---
_id: '62643'
author:
- first_name: Tobias
  full_name: Schwabe, Tobias
  id: '39217'
  last_name: Schwabe
- first_name: Christian
  full_name: Kress, Christian
  id: '13256'
  last_name: Kress
  orcid: 0000-0002-4403-2237
- first_name: Stephan
  full_name: Kruse, Stephan
  id: '38254'
  last_name: Kruse
- first_name: Maxim
  full_name: Weizel, Maxim
  id: '44271'
  last_name: Weizel
  orcid: 0000-0003-2699-9839
- first_name: Hanjo
  full_name: Rhee, Hanjo
  last_name: Rhee
- first_name: J. Christoph
  full_name: Scheytt, J. Christoph
  id: '37144'
  last_name: Scheytt
  orcid: '0000-0002-5950-6618 '
citation:
  ama: Schwabe T, Kress C, Kruse S, Weizel M, Rhee H, Scheytt JC. Forward-Biased Silicon
    Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in
    a 250 nm EPIC BiCMOS Technology. <i>Journal of Lightwave Technology</i>. 2025;43(1):255-270.
    doi:<a href="https://doi.org/10.1109/JLT.2024.3450949">10.1109/JLT.2024.3450949</a>
  apa: Schwabe, T., Kress, C., Kruse, S., Weizel, M., Rhee, H., &#38; Scheytt, J.
    C. (2025). Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic
    Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology. <i>Journal of
    Lightwave Technology</i>, <i>43</i>(1), 255–270. <a href="https://doi.org/10.1109/JLT.2024.3450949">https://doi.org/10.1109/JLT.2024.3450949</a>
  bibtex: '@article{Schwabe_Kress_Kruse_Weizel_Rhee_Scheytt_2025, title={Forward-Biased
    Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation
    in a 250 nm EPIC BiCMOS Technology}, volume={43}, DOI={<a href="https://doi.org/10.1109/JLT.2024.3450949">10.1109/JLT.2024.3450949</a>},
    number={1}, journal={Journal of Lightwave Technology}, author={Schwabe, Tobias
    and Kress, Christian and Kruse, Stephan and Weizel, Maxim and Rhee, Hanjo and
    Scheytt, J. Christoph}, year={2025}, pages={255–270} }'
  chicago: 'Schwabe, Tobias, Christian Kress, Stephan Kruse, Maxim Weizel, Hanjo Rhee,
    and J. Christoph Scheytt. “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic
    Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.” <i>Journal of
    Lightwave Technology</i> 43, no. 1 (2025): 255–70. <a href="https://doi.org/10.1109/JLT.2024.3450949">https://doi.org/10.1109/JLT.2024.3450949</a>.'
  ieee: 'T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, and J. C. Scheytt, “Forward-Biased
    Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation
    in a 250 nm EPIC BiCMOS Technology,” <i>Journal of Lightwave Technology</i>, vol.
    43, no. 1, pp. 255–270, 2025, doi: <a href="https://doi.org/10.1109/JLT.2024.3450949">10.1109/JLT.2024.3450949</a>.'
  mla: Schwabe, Tobias, et al. “Forward-Biased Silicon Phase Shifter Modeling for
    Electronic-Photonic Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.”
    <i>Journal of Lightwave Technology</i>, vol. 43, no. 1, 2025, pp. 255–70, doi:<a
    href="https://doi.org/10.1109/JLT.2024.3450949">10.1109/JLT.2024.3450949</a>.
  short: T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, J.C. Scheytt, Journal
    of Lightwave Technology 43 (2025) 255–270.
date_created: 2025-11-27T07:14:34Z
date_updated: 2025-11-27T07:16:01Z
department:
- _id: '58'
doi: 10.1109/JLT.2024.3450949
intvolume: '        43'
issue: '1'
keyword:
- Integrated circuit modeling
- Capacitance
- Silicon
- Modulation
- Adaptation models
- Semiconductor device modeling
- Bandwidth
- Data communication
- electrooptical transmitter
- equalization
- free-carrier-plasma dispersion effect
- modelling
- optical modulator
- phase shifter
- silicon photonics
language:
- iso: eng
page: 255-270
publication: Journal of Lightwave Technology
status: public
title: Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation
  and Validation in a 250 nm EPIC BiCMOS Technology
type: journal_article
user_id: '38254'
volume: 43
year: '2025'
...
---
_id: '63497'
author:
- first_name: Nikolas
  full_name: Förster, Nikolas
  last_name: Förster
- first_name: Oliver
  full_name: Wallscheid, Oliver
  last_name: Wallscheid
- first_name: Frank
  full_name: Schafmeister, Frank
  last_name: Schafmeister
citation:
  ama: 'Förster N, Wallscheid O, Schafmeister F. Dual-Active Bridge Sequential Pareto
    Optimization for Fast Pre-Design and Final Component Selection. In: <i>2024 IEEE
    Design Methodologies Conference (DMC)</i>. ; 2024:1-8. doi:<a href="https://doi.org/10.1109/DMC62632.2024.10812131">10.1109/DMC62632.2024.10812131</a>'
  apa: Förster, N., Wallscheid, O., &#38; Schafmeister, F. (2024). Dual-Active Bridge
    Sequential Pareto Optimization for Fast Pre-Design and Final Component Selection.
    <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 1–8. <a href="https://doi.org/10.1109/DMC62632.2024.10812131">https://doi.org/10.1109/DMC62632.2024.10812131</a>
  bibtex: '@inproceedings{Förster_Wallscheid_Schafmeister_2024, title={Dual-Active
    Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component
    Selection}, DOI={<a href="https://doi.org/10.1109/DMC62632.2024.10812131">10.1109/DMC62632.2024.10812131</a>},
    booktitle={2024 IEEE Design Methodologies Conference (DMC)}, author={Förster,
    Nikolas and Wallscheid, Oliver and Schafmeister, Frank}, year={2024}, pages={1–8}
    }'
  chicago: Förster, Nikolas, Oliver Wallscheid, and Frank Schafmeister. “Dual-Active
    Bridge Sequential Pareto Optimization for Fast Pre-Design and Final Component
    Selection.” In <i>2024 IEEE Design Methodologies Conference (DMC)</i>, 1–8, 2024.
    <a href="https://doi.org/10.1109/DMC62632.2024.10812131">https://doi.org/10.1109/DMC62632.2024.10812131</a>.
  ieee: 'N. Förster, O. Wallscheid, and F. Schafmeister, “Dual-Active Bridge Sequential
    Pareto Optimization for Fast Pre-Design and Final Component Selection,” in <i>2024
    IEEE Design Methodologies Conference (DMC)</i>, 2024, pp. 1–8, doi: <a href="https://doi.org/10.1109/DMC62632.2024.10812131">10.1109/DMC62632.2024.10812131</a>.'
  mla: Förster, Nikolas, et al. “Dual-Active Bridge Sequential Pareto Optimization
    for Fast Pre-Design and Final Component Selection.” <i>2024 IEEE Design Methodologies
    Conference (DMC)</i>, 2024, pp. 1–8, doi:<a href="https://doi.org/10.1109/DMC62632.2024.10812131">10.1109/DMC62632.2024.10812131</a>.
  short: 'N. Förster, O. Wallscheid, F. Schafmeister, in: 2024 IEEE Design Methodologies
    Conference (DMC), 2024, pp. 1–8.'
date_created: 2026-01-06T08:06:24Z
date_updated: 2026-01-06T08:07:50Z
department:
- _id: '52'
doi: 10.1109/DMC62632.2024.10812131
keyword:
- MOSFET
- Thermal resistance
- Surface resistance
- Bridge circuits
- Zero voltage switching
- Pareto optimization
- Capacitance
- Numerical simulation
- Optimization
- Resistance heating
- Pareto Optimization
- Dual-Active Bridge
- ZVS
- Inductor Optimization
- Transformer Optimization
- Heat Sink Optimization
language:
- iso: eng
page: 1-8
publication: 2024 IEEE Design Methodologies Conference (DMC)
status: public
title: Dual-Active Bridge Sequential Pareto Optimization for Fast Pre-Design and Final
  Component Selection
type: conference
user_id: '83383'
year: '2024'
...