---
_id: '41998'
article_number: '1031'
author:
- first_name: Denise
  full_name: Zacher, Denise
  last_name: Zacher
- first_name: Jianing
  full_name: Liu, Jianing
  last_name: Liu
- first_name: Klaus
  full_name: Huber, Klaus
  id: '237'
  last_name: Huber
- first_name: Roland A.
  full_name: Fischer, Roland A.
  last_name: Fischer
citation:
  ama: 'Zacher D, Liu J, Huber K, Fischer RA. Nanocrystals of [Cu3(btc)2] (HKUST-1):
    a combined time-resolved light scattering and scanning electron microscopy study.
    <i>Chemical Communications</i>. 2009;(9). doi:<a href="https://doi.org/10.1039/b819580c">10.1039/b819580c</a>'
  apa: 'Zacher, D., Liu, J., Huber, K., &#38; Fischer, R. A. (2009). Nanocrystals
    of [Cu3(btc)2] (HKUST-1): a combined time-resolved light scattering and scanning
    electron microscopy study. <i>Chemical Communications</i>, <i>9</i>, Article 1031.
    <a href="https://doi.org/10.1039/b819580c">https://doi.org/10.1039/b819580c</a>'
  bibtex: '@article{Zacher_Liu_Huber_Fischer_2009, title={Nanocrystals of [Cu3(btc)2]
    (HKUST-1): a combined time-resolved light scattering and scanning electron microscopy
    study}, DOI={<a href="https://doi.org/10.1039/b819580c">10.1039/b819580c</a>},
    number={91031}, journal={Chemical Communications}, publisher={Royal Society of
    Chemistry (RSC)}, author={Zacher, Denise and Liu, Jianing and Huber, Klaus and
    Fischer, Roland A.}, year={2009} }'
  chicago: 'Zacher, Denise, Jianing Liu, Klaus Huber, and Roland A. Fischer. “Nanocrystals
    of [Cu3(Btc)2] (HKUST-1): A Combined Time-Resolved Light Scattering and Scanning
    Electron Microscopy Study.” <i>Chemical Communications</i>, no. 9 (2009). <a href="https://doi.org/10.1039/b819580c">https://doi.org/10.1039/b819580c</a>.'
  ieee: 'D. Zacher, J. Liu, K. Huber, and R. A. Fischer, “Nanocrystals of [Cu3(btc)2]
    (HKUST-1): a combined time-resolved light scattering and scanning electron microscopy
    study,” <i>Chemical Communications</i>, no. 9, Art. no. 1031, 2009, doi: <a href="https://doi.org/10.1039/b819580c">10.1039/b819580c</a>.'
  mla: 'Zacher, Denise, et al. “Nanocrystals of [Cu3(Btc)2] (HKUST-1): A Combined
    Time-Resolved Light Scattering and Scanning Electron Microscopy Study.” <i>Chemical
    Communications</i>, no. 9, 1031, Royal Society of Chemistry (RSC), 2009, doi:<a
    href="https://doi.org/10.1039/b819580c">10.1039/b819580c</a>.'
  short: D. Zacher, J. Liu, K. Huber, R.A. Fischer, Chemical Communications (2009).
date_created: 2023-02-10T14:42:50Z
date_updated: 2023-02-10T14:43:11Z
department:
- _id: '314'
doi: 10.1039/b819580c
issue: '9'
keyword:
- Materials Chemistry
- Metals and Alloys
- Surfaces
- Coatings and Films
- General Chemistry
- Ceramics and Composites
- Electronic
- Optical and Magnetic Materials
- Catalysis
language:
- iso: eng
publication: Chemical Communications
publication_identifier:
  issn:
  - 1359-7345
  - 1364-548X
publication_status: published
publisher: Royal Society of Chemistry (RSC)
status: public
title: 'Nanocrystals of [Cu3(btc)2] (HKUST-1): a combined time-resolved light scattering
  and scanning electron microscopy study'
type: journal_article
user_id: '237'
year: '2009'
...
---
_id: '41277'
author:
- first_name: Christoph
  full_name: Rill, Christoph
  last_name: Rill
- first_name: Matthias
  full_name: Bauer, Matthias
  id: '47241'
  last_name: Bauer
  orcid: 0000-0002-9294-6076
- first_name: Helmut
  full_name: Bertagnolli, Helmut
  last_name: Bertagnolli
- first_name: Guido
  full_name: Kickelbick, Guido
  last_name: Kickelbick
citation:
  ama: Rill C, Bauer M, Bertagnolli H, Kickelbick G. Microemulsion approach to neodymium,
    europium, and ytterbium oxide/hydroxide colloids—Effects of precursors and preparation
    parameters on particle size and crystallinity. <i>Journal of Colloid and Interface
    Science</i>. 2008;325(1):179-186. doi:<a href="https://doi.org/10.1016/j.jcis.2008.05.008">10.1016/j.jcis.2008.05.008</a>
  apa: Rill, C., Bauer, M., Bertagnolli, H., &#38; Kickelbick, G. (2008). Microemulsion
    approach to neodymium, europium, and ytterbium oxide/hydroxide colloids—Effects
    of precursors and preparation parameters on particle size and crystallinity. <i>Journal
    of Colloid and Interface Science</i>, <i>325</i>(1), 179–186. <a href="https://doi.org/10.1016/j.jcis.2008.05.008">https://doi.org/10.1016/j.jcis.2008.05.008</a>
  bibtex: '@article{Rill_Bauer_Bertagnolli_Kickelbick_2008, title={Microemulsion approach
    to neodymium, europium, and ytterbium oxide/hydroxide colloids—Effects of precursors
    and preparation parameters on particle size and crystallinity}, volume={325},
    DOI={<a href="https://doi.org/10.1016/j.jcis.2008.05.008">10.1016/j.jcis.2008.05.008</a>},
    number={1}, journal={Journal of Colloid and Interface Science}, publisher={Elsevier
    BV}, author={Rill, Christoph and Bauer, Matthias and Bertagnolli, Helmut and Kickelbick,
    Guido}, year={2008}, pages={179–186} }'
  chicago: 'Rill, Christoph, Matthias Bauer, Helmut Bertagnolli, and Guido Kickelbick.
    “Microemulsion Approach to Neodymium, Europium, and Ytterbium Oxide/Hydroxide
    Colloids—Effects of Precursors and Preparation Parameters on Particle Size and
    Crystallinity.” <i>Journal of Colloid and Interface Science</i> 325, no. 1 (2008):
    179–86. <a href="https://doi.org/10.1016/j.jcis.2008.05.008">https://doi.org/10.1016/j.jcis.2008.05.008</a>.'
  ieee: 'C. Rill, M. Bauer, H. Bertagnolli, and G. Kickelbick, “Microemulsion approach
    to neodymium, europium, and ytterbium oxide/hydroxide colloids—Effects of precursors
    and preparation parameters on particle size and crystallinity,” <i>Journal of
    Colloid and Interface Science</i>, vol. 325, no. 1, pp. 179–186, 2008, doi: <a
    href="https://doi.org/10.1016/j.jcis.2008.05.008">10.1016/j.jcis.2008.05.008</a>.'
  mla: Rill, Christoph, et al. “Microemulsion Approach to Neodymium, Europium, and
    Ytterbium Oxide/Hydroxide Colloids—Effects of Precursors and Preparation Parameters
    on Particle Size and Crystallinity.” <i>Journal of Colloid and Interface Science</i>,
    vol. 325, no. 1, Elsevier BV, 2008, pp. 179–86, doi:<a href="https://doi.org/10.1016/j.jcis.2008.05.008">10.1016/j.jcis.2008.05.008</a>.
  short: C. Rill, M. Bauer, H. Bertagnolli, G. Kickelbick, Journal of Colloid and
    Interface Science 325 (2008) 179–186.
date_created: 2023-01-31T15:08:01Z
date_updated: 2023-01-31T15:08:08Z
department:
- _id: '306'
doi: 10.1016/j.jcis.2008.05.008
intvolume: '       325'
issue: '1'
keyword:
- Colloid and Surface Chemistry
- Surfaces
- Coatings and Films
- Biomaterials
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 179-186
publication: Journal of Colloid and Interface Science
publication_identifier:
  issn:
  - 0021-9797
publication_status: published
publisher: Elsevier BV
status: public
title: Microemulsion approach to neodymium, europium, and ytterbium oxide/hydroxide
  colloids—Effects of precursors and preparation parameters on particle size and crystallinity
type: journal_article
user_id: '48467'
volume: 325
year: '2008'
...
---
_id: '39556'
author:
- first_name: T.
  full_name: Diekmann, T.
  last_name: Diekmann
- first_name: C.
  full_name: Pannemann, C.
  last_name: Pannemann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
citation:
  ama: Diekmann T, Pannemann C, Hilleringmann U. Dielectric layers for organic field
    effect transistors as gate dielectric and surface passivation. <i>physica status
    solidi (a)</i>. 2008;205(3):564-577. doi:<a href="https://doi.org/10.1002/pssa.200723406">10.1002/pssa.200723406</a>
  apa: Diekmann, T., Pannemann, C., &#38; Hilleringmann, U. (2008). Dielectric layers
    for organic field effect transistors as gate dielectric and surface passivation.
    <i>Physica Status Solidi (a)</i>, <i>205</i>(3), 564–577. <a href="https://doi.org/10.1002/pssa.200723406">https://doi.org/10.1002/pssa.200723406</a>
  bibtex: '@article{Diekmann_Pannemann_Hilleringmann_2008, title={Dielectric layers
    for organic field effect transistors as gate dielectric and surface passivation},
    volume={205}, DOI={<a href="https://doi.org/10.1002/pssa.200723406">10.1002/pssa.200723406</a>},
    number={3}, journal={physica status solidi (a)}, publisher={Wiley}, author={Diekmann,
    T. and Pannemann, C. and Hilleringmann, Ulrich}, year={2008}, pages={564–577}
    }'
  chicago: 'Diekmann, T., C. Pannemann, and Ulrich Hilleringmann. “Dielectric Layers
    for Organic Field Effect Transistors as Gate Dielectric and Surface Passivation.”
    <i>Physica Status Solidi (a)</i> 205, no. 3 (2008): 564–77. <a href="https://doi.org/10.1002/pssa.200723406">https://doi.org/10.1002/pssa.200723406</a>.'
  ieee: 'T. Diekmann, C. Pannemann, and U. Hilleringmann, “Dielectric layers for organic
    field effect transistors as gate dielectric and surface passivation,” <i>physica
    status solidi (a)</i>, vol. 205, no. 3, pp. 564–577, 2008, doi: <a href="https://doi.org/10.1002/pssa.200723406">10.1002/pssa.200723406</a>.'
  mla: Diekmann, T., et al. “Dielectric Layers for Organic Field Effect Transistors
    as Gate Dielectric and Surface Passivation.” <i>Physica Status Solidi (a)</i>,
    vol. 205, no. 3, Wiley, 2008, pp. 564–77, doi:<a href="https://doi.org/10.1002/pssa.200723406">10.1002/pssa.200723406</a>.
  short: T. Diekmann, C. Pannemann, U. Hilleringmann, Physica Status Solidi (a) 205
    (2008) 564–577.
date_created: 2023-01-24T12:13:48Z
date_updated: 2023-03-21T09:38:46Z
department:
- _id: '59'
doi: 10.1002/pssa.200723406
intvolume: '       205'
issue: '3'
keyword:
- Materials Chemistry
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 564-577
publication: physica status solidi (a)
publication_identifier:
  issn:
  - 1862-6300
  - 1862-6319
publication_status: published
publisher: Wiley
status: public
title: Dielectric layers for organic field effect transistors as gate dielectric and
  surface passivation
type: journal_article
user_id: '20179'
volume: 205
year: '2008'
...
---
_id: '39969'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
- first_name: A.
  full_name: Lorenz, A.
  last_name: Lorenz
- first_name: H.
  full_name: Matthias, H.
  last_name: Matthias
citation:
  ama: Kitzerow H-S, Lorenz A, Matthias H. Tuneable photonic crystals obtained by
    liquid crystal infiltration. <i>physica status solidi (a)</i>. 2007;204(11):3754-3767.
    doi:<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>
  apa: Kitzerow, H.-S., Lorenz, A., &#38; Matthias, H. (2007). Tuneable photonic crystals
    obtained by liquid crystal infiltration. <i>Physica Status Solidi (a)</i>, <i>204</i>(11),
    3754–3767. <a href="https://doi.org/10.1002/pssa.200776404">https://doi.org/10.1002/pssa.200776404</a>
  bibtex: '@article{Kitzerow_Lorenz_Matthias_2007, title={Tuneable photonic crystals
    obtained by liquid crystal infiltration}, volume={204}, DOI={<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>},
    number={11}, journal={physica status solidi (a)}, publisher={Wiley}, author={Kitzerow,
    Heinz-Siegfried and Lorenz, A. and Matthias, H.}, year={2007}, pages={3754–3767}
    }'
  chicago: 'Kitzerow, Heinz-Siegfried, A. Lorenz, and H. Matthias. “Tuneable Photonic
    Crystals Obtained by Liquid Crystal Infiltration.” <i>Physica Status Solidi (a)</i>
    204, no. 11 (2007): 3754–67. <a href="https://doi.org/10.1002/pssa.200776404">https://doi.org/10.1002/pssa.200776404</a>.'
  ieee: 'H.-S. Kitzerow, A. Lorenz, and H. Matthias, “Tuneable photonic crystals obtained
    by liquid crystal infiltration,” <i>physica status solidi (a)</i>, vol. 204, no.
    11, pp. 3754–3767, 2007, doi: <a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>.'
  mla: Kitzerow, Heinz-Siegfried, et al. “Tuneable Photonic Crystals Obtained by Liquid
    Crystal Infiltration.” <i>Physica Status Solidi (a)</i>, vol. 204, no. 11, Wiley,
    2007, pp. 3754–67, doi:<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>.
  short: H.-S. Kitzerow, A. Lorenz, H. Matthias, Physica Status Solidi (a) 204 (2007)
    3754–3767.
date_created: 2023-01-25T11:24:41Z
date_updated: 2023-01-25T11:25:26Z
department:
- _id: '313'
- _id: '230'
- _id: '638'
doi: 10.1002/pssa.200776404
intvolume: '       204'
issue: '11'
keyword:
- Materials Chemistry
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 3754-3767
publication: physica status solidi (a)
publication_identifier:
  issn:
  - 1862-6300
  - 1862-6319
publication_status: published
publisher: Wiley
status: public
title: Tuneable photonic crystals obtained by liquid crystal infiltration
type: journal_article
user_id: '254'
volume: 204
year: '2007'
...
---
_id: '39759'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
- first_name: A.
  full_name: Lorenz, A.
  last_name: Lorenz
- first_name: H.
  full_name: Matthias, H.
  last_name: Matthias
citation:
  ama: Kitzerow H-S, Lorenz A, Matthias H. Tuneable photonic crystals obtained by
    liquid crystal infiltration. <i>physica status solidi (a)</i>. 2007;204(11):3754-3767.
    doi:<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>
  apa: Kitzerow, H.-S., Lorenz, A., &#38; Matthias, H. (2007). Tuneable photonic crystals
    obtained by liquid crystal infiltration. <i>Physica Status Solidi (a)</i>, <i>204</i>(11),
    3754–3767. <a href="https://doi.org/10.1002/pssa.200776404">https://doi.org/10.1002/pssa.200776404</a>
  bibtex: '@article{Kitzerow_Lorenz_Matthias_2007, title={Tuneable photonic crystals
    obtained by liquid crystal infiltration}, volume={204}, DOI={<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>},
    number={11}, journal={physica status solidi (a)}, publisher={Wiley}, author={Kitzerow,
    Heinz-Siegfried and Lorenz, A. and Matthias, H.}, year={2007}, pages={3754–3767}
    }'
  chicago: 'Kitzerow, Heinz-Siegfried, A. Lorenz, and H. Matthias. “Tuneable Photonic
    Crystals Obtained by Liquid Crystal Infiltration.” <i>Physica Status Solidi (a)</i>
    204, no. 11 (2007): 3754–67. <a href="https://doi.org/10.1002/pssa.200776404">https://doi.org/10.1002/pssa.200776404</a>.'
  ieee: 'H.-S. Kitzerow, A. Lorenz, and H. Matthias, “Tuneable photonic crystals obtained
    by liquid crystal infiltration,” <i>physica status solidi (a)</i>, vol. 204, no.
    11, pp. 3754–3767, 2007, doi: <a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>.'
  mla: Kitzerow, Heinz-Siegfried, et al. “Tuneable Photonic Crystals Obtained by Liquid
    Crystal Infiltration.” <i>Physica Status Solidi (a)</i>, vol. 204, no. 11, Wiley,
    2007, pp. 3754–67, doi:<a href="https://doi.org/10.1002/pssa.200776404">10.1002/pssa.200776404</a>.
  short: H.-S. Kitzerow, A. Lorenz, H. Matthias, Physica Status Solidi (a) 204 (2007)
    3754–3767.
date_created: 2023-01-24T19:06:15Z
date_updated: 2023-01-24T19:06:42Z
department:
- _id: '313'
- _id: '638'
doi: 10.1002/pssa.200776404
intvolume: '       204'
issue: '11'
keyword:
- Materials Chemistry
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 3754-3767
publication: physica status solidi (a)
publication_identifier:
  issn:
  - 1862-6300
  - 1862-6319
publication_status: published
publisher: Wiley
status: public
title: Tuneable photonic crystals obtained by liquid crystal infiltration
type: journal_article
user_id: '254'
volume: 204
year: '2007'
...
---
_id: '41280'
author:
- first_name: Matthias
  full_name: Bauer, Matthias
  id: '47241'
  last_name: Bauer
  orcid: 0000-0002-9294-6076
- first_name: Helmut
  full_name: Bertagnolli, Helmut
  last_name: Bertagnolli
citation:
  ama: Bauer M, Bertagnolli H. The Amplitude Reduction Factor and the Cumulant Expansion
    Method:  Crucial Factors in the Structural Analysis of Alkoxide Precursors in
    Solution. <i>The Journal of Physical Chemistry B</i>. 2007;111(49):13756-13764.
    doi:<a href="https://doi.org/10.1021/jp076386i">10.1021/jp076386i</a>
  apa: Bauer, M., &#38; Bertagnolli, H. (2007). The Amplitude Reduction Factor and
    the Cumulant Expansion Method:  Crucial Factors in the Structural Analysis of
    Alkoxide Precursors in Solution. <i>The Journal of Physical Chemistry B</i>, <i>111</i>(49),
    13756–13764. <a href="https://doi.org/10.1021/jp076386i">https://doi.org/10.1021/jp076386i</a>
  bibtex: '@article{Bauer_Bertagnolli_2007, title={The Amplitude Reduction Factor
    and the Cumulant Expansion Method:  Crucial Factors in the Structural Analysis
    of Alkoxide Precursors in Solution}, volume={111}, DOI={<a href="https://doi.org/10.1021/jp076386i">10.1021/jp076386i</a>},
    number={49}, journal={The Journal of Physical Chemistry B}, publisher={American
    Chemical Society (ACS)}, author={Bauer, Matthias and Bertagnolli, Helmut}, year={2007},
    pages={13756–13764} }'
  chicago: 'Bauer, Matthias, and Helmut Bertagnolli. “The Amplitude Reduction Factor
    and the Cumulant Expansion Method:  Crucial Factors in the Structural Analysis
    of Alkoxide Precursors in Solution.” <i>The Journal of Physical Chemistry B</i>
    111, no. 49 (2007): 13756–64. <a href="https://doi.org/10.1021/jp076386i">https://doi.org/10.1021/jp076386i</a>.'
  ieee: 'M. Bauer and H. Bertagnolli, “The Amplitude Reduction Factor and the Cumulant
    Expansion Method:  Crucial Factors in the Structural Analysis of Alkoxide Precursors
    in Solution,” <i>The Journal of Physical Chemistry B</i>, vol. 111, no. 49, pp.
    13756–13764, 2007, doi: <a href="https://doi.org/10.1021/jp076386i">10.1021/jp076386i</a>.'
  mla: Bauer, Matthias, and Helmut Bertagnolli. “The Amplitude Reduction Factor and
    the Cumulant Expansion Method:  Crucial Factors in the Structural Analysis of
    Alkoxide Precursors in Solution.” <i>The Journal of Physical Chemistry B</i>,
    vol. 111, no. 49, American Chemical Society (ACS), 2007, pp. 13756–64, doi:<a
    href="https://doi.org/10.1021/jp076386i">10.1021/jp076386i</a>.
  short: M. Bauer, H. Bertagnolli, The Journal of Physical Chemistry B 111 (2007)
    13756–13764.
date_created: 2023-01-31T15:09:21Z
date_updated: 2023-01-31T15:09:28Z
department:
- _id: '306'
doi: 10.1021/jp076386i
intvolume: '       111'
issue: '49'
keyword:
- Materials Chemistry
- Surfaces
- Coatings and Films
- Physical and Theoretical Chemistry
language:
- iso: eng
page: 13756-13764
publication: The Journal of Physical Chemistry B
publication_identifier:
  issn:
  - 1520-6106
  - 1520-5207
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: The Amplitude Reduction Factor and the Cumulant Expansion Method:  Crucial
  Factors in the Structural Analysis of Alkoxide Precursors in Solution
type: journal_article
user_id: '48467'
volume: 111
year: '2007'
...
---
_id: '42002'
author:
- first_name: Sebastian
  full_name: Lages, Sebastian
  last_name: Lages
- first_name: Ralf
  full_name: Schweins, Ralf
  last_name: Schweins
- first_name: Klaus
  full_name: Huber, Klaus
  id: '237'
  last_name: Huber
citation:
  ama: Lages S, Schweins R, Huber K. Temperature-Induced Collapse of Alkaline Earth
    Cation−Polyacrylate Anion Complexes. <i>The Journal of Physical Chemistry B</i>.
    2007;111(35):10431-10437. doi:<a href="https://doi.org/10.1021/jp068258k">10.1021/jp068258k</a>
  apa: Lages, S., Schweins, R., &#38; Huber, K. (2007). Temperature-Induced Collapse
    of Alkaline Earth Cation−Polyacrylate Anion Complexes. <i>The Journal of Physical
    Chemistry B</i>, <i>111</i>(35), 10431–10437. <a href="https://doi.org/10.1021/jp068258k">https://doi.org/10.1021/jp068258k</a>
  bibtex: '@article{Lages_Schweins_Huber_2007, title={Temperature-Induced Collapse
    of Alkaline Earth Cation−Polyacrylate Anion Complexes}, volume={111}, DOI={<a
    href="https://doi.org/10.1021/jp068258k">10.1021/jp068258k</a>}, number={35},
    journal={The Journal of Physical Chemistry B}, publisher={American Chemical Society
    (ACS)}, author={Lages, Sebastian and Schweins, Ralf and Huber, Klaus}, year={2007},
    pages={10431–10437} }'
  chicago: 'Lages, Sebastian, Ralf Schweins, and Klaus Huber. “Temperature-Induced
    Collapse of Alkaline Earth Cation−Polyacrylate Anion Complexes.” <i>The Journal
    of Physical Chemistry B</i> 111, no. 35 (2007): 10431–37. <a href="https://doi.org/10.1021/jp068258k">https://doi.org/10.1021/jp068258k</a>.'
  ieee: 'S. Lages, R. Schweins, and K. Huber, “Temperature-Induced Collapse of Alkaline
    Earth Cation−Polyacrylate Anion Complexes,” <i>The Journal of Physical Chemistry
    B</i>, vol. 111, no. 35, pp. 10431–10437, 2007, doi: <a href="https://doi.org/10.1021/jp068258k">10.1021/jp068258k</a>.'
  mla: Lages, Sebastian, et al. “Temperature-Induced Collapse of Alkaline Earth Cation−Polyacrylate
    Anion Complexes.” <i>The Journal of Physical Chemistry B</i>, vol. 111, no. 35,
    American Chemical Society (ACS), 2007, pp. 10431–37, doi:<a href="https://doi.org/10.1021/jp068258k">10.1021/jp068258k</a>.
  short: S. Lages, R. Schweins, K. Huber, The Journal of Physical Chemistry B 111
    (2007) 10431–10437.
date_created: 2023-02-10T14:45:44Z
date_updated: 2023-02-10T14:46:05Z
department:
- _id: '314'
doi: 10.1021/jp068258k
intvolume: '       111'
issue: '35'
keyword:
- Materials Chemistry
- Surfaces
- Coatings and Films
- Physical and Theoretical Chemistry
language:
- iso: eng
page: 10431-10437
publication: The Journal of Physical Chemistry B
publication_identifier:
  issn:
  - 1520-6106
  - 1520-5207
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: Temperature-Induced Collapse of Alkaline Earth Cation−Polyacrylate Anion Complexes
type: journal_article
user_id: '237'
volume: 111
year: '2007'
...
---
_id: '39563'
author:
- first_name: Jianliang
  full_name: Jiang, Jianliang
  last_name: Jiang
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: Xiaoping
  full_name: Shui, Xiaoping
  last_name: Shui
citation:
  ama: 'Jiang J, Hilleringmann U, Shui X. Electro-thermo-mechanical analytical modeling
    of multilayer cantilever microactuator. <i>Sensors and Actuators A: Physical</i>.
    2007;137(2):302-307. doi:<a href="https://doi.org/10.1016/j.sna.2007.03.012">10.1016/j.sna.2007.03.012</a>'
  apa: 'Jiang, J., Hilleringmann, U., &#38; Shui, X. (2007). Electro-thermo-mechanical
    analytical modeling of multilayer cantilever microactuator. <i>Sensors and Actuators
    A: Physical</i>, <i>137</i>(2), 302–307. <a href="https://doi.org/10.1016/j.sna.2007.03.012">https://doi.org/10.1016/j.sna.2007.03.012</a>'
  bibtex: '@article{Jiang_Hilleringmann_Shui_2007, title={Electro-thermo-mechanical
    analytical modeling of multilayer cantilever microactuator}, volume={137}, DOI={<a
    href="https://doi.org/10.1016/j.sna.2007.03.012">10.1016/j.sna.2007.03.012</a>},
    number={2}, journal={Sensors and Actuators A: Physical}, publisher={Elsevier BV},
    author={Jiang, Jianliang and Hilleringmann, Ulrich and Shui, Xiaoping}, year={2007},
    pages={302–307} }'
  chicago: 'Jiang, Jianliang, Ulrich Hilleringmann, and Xiaoping Shui. “Electro-Thermo-Mechanical
    Analytical Modeling of Multilayer Cantilever Microactuator.” <i>Sensors and Actuators
    A: Physical</i> 137, no. 2 (2007): 302–7. <a href="https://doi.org/10.1016/j.sna.2007.03.012">https://doi.org/10.1016/j.sna.2007.03.012</a>.'
  ieee: 'J. Jiang, U. Hilleringmann, and X. Shui, “Electro-thermo-mechanical analytical
    modeling of multilayer cantilever microactuator,” <i>Sensors and Actuators A:
    Physical</i>, vol. 137, no. 2, pp. 302–307, 2007, doi: <a href="https://doi.org/10.1016/j.sna.2007.03.012">10.1016/j.sna.2007.03.012</a>.'
  mla: 'Jiang, Jianliang, et al. “Electro-Thermo-Mechanical Analytical Modeling of
    Multilayer Cantilever Microactuator.” <i>Sensors and Actuators A: Physical</i>,
    vol. 137, no. 2, Elsevier BV, 2007, pp. 302–07, doi:<a href="https://doi.org/10.1016/j.sna.2007.03.012">10.1016/j.sna.2007.03.012</a>.'
  short: 'J. Jiang, U. Hilleringmann, X. Shui, Sensors and Actuators A: Physical 137
    (2007) 302–307.'
date_created: 2023-01-24T12:16:12Z
date_updated: 2023-03-21T10:12:55Z
department:
- _id: '59'
doi: 10.1016/j.sna.2007.03.012
intvolume: '       137'
issue: '2'
keyword:
- Electrical and Electronic Engineering
- Metals and Alloys
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Instrumentation
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 302-307
publication: 'Sensors and Actuators A: Physical'
publication_identifier:
  issn:
  - 0924-4247
publication_status: published
publisher: Elsevier BV
status: public
title: Electro-thermo-mechanical analytical modeling of multilayer cantilever microactuator
type: journal_article
user_id: '20179'
volume: 137
year: '2007'
...
---
_id: '35352'
article_type: original
author:
- first_name: Christian
  full_name: Frank, Christian
  last_name: Frank
- first_name: Reinhard
  full_name: Strey, Reinhard
  last_name: Strey
- first_name: Claudia
  full_name: Schmidt, Claudia
  id: '466'
  last_name: Schmidt
  orcid: 0000-0003-3179-9997
- first_name: Cosima
  full_name: Stubenrauch, Cosima
  last_name: Stubenrauch
citation:
  ama: Frank C, Strey R, Schmidt C, Stubenrauch C. Coexisting lamellar phases in water–oil–surfactant
    systems induced by the addition of an amphiphilic block copolymer. <i>Journal
    of Colloid and Interface Science</i>. 2006;312(1):76-86. doi:<a href="https://doi.org/10.1016/j.jcis.2006.06.043">10.1016/j.jcis.2006.06.043</a>
  apa: Frank, C., Strey, R., Schmidt, C., &#38; Stubenrauch, C. (2006). Coexisting
    lamellar phases in water–oil–surfactant systems induced by the addition of an
    amphiphilic block copolymer. <i>Journal of Colloid and Interface Science</i>,
    <i>312</i>(1), 76–86. <a href="https://doi.org/10.1016/j.jcis.2006.06.043">https://doi.org/10.1016/j.jcis.2006.06.043</a>
  bibtex: '@article{Frank_Strey_Schmidt_Stubenrauch_2006, title={Coexisting lamellar
    phases in water–oil–surfactant systems induced by the addition of an amphiphilic
    block copolymer}, volume={312}, DOI={<a href="https://doi.org/10.1016/j.jcis.2006.06.043">10.1016/j.jcis.2006.06.043</a>},
    number={1}, journal={Journal of Colloid and Interface Science}, publisher={Elsevier
    BV}, author={Frank, Christian and Strey, Reinhard and Schmidt, Claudia and Stubenrauch,
    Cosima}, year={2006}, pages={76–86} }'
  chicago: 'Frank, Christian, Reinhard Strey, Claudia Schmidt, and Cosima Stubenrauch.
    “Coexisting Lamellar Phases in Water–Oil–Surfactant Systems Induced by the Addition
    of an Amphiphilic Block Copolymer.” <i>Journal of Colloid and Interface Science</i>
    312, no. 1 (2006): 76–86. <a href="https://doi.org/10.1016/j.jcis.2006.06.043">https://doi.org/10.1016/j.jcis.2006.06.043</a>.'
  ieee: 'C. Frank, R. Strey, C. Schmidt, and C. Stubenrauch, “Coexisting lamellar
    phases in water–oil–surfactant systems induced by the addition of an amphiphilic
    block copolymer,” <i>Journal of Colloid and Interface Science</i>, vol. 312, no.
    1, pp. 76–86, 2006, doi: <a href="https://doi.org/10.1016/j.jcis.2006.06.043">10.1016/j.jcis.2006.06.043</a>.'
  mla: Frank, Christian, et al. “Coexisting Lamellar Phases in Water–Oil–Surfactant
    Systems Induced by the Addition of an Amphiphilic Block Copolymer.” <i>Journal
    of Colloid and Interface Science</i>, vol. 312, no. 1, Elsevier BV, 2006, pp.
    76–86, doi:<a href="https://doi.org/10.1016/j.jcis.2006.06.043">10.1016/j.jcis.2006.06.043</a>.
  short: C. Frank, R. Strey, C. Schmidt, C. Stubenrauch, Journal of Colloid and Interface
    Science 312 (2006) 76–86.
date_created: 2023-01-06T13:12:31Z
date_updated: 2023-01-07T11:25:55Z
department:
- _id: '2'
- _id: '315'
doi: 10.1016/j.jcis.2006.06.043
intvolume: '       312'
issue: '1'
keyword:
- Colloid and Surface Chemistry
- Surfaces
- Coatings and Films
- Biomaterials
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 76-86
publication: Journal of Colloid and Interface Science
publication_identifier:
  issn:
  - 0021-9797
publication_status: published
publisher: Elsevier BV
quality_controlled: '1'
status: public
title: Coexisting lamellar phases in water–oil–surfactant systems induced by the addition
  of an amphiphilic block copolymer
type: journal_article
user_id: '466'
volume: 312
year: '2006'
...
---
_id: '42018'
author:
- first_name: Thomas
  full_name: Kramer, Thomas
  last_name: Kramer
- first_name: Stephanie
  full_name: Scholz, Stephanie
  last_name: Scholz
- first_name: Michael
  full_name: Maskos, Michael
  last_name: Maskos
- first_name: Klaus
  full_name: Huber, Klaus
  id: '237'
  last_name: Huber
citation:
  ama: Kramer T, Scholz S, Maskos M, Huber K. Colloid–polymer mixtures in solution
    with refractive index matched acrylate colloids. <i>Journal of Colloid and Interface
    Science</i>. 2004;279(2):447-457. doi:<a href="https://doi.org/10.1016/j.jcis.2004.06.102">10.1016/j.jcis.2004.06.102</a>
  apa: Kramer, T., Scholz, S., Maskos, M., &#38; Huber, K. (2004). Colloid–polymer
    mixtures in solution with refractive index matched acrylate colloids. <i>Journal
    of Colloid and Interface Science</i>, <i>279</i>(2), 447–457. <a href="https://doi.org/10.1016/j.jcis.2004.06.102">https://doi.org/10.1016/j.jcis.2004.06.102</a>
  bibtex: '@article{Kramer_Scholz_Maskos_Huber_2004, title={Colloid–polymer mixtures
    in solution with refractive index matched acrylate colloids}, volume={279}, DOI={<a
    href="https://doi.org/10.1016/j.jcis.2004.06.102">10.1016/j.jcis.2004.06.102</a>},
    number={2}, journal={Journal of Colloid and Interface Science}, publisher={Elsevier
    BV}, author={Kramer, Thomas and Scholz, Stephanie and Maskos, Michael and Huber,
    Klaus}, year={2004}, pages={447–457} }'
  chicago: 'Kramer, Thomas, Stephanie Scholz, Michael Maskos, and Klaus Huber. “Colloid–Polymer
    Mixtures in Solution with Refractive Index Matched Acrylate Colloids.” <i>Journal
    of Colloid and Interface Science</i> 279, no. 2 (2004): 447–57. <a href="https://doi.org/10.1016/j.jcis.2004.06.102">https://doi.org/10.1016/j.jcis.2004.06.102</a>.'
  ieee: 'T. Kramer, S. Scholz, M. Maskos, and K. Huber, “Colloid–polymer mixtures
    in solution with refractive index matched acrylate colloids,” <i>Journal of Colloid
    and Interface Science</i>, vol. 279, no. 2, pp. 447–457, 2004, doi: <a href="https://doi.org/10.1016/j.jcis.2004.06.102">10.1016/j.jcis.2004.06.102</a>.'
  mla: Kramer, Thomas, et al. “Colloid–Polymer Mixtures in Solution with Refractive
    Index Matched Acrylate Colloids.” <i>Journal of Colloid and Interface Science</i>,
    vol. 279, no. 2, Elsevier BV, 2004, pp. 447–57, doi:<a href="https://doi.org/10.1016/j.jcis.2004.06.102">10.1016/j.jcis.2004.06.102</a>.
  short: T. Kramer, S. Scholz, M. Maskos, K. Huber, Journal of Colloid and Interface
    Science 279 (2004) 447–457.
date_created: 2023-02-10T15:24:19Z
date_updated: 2023-02-10T15:24:46Z
department:
- _id: '314'
doi: 10.1016/j.jcis.2004.06.102
intvolume: '       279'
issue: '2'
keyword:
- Colloid and Surface Chemistry
- Surfaces
- Coatings and Films
- Biomaterials
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 447-457
publication: Journal of Colloid and Interface Science
publication_identifier:
  issn:
  - 0021-9797
publication_status: published
publisher: Elsevier BV
status: public
title: Colloid–polymer mixtures in solution with refractive index matched acrylate
  colloids
type: journal_article
user_id: '237'
volume: 279
year: '2004'
...
---
_id: '35360'
article_type: original
author:
- first_name: R.
  full_name: Angelico, R.
  last_name: Angelico
- first_name: D.
  full_name: Burgemeister, D.
  last_name: Burgemeister
- first_name: A.
  full_name: Ceglie, A.
  last_name: Ceglie
- first_name: U.
  full_name: Olsson, U.
  last_name: Olsson
- first_name: G.
  full_name: Palazzo, G.
  last_name: Palazzo
- first_name: Claudia
  full_name: Schmidt, Claudia
  id: '466'
  last_name: Schmidt
  orcid: 0000-0003-3179-9997
citation:
  ama: Angelico R, Burgemeister D, Ceglie A, Olsson U, Palazzo G, Schmidt C. Deuterium
    NMR Study of Slow Relaxation Dynamics in a Polymer-like Micelles System after
    Flow-Induced Orientation. <i>The Journal of Physical Chemistry B</i>. 2003;107(38):10325-10328.
    doi:<a href="https://doi.org/10.1021/jp0356259">10.1021/jp0356259</a>
  apa: Angelico, R., Burgemeister, D., Ceglie, A., Olsson, U., Palazzo, G., &#38;
    Schmidt, C. (2003). Deuterium NMR Study of Slow Relaxation Dynamics in a Polymer-like
    Micelles System after Flow-Induced Orientation. <i>The Journal of Physical Chemistry
    B</i>, <i>107</i>(38), 10325–10328. <a href="https://doi.org/10.1021/jp0356259">https://doi.org/10.1021/jp0356259</a>
  bibtex: '@article{Angelico_Burgemeister_Ceglie_Olsson_Palazzo_Schmidt_2003, title={Deuterium
    NMR Study of Slow Relaxation Dynamics in a Polymer-like Micelles System after
    Flow-Induced Orientation}, volume={107}, DOI={<a href="https://doi.org/10.1021/jp0356259">10.1021/jp0356259</a>},
    number={38}, journal={The Journal of Physical Chemistry B}, publisher={American
    Chemical Society (ACS)}, author={Angelico, R. and Burgemeister, D. and Ceglie,
    A. and Olsson, U. and Palazzo, G. and Schmidt, Claudia}, year={2003}, pages={10325–10328}
    }'
  chicago: 'Angelico, R., D. Burgemeister, A. Ceglie, U. Olsson, G. Palazzo, and Claudia
    Schmidt. “Deuterium NMR Study of Slow Relaxation Dynamics in a Polymer-like Micelles
    System after Flow-Induced Orientation.” <i>The Journal of Physical Chemistry B</i>
    107, no. 38 (2003): 10325–28. <a href="https://doi.org/10.1021/jp0356259">https://doi.org/10.1021/jp0356259</a>.'
  ieee: 'R. Angelico, D. Burgemeister, A. Ceglie, U. Olsson, G. Palazzo, and C. Schmidt,
    “Deuterium NMR Study of Slow Relaxation Dynamics in a Polymer-like Micelles System
    after Flow-Induced Orientation,” <i>The Journal of Physical Chemistry B</i>, vol.
    107, no. 38, pp. 10325–10328, 2003, doi: <a href="https://doi.org/10.1021/jp0356259">10.1021/jp0356259</a>.'
  mla: Angelico, R., et al. “Deuterium NMR Study of Slow Relaxation Dynamics in a
    Polymer-like Micelles System after Flow-Induced Orientation.” <i>The Journal of
    Physical Chemistry B</i>, vol. 107, no. 38, American Chemical Society (ACS), 2003,
    pp. 10325–28, doi:<a href="https://doi.org/10.1021/jp0356259">10.1021/jp0356259</a>.
  short: R. Angelico, D. Burgemeister, A. Ceglie, U. Olsson, G. Palazzo, C. Schmidt,
    The Journal of Physical Chemistry B 107 (2003) 10325–10328.
date_created: 2023-01-06T13:15:22Z
date_updated: 2023-01-07T11:22:29Z
department:
- _id: '2'
- _id: '315'
doi: 10.1021/jp0356259
intvolume: '       107'
issue: '38'
keyword:
- Materials Chemistry
- Surfaces
- Coatings and Films
- Physical and Theoretical Chemistry
language:
- iso: eng
page: 10325-10328
publication: The Journal of Physical Chemistry B
publication_identifier:
  issn:
  - 1520-6106
  - 1520-5207
publication_status: published
publisher: American Chemical Society (ACS)
quality_controlled: '1'
status: public
title: Deuterium NMR Study of Slow Relaxation Dynamics in a Polymer-like Micelles
  System after Flow-Induced Orientation
type: journal_article
user_id: '466'
volume: 107
year: '2003'
...
---
_id: '39851'
author:
- first_name: Ch.
  full_name: Pannemann, Ch.
  last_name: Pannemann
- first_name: T.
  full_name: Diekmann, T.
  last_name: Diekmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
citation:
  ama: Pannemann Ch, Diekmann T, Hilleringmann U. Nanometer scale organic thin film
    transistors with Pentacene. <i>Microelectronic Engineering</i>. 2003;67-68:845-852.
    doi:<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>
  apa: Pannemann, Ch., Diekmann, T., &#38; Hilleringmann, U. (2003). Nanometer scale
    organic thin film transistors with Pentacene. <i>Microelectronic Engineering</i>,
    <i>67–68</i>, 845–852. <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">https://doi.org/10.1016/s0167-9317(03)00146-1</a>
  bibtex: '@article{Pannemann_Diekmann_Hilleringmann_2003, title={Nanometer scale
    organic thin film transistors with Pentacene}, volume={67–68}, DOI={<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>},
    journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Pannemann,
    Ch. and Diekmann, T. and Hilleringmann, Ulrich}, year={2003}, pages={845–852}
    }'
  chicago: 'Pannemann, Ch., T. Diekmann, and Ulrich Hilleringmann. “Nanometer Scale
    Organic Thin Film Transistors with Pentacene.” <i>Microelectronic Engineering</i>
    67–68 (2003): 845–52. <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">https://doi.org/10.1016/s0167-9317(03)00146-1</a>.'
  ieee: 'Ch. Pannemann, T. Diekmann, and U. Hilleringmann, “Nanometer scale organic
    thin film transistors with Pentacene,” <i>Microelectronic Engineering</i>, vol.
    67–68, pp. 845–852, 2003, doi: <a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>.'
  mla: Pannemann, Ch., et al. “Nanometer Scale Organic Thin Film Transistors with
    Pentacene.” <i>Microelectronic Engineering</i>, vol. 67–68, Elsevier BV, 2003,
    pp. 845–52, doi:<a href="https://doi.org/10.1016/s0167-9317(03)00146-1">10.1016/s0167-9317(03)00146-1</a>.
  short: Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering
    67–68 (2003) 845–852.
date_created: 2023-01-25T08:39:40Z
date_updated: 2023-03-21T10:04:43Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(03)00146-1
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 845-852
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Nanometer scale organic thin film transistors with Pentacene
type: journal_article
user_id: '20179'
volume: 67-68
year: '2003'
...
---
_id: '39912'
author:
- first_name: I.
  full_name: Schönstein, I.
  last_name: Schönstein
- first_name: J.
  full_name: Müller, J.
  last_name: Müller
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Schönstein I, Müller J, Hilleringmann U, Goser K. Characterization of submicron
    NMOS devices due to visible light emission. <i>Microelectronic Engineering</i>.
    2002;21(1-4):363-366. doi:<a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>
  apa: Schönstein, I., Müller, J., Hilleringmann, U., &#38; Goser, K. (2002). Characterization
    of submicron NMOS devices due to visible light emission. <i>Microelectronic Engineering</i>,
    <i>21</i>(1–4), 363–366. <a href="https://doi.org/10.1016/0167-9317(93)90092-j">https://doi.org/10.1016/0167-9317(93)90092-j</a>
  bibtex: '@article{Schönstein_Müller_Hilleringmann_Goser_2002, title={Characterization
    of submicron NMOS devices due to visible light emission}, volume={21}, DOI={<a
    href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Schönstein, I. and Müller, J. and Hilleringmann, Ulrich and Goser, K.},
    year={2002}, pages={363–366} }'
  chicago: 'Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization
    of Submicron NMOS Devices Due to Visible Light Emission.” <i>Microelectronic Engineering</i>
    21, no. 1–4 (2002): 363–66. <a href="https://doi.org/10.1016/0167-9317(93)90092-j">https://doi.org/10.1016/0167-9317(93)90092-j</a>.'
  ieee: 'I. Schönstein, J. Müller, U. Hilleringmann, and K. Goser, “Characterization
    of submicron NMOS devices due to visible light emission,” <i>Microelectronic Engineering</i>,
    vol. 21, no. 1–4, pp. 363–366, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>.'
  mla: Schönstein, I., et al. “Characterization of Submicron NMOS Devices Due to Visible
    Light Emission.” <i>Microelectronic Engineering</i>, vol. 21, no. 1–4, Elsevier
    BV, 2002, pp. 363–66, doi:<a href="https://doi.org/10.1016/0167-9317(93)90092-j">10.1016/0167-9317(93)90092-j</a>.
  short: I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering
    21 (2002) 363–366.
date_created: 2023-01-25T09:26:21Z
date_updated: 2023-03-21T09:50:03Z
department:
- _id: '59'
doi: 10.1016/0167-9317(93)90092-j
intvolume: '        21'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 363-366
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Characterization of submicron NMOS devices due to visible light emission
type: journal_article
user_id: '20179'
volume: 21
year: '2002'
...
---
_id: '39914'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides,
    photodiodes and CMOS circuits on silicon. <i>Microelectronic Engineering</i>.
    2002;19(1-4):211-214. doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>
  apa: Hilleringmann, U., &#38; Goser, K. (2002). Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon. <i>Microelectronic
    Engineering</i>, <i>19</i>(1–4), 211–214. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>
  bibtex: '@article{Hilleringmann_Goser_2002, title={Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon}, volume={19},
    DOI={<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={211–214} }'
  chicago: 'Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration
    of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i> 19, no. 1–4 (2002): 211–14. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>.'
  ieee: 'U. Hilleringmann and K. Goser, “Results of monolithic integration of optical
    waveguides, photodiodes and CMOS circuits on silicon,” <i>Microelectronic Engineering</i>,
    vol. 19, no. 1–4, pp. 211–214, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.'
  mla: Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of
    Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i>, vol. 19, no. 1–4, Elsevier BV, 2002, pp. 211–14, doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.
  short: U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
date_created: 2023-01-25T09:27:23Z
date_updated: 2023-03-21T09:49:25Z
department:
- _id: '59'
doi: 10.1016/0167-9317(92)90425-q
intvolume: '        19'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 211-214
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Results of monolithic integration of optical waveguides, photodiodes and CMOS
  circuits on silicon
type: journal_article
user_id: '20179'
volume: 19
year: '2002'
...
---
_id: '39899'
author:
- first_name: J.T.
  full_name: Horstmann, J.T.
  last_name: Horstmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Horstmann JT, Hilleringmann U, Goser K. Characterisation of sub-100 nm-MOS-transistors
    processed by optical lithography and a sidewall-etchback technique. <i>Microelectronic
    Engineering</i>. 2002;30(1-4):431-434. doi:<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>
  apa: Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. (2002). Characterisation
    of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback
    technique. <i>Microelectronic Engineering</i>, <i>30</i>(1–4), 431–434. <a href="https://doi.org/10.1016/0167-9317(95)00280-4">https://doi.org/10.1016/0167-9317(95)00280-4</a>
  bibtex: '@article{Horstmann_Hilleringmann_Goser_2002, title={Characterisation of
    sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback
    technique}, volume={30}, DOI={<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={431–434} }'
  chicago: 'Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation
    of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback
    Technique.” <i>Microelectronic Engineering</i> 30, no. 1–4 (2002): 431–34. <a
    href="https://doi.org/10.1016/0167-9317(95)00280-4">https://doi.org/10.1016/0167-9317(95)00280-4</a>.'
  ieee: 'J. T. Horstmann, U. Hilleringmann, and K. Goser, “Characterisation of sub-100
    nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique,”
    <i>Microelectronic Engineering</i>, vol. 30, no. 1–4, pp. 431–434, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>.'
  mla: Horstmann, J. T., et al. “Characterisation of Sub-100 Nm-MOS-Transistors Processed
    by Optical Lithography and a Sidewall-Etchback Technique.” <i>Microelectronic
    Engineering</i>, vol. 30, no. 1–4, Elsevier BV, 2002, pp. 431–34, doi:<a href="https://doi.org/10.1016/0167-9317(95)00280-4">10.1016/0167-9317(95)00280-4</a>.
  short: J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30
    (2002) 431–434.
date_created: 2023-01-25T09:20:20Z
date_updated: 2023-03-21T09:53:55Z
department:
- _id: '59'
doi: 10.1016/0167-9317(95)00280-4
intvolume: '        30'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 431-434
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Characterisation of sub-100 nm-MOS-transistors processed by optical lithography
  and a sidewall-etchback technique
type: journal_article
user_id: '20179'
volume: 30
year: '2002'
...
---
_id: '39882'
author:
- first_name: V.
  full_name: Mankowski, V.
  last_name: Mankowski
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Schumacher, K.
  last_name: Schumacher
citation:
  ama: Mankowski V, Hilleringmann U, Schumacher K. A novel insulation technique for
    smart power switching devices and very high voltage ICs above 10 kV. <i>Microelectronic
    Engineering</i>. 2002;53(1-4):525-528. doi:<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>
  apa: Mankowski, V., Hilleringmann, U., &#38; Schumacher, K. (2002). A novel insulation
    technique for smart power switching devices and very high voltage ICs above 10
    kV. <i>Microelectronic Engineering</i>, <i>53</i>(1–4), 525–528. <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">https://doi.org/10.1016/s0167-9317(00)00370-1</a>
  bibtex: '@article{Mankowski_Hilleringmann_Schumacher_2002, title={A novel insulation
    technique for smart power switching devices and very high voltage ICs above 10
    kV}, volume={53}, DOI={<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Mankowski, V. and Hilleringmann, Ulrich and Schumacher, K.}, year={2002},
    pages={525–528} }'
  chicago: 'Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “A Novel Insulation
    Technique for Smart Power Switching Devices and Very High Voltage ICs above 10
    KV.” <i>Microelectronic Engineering</i> 53, no. 1–4 (2002): 525–28. <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">https://doi.org/10.1016/s0167-9317(00)00370-1</a>.'
  ieee: 'V. Mankowski, U. Hilleringmann, and K. Schumacher, “A novel insulation technique
    for smart power switching devices and very high voltage ICs above 10 kV,” <i>Microelectronic
    Engineering</i>, vol. 53, no. 1–4, pp. 525–528, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>.'
  mla: Mankowski, V., et al. “A Novel Insulation Technique for Smart Power Switching
    Devices and Very High Voltage ICs above 10 KV.” <i>Microelectronic Engineering</i>,
    vol. 53, no. 1–4, Elsevier BV, 2002, pp. 525–28, doi:<a href="https://doi.org/10.1016/s0167-9317(00)00370-1">10.1016/s0167-9317(00)00370-1</a>.
  short: V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering
    53 (2002) 525–528.
date_created: 2023-01-25T09:10:13Z
date_updated: 2023-03-21T10:00:06Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(00)00370-1
intvolume: '        53'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 525-528
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: A novel insulation technique for smart power switching devices and very high
  voltage ICs above 10 kV
type: journal_article
user_id: '20179'
volume: 53
year: '2002'
...
---
_id: '39879'
author:
- first_name: J.T.
  full_name: Horstmann, J.T.
  last_name: Horstmann
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Horstmann JT, Hilleringmann U, Goser K. 1/f-Noise of sub-100 nm-MOS-transistors
    fabricated by a special deposition and etchback technique. <i>Microelectronic
    Engineering</i>. 2002;53(1-4):213-216. doi:<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>
  apa: Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. (2002). 1/f-Noise of sub-100
    nm-MOS-transistors fabricated by a special deposition and etchback technique.
    <i>Microelectronic Engineering</i>, <i>53</i>(1–4), 213–216. <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">https://doi.org/10.1016/s0167-9317(00)00299-9</a>
  bibtex: '@article{Horstmann_Hilleringmann_Goser_2002, title={1/f-Noise of sub-100
    nm-MOS-transistors fabricated by a special deposition and etchback technique},
    volume={53}, DOI={<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={213–216} }'
  chicago: 'Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “1/f-Noise of Sub-100
    Nm-MOS-Transistors Fabricated by a Special Deposition and Etchback Technique.”
    <i>Microelectronic Engineering</i> 53, no. 1–4 (2002): 213–16. <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">https://doi.org/10.1016/s0167-9317(00)00299-9</a>.'
  ieee: 'J. T. Horstmann, U. Hilleringmann, and K. Goser, “1/f-Noise of sub-100 nm-MOS-transistors
    fabricated by a special deposition and etchback technique,” <i>Microelectronic
    Engineering</i>, vol. 53, no. 1–4, pp. 213–216, 2002, doi: <a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>.'
  mla: Horstmann, J. T., et al. “1/f-Noise of Sub-100 Nm-MOS-Transistors Fabricated
    by a Special Deposition and Etchback Technique.” <i>Microelectronic Engineering</i>,
    vol. 53, no. 1–4, Elsevier BV, 2002, pp. 213–16, doi:<a href="https://doi.org/10.1016/s0167-9317(00)00299-9">10.1016/s0167-9317(00)00299-9</a>.
  short: J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53
    (2002) 213–216.
date_created: 2023-01-25T09:08:36Z
date_updated: 2023-03-21T10:02:46Z
department:
- _id: '59'
doi: 10.1016/s0167-9317(00)00299-9
intvolume: '        53'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 213-216
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: 1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition
  and etchback technique
type: journal_article
user_id: '20179'
volume: 53
year: '2002'
...
---
_id: '39919'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Knospe, K.
  last_name: Knospe
- first_name: C.
  full_name: Heite, C.
  last_name: Heite
- first_name: K.
  full_name: Schumacher, K.
  last_name: Schumacher
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Knospe K, Heite C, Schumacher K, Goser K. A silicon based
    technology for monolithic integration of waveguides and VLSI CMOS circuits. <i>Microelectronic
    Engineering</i>. 2002;15(1-4):289-292. doi:<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>
  apa: Hilleringmann, U., Knospe, K., Heite, C., Schumacher, K., &#38; Goser, K. (2002).
    A silicon based technology for monolithic integration of waveguides and VLSI CMOS
    circuits. <i>Microelectronic Engineering</i>, <i>15</i>(1–4), 289–292. <a href="https://doi.org/10.1016/0167-9317(91)90231-2">https://doi.org/10.1016/0167-9317(91)90231-2</a>
  bibtex: '@article{Hilleringmann_Knospe_Heite_Schumacher_Goser_2002, title={A silicon
    based technology for monolithic integration of waveguides and VLSI CMOS circuits},
    volume={15}, DOI={<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Knospe, K. and Heite, C. and Schumacher, K.
    and Goser, K.}, year={2002}, pages={289–292} }'
  chicago: 'Hilleringmann, Ulrich, K. Knospe, C. Heite, K. Schumacher, and K. Goser.
    “A Silicon Based Technology for Monolithic Integration of Waveguides and VLSI
    CMOS Circuits.” <i>Microelectronic Engineering</i> 15, no. 1–4 (2002): 289–92.
    <a href="https://doi.org/10.1016/0167-9317(91)90231-2">https://doi.org/10.1016/0167-9317(91)90231-2</a>.'
  ieee: 'U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, and K. Goser, “A silicon
    based technology for monolithic integration of waveguides and VLSI CMOS circuits,”
    <i>Microelectronic Engineering</i>, vol. 15, no. 1–4, pp. 289–292, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>.'
  mla: Hilleringmann, Ulrich, et al. “A Silicon Based Technology for Monolithic Integration
    of Waveguides and VLSI CMOS Circuits.” <i>Microelectronic Engineering</i>, vol.
    15, no. 1–4, Elsevier BV, 2002, pp. 289–92, doi:<a href="https://doi.org/10.1016/0167-9317(91)90231-2">10.1016/0167-9317(91)90231-2</a>.
  short: U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic
    Engineering 15 (2002) 289–292.
date_created: 2023-01-25T09:29:32Z
date_updated: 2023-03-22T10:29:08Z
department:
- _id: '59'
doi: 10.1016/0167-9317(91)90231-2
intvolume: '        15'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 289-292
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: A silicon based technology for monolithic integration of waveguides and VLSI
  CMOS circuits
type: journal_article
user_id: '20179'
volume: 15
year: '2002'
...
---
_id: '39920'
author:
- first_name: A.
  full_name: Soennecken, A.
  last_name: Soennecken
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Soennecken A, Hilleringmann U, Goser K. Floating gate structures as nonvolatile
    analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica. <i>Microelectronic
    Engineering</i>. 2002;15(1-4):633-636. doi:<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>
  apa: Soennecken, A., Hilleringmann, U., &#38; Goser, K. (2002). Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica.
    <i>Microelectronic Engineering</i>, <i>15</i>(1–4), 633–636. <a href="https://doi.org/10.1016/0167-9317(91)90299-s">https://doi.org/10.1016/0167-9317(91)90299-s</a>
  bibtex: '@article{Soennecken_Hilleringmann_Goser_2002, title={Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica},
    volume={15}, DOI={<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Soennecken, A. and Hilleringmann, Ulrich and Goser, K.}, year={2002},
    pages={633–636} }'
  chicago: 'Soennecken, A., Ulrich Hilleringmann, and K. Goser. “Floating Gate Structures
    as Nonvolatile Analog Memory Cells in 1.0μm-LOCOS-CMOS Technology with PZT Dielectrica.”
    <i>Microelectronic Engineering</i> 15, no. 1–4 (2002): 633–36. <a href="https://doi.org/10.1016/0167-9317(91)90299-s">https://doi.org/10.1016/0167-9317(91)90299-s</a>.'
  ieee: 'A. Soennecken, U. Hilleringmann, and K. Goser, “Floating gate structures
    as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica,”
    <i>Microelectronic Engineering</i>, vol. 15, no. 1–4, pp. 633–636, 2002, doi:
    <a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>.'
  mla: Soennecken, A., et al. “Floating Gate Structures as Nonvolatile Analog Memory
    Cells in 1.0μm-LOCOS-CMOS Technology with PZT Dielectrica.” <i>Microelectronic
    Engineering</i>, vol. 15, no. 1–4, Elsevier BV, 2002, pp. 633–36, doi:<a href="https://doi.org/10.1016/0167-9317(91)90299-s">10.1016/0167-9317(91)90299-s</a>.
  short: A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15
    (2002) 633–636.
date_created: 2023-01-25T09:29:53Z
date_updated: 2023-03-21T09:47:17Z
department:
- _id: '59'
doi: 10.1016/0167-9317(91)90299-s
intvolume: '        15'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 633-636
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS
  technology with PZT dielectrica
type: journal_article
user_id: '20179'
volume: 15
year: '2002'
...
---
_id: '39915'
author:
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  id: '20179'
  last_name: Hilleringmann
- first_name: K.
  full_name: Goser, K.
  last_name: Goser
citation:
  ama: Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides,
    photodiodes and CMOS circuits on silicon. <i>Microelectronic Engineering</i>.
    2002;19(1-4):211-214. doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>
  apa: Hilleringmann, U., &#38; Goser, K. (2002). Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon. <i>Microelectronic
    Engineering</i>, <i>19</i>(1–4), 211–214. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>
  bibtex: '@article{Hilleringmann_Goser_2002, title={Results of monolithic integration
    of optical waveguides, photodiodes and CMOS circuits on silicon}, volume={19},
    DOI={<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>},
    number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV},
    author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={211–214} }'
  chicago: 'Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration
    of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i> 19, no. 1–4 (2002): 211–14. <a href="https://doi.org/10.1016/0167-9317(92)90425-q">https://doi.org/10.1016/0167-9317(92)90425-q</a>.'
  ieee: 'U. Hilleringmann and K. Goser, “Results of monolithic integration of optical
    waveguides, photodiodes and CMOS circuits on silicon,” <i>Microelectronic Engineering</i>,
    vol. 19, no. 1–4, pp. 211–214, 2002, doi: <a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.'
  mla: Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of
    Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” <i>Microelectronic
    Engineering</i>, vol. 19, no. 1–4, Elsevier BV, 2002, pp. 211–14, doi:<a href="https://doi.org/10.1016/0167-9317(92)90425-q">10.1016/0167-9317(92)90425-q</a>.
  short: U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
date_created: 2023-01-25T09:27:51Z
date_updated: 2023-03-21T09:49:09Z
department:
- _id: '59'
doi: 10.1016/0167-9317(92)90425-q
intvolume: '        19'
issue: 1-4
keyword:
- Electrical and Electronic Engineering
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 211-214
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Results of monolithic integration of optical waveguides, photodiodes and CMOS
  circuits on silicon
type: journal_article
user_id: '20179'
volume: 19
year: '2002'
...