[{"author":[{"full_name":"Schwabe, Tobias","last_name":"Schwabe","first_name":"Tobias","id":"39217"},{"last_name":"Kress","first_name":"Christian","orcid":"0000-0002-4403-2237","full_name":"Kress, Christian","id":"13256"},{"full_name":"Kruse, Stephan","first_name":"Stephan","last_name":"Kruse","id":"38254"},{"full_name":"Weizel, Maxim","first_name":"Maxim","orcid":"0000-0003-2699-9839","last_name":"Weizel","id":"44271"},{"full_name":"Rhee, Hanjo","first_name":"Hanjo","last_name":"Rhee"},{"id":"37144","orcid":"0000-0002-5950-6618 ","last_name":"Scheytt","first_name":"J. Christoph","full_name":"Scheytt, J. Christoph"}],"title":"Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology","status":"public","year":"2025","intvolume":"        43","date_updated":"2025-11-27T07:16:01Z","language":[{"iso":"eng"}],"_id":"62643","page":"255-270","volume":43,"user_id":"38254","doi":"10.1109/JLT.2024.3450949","citation":{"bibtex":"@article{Schwabe_Kress_Kruse_Weizel_Rhee_Scheytt_2025, title={Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology}, volume={43}, DOI={<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>}, number={1}, journal={Journal of Lightwave Technology}, author={Schwabe, Tobias and Kress, Christian and Kruse, Stephan and Weizel, Maxim and Rhee, Hanjo and Scheytt, J. Christoph}, year={2025}, pages={255–270} }","ama":"Schwabe T, Kress C, Kruse S, Weizel M, Rhee H, Scheytt JC. Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology. <i>Journal of Lightwave Technology</i>. 2025;43(1):255-270. doi:<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>","short":"T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, J.C. Scheytt, Journal of Lightwave Technology 43 (2025) 255–270.","chicago":"Schwabe, Tobias, Christian Kress, Stephan Kruse, Maxim Weizel, Hanjo Rhee, and J. Christoph Scheytt. “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.” <i>Journal of Lightwave Technology</i> 43, no. 1 (2025): 255–70. <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">https://doi.org/10.1109/JLT.2024.3450949</a>.","ieee":"T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, and J. C. Scheytt, “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology,” <i>Journal of Lightwave Technology</i>, vol. 43, no. 1, pp. 255–270, 2025, doi: <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>.","apa":"Schwabe, T., Kress, C., Kruse, S., Weizel, M., Rhee, H., &#38; Scheytt, J. C. (2025). Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology. <i>Journal of Lightwave Technology</i>, <i>43</i>(1), 255–270. <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">https://doi.org/10.1109/JLT.2024.3450949</a>","mla":"Schwabe, Tobias, et al. “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.” <i>Journal of Lightwave Technology</i>, vol. 43, no. 1, 2025, pp. 255–70, doi:<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>."},"issue":"1","publication":"Journal of Lightwave Technology","date_created":"2025-11-27T07:14:34Z","department":[{"_id":"58"}],"keyword":["Integrated circuit modeling","Capacitance","Silicon","Modulation","Adaptation models","Semiconductor device modeling","Bandwidth","Data communication","electrooptical transmitter","equalization","free-carrier-plasma dispersion effect","modelling","optical modulator","phase shifter","silicon photonics"],"type":"journal_article"},{"author":[{"full_name":"Förster, Nikolas","first_name":"Nikolas","last_name":"Förster"},{"first_name":"Oliver","last_name":"Wallscheid","full_name":"Wallscheid, Oliver"},{"full_name":"Schafmeister, Frank","first_name":"Frank","last_name":"Schafmeister"}],"status":"public","year":"2024","title":"Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection","date_updated":"2026-01-06T08:07:50Z","_id":"63497","language":[{"iso":"eng"}],"page":"1-8","doi":"10.1109/DMC62632.2024.10812131","user_id":"83383","citation":{"mla":"Förster, Nikolas, et al. “Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection.” <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 2024, pp. 1–8, doi:<a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">10.1109/DMC62632.2024.10812131</a>.","ama":"Förster N, Wallscheid O, Schafmeister F. Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection. In: <i>2024 IEEE Design Methodologies Conference (DMC)</i>. ; 2024:1-8. doi:<a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">10.1109/DMC62632.2024.10812131</a>","bibtex":"@inproceedings{Förster_Wallscheid_Schafmeister_2024, title={Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection}, DOI={<a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">10.1109/DMC62632.2024.10812131</a>}, booktitle={2024 IEEE Design Methodologies Conference (DMC)}, author={Förster, Nikolas and Wallscheid, Oliver and Schafmeister, Frank}, year={2024}, pages={1–8} }","apa":"Förster, N., Wallscheid, O., &#38; Schafmeister, F. (2024). Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection. <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 1–8. <a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">https://doi.org/10.1109/DMC62632.2024.10812131</a>","ieee":"N. Förster, O. Wallscheid, and F. Schafmeister, “Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection,” in <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 2024, pp. 1–8, doi: <a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">10.1109/DMC62632.2024.10812131</a>.","short":"N. Förster, O. Wallscheid, F. Schafmeister, in: 2024 IEEE Design Methodologies Conference (DMC), 2024, pp. 1–8.","chicago":"Förster, Nikolas, Oliver Wallscheid, and Frank Schafmeister. “Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection.” In <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 1–8, 2024. <a href=\"https://doi.org/10.1109/DMC62632.2024.10812131\">https://doi.org/10.1109/DMC62632.2024.10812131</a>."},"publication":"2024 IEEE Design Methodologies Conference (DMC)","date_created":"2026-01-06T08:06:24Z","department":[{"_id":"52"}],"keyword":["MOSFET","Thermal resistance","Surface resistance","Bridge circuits","Zero voltage switching","Pareto optimization","Capacitance","Numerical simulation","Optimization","Resistance heating","Pareto Optimization","Dual-Active Bridge","ZVS","Inductor Optimization","Transformer Optimization","Heat Sink Optimization"],"type":"conference"}]