic crystals
type: journal_article
user_id: '254'
volume: 9
year: '2007'
...
---
_id: '39973'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
citation:
  ama: Kitzerow H-S. News about Soft Condensed Matter—A Liquid Crystal Meeting Review.
    <i>ChemPhysChem</i>. 2005;2(10):628-632. doi:<a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>
  apa: Kitzerow, H.-S. (2005). News about Soft Condensed Matter—A Liquid Crystal Meeting
    Review. <i>ChemPhysChem</i>, <i>2</i>(10), 628–632. <a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>
  bibtex: '@article{Kitzerow_2005, title={News about Soft Condensed Matter—A Liquid
    Crystal Meeting Review}, volume={2}, DOI={<a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>},
    number={10}, journal={ChemPhysChem}, publisher={Wiley}, author={Kitzerow, Heinz-Siegfried},
    year={2005}, pages={628–632} }'
  chicago: 'Kitzerow, Heinz-Siegfried. “News about Soft Condensed Matter—A Liquid
    Crystal Meeting Review.” <i>ChemPhysChem</i> 2, no. 10 (2005): 628–32. <a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>.'
  ieee: 'H.-S. Kitzerow, “News about Soft Condensed Matter—A Liquid Crystal Meeting
    Review,” <i>ChemPhysChem</i>, vol. 2, no. 10, pp. 628–632, 2005, doi: <a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>.'
  mla: Kitzerow, Heinz-Siegfried. “News about Soft Condensed Matter—A Liquid Crystal
    Meeting Review.” <i>ChemPhysChem</i>, vol. 2, no. 10, Wiley, 2005, pp. 628–32,
    doi:<a href="https://doi.org/10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7">10.1002/1439-7641(20011015)2:10&#60;628::aid-cphc628&#62;3.0.co;2-7</a>.
  short: H.-S. Kitzerow, ChemPhysChem 2 (2005) 628–632.
date_created: 2023-01-25T11:32:08Z
date_updated: 2023-01-25T11:38:17Z
department:
- _id: '313'
- _id: '638'
doi: 10.1002/1439-7641(20011015)2:10<628::aid-cphc628>3.0.co;2-7
intvolume: '         2'
issue: '10'
keyword:
- Physical and Theoretical Chemistry
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 628-632
publication: ChemPhysChem
publication_identifier:
  issn:
  - 1439-4235
  - 1439-7641
publication_status: published
publisher: Wiley
status: public
title: News about Soft Condensed Matter—A Liquid Crystal Meeting Review
type: journal_article
user_id: '254'
volume: 2
year: '2005'
...
---
_id: '39993'
author:
- first_name: Nicole
  full_name: Mießen, Nicole
  last_name: Mießen
- first_name: Jochen
  full_name: Strauß, Jochen
  last_name: Strauß
- first_name: Andreas
  full_name: Hoischen, Andreas
  last_name: Hoischen
- first_name: Kathrin
  full_name: Kürschner, Kathrin
  last_name: Kürschner
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
citation:
  ama: Mießen N, Strauß J, Hoischen A, Kürschner K, Kitzerow H-S. Durable Micropatterns
    Obtained from Dissipative Structures in Liquid Crystals. <i>ChemPhysChem</i>.
    2005;2(11):691-694. doi:<a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>
  apa: Mießen, N., Strauß, J., Hoischen, A., Kürschner, K., &#38; Kitzerow, H.-S.
    (2005). Durable Micropatterns Obtained from Dissipative Structures in Liquid Crystals.
    <i>ChemPhysChem</i>, <i>2</i>(11), 691–694. <a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>
  bibtex: '@article{Mießen_Strauß_Hoischen_Kürschner_Kitzerow_2005, title={Durable
    Micropatterns Obtained from Dissipative Structures in Liquid Crystals}, volume={2},
    DOI={<a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>},
    number={11}, journal={ChemPhysChem}, publisher={Wiley}, author={Mießen, Nicole
    and Strauß, Jochen and Hoischen, Andreas and Kürschner, Kathrin and Kitzerow,
    Heinz-Siegfried}, year={2005}, pages={691–694} }'
  chicago: 'Mießen, Nicole, Jochen Strauß, Andreas Hoischen, Kathrin Kürschner, and
    Heinz-Siegfried Kitzerow. “Durable Micropatterns Obtained from Dissipative Structures
    in Liquid Crystals.” <i>ChemPhysChem</i> 2, no. 11 (2005): 691–94. <a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>.'
  ieee: 'N. Mießen, J. Strauß, A. Hoischen, K. Kürschner, and H.-S. Kitzerow, “Durable
    Micropatterns Obtained from Dissipative Structures in Liquid Crystals,” <i>ChemPhysChem</i>,
    vol. 2, no. 11, pp. 691–694, 2005, doi: <a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>.'
  mla: Mießen, Nicole, et al. “Durable Micropatterns Obtained from Dissipative Structures
    in Liquid Crystals.” <i>ChemPhysChem</i>, vol. 2, no. 11, Wiley, 2005, pp. 691–94,
    doi:<a href="https://doi.org/10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s">10.1002/1439-7641(20011119)2:11&#60;691::aid-cphc691&#62;3.0.co;2-s</a>.
  short: N. Mießen, J. Strauß, A. Hoischen, K. Kürschner, H.-S. Kitzerow, ChemPhysChem
    2 (2005) 691–694.
date_created: 2023-01-25T13:16:21Z
date_updated: 2023-01-25T16:08:40Z
department:
- _id: '313'
- _id: '638'
doi: 10.1002/1439-7641(20011119)2:11<691::aid-cphc691>3.0.co;2-s
intvolume: '         2'
issue: '11'
keyword:
- Physical and Theoretical Chemistry
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 691-694
publication: ChemPhysChem
publication_identifier:
  issn:
  - 1439-4235
  - 1439-7641
publication_status: published
publisher: Wiley
status: public
title: Durable Micropatterns Obtained from Dissipative Structures in Liquid Crystals
type: journal_article
user_id: '254'
volume: 2
year: '2005'
...
---
_id: '39851'
author:
- first_name: Ch.
  full_name: Pannemann, Ch.
  last_name: Pannemann
- first_name: T.
  full_name: Diekmann, T.
  last_name: Diekmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
citation:
  ama: Pannemann Ch, Diekmann T, Hilleringmann U. Nanometer scale organic thin film
    transistors with Pentacene. <i>Microelectronic Engineering</i>. 2003;67-68:845-852.
    doi:<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>
  apa: Pannemann, Ch., Diekmann, T., &#38; Hilleringmann, U. (2003). Nanometer scale
    organic thin film transistors with Pentacene. <i>Microelectronic Engineering</i>,
    <i>67–68</i>, 845–852. <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">https://doi.org/10.1016/s0167-9317(03)00146-1</a>
  bibtex: '@article{Pannemann_Diekmann_Hilleringmann_2003, title={Nanometer scale
    organic thin film transistors with Pentacene}, volume={67–68}, DOI={<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>},
    journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Pannemann,
    Ch. and Diekmann, T. and Hilleringmann, Ulrich}, year={2003}, pages={845–852}
    }'
  chicago: 'Pannemann, Ch., T. Diekmann, and Ulrich Hilleringmann. “Nanometer Scale
    Organic Thin Film Transistors with Pentacene.” <i>Microelectronic Engineering</i>
    67–68 (2003): 845–52. <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">https://doi.org/10.1016/s0167-9317(03)00146-1</a>.'
  ieee: 'Ch. Pannemann, T. Diekmann, and U. Hilleringmann, “Nanometer scale organic
    thin film transistors with Pentacene,” <i>Microelectronic Engineering</i>, vol.
    67–68, pp. 845–852, 2003, doi: <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>.'
  mla: Pannemann, Ch., et al. “Nanometer Scale Organic Thin Film Transistors with
    Pentacene.” <i>Microelectronic Engineering</i>, vol. 67–68, Elsevier BV, 2003,
    pp. 845–52, doi:<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>.
  short: Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering
    67–68 (2003) 845–852.
date_created: 2023-01-25T08:39:40Z
date_updated: 2023-03-21T10:04:43Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(03)00146-1
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 845-852
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Nanometer scale organic thin film transistors with Pentacene
type: journal_article
user_id: '20179'
volume: 67-68
year: '2003'
...
---
_id: '39912'
author:
- first_name: I.
  full_name: Schönstein, I.
  last_name: Schönstein
- first_name: J.
  full_name: Müller, J.
  last_name: Müller
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Schönstein I, Müller J, Hilleringmann U, Goser K. Characterization of submicron
    NMOS devices due to visible light emission. <i>Microelectronic Engineering</i>.
    2002;21(1-4):363-366. doi:<a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>
  apa: Schönstein, I., Müller, J., Hilleringmann, U., &#38; Goser, K. (2002). Characterization
    of submicron NMOS devices due to visible light emission. <i>Microelectronic Engineering</i>,
    <i>21</i>(1–4), 363–366. <a href="https://doi.org/10.1016/0167-9317(93)90092-j">https://doi.org/10.1016/0167-9317(93)90092-j</a>
  bibtex: '@article{Schönstein_Müller_Hilleringmann_Goser_2002, title={Characterization
    of submicron NMOS devices due to visible light emission}, volume={21}, DOI={<a
    href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Schönstein, I. and Müller, J. and Hilleringmann, Ulrich and Goser, K.},
    year={2002}, pages={363–366} }'
  chicago: 'Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization
    of Submicron NMOS Devices Due to Visible Light Emission.” <i>Microelectronic Engineering</i>
    21, no. 1–4 (2002): 363–66. <a href="https://doi.org/10.1016/0167-9317(93)90092-j">https://doi.org/10.1016/0167-9317(93)90092-j</a>.'
  ieee: 'I. Schönstein, J. Müller, U. Hilleringmann, and K. Goser, “Characterization
    of submicron NMOS devices due to visible light emission,” <i>Microelectronic Engineering</i>,
    vol. 21, no. 1–4, pp. 363–366, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>.'
  mla: Schönstein, I., et al. “Characterization of Submicron NMOS Devices Due to Visible
    Light Emission.” <i>Microelectronic Engineering</i>, vol. 21, no. 1–4, Elsevier
    BV, 2002, pp. 363–66, doi:<a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>.
  short: I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering
    21 (2002) 363–366.
date_created: 2023-01-25T09:26:21Z
date_updated: 2023-03-21T09:50:03Z
department:
- _id: '59'
doi: 10.1016/0167-9317(93)90092-j
intvolume: '        21'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 363-366
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Characterization of submicron NMOS devices due to visible light emission
type: journal_article
user_id: '20179'
volume: 21
year: '2002'
...
---
_id: '39914'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides,
    photodiodes and CMOS circuits on silicon. <i>Microelectronic Engineering</i>.
    2002;19(1-4):211-214. doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>
  apa: Hilleringmann, U., &#38; Goser, K. (2002). Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon. <i>Microelectronic
    Engineering</i>, <i>19</i>(1–4), 211–214. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>
  bibtex: '@article{Hilleringmann_Goser_2002, title={Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon}, volume={19},
    DOI={<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={211–214} }'
  chicago: 'Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration
    of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i> 19, no. 1–4 (2002): 211–14. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>.'
  ieee: 'U. Hilleringmann and K. Goser, “Results of monolithic integration of optical
    waveguides, photodiodes and CMOS circuits on silicon,” <i>Microelectronic Engineering</i>,
    vol. 19, no. 1–4, pp. 211–214, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.'
  mla: Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of
    Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i>, vol. 19, no. 1–4, Elsevier BV, 2002, pp. 211–14, doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.
  short: U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
date_created: 2023-01-25T09:27:23Z
date_updated: 2023-03-21T09:49:25Z
department:
- _id: '59'
doi: 10.1016/0167-9317(92)90425-q
intvolume: '        19'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 211-214
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Results of monolithic integration of optical waveguides, photodiodes and CMOS
  circuits on silicon
type: journal_article
user_id: '20179'
volume: 19
year: '2002'
...
---
_id: '39899'
author:
- first_name: J.T.
  full_name: Horstmann, J.T.
  last_name: Horstmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Horstmann JT, Hilleringmann U, Goser K. Characterisation of sub-100 nm-MOS-transistors
    processed by optical lithography and a sidewall-etchback technique. <i>Microelectronic
    Engineering</i>. 2002;30(1-4):431-434. doi:<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>
  apa: Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. (2002). Characterisation
    of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback
    technique. <i>Microelectronic Engineering</i>, <i>30</i>(1–4), 431–434. <a href="https://doi.org/10.1016/0167-9317(95)00280-4">https://doi.org/10.1016/0167-9317(95)00280-4</a>
  bibtex: '@article{Horstmann_Hilleringmann_Goser_2002, title={Characterisation of
    sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback
    technique}, volume={30}, DOI={<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={431–434} }'
  chicago: 'Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation
    of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback
    Technique.” <i>Microelectronic Engineering</i> 30, no. 1–4 (2002): 431–34. <a
    href="https://doi.org/10.1016/0167-9317(95)00280-4">https://doi.org/10.1016/0167-9317(95)00280-4</a>.'
  ieee: 'J. T. Horstmann, U. Hilleringmann, and K. Goser, “Characterisation of sub-100
    nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique,”
    <i>Microelectronic Engineering</i>, vol. 30, no. 1–4, pp. 431–434, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>.'
  mla: Horstmann, J. T., et al. “Characterisation of Sub-100 Nm-MOS-Transistors Processed
    by Optical Lithography and a Sidewall-Etchback Technique.” <i>Microelectronic
    Engineering</i>, vol. 30, no. 1–4, Elsevier BV, 2002, pp. 431–34, doi:<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>.
  short: J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30
    (2002) 431–434.
date_created: 2023-01-25T09:20:20Z
date_updated: 2023-03-21T09:53:55Z
department:
- _id: '59'
doi: 10.1016/0167-9317(95)00280-4
intvolume: '        30'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 431-434
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Characterisation of sub-100 nm-MOS-transistors processed by optical lithography
  and a sidewall-etchback technique
type: journal_article
user_id: '20179'
volume: 30
year: '2002'
...
---
_id: '39882'
author:
- first_name: V.
  full_name: Mankowski, V.
  last_name: Mankowski
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Schumacher, K.
  last_name: Schumacher
citation:
  ama: Mankowski V, Hilleringmann U, Schumacher K. A novel insulation technique for
    smart power switching devices and very high voltage ICs above 10 kV. <i>Microelectronic
    Engineering</i>. 2002;53(1-4):525-528. doi:<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>
  apa: Mankowski, V., Hilleringmann, U., &#38; Schumacher, K. (2002). A novel insulation
    technique for smart power switching devices and very high voltage ICs above 10
    kV. <i>Microelectronic Engineering</i>, <i>53</i>(1–4), 525–528. <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">https://doi.org/10.1016/s0167-9317(00)00370-1</a>
  bibtex: '@article{Mankowski_Hilleringmann_Schumacher_2002, title={A novel insulation
    technique for smart power switching devices and very high voltage ICs above 10
    kV}, volume={53}, DOI={<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Mankowski, V. and Hilleringmann, Ulrich and Schumacher, K.}, year={2002},
    pages={525–528} }'
  chicago: 'Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “A Novel Insulation
    Technique for Smart Power Switching Devices and Very High Voltage ICs above 10
    KV.” <i>Microelectronic Engineering</i> 53, no. 1–4 (2002): 525–28. <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">https://doi.org/10.1016/s0167-9317(00)00370-1</a>.'
  ieee: 'V. Mankowski, U. Hilleringmann, and K. Schumacher, “A novel insulation technique
    for smart power switching devices and very high voltage ICs above 10 kV,” <i>Microelectronic
    Engineering</i>, vol. 53, no. 1–4, pp. 525–528, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>.'
  mla: Mankowski, V., et al. “A Novel Insulation Technique for Smart Power Switching
    Devices and Very High Voltage ICs above 10 KV.” <i>Microelectronic Engineering</i>,
    vol. 53, no. 1–4, Elsevier BV, 2002, pp. 525–28, doi:<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>.
  short: V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering
    53 (2002) 525–528.
date_created: 2023-01-25T09:10:13Z
date_updated: 2023-03-21T10:00:06Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(00)00370-1
intvolume: '        53'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 525-528
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: A novel insulation technique for smart power switching devices and very high
  voltage ICs above 10 kV
type: journal_article
user_id: '20179'
volume: 53
year: '2002'
...
---
_id: '39879'
author:
- first_name: J.T.
  full_name: Horstmann, J.T.
  last_name: Horstmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Horstmann JT, Hilleringmann U, Goser K. 1/f-Noise of sub-100 nm-MOS-transistors
    fabricated by a special deposition and etchback technique. <i>Microelectronic
    Engineering</i>. 2002;53(1-4):213-216. doi:<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>
  apa: Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. (2002). 1/f-Noise of sub-100
    nm-MOS-transistors fabricated by a special deposition and etchback technique.
    <i>Microelectronic Engineering</i>, <i>53</i>(1–4), 213–216. <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">https://doi.org/10.1016/s0167-9317(00)00299-9</a>
  bibtex: '@article{Horstmann_Hilleringmann_Goser_2002, title={1/f-Noise of sub-100
    nm-MOS-transistors fabricated by a special deposition and etchback technique},
    volume={53}, DOI={<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={213–216} }'
  chicago: 'Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “1/f-Noise of Sub-100
    Nm-MOS-Transistors Fabricated by a Special Deposition and Etchback Technique.”
    <i>Microelectronic Engineering</i> 53, no. 1–4 (2002): 213–16. <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">https://doi.org/10.1016/s0167-9317(00)00299-9</a>.'
  ieee: 'J. T. Horstmann, U. Hilleringmann, and K. Goser, “1/f-Noise of sub-100 nm-MOS-transistors
    fabricated by a special deposition and etchback technique,” <i>Microelectronic
    Engineering</i>, vol. 53, no. 1–4, pp. 213–216, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>.'
  mla: Horstmann, J. T., et al. “1/f-Noise of Sub-100 Nm-MOS-Transistors Fabricated
    by a Special Deposition and Etchback Technique.” <i>Microelectronic Engineering</i>,
    vol. 53, no. 1–4, Elsevier BV, 2002, pp. 213–16, doi:<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>.
  short: J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53
    (2002) 213–216.
date_created: 2023-01-25T09:08:36Z
date_updated: 2023-03-21T10:02:46Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(00)00299-9
intvolume: '        53'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 213-216
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: 1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition
  and etchback technique
type: journal_article
user_id: '20179'
volume: 53
year: '2002'
...
---
_id: '39919'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Knospe, K.
  last_name: Knospe
- first_name: C.
  full_name: Heite, C.
  last_name: Heite
- first_name: K.
  full_name: Schumacher, K.
  last_name: Schumacher
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Knospe K, Heite C, Schumacher K, Goser K. A silicon based
    technology for monolithic integration of waveguides and VLSI CMOS circuits. <i>Microelectronic
    Engineering</i>. 2002;15(1-4):289-292. doi:<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>
  apa: Hilleringmann, U., Knospe, K., Heite, C., Schumacher, K., &#38; Goser, K. (2002).
    A silicon based technology for monolithic integration of waveguides and VLSI CMOS
    circuits. <i>Microelectronic Engineering</i>, <i>15</i>(1–4), 289–292. <a href="https://doi.org/10.1016/0167-9317(91)90231-2">https://doi.org/10.1016/0167-9317(91)90231-2</a>
  bibtex: '@article{Hilleringmann_Knospe_Heite_Schumacher_Goser_2002, title={A silicon
    based technology for monolithic integration of waveguides and VLSI CMOS circuits},
    volume={15}, DOI={<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Knospe, K. and Heite, C. and Schumacher, K.
    and Goser, K.}, year={2002}, pages={289–292} }'
  chicago: 'Hilleringmann, Ulrich, K. Knospe, C. Heite, K. Schumacher, and K. Goser.
    “A Silicon Based Technology for Monolithic Integration of Waveguides and VLSI
    CMOS Circuits.” <i>Microelectronic Engineering</i> 15, no. 1–4 (2002): 289–92.
    <a href="https://doi.org/10.1016/0167-9317(91)90231-2">https://doi.org/10.1016/0167-9317(91)90231-2</a>.'
  ieee: 'U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, and K. Goser, “A silicon
    based technology for monolithic integration of waveguides and VLSI CMOS circuits,”
    <i>Microelectronic Engineering</i>, vol. 15, no. 1–4, pp. 289–292, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>.'
  mla: Hilleringmann, Ulrich, et al. “A Silicon Based Technology for Monolithic Integration
    of Waveguides and VLSI CMOS Circuits.” <i>Microelectronic Engineering</i>, vol.
    15, no. 1–4, Elsevier BV, 2002, pp. 289–92, doi:<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>.
  short: U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic
    Engineering 15 (2002) 289–292.
date_created: 2023-01-25T09:29:32Z
date_updated: 2023-03-22T10:29:08Z
department:
- _id: '59'
doi: 10.1016/0167-9317(91)90231-2
intvolume: '        15'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 289-292
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: A silicon based technology for monolithic integration of waveguides and VLSI
  CMOS circuits
type: journal_article
user_id: '20179'
volume: 15
year: '2002'
...
---
_id: '39920'
author:
- first_name: A.
  full_name: Soennecken, A.
  last_name: Soennecken
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Soennecken A, Hilleringmann U, Goser K. Floating gate structures as nonvolatile
    analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica. <i>Microelectronic
    Engineering</i>. 2002;15(1-4):633-636. doi:<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>
  apa: Soennecken, A., Hilleringmann, U., &#38; Goser, K. (2002). Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica.
    <i>Microelectronic Engineering</i>, <i>15</i>(1–4), 633–636. <a href="https://doi.org/10.1016/0167-9317(91)90299-s">https://doi.org/10.1016/0167-9317(91)90299-s</a>
  bibtex: '@article{Soennecken_Hilleringmann_Goser_2002, title={Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica},
    volume={15}, DOI={<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Soennecken, A. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={633–636} }'
  chicago: 'Soennecken, A., Ulrich Hilleringmann, and K. Goser. “Floating Gate Structures
    as Nonvolatile Analog Memory Cells in 1.0μm-LOCOS-CMOS Technology with PZT Dielectrica.”
    <i>Microelectronic Engineering</i> 15, no. 1–4 (2002): 633–36. <a href="https://doi.org/10.1016/0167-9317(91)90299-s">https://doi.org/10.1016/0167-9317(91)90299-s</a>.'
  ieee: 'A. Soennecken, U. Hilleringmann, and K. Goser, “Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica,”
    <i>Microelectronic Engineering</i>, vol. 15, no. 1–4, pp. 633–636, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>.'
  mla: Soennecken, A., et al. “Floating Gate Structures as Nonvolatile Analog Memory
    Cells in 1.0μm-LOCOS-CMOS Technology with PZT Dielectrica.” <i>Microelectronic
    Engineering</i>, vol. 15, no. 1–4, Elsevier BV, 2002, pp. 633–36, doi:<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>.
  short: A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15
    (2002) 633–636.
date_created: 2023-01-25T09:29:53Z
date_updated: 2023-03-21T09:47:17Z
department:
- _id: '59'
doi: 10.1016/0167-9317(91)90299-s
intvolume: '        15'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 633-636
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS
  technology with PZT dielectrica
type: journal_article
user_id: '20179'
volume: 15
year: '2002'
...
---
_id: '39915'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides,
    photodiodes and CMOS circuits on silicon. <i>Microelectronic Engineering</i>.
    2002;19(1-4):211-214. doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>
  apa: Hilleringmann, U., &#38; Goser, K. (2002). Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon. <i>Microelectronic
    Engineering</i>, <i>19</i>(1–4), 211–214. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>
  bibtex: '@article{Hilleringmann_Goser_2002, title={Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon}, volume={19},
    DOI={<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={211–214} }'
  chicago: 'Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration
    of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i> 19, no. 1–4 (2002): 211–14. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>.'
  ieee: 'U. Hilleringmann and K. Goser, “Results of monolithic integration of optical
    waveguides, photodiodes and CMOS circuits on silicon,” <i>Microelectronic Engineering</i>,
    vol. 19, no. 1–4, pp. 211–214, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.'
  mla: Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of
    Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i>, vol. 19, no. 1–4, Elsevier BV, 2002, pp. 211–14, doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.
  short: U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
date_created: 2023-01-25T09:27:51Z
date_updated: 2023-03-21T09:49:09Z
department:
- _id: '59'
doi: 10.1016/0167-9317(92)90425-q
intvolume: '        19'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 211-214
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Results of monolithic integration of optical waveguides, photodiodes and CMOS
  circuits on silicon
type: journal_article
user_id: '20179'
volume: 19
year: '2002'
...
---
_id: '39916'
author:
- first_name: S.
  full_name: Adams, S.
  last_name: Adams
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Adams S, Hilleringmann U, Goser K. CMOS compatible micromachining by dry silicon-etching
    techniques. <i>Microelectronic Engineering</i>. 2002;19(1-4):191-194. doi:<a href="https://doi.org/10.1016/0167-9317(92)90420-v">10.1016/0167-9317(92)90420-v</a>
  apa: Adams, S., Hilleringmann, U., &#38; Goser, K. (2002). CMOS compatible micromachining
    by dry silicon-etching techniques. <i>Microelectronic Engineering</i>, <i>19</i>(1–4),
    191–194. <a href="https://doi.org/10.1016/0167-9317(92)90420-v">https://doi.org/10.1016/0167-9317(92)90420-v</a>
  bibtex: '@article{Adams_Hilleringmann_Goser_2002, title={CMOS compatible micromachining
    by dry silicon-etching techniques}, volume={19}, DOI={<a href="https://doi.org/10.1016/0167-9317(92)90420-v">10.1016/0167-9317(92)90420-v</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Adams, S. and Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={191–194}
    }'
  chicago: 'Adams, S., Ulrich Hilleringmann, and K. Goser. “CMOS Compatible Micromachining
    by Dry Silicon-Etching Techniques.” <i>Microelectronic Engineering</i> 19, no.
    1–4 (2002): 191–94. <a href="https://doi.org/10.1016/0167-9317(92)90420-v">https://doi.org/10.1016/0167-9317(92)90420-v</a>.'
  ieee: 'S. Adams, U. Hilleringmann, and K. Goser, “CMOS compatible micromachining
    by dry silicon-etching techniques,” <i>Microelectronic Engineering</i>, vol. 19,
    no. 1–4, pp. 191–194, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(92)90420-v">10.1016/0167-9317(92)90420-v</a>.'
  mla: Adams, S., et al. “CMOS Compatible Micromachining by Dry Silicon-Etching Techniques.”
    <i>Microelectronic Engineering</i>, vol. 19, no. 1–4, Elsevier BV, 2002, pp. 191–94,
    doi:<a href="https://doi.org/10.1016/0167-9317(92)90420-v">10.1016/0167-9317(92)90420-v</a>.
  short: S. Adams, U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002)
    191–194.
date_created: 2023-01-25T09:28:16Z
date_updated: 2023-03-21T09:48:55Z
department:
- _id: '59'
doi: 10.1016/0167-9317(92)90420-v
intvolume: '        19'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 191-194
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: CMOS compatible micromachining by dry silicon-etching techniques
type: journal_article
user_id: '20179'
volume: 19
year: '2002'
...
---
_id: '39889'
author:
- first_name: V.
  full_name: Mankowski, V.
  last_name: Mankowski
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Schumacher, K.
  last_name: Schumacher
citation:
  ama: Mankowski V, Hilleringmann U, Schumacher K. 12 kV low current cascaded light
    triggered switch on one silicon chip. <i>Microelectronic Engineering</i>. 2002;46(1-4):413-417.
    doi:<a href="https://doi.org/10.1016/s0167-9317(99)00122-7">10.1016/s0167-9317(99)00122-7</a>
  apa: Mankowski, V., Hilleringmann, U., &#38; Schumacher, K. (2002). 12 kV low current
    cascaded light triggered switch on one silicon chip. <i>Microelectronic Engineering</i>,
    <i>46</i>(1–4), 413–417. <a href="https://doi.org/10.1016/s0167-9317(99)00122-7">https://doi.org/10.1016/s0167-9317(99)00122-7</a>
  bibtex: '@article{Mankowski_Hilleringmann_Schumacher_2002, title={12 kV low current
    cascaded light triggered switch on one silicon chip}, volume={46}, DOI={<a href="https://doi.org/10.1016/s0167-9317(99)00122-7">10.1016/s0167-9317(99)00122-7</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Mankowski, V. and Hilleringmann, Ulrich and Schumacher, K.}, year={2002},
    pages={413–417} }'
  chicago: 'Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “12 KV Low Current
    Cascaded Light Triggered Switch on One Silicon Chip.” <i>Microelectronic Engineering</i>
    46, no. 1–4 (2002): 413–17. <a href="https://doi.org/10.1016/s0167-9317(99)00122-7">https://doi.org/10.1016/s0167-9317(99)00122-7</a>.'
  ieee: 'V. Mankowski, U. Hilleringmann, and K. Schumacher, “12 kV low current cascaded
    light triggered switch on one silicon chip,” <i>Microelectronic Engineering</i>,
    vol. 46, no. 1–4, pp. 413–417, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(99)00122-7">10.1016/s0167-9317(99)00122-7</a>.'
  mla: Mankowski, V., et al. “12 KV Low Current Cascaded Light Triggered Switch on
    One Silicon Chip.” <i>Microelectronic Engineering</i>, vol. 46, no. 1–4, Elsevier
    BV, 2002, pp. 413–17, doi:<a href="https://doi.org/10.1016/s0167-9317(99)00122-7">10.1016/s0167-9317(99)00122-7</a>.
  short: V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering
    46 (2002) 413–417.
date_created: 2023-01-25T09:13:17Z
date_updated: 2023-03-21T09:58:35Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(99)00122-7
intvolume: '        46'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 413-417
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: 12 kV low current cascaded light triggered switch on one silicon chip
type: journal_article
user_id: '20179'
volume: 46
year: '2002'
...
---
_id: '39877'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: T.
  full_name: Vieregge, T.
  last_name: Vieregge
- first_name: J.T.
  full_name: Horstmann, J.T.
  last_name: Horstmann
citation:
  ama: Hilleringmann U, Vieregge T, Horstmann JT. A structure definition technique
    for 25 nm lines of silicon and related materials. <i>Microelectronic Engineering</i>.
    2002;53(1-4):569-572. doi:<a href="https://doi.org/10.1016/s0167-9317(00)00380-4">10.1016/s0167-9317(00)00380-4</a>
  apa: Hilleringmann, U., Vieregge, T., &#38; Horstmann, J. T. (2002). A structure
    definition technique for 25 nm lines of silicon and related materials. <i>Microelectronic
    Engineering</i>, <i>53</i>(1–4), 569–572. <a href="https://doi.org/10.1016/s0167-9317(00)00380-4">https://doi.org/10.1016/s0167-9317(00)00380-4</a>
  bibtex: '@article{Hilleringmann_Vieregge_Horstmann_2002, title={A structure definition
    technique for 25 nm lines of silicon and related materials}, volume={53}, DOI={<a
    href="https://doi.org/10.1016/s0167-9317(00)00380-4">10.1016/s0167-9317(00)00380-4</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Vieregge, T. and Horstmann, J.T.}, year={2002},
    pages={569–572} }'
  chicago: 'Hilleringmann, Ulrich, T. Vieregge, and J.T. Horstmann. “A Structure Definition
    Technique for 25 Nm Lines of Silicon and Related Materials.” <i>Microelectronic
    Engineering</i> 53, no. 1–4 (2002): 569–72. <a href="https://doi.org/10.1016/s0167-9317(00)00380-4">https://doi.org/10.1016/s0167-9317(00)00380-4</a>.'
  ieee: 'U. Hilleringmann, T. Vieregge, and J. T. Horstmann, “A structure definition
    technique for 25 nm lines of silicon and related materials,” <i>Microelectronic
    Engineering</i>, vol. 53, no. 1–4, pp. 569–572, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(00)00380-4">10.1016/s0167-9317(00)00380-4</a>.'
  mla: Hilleringmann, Ulrich, et al. “A Structure Definition Technique for 25 Nm Lines
    of Silicon and Related Materials.” <i>Microelectronic Engineering</i>, vol. 53,
    no. 1–4, Elsevier BV, 2002, pp. 569–72, doi:<a href="https://doi.org/10.1016/s0167-9317(00)00380-4">10.1016/s0167-9317(00)00380-4</a>.
  short: U. Hilleringmann, T. Vieregge, J.T. Horstmann, Microelectronic Engineering
    53 (2002) 569–572.
date_created: 2023-01-25T09:08:13Z
date_updated: 2023-03-21T10:03:00Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(00)00380-4
intvolume: '        53'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 569-572
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: A structure definition technique for 25 nm lines of silicon and related materials
type: journal_article
user_id: '20179'
volume: 53
year: '2002'
...
---
_id: '35377'
article_type: original
author:
- first_name: Stefan
  full_name: Müller, Stefan
  last_name: Müller
- first_name: Peter
  full_name: Fischer, Peter
  last_name: Fischer
- first_name: Claudia
  full_name: Schmidt, Claudia
  id: '466'
  last_name: Schmidt
  orcid: 0000-0003-3179-9997
citation:
  ama: Müller S, Fischer P, Schmidt C. Solid-Like Director Reorientation in Sheared
    Hexagonal Lyotropic Liquid Crystals as Studied by Nuclear Maginetic Resonance.
    <i>Journal de Physique II</i>. 1997;7(3):421-432. doi:<a href="https://doi.org/10.1051/jp2:1997135">10.1051/jp2:1997135</a>
  apa: Müller, S., Fischer, P., &#38; Schmidt, C. (1997). Solid-Like Director Reorientation
    in Sheared Hexagonal Lyotropic Liquid Crystals as Studied by Nuclear Maginetic
    Resonance. <i>Journal de Physique II</i>, <i>7</i>(3), 421–432. <a href="https://doi.org/10.1051/jp2:1997135">https://doi.org/10.1051/jp2:1997135</a>
  bibtex: '@article{Müller_Fischer_Schmidt_1997, title={Solid-Like Director Reorientation
    in Sheared Hexagonal Lyotropic Liquid Crystals as Studied by Nuclear Maginetic
    Resonance}, volume={7}, DOI={<a href="https://doi.org/10.1051/jp2:1997135">10.1051/jp2:1997135</a>},
    number={3}, journal={Journal de Physique II}, publisher={EDP Sciences}, author={Müller,
    Stefan and Fischer, Peter and Schmidt, Claudia}, year={1997}, pages={421–432}
    }'
  chicago: 'Müller, Stefan, Peter Fischer, and Claudia Schmidt. “Solid-Like Director
    Reorientation in Sheared Hexagonal Lyotropic Liquid Crystals as Studied by Nuclear
    Maginetic Resonance.” <i>Journal de Physique II</i> 7, no. 3 (1997): 421–32. <a
    href="https://doi.org/10.1051/jp2:1997135">https://doi.org/10.1051/jp2:1997135</a>.'
  ieee: 'S. Müller, P. Fischer, and C. Schmidt, “Solid-Like Director Reorientation
    in Sheared Hexagonal Lyotropic Liquid Crystals as Studied by Nuclear Maginetic
    Resonance,” <i>Journal de Physique II</i>, vol. 7, no. 3, pp. 421–432, 1997, doi:
    <a href="https://doi.org/10.1051/jp2:1997135">10.1051/jp2:1997135</a>.'
  mla: Müller, Stefan, et al. “Solid-Like Director Reorientation in Sheared Hexagonal
    Lyotropic Liquid Crystals as Studied by Nuclear Maginetic Resonance.” <i>Journal
    de Physique II</i>, vol. 7, no. 3, EDP Sciences, 1997, pp. 421–32, doi:<a href="https://doi.org/10.1051/jp2:1997135">10.1051/jp2:1997135</a>.
  short: S. Müller, P. Fischer, C. Schmidt, Journal de Physique II 7 (1997) 421–432.
date_created: 2023-01-06T13:20:59Z
date_updated: 2023-01-07T11:10:22Z
department:
- _id: '2'
- _id: '315'
doi: 10.1051/jp2:1997135
extern: '1'
intvolume: '         7'
issue: '3'
keyword:
- Physics and Astronomy (miscellaneous)
- General Engineering
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 421-432
publication: Journal de Physique II
publication_identifier:
  issn:
  - 1155-4312
  - 1286-4870
publication_status: published
publisher: EDP Sciences
quality_controlled: '1'
status: public
title: Solid-Like Director Reorientation in Sheared Hexagonal Lyotropic Liquid Crystals
  as Studied by Nuclear Maginetic Resonance
type: journal_article
user_id: '466'
volume: 7
year: '1997'
...
---
_id: '40074'
author:
- first_name: V. K.
  full_name: Dolganov, V. K.
  last_name: Dolganov
- first_name: O. R.
  full_name: Lourie, O. R.
  last_name: Lourie
- first_name: G.
  full_name: Heppke, G.
  last_name: Heppke
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
citation:
  ama: Dolganov VK, Lourie OR, Heppke G, Kitzerow H-S. Anomalies of the temperature
    dependence of electrostriction in blue phases. <i>Journal de Physique II</i>.
    1993;3(7):1087-1096. doi:<a href="https://doi.org/10.1051/jp2:1993185">10.1051/jp2:1993185</a>
  apa: Dolganov, V. K., Lourie, O. R., Heppke, G., &#38; Kitzerow, H.-S. (1993). Anomalies
    of the temperature dependence of electrostriction in blue phases. <i>Journal de
    Physique II</i>, <i>3</i>(7), 1087–1096. <a href="https://doi.org/10.1051/jp2:1993185">https://doi.org/10.1051/jp2:1993185</a>
  bibtex: '@article{Dolganov_Lourie_Heppke_Kitzerow_1993, title={Anomalies of the
    temperature dependence of electrostriction in blue phases}, volume={3}, DOI={<a
    href="https://doi.org/10.1051/jp2:1993185">10.1051/jp2:1993185</a>}, number={7},
    journal={Journal de Physique II}, publisher={EDP Sciences}, author={Dolganov,
    V. K. and Lourie, O. R. and Heppke, G. and Kitzerow, Heinz-Siegfried}, year={1993},
    pages={1087–1096} }'
  chicago: 'Dolganov, V. K., O. R. Lourie, G. Heppke, and Heinz-Siegfried Kitzerow.
    “Anomalies of the Temperature Dependence of Electrostriction in Blue Phases.”
    <i>Journal de Physique II</i> 3, no. 7 (1993): 1087–96. <a href="https://doi.org/10.1051/jp2:1993185">https://doi.org/10.1051/jp2:1993185</a>.'
  ieee: 'V. K. Dolganov, O. R. Lourie, G. Heppke, and H.-S. Kitzerow, “Anomalies of
    the temperature dependence of electrostriction in blue phases,” <i>Journal de
    Physique II</i>, vol. 3, no. 7, pp. 1087–1096, 1993, doi: <a href="https://doi.org/10.1051/jp2:1993185">10.1051/jp2:1993185</a>.'
  mla: Dolganov, V. K., et al. “Anomalies of the Temperature Dependence of Electrostriction
    in Blue Phases.” <i>Journal de Physique II</i>, vol. 3, no. 7, EDP Sciences, 1993,
    pp. 1087–96, doi:<a href="https://doi.org/10.1051/jp2:1993185">10.1051/jp2:1993185</a>.
  short: V.K. Dolganov, O.R. Lourie, G. Heppke, H.-S. Kitzerow, Journal de Physique
    II 3 (1993) 1087–1096.
date_created: 2023-01-25T15:53:47Z
date_updated: 2023-01-25T16:03:07Z
department:
- _id: '313'
doi: 10.1051/jp2:1993185
extern: '1'
intvolume: '         3'
issue: '7'
keyword:
- Physics and Astronomy (miscellaneous)
- General Engineering
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 1087-1096
publication: Journal de Physique II
publication_identifier:
  issn:
  - 1155-4312
  - 1286-4870
publication_status: published
publisher: EDP Sciences
status: public
title: Anomalies of the temperature dependence of electrostriction in blue phases
type: journal_article
user_id: '254'
volume: 3
year: '1993'
...
---
_id: '40071'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
- first_name: P. P.
  full_name: Crooker, P. P.
  last_name: Crooker
citation:
  ama: Kitzerow H-S, Crooker PP. UV-cured cholesteric polymer-dispersed liquid crystal
    display. <i>Journal de Physique II</i>. 1993;3(5):719-726. doi:<a href="https://doi.org/10.1051/jp2:1993162">10.1051/jp2:1993162</a>
  apa: Kitzerow, H.-S., &#38; Crooker, P. P. (1993). UV-cured cholesteric polymer-dispersed
    liquid crystal display. <i>Journal de Physique II</i>, <i>3</i>(5), 719–726. <a
    href="https://doi.org/10.1051/jp2:1993162">https://doi.org/10.1051/jp2:1993162</a>
  bibtex: '@article{Kitzerow_Crooker_1993, title={UV-cured cholesteric polymer-dispersed
    liquid crystal display}, volume={3}, DOI={<a href="https://doi.org/10.1051/jp2:1993162">10.1051/jp2:1993162</a>},
    number={5}, journal={Journal de Physique II}, publisher={EDP Sciences}, author={Kitzerow,
    Heinz-Siegfried and Crooker, P. P.}, year={1993}, pages={719–726} }'
  chicago: 'Kitzerow, Heinz-Siegfried, and P. P. Crooker. “UV-Cured Cholesteric Polymer-Dispersed
    Liquid Crystal Display.” <i>Journal de Physique II</i> 3, no. 5 (1993): 719–26.
    <a href="https://doi.org/10.1051/jp2:1993162">https://doi.org/10.1051/jp2:1993162</a>.'
  ieee: 'H.-S. Kitzerow and P. P. Crooker, “UV-cured cholesteric polymer-dispersed
    liquid crystal display,” <i>Journal de Physique II</i>, vol. 3, no. 5, pp. 719–726,
    1993, doi: <a href="https://doi.org/10.1051/jp2:1993162">10.1051/jp2:1993162</a>.'
  mla: Kitzerow, Heinz-Siegfried, and P. P. Crooker. “UV-Cured Cholesteric Polymer-Dispersed
    Liquid Crystal Display.” <i>Journal de Physique II</i>, vol. 3, no. 5, EDP Sciences,
    1993, pp. 719–26, doi:<a href="https://doi.org/10.1051/jp2:1993162">10.1051/jp2:1993162</a>.
  short: H.-S. Kitzerow, P.P. Crooker, Journal de Physique II 3 (1993) 719–726.
date_created: 2023-01-25T15:50:06Z
date_updated: 2023-01-25T16:03:16Z
department:
- _id: '313'
doi: 10.1051/jp2:1993162
extern: '1'
intvolume: '         3'
issue: '5'
keyword:
- Physics and Astronomy (miscellaneous)
- General Engineering
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 719-726
publication: Journal de Physique II
publication_identifier:
  issn:
  - 1155-4312
  - 1286-4870
publication_status: published
publisher: EDP Sciences
status: public
title: UV-cured cholesteric polymer-dispersed liquid crystal display
type: journal_article
user_id: '254'
volume: 3
year: '1993'
...
---
_id: '40075'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
- first_name: P. P.
  full_name: Crooker, P. P.
  last_name: Crooker
- first_name: J.
  full_name: Rand, J.
  last_name: Rand
- first_name: J.
  full_name: Xu, J.
  last_name: Xu
- first_name: G.
  full_name: Heppke, G.
  last_name: Heppke
citation:
  ama: Kitzerow H-S, Crooker PP, Rand J, Xu J, Heppke G. Electrostriction dynamics
    of blue phase II crystallites. <i>Journal de Physique II</i>. 1992;2(3):279-284.
    doi:<a href="https://doi.org/10.1051/jp2:1992132">10.1051/jp2:1992132</a>
  apa: Kitzerow, H.-S., Crooker, P. P., Rand, J., Xu, J., &#38; Heppke, G. (1992).
    Electrostriction dynamics of blue phase II crystallites. <i>Journal de Physique
    II</i>, <i>2</i>(3), 279–284. <a href="https://doi.org/10.1051/jp2:1992132">https://doi.org/10.1051/jp2:1992132</a>
  bibtex: '@article{Kitzerow_Crooker_Rand_Xu_Heppke_1992, title={Electrostriction
    dynamics of blue phase II crystallites}, volume={2}, DOI={<a href="https://doi.org/10.1051/jp2:1992132">10.1051/jp2:1992132</a>},
    number={3}, journal={Journal de Physique II}, publisher={EDP Sciences}, author={Kitzerow,
    Heinz-Siegfried and Crooker, P. P. and Rand, J. and Xu, J. and Heppke, G.}, year={1992},
    pages={279–284} }'
  chicago: 'Kitzerow, Heinz-Siegfried, P. P. Crooker, J. Rand, J. Xu, and G. Heppke.
    “Electrostriction Dynamics of Blue Phase II Crystallites.” <i>Journal de Physique
    II</i> 2, no. 3 (1992): 279–84. <a href="https://doi.org/10.1051/jp2:1992132">https://doi.org/10.1051/jp2:1992132</a>.'
  ieee: 'H.-S. Kitzerow, P. P. Crooker, J. Rand, J. Xu, and G. Heppke, “Electrostriction
    dynamics of blue phase II crystallites,” <i>Journal de Physique II</i>, vol. 2,
    no. 3, pp. 279–284, 1992, doi: <a href="https://doi.org/10.1051/jp2:1992132">10.1051/jp2:1992132</a>.'
  mla: Kitzerow, Heinz-Siegfried, et al. “Electrostriction Dynamics of Blue Phase
    II Crystallites.” <i>Journal de Physique II</i>, vol. 2, no. 3, EDP Sciences,
    1992, pp. 279–84, doi:<a href="https://doi.org/10.1051/jp2:1992132">10.1051/jp2:1992132</a>.
  short: H.-S. Kitzerow, P.P. Crooker, J. Rand, J. Xu, G. Heppke, Journal de Physique
    II 2 (1992) 279–284.
date_created: 2023-01-25T15:56:14Z
date_updated: 2023-01-25T16:03:00Z
department:
- _id: '313'
doi: 10.1051/jp2:1992132
extern: '1'
intvolume: '         2'
issue: '3'
keyword:
- Physics and Astronomy (miscellaneous)
- General Engineering
- Atomic and Molecular Physics
- and Optics
language:
- iso: eng
page: 279-284
publication: Journal de Physique II
publication_identifier:
  issn:
  - 1155-4312
  - 1286-4870
publication_status: published
publisher: EDP Sciences
status: public
title: Electrostriction dynamics of blue phase II crystallites
type: journal_article
user_id: '254'
volume: 2
year: '1992'
...