[{"user_id":"16199","department":[{"_id":"15"},{"_id":"170"},{"_id":"230"},{"_id":"569"},{"_id":"429"},{"_id":"35"}],"_id":"41035","language":[{"iso":"eng"}],"article_number":"2200408","keyword":["Condensed Matter Physics","Atomic and Molecular Physics","and Optics","Electronic","Optical and Magnetic Materials"],"type":"journal_article","publication":"Laser &amp; Photonics Reviews","status":"public","author":[{"full_name":"Sharapova, Polina R.","id":"60286","last_name":"Sharapova","first_name":"Polina R."},{"first_name":"Sergey S.","last_name":"Kruk","full_name":"Kruk, Sergey S."},{"last_name":"Solntsev","full_name":"Solntsev, Alexander S.","first_name":"Alexander S."}],"date_created":"2023-01-30T18:24:45Z","publisher":"Wiley","date_updated":"2025-12-16T11:26:28Z","doi":"10.1002/lpor.202200408","title":"Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons","publication_status":"published","publication_identifier":{"issn":["1863-8880","1863-8899"]},"citation":{"apa":"Sharapova, P. R., Kruk, S. S., &#38; Solntsev, A. S. (2023). Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons. <i>Laser &#38;amp; Photonics Reviews</i>, Article 2200408. <a href=\"https://doi.org/10.1002/lpor.202200408\">https://doi.org/10.1002/lpor.202200408</a>","short":"P.R. Sharapova, S.S. Kruk, A.S. Solntsev, Laser &#38;amp; Photonics Reviews (2023).","bibtex":"@article{Sharapova_Kruk_Solntsev_2023, title={Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons}, DOI={<a href=\"https://doi.org/10.1002/lpor.202200408\">10.1002/lpor.202200408</a>}, number={2200408}, journal={Laser &#38;amp; Photonics Reviews}, publisher={Wiley}, author={Sharapova, Polina R. and Kruk, Sergey S. and Solntsev, Alexander S.}, year={2023} }","mla":"Sharapova, Polina R., et al. “Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons.” <i>Laser &#38;amp; Photonics Reviews</i>, 2200408, Wiley, 2023, doi:<a href=\"https://doi.org/10.1002/lpor.202200408\">10.1002/lpor.202200408</a>.","ieee":"P. R. Sharapova, S. S. Kruk, and A. S. Solntsev, “Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons,” <i>Laser &#38;amp; Photonics Reviews</i>, Art. no. 2200408, 2023, doi: <a href=\"https://doi.org/10.1002/lpor.202200408\">10.1002/lpor.202200408</a>.","chicago":"Sharapova, Polina R., Sergey S. Kruk, and Alexander S. Solntsev. “Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons.” <i>Laser &#38;amp; Photonics Reviews</i>, 2023. <a href=\"https://doi.org/10.1002/lpor.202200408\">https://doi.org/10.1002/lpor.202200408</a>.","ama":"Sharapova PR, Kruk SS, Solntsev AS. Nonlinear Dielectric Nanoresonators and Metasurfaces: Toward Efficient Generation of Entangled Photons. <i>Laser &#38;amp; Photonics Reviews</i>. Published online 2023. doi:<a href=\"https://doi.org/10.1002/lpor.202200408\">10.1002/lpor.202200408</a>"},"year":"2023"},{"status":"public","publication":"Materials Science and Engineering: A","type":"journal_article","keyword":["Mechanical Engineering","Mechanics of Materials","Condensed Matter Physics","General Materials Science"],"article_number":"142780","language":[{"iso":"eng"}],"_id":"29809","user_id":"43822","year":"2022","intvolume":"       838","citation":{"ieee":"A. Reitz, O. Grydin, and M. Schaper, “Influence of thermomechanical processing on the microstructural and mechanical properties of steel 22MnB5,” <i>Materials Science and Engineering: A</i>, vol. 838, Art. no. 142780, 2022, doi: <a href=\"https://doi.org/10.1016/j.msea.2022.142780\">10.1016/j.msea.2022.142780</a>.","chicago":"Reitz, A., O. Grydin, and M. Schaper. “Influence of Thermomechanical Processing on the Microstructural and Mechanical Properties of Steel 22MnB5.” <i>Materials Science and Engineering: A</i> 838 (2022). <a href=\"https://doi.org/10.1016/j.msea.2022.142780\">https://doi.org/10.1016/j.msea.2022.142780</a>.","ama":"Reitz A, Grydin O, Schaper M. Influence of thermomechanical processing on the microstructural and mechanical properties of steel 22MnB5. <i>Materials Science and Engineering: A</i>. 2022;838. doi:<a href=\"https://doi.org/10.1016/j.msea.2022.142780\">10.1016/j.msea.2022.142780</a>","short":"A. Reitz, O. Grydin, M. Schaper, Materials Science and Engineering: A 838 (2022).","bibtex":"@article{Reitz_Grydin_Schaper_2022, title={Influence of thermomechanical processing on the microstructural and mechanical properties of steel 22MnB5}, volume={838}, DOI={<a href=\"https://doi.org/10.1016/j.msea.2022.142780\">10.1016/j.msea.2022.142780</a>}, number={142780}, journal={Materials Science and Engineering: A}, publisher={Elsevier BV}, author={Reitz, A. and Grydin, O. and Schaper, M.}, year={2022} }","mla":"Reitz, A., et al. “Influence of Thermomechanical Processing on the Microstructural and Mechanical Properties of Steel 22MnB5.” <i>Materials Science and Engineering: A</i>, vol. 838, 142780, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.msea.2022.142780\">10.1016/j.msea.2022.142780</a>.","apa":"Reitz, A., Grydin, O., &#38; Schaper, M. (2022). Influence of thermomechanical processing on the microstructural and mechanical properties of steel 22MnB5. <i>Materials Science and Engineering: A</i>, <i>838</i>, Article 142780. <a href=\"https://doi.org/10.1016/j.msea.2022.142780\">https://doi.org/10.1016/j.msea.2022.142780</a>"},"publication_identifier":{"issn":["0921-5093"]},"publication_status":"published","title":"Influence of thermomechanical processing on the microstructural and mechanical properties of steel 22MnB5","doi":"10.1016/j.msea.2022.142780","publisher":"Elsevier BV","date_updated":"2022-02-11T17:24:05Z","volume":838,"date_created":"2022-02-11T17:17:40Z","author":[{"full_name":"Reitz, A.","last_name":"Reitz","first_name":"A."},{"full_name":"Grydin, O.","last_name":"Grydin","first_name":"O."},{"last_name":"Schaper","full_name":"Schaper, M.","first_name":"M."}]},{"doi":"10.1149/1945-7111/ac653f","title":"Conformal Pressure and Fast-Charging Li-Ion Batteries","date_created":"2022-04-20T06:37:40Z","author":[{"first_name":"Chuntian","full_name":"Cao, Chuntian","last_name":"Cao"},{"first_name":"Hans-Georg","id":"84268","full_name":"Steinrück, Hans-Georg","orcid":"0000-0001-6373-0877","last_name":"Steinrück"},{"first_name":"Partha P","last_name":"Paul","full_name":"Paul, Partha P"},{"full_name":"Dunlop, Alison R.","last_name":"Dunlop","first_name":"Alison R."},{"first_name":"Stephen E.","full_name":"Trask, Stephen E.","last_name":"Trask"},{"last_name":"Jansen","full_name":"Jansen, Andrew","first_name":"Andrew"},{"last_name":"Kasse","full_name":"Kasse, Robert M","first_name":"Robert M"},{"first_name":"Vivek","full_name":"Thampy, Vivek","last_name":"Thampy"},{"last_name":"Yusuf","full_name":"Yusuf, Maha","first_name":"Maha"},{"last_name":"Nelson Weker","full_name":"Nelson Weker, Johanna","first_name":"Johanna"},{"first_name":"Badri","last_name":"Shyam","full_name":"Shyam, Badri"},{"first_name":"Ram","full_name":"Subbaraman, Ram","last_name":"Subbaraman"},{"first_name":"Kelly","last_name":"Davis","full_name":"Davis, Kelly"},{"last_name":"Johnston","full_name":"Johnston, Christina M","first_name":"Christina M"},{"last_name":"Takacs","full_name":"Takacs, Christopher J","first_name":"Christopher J"},{"full_name":"Toney, Michael","last_name":"Toney","first_name":"Michael"}],"volume":169,"publisher":"The Electrochemical Society","date_updated":"2022-04-20T06:38:37Z","citation":{"chicago":"Cao, Chuntian, Hans-Georg Steinrück, Partha P Paul, Alison R. Dunlop, Stephen E. Trask, Andrew Jansen, Robert M Kasse, et al. “Conformal Pressure and Fast-Charging Li-Ion Batteries.” <i>Journal of The Electrochemical Society</i> 169 (2022): 040540. <a href=\"https://doi.org/10.1149/1945-7111/ac653f\">https://doi.org/10.1149/1945-7111/ac653f</a>.","ieee":"C. Cao <i>et al.</i>, “Conformal Pressure and Fast-Charging Li-Ion Batteries,” <i>Journal of The Electrochemical Society</i>, vol. 169, p. 040540, 2022, doi: <a href=\"https://doi.org/10.1149/1945-7111/ac653f\">10.1149/1945-7111/ac653f</a>.","ama":"Cao C, Steinrück H-G, Paul PP, et al. Conformal Pressure and Fast-Charging Li-Ion Batteries. <i>Journal of The Electrochemical Society</i>. 2022;169:040540. doi:<a href=\"https://doi.org/10.1149/1945-7111/ac653f\">10.1149/1945-7111/ac653f</a>","bibtex":"@article{Cao_Steinrück_Paul_Dunlop_Trask_Jansen_Kasse_Thampy_Yusuf_Nelson Weker_et al._2022, title={Conformal Pressure and Fast-Charging Li-Ion Batteries}, volume={169}, DOI={<a href=\"https://doi.org/10.1149/1945-7111/ac653f\">10.1149/1945-7111/ac653f</a>}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Cao, Chuntian and Steinrück, Hans-Georg and Paul, Partha P and Dunlop, Alison R. and Trask, Stephen E. and Jansen, Andrew and Kasse, Robert M and Thampy, Vivek and Yusuf, Maha and Nelson Weker, Johanna and et al.}, year={2022}, pages={040540} }","short":"C. Cao, H.-G. Steinrück, P.P. Paul, A.R. Dunlop, S.E. Trask, A. Jansen, R.M. Kasse, V. Thampy, M. Yusuf, J. Nelson Weker, B. Shyam, R. Subbaraman, K. Davis, C.M. Johnston, C.J. Takacs, M. Toney, Journal of The Electrochemical Society 169 (2022) 040540.","mla":"Cao, Chuntian, et al. “Conformal Pressure and Fast-Charging Li-Ion Batteries.” <i>Journal of The Electrochemical Society</i>, vol. 169, The Electrochemical Society, 2022, p. 040540, doi:<a href=\"https://doi.org/10.1149/1945-7111/ac653f\">10.1149/1945-7111/ac653f</a>.","apa":"Cao, C., Steinrück, H.-G., Paul, P. P., Dunlop, A. R., Trask, S. E., Jansen, A., Kasse, R. M., Thampy, V., Yusuf, M., Nelson Weker, J., Shyam, B., Subbaraman, R., Davis, K., Johnston, C. M., Takacs, C. J., &#38; Toney, M. (2022). Conformal Pressure and Fast-Charging Li-Ion Batteries. <i>Journal of The Electrochemical Society</i>, <i>169</i>, 040540. <a href=\"https://doi.org/10.1149/1945-7111/ac653f\">https://doi.org/10.1149/1945-7111/ac653f</a>"},"intvolume":"       169","page":"040540","year":"2022","publication_status":"published","publication_identifier":{"issn":["0013-4651","1945-7111"]},"language":[{"iso":"eng"}],"keyword":["Materials Chemistry","Electrochemistry","Surfaces","Coatings and Films","Condensed Matter Physics","Renewable Energy","Sustainability and the Environment","Electronic","Optical and Magnetic Materials"],"user_id":"84268","department":[{"_id":"633"}],"_id":"30920","status":"public","abstract":[{"text":"<jats:title>Abstract</jats:title>\r\n               <jats:p>Batteries capable of extreme fast-charging (XFC) are a necessity for the deployment of electric vehicles. Material properties of electrodes and electrolytes along with cell parameters such as stack pressure and temperature have coupled, synergistic, and sometimes deleterious effects on fast-charging performance. We develop a new experimental testbed that allows precise and conformal application of electrode stack pressure. We focus on cell capacity degradation using single-layer pouch cells with graphite anodes, LiNi0.5Mn0.3Co0.2O2 (NMC532) cathodes, and carbonate-based electrolyte. In the tested range (10 – 125 psi), cells cycled at higher pressure show higher capacity and less capacity fading. Additionally, Li plating decreases with increasing pressure as observed with scanning electron microscopy (SEM) and optical imaging. While the loss of Li inventory from Li plating is the largest contributor to capacity fade, electrochemical and SEM examination of the NMC cathodes after XFC experiments show increased secondary particle damage at lower pressure. We infer that the better performance at higher pressure is due to more homogenous reactions of active materials across the electrode and less polarization through the electrode thickness. Our study emphasizes the importance of electrode stack pressure in XFC batteries and highlights its subtle role in cell conditions.</jats:p>","lang":"eng"}],"type":"journal_article","publication":"Journal of The Electrochemical Society"},{"language":[{"iso":"eng"}],"article_number":"126756","keyword":["Materials Chemistry","Inorganic Chemistry","Condensed Matter Physics"],"user_id":"42514","department":[{"_id":"15"},{"_id":"230"}],"_id":"32108","status":"public","type":"journal_article","publication":"Journal of Crystal Growth","doi":"10.1016/j.jcrysgro.2022.126756","title":"Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates","date_created":"2022-06-23T06:17:32Z","author":[{"first_name":"T.","last_name":"Henksmeier","full_name":"Henksmeier, T."},{"first_name":"J.F.","last_name":"Schulz","full_name":"Schulz, J.F."},{"first_name":"E.","full_name":"Kluth, E.","last_name":"Kluth"},{"first_name":"M.","last_name":"Feneberg","full_name":"Feneberg, M."},{"full_name":"Goldhahn, R.","last_name":"Goldhahn","first_name":"R."},{"first_name":"A.M.","full_name":"Sanchez, A.M.","last_name":"Sanchez"},{"first_name":"M.","last_name":"Voigt","full_name":"Voigt, M."},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"last_name":"Reuter","id":"37763","full_name":"Reuter, Dirk","first_name":"Dirk"}],"volume":593,"publisher":"Elsevier BV","date_updated":"2022-06-23T06:18:32Z","citation":{"short":"T. Henksmeier, J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez, M. Voigt, G. Grundmeier, D. Reuter, Journal of Crystal Growth 593 (2022).","mla":"Henksmeier, T., et al. “Remote Epitaxy of InxGa1-XAs (0 0 1) on Graphene Covered GaAs(0 0 1) Substrates.” <i>Journal of Crystal Growth</i>, vol. 593, 126756, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">10.1016/j.jcrysgro.2022.126756</a>.","bibtex":"@article{Henksmeier_Schulz_Kluth_Feneberg_Goldhahn_Sanchez_Voigt_Grundmeier_Reuter_2022, title={Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates}, volume={593}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">10.1016/j.jcrysgro.2022.126756</a>}, number={126756}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Henksmeier, T. and Schulz, J.F. and Kluth, E. and Feneberg, M. and Goldhahn, R. and Sanchez, A.M. and Voigt, M. and Grundmeier, Guido and Reuter, Dirk}, year={2022} }","apa":"Henksmeier, T., Schulz, J. F., Kluth, E., Feneberg, M., Goldhahn, R., Sanchez, A. M., Voigt, M., Grundmeier, G., &#38; Reuter, D. (2022). Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates. <i>Journal of Crystal Growth</i>, <i>593</i>, Article 126756. <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">https://doi.org/10.1016/j.jcrysgro.2022.126756</a>","ama":"Henksmeier T, Schulz JF, Kluth E, et al. Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates. <i>Journal of Crystal Growth</i>. 2022;593. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">10.1016/j.jcrysgro.2022.126756</a>","ieee":"T. Henksmeier <i>et al.</i>, “Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates,” <i>Journal of Crystal Growth</i>, vol. 593, Art. no. 126756, 2022, doi: <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">10.1016/j.jcrysgro.2022.126756</a>.","chicago":"Henksmeier, T., J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez, M. Voigt, Guido Grundmeier, and Dirk Reuter. “Remote Epitaxy of InxGa1-XAs (0 0 1) on Graphene Covered GaAs(0 0 1) Substrates.” <i>Journal of Crystal Growth</i> 593 (2022). <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126756\">https://doi.org/10.1016/j.jcrysgro.2022.126756</a>."},"intvolume":"       593","year":"2022","publication_status":"published","publication_identifier":{"issn":["0022-0248"]}},{"doi":"10.1021/acs.langmuir.2c01016","title":"Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide","author":[{"last_name":"Yang","full_name":"Yang, Yu","first_name":"Yu"},{"first_name":"Jingyuan","full_name":"Huang, Jingyuan","last_name":"Huang"},{"first_name":"Daniel","last_name":"Dornbusch","full_name":"Dornbusch, Daniel"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"last_name":"Fahmy","full_name":"Fahmy, Karim","first_name":"Karim"},{"first_name":"Adrian","full_name":"Keller, Adrian","id":"48864","last_name":"Keller","orcid":"0000-0001-7139-3110"},{"full_name":"Cheung, David L.","last_name":"Cheung","first_name":"David L."}],"date_created":"2022-07-27T07:45:51Z","volume":38,"date_updated":"2022-08-08T06:39:04Z","publisher":"American Chemical Society (ACS)","citation":{"short":"Y. Yang, J. Huang, D. Dornbusch, G. Grundmeier, K. Fahmy, A. Keller, D.L. Cheung, Langmuir 38 (2022) 9257–9265.","bibtex":"@article{Yang_Huang_Dornbusch_Grundmeier_Fahmy_Keller_Cheung_2022, title={Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide}, volume={38}, DOI={<a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">10.1021/acs.langmuir.2c01016</a>}, journal={Langmuir}, publisher={American Chemical Society (ACS)}, author={Yang, Yu and Huang, Jingyuan and Dornbusch, Daniel and Grundmeier, Guido and Fahmy, Karim and Keller, Adrian and Cheung, David L.}, year={2022}, pages={9257–9265} }","mla":"Yang, Yu, et al. “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide.” <i>Langmuir</i>, vol. 38, American Chemical Society (ACS), 2022, pp. 9257–9265, doi:<a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">10.1021/acs.langmuir.2c01016</a>.","apa":"Yang, Y., Huang, J., Dornbusch, D., Grundmeier, G., Fahmy, K., Keller, A., &#38; Cheung, D. L. (2022). Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide. <i>Langmuir</i>, <i>38</i>, 9257–9265. <a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">https://doi.org/10.1021/acs.langmuir.2c01016</a>","chicago":"Yang, Yu, Jingyuan Huang, Daniel Dornbusch, Guido Grundmeier, Karim Fahmy, Adrian Keller, and David L. Cheung. “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide.” <i>Langmuir</i> 38 (2022): 9257–9265. <a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">https://doi.org/10.1021/acs.langmuir.2c01016</a>.","ieee":"Y. Yang <i>et al.</i>, “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide,” <i>Langmuir</i>, vol. 38, pp. 9257–9265, 2022, doi: <a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">10.1021/acs.langmuir.2c01016</a>.","ama":"Yang Y, Huang J, Dornbusch D, et al. Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide. <i>Langmuir</i>. 2022;38:9257–9265. doi:<a href=\"https://doi.org/10.1021/acs.langmuir.2c01016\">10.1021/acs.langmuir.2c01016</a>"},"intvolume":"        38","page":"9257–9265","year":"2022","publication_status":"published","publication_identifier":{"issn":["0743-7463","1520-5827"]},"language":[{"iso":"eng"}],"keyword":["Electrochemistry","Spectroscopy","Surfaces and Interfaces","Condensed Matter Physics","General Materials Science"],"user_id":"48864","department":[{"_id":"302"}],"_id":"32432","status":"public","type":"journal_article","publication":"Langmuir"},{"intvolume":"        24","citation":{"bibtex":"@article{Neuser_Kappe_Ostermeier_Krüger_Bobbert_Meschut_Schaper_Grydin_2022, title={Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting}, volume={24}, DOI={<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>}, number={102200874}, journal={Advanced Engineering Materials}, publisher={Wiley}, author={Neuser, Moritz and Kappe, Fabian and Ostermeier, Jakob and Krüger, Jan Tobias and Bobbert, Mathias and Meschut, Gerson and Schaper, Mirko and Grydin, Olexandr}, year={2022} }","short":"M. Neuser, F. Kappe, J. Ostermeier, J.T. Krüger, M. Bobbert, G. Meschut, M. Schaper, O. Grydin, Advanced Engineering Materials 24 (2022).","mla":"Neuser, Moritz, et al. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” <i>Advanced Engineering Materials</i>, vol. 24, no. 10, 2200874, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>.","apa":"Neuser, M., Kappe, F., Ostermeier, J., Krüger, J. T., Bobbert, M., Meschut, G., Schaper, M., &#38; Grydin, O. (2022). Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. <i>Advanced Engineering Materials</i>, <i>24</i>(10), Article 2200874. <a href=\"https://doi.org/10.1002/adem.202200874\">https://doi.org/10.1002/adem.202200874</a>","ieee":"M. Neuser <i>et al.</i>, “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting,” <i>Advanced Engineering Materials</i>, vol. 24, no. 10, Art. no. 2200874, 2022, doi: <a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>.","chicago":"Neuser, Moritz, Fabian Kappe, Jakob Ostermeier, Jan Tobias Krüger, Mathias Bobbert, Gerson Meschut, Mirko Schaper, and Olexandr Grydin. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” <i>Advanced Engineering Materials</i> 24, no. 10 (2022). <a href=\"https://doi.org/10.1002/adem.202200874\">https://doi.org/10.1002/adem.202200874</a>.","ama":"Neuser M, Kappe F, Ostermeier J, et al. Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. <i>Advanced Engineering Materials</i>. 2022;24(10). doi:<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>"},"year":"2022","issue":"10","publication_identifier":{"issn":["1438-1656","1527-2648"]},"publication_status":"published","doi":"10.1002/adem.202200874","title":"Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting","volume":24,"date_created":"2022-12-05T20:07:55Z","author":[{"last_name":"Neuser","full_name":"Neuser, Moritz","first_name":"Moritz"},{"full_name":"Kappe, Fabian","last_name":"Kappe","first_name":"Fabian"},{"last_name":"Ostermeier","full_name":"Ostermeier, Jakob","first_name":"Jakob"},{"first_name":"Jan Tobias","last_name":"Krüger","full_name":"Krüger, Jan Tobias"},{"last_name":"Bobbert","full_name":"Bobbert, Mathias","first_name":"Mathias"},{"full_name":"Meschut, Gerson","last_name":"Meschut","first_name":"Gerson"},{"full_name":"Schaper, Mirko","last_name":"Schaper","first_name":"Mirko"},{"first_name":"Olexandr","last_name":"Grydin","full_name":"Grydin, Olexandr"}],"publisher":"Wiley","date_updated":"2022-12-05T20:09:50Z","status":"public","abstract":[{"text":"AlSi casting alloys combine excellent castability with high strength. Hence, this group of alloys is often used in the automotive sector. The challenge for this application is the brittle character of these alloys which leads to cracks during joint formation when mechanical joining technologies are used. A rise in ductility can be achieved by a considerable increase in the solidification rate which results in grain refinement. High solidification rates can be realized in twin–roll casting (TRC) by water-cooled rolls. Therefore, a hypoeutectic EN AC–AlSi9 (for European Norm - aluminum cast product) is manufactured by the TRC process and analyzed. Subsequently, joining investigations are performed on castings in as-cast and heat-treated condition using the self-piercing riveting process considering the joint formation and the load-bearing capacity. Due to the fine microstructure, the crack initiation can be avoided during joining, while maintaining the joining parameters, especially by specimens in heat treatment conditions. Furthermore, due to the extremely fine microstructure, the load-bearing capacity of the joint can be significantly increased in terms of the maximum load-bearing force and the energy absorbed.","lang":"eng"}],"publication":"Advanced Engineering Materials","type":"journal_article","language":[{"iso":"eng"}],"keyword":["Condensed Matter Physics","General Materials Science"],"article_number":"2200874","user_id":"7850","_id":"34207","project":[{"grant_number":"418701707","name":"TRR 285: TRR 285","_id":"130"},{"name":"TRR 285 - A: TRR 285 - Project Area A","_id":"131"},{"name":"TRR 285 – A02: TRR 285 - Subproject A02","_id":"136"},{"_id":"133","name":"TRR 285 - C: TRR 285 - Project Area C"},{"_id":"146","name":"TRR 285 – C02: TRR 285 - Subproject C02"}]},{"doi":"10.1002/ppap.202100174","title":"Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS","volume":19,"author":[{"full_name":"Hoppe, Christian","id":"27401","last_name":"Hoppe","first_name":"Christian"},{"full_name":"Mitschker, Felix","last_name":"Mitschker","first_name":"Felix"},{"full_name":"Mai, Lukas","last_name":"Mai","first_name":"Lukas"},{"full_name":"Liedke, Maciej Oskar","last_name":"Liedke","first_name":"Maciej Oskar"},{"full_name":"Arcos, Teresa","last_name":"Arcos","first_name":"Teresa"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"},{"first_name":"Ahmed Gamal","full_name":"Attallah, Ahmed Gamal","last_name":"Attallah"},{"first_name":"Maik","full_name":"Butterling, Maik","last_name":"Butterling"},{"last_name":"Wagner","full_name":"Wagner, Andreas","first_name":"Andreas"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"}],"date_created":"2022-12-21T09:32:52Z","publisher":"Wiley","date_updated":"2022-12-21T09:33:14Z","intvolume":"        19","citation":{"apa":"Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., Arcos, T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &#38; Grundmeier, G. (2022). Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>, <i>19</i>(4), Article 2100174. <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>","short":"C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","mla":"Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, 2100174, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","bibtex":"@article{Hoppe_Mitschker_Mai_Liedke_Arcos_Awakowicz_Devi_Attallah_Butterling_Wagner_et al._2022, title={Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}, volume={19}, DOI={<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>}, number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and Arcos, Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }","ieee":"C. Hoppe <i>et al.</i>, “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS,” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, Art. no. 2100174, 2022, doi: <a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","chicago":"Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Teresa Arcos, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i> 19, no. 4 (2022). <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>.","ama":"Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>. 2022;19(4). doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>"},"year":"2022","issue":"4","publication_identifier":{"issn":["1612-8850","1612-8869"]},"publication_status":"published","language":[{"iso":"eng"}],"keyword":["Polymers and Plastics","Condensed Matter Physics"],"article_number":"2100174","department":[{"_id":"302"}],"user_id":"48864","_id":"34648","status":"public","publication":"Plasma Processes and Polymers","type":"journal_article"},{"publication_identifier":{"issn":["1612-8850","1612-8869"]},"publication_status":"published","intvolume":"        19","citation":{"apa":"Xie, X., de los Arcos, T., &#38; Grundmeier, G. (2022). Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. <i>Plasma Processes and Polymers</i>, <i>19</i>(11), Article 2200052. <a href=\"https://doi.org/10.1002/ppap.202200052\">https://doi.org/10.1002/ppap.202200052</a>","short":"X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","mla":"Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before and after Plasma Oxidation.” <i>Plasma Processes and Polymers</i>, vol. 19, no. 11, 2200052, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/ppap.202200052\">10.1002/ppap.202200052</a>.","bibtex":"@article{Xie_de los Arcos_Grundmeier_2022, title={Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation}, volume={19}, DOI={<a href=\"https://doi.org/10.1002/ppap.202200052\">10.1002/ppap.202200052</a>}, number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Xie, Xiaofan and de los Arcos, Teresa and Grundmeier, Guido}, year={2022} }","ama":"Xie X, de los Arcos T, Grundmeier G. Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. <i>Plasma Processes and Polymers</i>. 2022;19(11). doi:<a href=\"https://doi.org/10.1002/ppap.202200052\">10.1002/ppap.202200052</a>","chicago":"Xie, Xiaofan, Teresa de los Arcos, and Guido Grundmeier. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before and after Plasma Oxidation.” <i>Plasma Processes and Polymers</i> 19, no. 11 (2022). <a href=\"https://doi.org/10.1002/ppap.202200052\">https://doi.org/10.1002/ppap.202200052</a>.","ieee":"X. Xie, T. de los Arcos, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,” <i>Plasma Processes and Polymers</i>, vol. 19, no. 11, Art. no. 2200052, 2022, doi: <a href=\"https://doi.org/10.1002/ppap.202200052\">10.1002/ppap.202200052</a>."},"date_updated":"2022-12-21T09:34:05Z","volume":19,"author":[{"full_name":"Xie, Xiaofan","last_name":"Xie","first_name":"Xiaofan"},{"first_name":"Teresa","last_name":"de los Arcos","full_name":"de los Arcos, Teresa"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"}],"doi":"10.1002/ppap.202200052","type":"journal_article","status":"public","_id":"34650","department":[{"_id":"302"}],"user_id":"48864","article_number":"2200052","issue":"11","year":"2022","publisher":"Wiley","date_created":"2022-12-21T09:33:54Z","title":"Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation","publication":"Plasma Processes and Polymers","keyword":["Polymers and Plastics","Condensed Matter Physics"],"language":[{"iso":"eng"}]},{"user_id":"42514","department":[{"_id":"15"},{"_id":"230"}],"_id":"31241","language":[{"iso":"eng"}],"article_number":"126715","keyword":["Materials Chemistry","Inorganic Chemistry","Condensed Matter Physics"],"type":"journal_article","publication":"Journal of Crystal Growth","status":"public","date_created":"2022-05-13T06:11:50Z","author":[{"full_name":"Verma, A.K.","last_name":"Verma","first_name":"A.K."},{"full_name":"Bopp, F.","last_name":"Bopp","first_name":"F."},{"first_name":"J.J.","last_name":"Finley","full_name":"Finley, J.J."},{"first_name":"B.","last_name":"Jonas","full_name":"Jonas, B."},{"first_name":"A.","last_name":"Zrenner","full_name":"Zrenner, A."},{"full_name":"Reuter, Dirk","id":"37763","last_name":"Reuter","first_name":"Dirk"}],"date_updated":"2022-05-13T06:12:40Z","publisher":"Elsevier BV","doi":"10.1016/j.jcrysgro.2022.126715","title":"Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy","publication_status":"published","publication_identifier":{"issn":["0022-0248"]},"citation":{"ama":"Verma AK, Bopp F, Finley JJ, Jonas B, Zrenner A, Reuter D. Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy. <i>Journal of Crystal Growth</i>. Published online 2022. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">10.1016/j.jcrysgro.2022.126715</a>","ieee":"A. K. Verma, F. Bopp, J. J. Finley, B. Jonas, A. Zrenner, and D. Reuter, “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy,” <i>Journal of Crystal Growth</i>, Art. no. 126715, 2022, doi: <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">10.1016/j.jcrysgro.2022.126715</a>.","chicago":"Verma, A.K., F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, and Dirk Reuter. “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i>, 2022. <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">https://doi.org/10.1016/j.jcrysgro.2022.126715</a>.","apa":"Verma, A. K., Bopp, F., Finley, J. J., Jonas, B., Zrenner, A., &#38; Reuter, D. (2022). Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy. <i>Journal of Crystal Growth</i>, Article 126715. <a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">https://doi.org/10.1016/j.jcrysgro.2022.126715</a>","short":"A.K. Verma, F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, D. Reuter, Journal of Crystal Growth (2022).","bibtex":"@article{Verma_Bopp_Finley_Jonas_Zrenner_Reuter_2022, title={Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">10.1016/j.jcrysgro.2022.126715</a>}, number={126715}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Verma, A.K. and Bopp, F. and Finley, J.J. and Jonas, B. and Zrenner, A. and Reuter, Dirk}, year={2022} }","mla":"Verma, A. K., et al. “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i>, 126715, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2022.126715\">10.1016/j.jcrysgro.2022.126715</a>."},"year":"2022"},{"title":"Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling","doi":"10.1002/qute.202200049","publisher":"Wiley","date_updated":"2022-09-12T07:18:06Z","date_created":"2022-09-12T07:17:26Z","author":[{"first_name":"Frederik","full_name":"Bopp, Frederik","last_name":"Bopp"},{"first_name":"Jonathan","full_name":"Rojas, Jonathan","last_name":"Rojas"},{"first_name":"Natalia","full_name":"Revenga, Natalia","last_name":"Revenga"},{"first_name":"Hubert","full_name":"Riedl, Hubert","last_name":"Riedl"},{"last_name":"Sbresny","full_name":"Sbresny, Friedrich","first_name":"Friedrich"},{"first_name":"Katarina","full_name":"Boos, Katarina","last_name":"Boos"},{"last_name":"Simmet","full_name":"Simmet, Tobias","first_name":"Tobias"},{"first_name":"Arash","last_name":"Ahmadi","full_name":"Ahmadi, Arash"},{"first_name":"David","full_name":"Gershoni, David","last_name":"Gershoni"},{"first_name":"Jacek","full_name":"Kasprzak, Jacek","last_name":"Kasprzak"},{"full_name":"Ludwig, Arne","last_name":"Ludwig","first_name":"Arne"},{"first_name":"Stephan","last_name":"Reitzenstein","full_name":"Reitzenstein, Stephan"},{"first_name":"Andreas","last_name":"Wieck","full_name":"Wieck, Andreas"},{"id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter","first_name":"Dirk"},{"first_name":"Kai","full_name":"Müller, Kai","last_name":"Müller"},{"last_name":"Finley","full_name":"Finley, Jonathan J.","first_name":"Jonathan J."}],"year":"2022","citation":{"chicago":"Bopp, Frederik, Jonathan Rojas, Natalia Revenga, Hubert Riedl, Friedrich Sbresny, Katarina Boos, Tobias Simmet, et al. “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling.” <i>Advanced Quantum Technologies</i>, 2022. <a href=\"https://doi.org/10.1002/qute.202200049\">https://doi.org/10.1002/qute.202200049</a>.","ieee":"F. Bopp <i>et al.</i>, “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling,” <i>Advanced Quantum Technologies</i>, Art. no. 2200049, 2022, doi: <a href=\"https://doi.org/10.1002/qute.202200049\">10.1002/qute.202200049</a>.","ama":"Bopp F, Rojas J, Revenga N, et al. Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling. <i>Advanced Quantum Technologies</i>. Published online 2022. doi:<a href=\"https://doi.org/10.1002/qute.202200049\">10.1002/qute.202200049</a>","apa":"Bopp, F., Rojas, J., Revenga, N., Riedl, H., Sbresny, F., Boos, K., Simmet, T., Ahmadi, A., Gershoni, D., Kasprzak, J., Ludwig, A., Reitzenstein, S., Wieck, A., Reuter, D., Müller, K., &#38; Finley, J. J. (2022). Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling. <i>Advanced Quantum Technologies</i>, Article 2200049. <a href=\"https://doi.org/10.1002/qute.202200049\">https://doi.org/10.1002/qute.202200049</a>","bibtex":"@article{Bopp_Rojas_Revenga_Riedl_Sbresny_Boos_Simmet_Ahmadi_Gershoni_Kasprzak_et al._2022, title={Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling}, DOI={<a href=\"https://doi.org/10.1002/qute.202200049\">10.1002/qute.202200049</a>}, number={2200049}, journal={Advanced Quantum Technologies}, publisher={Wiley}, author={Bopp, Frederik and Rojas, Jonathan and Revenga, Natalia and Riedl, Hubert and Sbresny, Friedrich and Boos, Katarina and Simmet, Tobias and Ahmadi, Arash and Gershoni, David and Kasprzak, Jacek and et al.}, year={2022} }","short":"F. Bopp, J. Rojas, N. Revenga, H. Riedl, F. Sbresny, K. Boos, T. Simmet, A. Ahmadi, D. Gershoni, J. Kasprzak, A. Ludwig, S. Reitzenstein, A. Wieck, D. Reuter, K. Müller, J.J. Finley, Advanced Quantum Technologies (2022).","mla":"Bopp, Frederik, et al. “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling.” <i>Advanced Quantum Technologies</i>, 2200049, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/qute.202200049\">10.1002/qute.202200049</a>."},"publication_identifier":{"issn":["2511-9044","2511-9044"]},"publication_status":"published","keyword":["Electrical and Electronic Engineering","Computational Theory and Mathematics","Condensed Matter Physics","Mathematical Physics","Nuclear and High Energy Physics","Electronic","Optical and Magnetic Materials","Statistical and Nonlinear Physics"],"article_number":"2200049","language":[{"iso":"eng"}],"_id":"33332","department":[{"_id":"15"},{"_id":"230"}],"user_id":"42514","status":"public","publication":"Advanced Quantum Technologies","type":"journal_article"},{"publisher":"Wiley","date_updated":"2022-10-11T08:15:28Z","date_created":"2022-10-11T08:15:11Z","author":[{"first_name":"Mohammad","full_name":"Khazaei, Mohammad","last_name":"Khazaei"},{"first_name":"Ahmad","full_name":"Ranjbar, Ahmad","last_name":"Ranjbar"},{"first_name":"Yoon‐Gu","full_name":"Kang, Yoon‐Gu","last_name":"Kang"},{"last_name":"Liang","full_name":"Liang, Yunye","first_name":"Yunye"},{"full_name":"Khaledialidusti, Rasoul","last_name":"Khaledialidusti","first_name":"Rasoul"},{"last_name":"Bae","full_name":"Bae, Soungmin","first_name":"Soungmin"},{"first_name":"Hannes","last_name":"Raebiger","full_name":"Raebiger, Hannes"},{"last_name":"Wang","full_name":"Wang, Vei","first_name":"Vei"},{"last_name":"Han","full_name":"Han, Myung Joon","first_name":"Myung Joon"},{"full_name":"Mizoguchi, Hiroshi","last_name":"Mizoguchi","first_name":"Hiroshi"},{"first_name":"Mohammad S.","full_name":"Bahramy, Mohammad S.","last_name":"Bahramy"},{"first_name":"Thomas","full_name":"Kühne, Thomas","id":"49079","last_name":"Kühne"},{"first_name":"Rodion V.","last_name":"Belosludov","full_name":"Belosludov, Rodion V."},{"first_name":"Kaoru","last_name":"Ohno","full_name":"Ohno, Kaoru"},{"full_name":"Hosono, Hideo","last_name":"Hosono","first_name":"Hideo"}],"volume":32,"title":"Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators","doi":"10.1002/adfm.202110930","publication_status":"published","publication_identifier":{"issn":["1616-301X","1616-3028"]},"issue":"20","year":"2022","citation":{"bibtex":"@article{Khazaei_Ranjbar_Kang_Liang_Khaledialidusti_Bae_Raebiger_Wang_Han_Mizoguchi_et al._2022, title={Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators}, volume={32}, DOI={<a href=\"https://doi.org/10.1002/adfm.202110930\">10.1002/adfm.202110930</a>}, number={202110930}, journal={Advanced Functional Materials}, publisher={Wiley}, author={Khazaei, Mohammad and Ranjbar, Ahmad and Kang, Yoon‐Gu and Liang, Yunye and Khaledialidusti, Rasoul and Bae, Soungmin and Raebiger, Hannes and Wang, Vei and Han, Myung Joon and Mizoguchi, Hiroshi and et al.}, year={2022} }","short":"M. Khazaei, A. Ranjbar, Y. Kang, Y. Liang, R. Khaledialidusti, S. Bae, H. Raebiger, V. Wang, M.J. Han, H. Mizoguchi, M.S. Bahramy, T. Kühne, R.V. Belosludov, K. Ohno, H. Hosono, Advanced Functional Materials 32 (2022).","mla":"Khazaei, Mohammad, et al. “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators.” <i>Advanced Functional Materials</i>, vol. 32, no. 20, 2110930, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/adfm.202110930\">10.1002/adfm.202110930</a>.","apa":"Khazaei, M., Ranjbar, A., Kang, Y., Liang, Y., Khaledialidusti, R., Bae, S., Raebiger, H., Wang, V., Han, M. J., Mizoguchi, H., Bahramy, M. S., Kühne, T., Belosludov, R. V., Ohno, K., &#38; Hosono, H. (2022). Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators. <i>Advanced Functional Materials</i>, <i>32</i>(20), Article 2110930. <a href=\"https://doi.org/10.1002/adfm.202110930\">https://doi.org/10.1002/adfm.202110930</a>","ieee":"M. Khazaei <i>et al.</i>, “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators,” <i>Advanced Functional Materials</i>, vol. 32, no. 20, Art. no. 2110930, 2022, doi: <a href=\"https://doi.org/10.1002/adfm.202110930\">10.1002/adfm.202110930</a>.","chicago":"Khazaei, Mohammad, Ahmad Ranjbar, Yoon‐Gu Kang, Yunye Liang, Rasoul Khaledialidusti, Soungmin Bae, Hannes Raebiger, et al. “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators.” <i>Advanced Functional Materials</i> 32, no. 20 (2022). <a href=\"https://doi.org/10.1002/adfm.202110930\">https://doi.org/10.1002/adfm.202110930</a>.","ama":"Khazaei M, Ranjbar A, Kang Y, et al. Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators. <i>Advanced Functional Materials</i>. 2022;32(20). doi:<a href=\"https://doi.org/10.1002/adfm.202110930\">10.1002/adfm.202110930</a>"},"intvolume":"        32","_id":"33682","user_id":"71051","department":[{"_id":"613"}],"article_number":"2110930","keyword":["Electrochemistry","Condensed Matter Physics","Biomaterials","Electronic","Optical and Magnetic Materials"],"language":[{"iso":"eng"}],"type":"journal_article","publication":"Advanced Functional Materials","status":"public"},{"page":"580-614","intvolume":"        59","citation":{"apa":"Schneider, M., Bettge, D., Binder, M., Dollmeier, K., Dreyer, M., Hilgenberg, K., Klöden, B., Schlingmann, T., &#38; Schmidt, J. (2022). Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy. <i>Practical Metallography</i>, <i>59</i>(10), 580–614. <a href=\"https://doi.org/10.1515/pm-2022-1018\">https://doi.org/10.1515/pm-2022-1018</a>","mla":"Schneider, M., et al. “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.” <i>Practical Metallography</i>, vol. 59, no. 10, Walter de Gruyter GmbH, 2022, pp. 580–614, doi:<a href=\"https://doi.org/10.1515/pm-2022-1018\">10.1515/pm-2022-1018</a>.","bibtex":"@article{Schneider_Bettge_Binder_Dollmeier_Dreyer_Hilgenberg_Klöden_Schlingmann_Schmidt_2022, title={Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy}, volume={59}, DOI={<a href=\"https://doi.org/10.1515/pm-2022-1018\">10.1515/pm-2022-1018</a>}, number={10}, journal={Practical Metallography}, publisher={Walter de Gruyter GmbH}, author={Schneider, M. and Bettge, D. and Binder, M. and Dollmeier, K. and Dreyer, Malte and Hilgenberg, K. and Klöden, B. and Schlingmann, T. and Schmidt, J.}, year={2022}, pages={580–614} }","short":"M. Schneider, D. Bettge, M. Binder, K. Dollmeier, M. Dreyer, K. Hilgenberg, B. Klöden, T. Schlingmann, J. Schmidt, Practical Metallography 59 (2022) 580–614.","ieee":"M. Schneider <i>et al.</i>, “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy,” <i>Practical Metallography</i>, vol. 59, no. 10, pp. 580–614, 2022, doi: <a href=\"https://doi.org/10.1515/pm-2022-1018\">10.1515/pm-2022-1018</a>.","chicago":"Schneider, M., D. Bettge, M. Binder, K. Dollmeier, Malte Dreyer, K. Hilgenberg, B. Klöden, T. Schlingmann, and J. Schmidt. “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.” <i>Practical Metallography</i> 59, no. 10 (2022): 580–614. <a href=\"https://doi.org/10.1515/pm-2022-1018\">https://doi.org/10.1515/pm-2022-1018</a>.","ama":"Schneider M, Bettge D, Binder M, et al. Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy. <i>Practical Metallography</i>. 2022;59(10):580-614. doi:<a href=\"https://doi.org/10.1515/pm-2022-1018\">10.1515/pm-2022-1018</a>"},"year":"2022","issue":"10","publication_identifier":{"issn":["2195-8599","0032-678X"]},"publication_status":"published","doi":"10.1515/pm-2022-1018","title":"Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy","volume":59,"date_created":"2022-10-11T13:15:48Z","author":[{"first_name":"M.","last_name":"Schneider","full_name":"Schneider, M."},{"last_name":"Bettge","full_name":"Bettge, D.","first_name":"D."},{"first_name":"M.","last_name":"Binder","full_name":"Binder, M."},{"first_name":"K.","last_name":"Dollmeier","full_name":"Dollmeier, K."},{"full_name":"Dreyer, Malte","id":"66695","orcid":"0000-0001-9560-9510","last_name":"Dreyer","first_name":"Malte"},{"first_name":"K.","full_name":"Hilgenberg, K.","last_name":"Hilgenberg"},{"first_name":"B.","full_name":"Klöden, B.","last_name":"Klöden"},{"last_name":"Schlingmann","full_name":"Schlingmann, T.","first_name":"T."},{"full_name":"Schmidt, J.","last_name":"Schmidt","first_name":"J."}],"publisher":"Walter de Gruyter GmbH","date_updated":"2023-01-04T14:48:17Z","status":"public","abstract":[{"lang":"eng","text":"<jats:title>Abstract</jats:title>\r\n               <jats:p>The round robin test investigated the reliability users can expect for AlSi10Mg additive manufactured specimens by laser powder bed fusion through examining powder quality, process parameter, microstructure defects, strength and fatigue. Besides for one outlier, expected static material properties could be found. Optical microstructure inspection was beneficial to determine true porosity and porosity types to explain the occurring scatter in properties. Fractographic analyses reveal that the fatigue crack propagation starts at the rough as-built surface for all specimens. Statistical analysis of the scatter in fatigue using statistical derived safety factors concludes that at a stress of 36.87 MPa the fatigue limit of 10<jats:sup>7</jats:sup> cycles could be reached for all specimen with a survival probability of 99.999 %.</jats:p>"}],"publication":"Practical Metallography","type":"journal_article","language":[{"iso":"eng"}],"keyword":["Metals and Alloys","Mechanics of Materials","Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"user_id":"66695","_id":"33694"},{"_id":"35232","department":[{"_id":"15"}],"user_id":"77496","keyword":["Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"article_number":"2200508","language":[{"iso":"eng"}],"publication":"physica status solidi (b)","type":"journal_article","status":"public","publisher":"Wiley","date_updated":"2023-01-04T14:53:24Z","date_created":"2023-01-04T14:51:51Z","author":[{"first_name":"Falco","full_name":"Meier, Falco","last_name":"Meier"},{"full_name":"Littmann, Mario","last_name":"Littmann","first_name":"Mario"},{"first_name":"Julius","id":"46952","full_name":"Bürger, Julius","last_name":"Bürger"},{"first_name":"Thomas","last_name":"Riedl","id":"36950","full_name":"Riedl, Thomas"},{"first_name":"Daniel","last_name":"Kool","full_name":"Kool, Daniel","id":"44586"},{"first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner"},{"first_name":"Dirk","last_name":"Reuter","full_name":"Reuter, Dirk","id":"37763"},{"last_name":"As","orcid":"0000-0003-1121-3565","full_name":"As, Donat Josef","id":"14","first_name":"Donat Josef"}],"title":"Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks","doi":"10.1002/pssb.202200508","publication_identifier":{"issn":["0370-1972","1521-3951"]},"publication_status":"published","year":"2022","citation":{"ama":"Meier F, Littmann M, Bürger J, et al. Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. <i>physica status solidi (b)</i>. Published online 2022. doi:<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>","ieee":"F. Meier <i>et al.</i>, “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks,” <i>physica status solidi (b)</i>, Art. no. 2200508, 2022, doi: <a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>.","chicago":"Meier, Falco, Mario Littmann, Julius Bürger, Thomas Riedl, Daniel Kool, Jörg Lindner, Dirk Reuter, and Donat Josef As. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” <i>Physica Status Solidi (b)</i>, 2022. <a href=\"https://doi.org/10.1002/pssb.202200508\">https://doi.org/10.1002/pssb.202200508</a>.","bibtex":"@article{Meier_Littmann_Bürger_Riedl_Kool_Lindner_Reuter_As_2022, title={Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks}, DOI={<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>}, number={2200508}, journal={physica status solidi (b)}, publisher={Wiley}, author={Meier, Falco and Littmann, Mario and Bürger, Julius and Riedl, Thomas and Kool, Daniel and Lindner, Jörg and Reuter, Dirk and As, Donat Josef}, year={2022} }","mla":"Meier, Falco, et al. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” <i>Physica Status Solidi (b)</i>, 2200508, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>.","short":"F. Meier, M. Littmann, J. Bürger, T. Riedl, D. Kool, J. Lindner, D. Reuter, D.J. As, Physica Status Solidi (b) (2022).","apa":"Meier, F., Littmann, M., Bürger, J., Riedl, T., Kool, D., Lindner, J., Reuter, D., &#38; As, D. J. (2022). Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. <i>Physica Status Solidi (b)</i>, Article 2200508. <a href=\"https://doi.org/10.1002/pssb.202200508\">https://doi.org/10.1002/pssb.202200508</a>"}},{"publication_identifier":{"issn":["0953-2048","1361-6668"]},"publication_status":"published","intvolume":"        35","citation":{"bibtex":"@article{Protte_Verma_Höpker_Mirin_Woo Nam_Bartley_2022, title={Laser-lithographically written micron-wide superconducting nanowire single-photon detectors}, volume={35}, DOI={<a href=\"https://doi.org/10.1088/1361-6668/ac5338\">10.1088/1361-6668/ac5338</a>}, number={5055005}, journal={Superconductor Science and Technology}, publisher={IOP Publishing}, author={Protte, Maximilian and Verma, Varun B and Höpker, Jan Philipp and Mirin, Richard P and Woo Nam, Sae and Bartley, Tim}, year={2022} }","mla":"Protte, Maximilian, et al. “Laser-Lithographically Written Micron-Wide Superconducting Nanowire Single-Photon Detectors.” <i>Superconductor Science and Technology</i>, vol. 35, no. 5, 055005, IOP Publishing, 2022, doi:<a href=\"https://doi.org/10.1088/1361-6668/ac5338\">10.1088/1361-6668/ac5338</a>.","short":"M. Protte, V.B. Verma, J.P. Höpker, R.P. Mirin, S. Woo Nam, T. Bartley, Superconductor Science and Technology 35 (2022).","apa":"Protte, M., Verma, V. B., Höpker, J. P., Mirin, R. P., Woo Nam, S., &#38; Bartley, T. (2022). Laser-lithographically written micron-wide superconducting nanowire single-photon detectors. <i>Superconductor Science and Technology</i>, <i>35</i>(5), Article 055005. <a href=\"https://doi.org/10.1088/1361-6668/ac5338\">https://doi.org/10.1088/1361-6668/ac5338</a>","ama":"Protte M, Verma VB, Höpker JP, Mirin RP, Woo Nam S, Bartley T. Laser-lithographically written micron-wide superconducting nanowire single-photon detectors. <i>Superconductor Science and Technology</i>. 2022;35(5). doi:<a href=\"https://doi.org/10.1088/1361-6668/ac5338\">10.1088/1361-6668/ac5338</a>","chicago":"Protte, Maximilian, Varun B Verma, Jan Philipp Höpker, Richard P Mirin, Sae Woo Nam, and Tim Bartley. “Laser-Lithographically Written Micron-Wide Superconducting Nanowire Single-Photon Detectors.” <i>Superconductor Science and Technology</i> 35, no. 5 (2022). <a href=\"https://doi.org/10.1088/1361-6668/ac5338\">https://doi.org/10.1088/1361-6668/ac5338</a>.","ieee":"M. Protte, V. B. Verma, J. P. Höpker, R. P. Mirin, S. Woo Nam, and T. Bartley, “Laser-lithographically written micron-wide superconducting nanowire single-photon detectors,” <i>Superconductor Science and Technology</i>, vol. 35, no. 5, Art. no. 055005, 2022, doi: <a href=\"https://doi.org/10.1088/1361-6668/ac5338\">10.1088/1361-6668/ac5338</a>."},"volume":35,"author":[{"id":"46170","full_name":"Protte, Maximilian","last_name":"Protte","first_name":"Maximilian"},{"last_name":"Verma","full_name":"Verma, Varun B","first_name":"Varun B"},{"first_name":"Jan Philipp","id":"33913","full_name":"Höpker, Jan Philipp","last_name":"Höpker"},{"first_name":"Richard P","full_name":"Mirin, Richard P","last_name":"Mirin"},{"last_name":"Woo Nam","full_name":"Woo Nam, Sae","first_name":"Sae"},{"first_name":"Tim","full_name":"Bartley, Tim","id":"49683","last_name":"Bartley"}],"date_updated":"2023-01-12T13:02:52Z","doi":"10.1088/1361-6668/ac5338","type":"journal_article","status":"public","department":[{"_id":"15"},{"_id":"230"},{"_id":"623"}],"user_id":"33913","_id":"33671","article_number":"055005","issue":"5","year":"2022","date_created":"2022-10-11T07:14:11Z","publisher":"IOP Publishing","title":"Laser-lithographically written micron-wide superconducting nanowire single-photon detectors","publication":"Superconductor Science and Technology","abstract":[{"text":"<jats:title>Abstract</jats:title>\r\n               <jats:p>We demonstrate the fabrication of micron-wide tungsten silicide superconducting nanowire single-photon detectors on a silicon substrate using laser lithography. We show saturated internal detection efficiencies with wire widths ranging from 0.59 <jats:italic>µ</jats:italic>m to 1.43 <jats:italic>µ</jats:italic>m under illumination at 1550 nm. We demonstrate both straight wires, as well as meandered structures. Single-photon sensitivity is shown in devices up to 4 mm in length. Laser-lithographically written devices allow for fast and easy structuring of large areas while maintaining a saturated internal efficiency for wire widths around 1 <jats:italic>µ</jats:italic>m.</jats:p>","lang":"eng"}],"language":[{"iso":"eng"}],"keyword":["Materials Chemistry","Electrical and Electronic Engineering","Metals and Alloys","Condensed Matter Physics","Ceramics and Composites"]},{"_id":"36332","project":[{"_id":"136","name":"TRR 285 – A02: TRR 285 - Subproject A02"},{"_id":"131","name":"TRR 285 - A: TRR 285 - Project Area A"},{"_id":"133","name":"TRR 285 - C: TRR 285 - Project Area C"},{"_id":"146","name":"TRR 285 – C02: TRR 285 - Subproject C02"}],"department":[{"_id":"158"},{"_id":"157"},{"_id":"321"}],"user_id":"32340","article_number":"2200874","article_type":"original","type":"journal_article","status":"public","date_updated":"2024-03-14T15:22:33Z","oa":"1","volume":24,"author":[{"first_name":"Moritz","last_name":"Neuser","full_name":"Neuser, Moritz","id":"32340"},{"first_name":"Fabian","id":"66459","full_name":"Kappe, Fabian","last_name":"Kappe"},{"full_name":"Ostermeier, Jakob","last_name":"Ostermeier","first_name":"Jakob"},{"first_name":"Jan Tobias","full_name":"Krüger, Jan Tobias","id":"44307","orcid":"0000-0002-0827-9654","last_name":"Krüger"},{"first_name":"Mathias","last_name":"Bobbert","full_name":"Bobbert, Mathias","id":"7850"},{"first_name":"Gerson","last_name":"Meschut","orcid":"0000-0002-2763-1246","id":"32056","full_name":"Meschut, Gerson"},{"id":"43720","full_name":"Schaper, Mirko","last_name":"Schaper","first_name":"Mirko"},{"first_name":"Olexandr","id":"43822","full_name":"Grydin, Olexandr","last_name":"Grydin"}],"doi":"10.1002/adem.202200874","main_file_link":[{"url":"https://onlinelibrary.wiley.com/doi/full/10.1002/adem.202200874","open_access":"1"}],"publication_identifier":{"issn":["1438-1656","1527-2648"]},"publication_status":"published","intvolume":"        24","citation":{"bibtex":"@article{Neuser_Kappe_Ostermeier_Krüger_Bobbert_Meschut_Schaper_Grydin_2022, title={Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting}, volume={24}, DOI={<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>}, number={102200874}, journal={Advanced Engineering Materials}, publisher={Wiley}, author={Neuser, Moritz and Kappe, Fabian and Ostermeier, Jakob and Krüger, Jan Tobias and Bobbert, Mathias and Meschut, Gerson and Schaper, Mirko and Grydin, Olexandr}, year={2022} }","short":"M. Neuser, F. Kappe, J. Ostermeier, J.T. Krüger, M. Bobbert, G. Meschut, M. Schaper, O. Grydin, Advanced Engineering Materials 24 (2022).","mla":"Neuser, Moritz, et al. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” <i>Advanced Engineering Materials</i>, vol. 24, no. 10, 2200874, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>.","apa":"Neuser, M., Kappe, F., Ostermeier, J., Krüger, J. T., Bobbert, M., Meschut, G., Schaper, M., &#38; Grydin, O. (2022). Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. <i>Advanced Engineering Materials</i>, <i>24</i>(10), Article 2200874. <a href=\"https://doi.org/10.1002/adem.202200874\">https://doi.org/10.1002/adem.202200874</a>","ama":"Neuser M, Kappe F, Ostermeier J, et al. Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. <i>Advanced Engineering Materials</i>. 2022;24(10). doi:<a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>","chicago":"Neuser, Moritz, Fabian Kappe, Jakob Ostermeier, Jan Tobias Krüger, Mathias Bobbert, Gerson Meschut, Mirko Schaper, and Olexandr Grydin. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” <i>Advanced Engineering Materials</i> 24, no. 10 (2022). <a href=\"https://doi.org/10.1002/adem.202200874\">https://doi.org/10.1002/adem.202200874</a>.","ieee":"M. Neuser <i>et al.</i>, “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting,” <i>Advanced Engineering Materials</i>, vol. 24, no. 10, Art. no. 2200874, 2022, doi: <a href=\"https://doi.org/10.1002/adem.202200874\">10.1002/adem.202200874</a>."},"keyword":["Condensed Matter Physics","General Materials Science"],"language":[{"iso":"eng"}],"publication":"Advanced Engineering Materials","abstract":[{"lang":"eng","text":"AlSi casting alloys combine excellent castability with high strength. Hence, this group of alloys is often used in the automotive sector. The challenge for this application is the brittle character of these alloys which leads to cracks during joint formation when mechanical joining technologies are used. A rise in ductility can be achieved by a considerable increase in the solidification rate which results in grain refinement. High solidification rates can be realized in twin–roll casting (TRC) by water-cooled rolls. Therefore, a hypoeutectic EN AC–AlSi9 (for European Norm - aluminum cast product) is manufactured by the TRC process and analyzed. Subsequently, joining investigations are performed on castings in as-cast and heat-treated condition using the self-piercing riveting process considering the joint formation and the load-bearing capacity. Due to the fine microstructure, the crack initiation can be avoided during joining, while maintaining the joining parameters, especially by specimens in heat treatment conditions. Furthermore, due to the extremely fine microstructure, the load-bearing capacity of the joint can be significantly increased in terms of the maximum load-bearing force and the energy absorbed."}],"publisher":"Wiley","date_created":"2023-01-12T09:33:55Z","title":"Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting","quality_controlled":"1","issue":"10","year":"2022"},{"status":"public","type":"journal_article","extern":"1","user_id":"94562","department":[{"_id":"728"}],"_id":"53084","citation":{"ama":"Grimm S, Baik S-J, Hemberger P, Kasper T, Kempf AM, Atakan B. Insights into the decomposition of zirconium acetylacetonate using synchrotron radiation: Routes to the formation of volatile Zr-intermediates. <i>Journal of Materials Research</i>. 2022;37(9):1558-1575. doi:<a href=\"https://doi.org/10.1557/s43578-022-00566-6\">10.1557/s43578-022-00566-6</a>","chicago":"Grimm, Sebastian, Seung-Jin Baik, Patrick Hemberger, Tina Kasper, Andreas M. Kempf, and Burak Atakan. “Insights into the Decomposition of Zirconium Acetylacetonate Using Synchrotron Radiation: Routes to the Formation of Volatile Zr-Intermediates.” <i>Journal of Materials Research</i> 37, no. 9 (2022): 1558–75. <a href=\"https://doi.org/10.1557/s43578-022-00566-6\">https://doi.org/10.1557/s43578-022-00566-6</a>.","ieee":"S. Grimm, S.-J. Baik, P. Hemberger, T. Kasper, A. M. Kempf, and B. Atakan, “Insights into the decomposition of zirconium acetylacetonate using synchrotron radiation: Routes to the formation of volatile Zr-intermediates,” <i>Journal of Materials Research</i>, vol. 37, no. 9, pp. 1558–1575, 2022, doi: <a href=\"https://doi.org/10.1557/s43578-022-00566-6\">10.1557/s43578-022-00566-6</a>.","short":"S. Grimm, S.-J. Baik, P. Hemberger, T. Kasper, A.M. Kempf, B. Atakan, Journal of Materials Research 37 (2022) 1558–1575.","mla":"Grimm, Sebastian, et al. “Insights into the Decomposition of Zirconium Acetylacetonate Using Synchrotron Radiation: Routes to the Formation of Volatile Zr-Intermediates.” <i>Journal of Materials Research</i>, vol. 37, no. 9, Springer Science and Business Media LLC, 2022, pp. 1558–75, doi:<a href=\"https://doi.org/10.1557/s43578-022-00566-6\">10.1557/s43578-022-00566-6</a>.","bibtex":"@article{Grimm_Baik_Hemberger_Kasper_Kempf_Atakan_2022, title={Insights into the decomposition of zirconium acetylacetonate using synchrotron radiation: Routes to the formation of volatile Zr-intermediates}, volume={37}, DOI={<a href=\"https://doi.org/10.1557/s43578-022-00566-6\">10.1557/s43578-022-00566-6</a>}, number={9}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Grimm, Sebastian and Baik, Seung-Jin and Hemberger, Patrick and Kasper, Tina and Kempf, Andreas M. and Atakan, Burak}, year={2022}, pages={1558–1575} }","apa":"Grimm, S., Baik, S.-J., Hemberger, P., Kasper, T., Kempf, A. M., &#38; Atakan, B. (2022). Insights into the decomposition of zirconium acetylacetonate using synchrotron radiation: Routes to the formation of volatile Zr-intermediates. <i>Journal of Materials Research</i>, <i>37</i>(9), 1558–1575. <a href=\"https://doi.org/10.1557/s43578-022-00566-6\">https://doi.org/10.1557/s43578-022-00566-6</a>"},"page":"1558-1575","intvolume":"        37","publication_status":"published","publication_identifier":{"issn":["0884-2914","2044-5326"]},"doi":"10.1557/s43578-022-00566-6","author":[{"full_name":"Grimm, Sebastian","last_name":"Grimm","first_name":"Sebastian"},{"full_name":"Baik, Seung-Jin","last_name":"Baik","first_name":"Seung-Jin"},{"last_name":"Hemberger","full_name":"Hemberger, Patrick","first_name":"Patrick"},{"first_name":"Tina","orcid":"0000-0003-3993-5316 ","last_name":"Kasper","full_name":"Kasper, Tina","id":"94562"},{"full_name":"Kempf, Andreas M.","last_name":"Kempf","first_name":"Andreas M."},{"last_name":"Atakan","full_name":"Atakan, Burak","first_name":"Burak"}],"volume":37,"date_updated":"2024-03-27T17:49:03Z","abstract":[{"lang":"eng","text":"<jats:title>Abstract</jats:title><jats:p>The thermal decomposition of Zr(acac)<jats:sub>4</jats:sub> is studied in a SiC-microreactor on the micro-second time scale. By utilizing synchrotron radiation and photoelectron photoion coincidence spectroscopy, six important zirconium intermediates, as for instance Zr(C<jats:sub>5</jats:sub>H<jats:sub>7</jats:sub>O<jats:sub>2</jats:sub>)<jats:sub>2</jats:sub>(C<jats:sub>5</jats:sub>H<jats:sub>6</jats:sub>O<jats:sub>2</jats:sub>), and Zr(C<jats:sub>5</jats:sub>H<jats:sub>6</jats:sub>O<jats:sub>2</jats:sub>)<jats:sub>2</jats:sub>, are identified in the gas phase for the first time. The adiabatic ionization thresholds of intermediately formed zirconium species are estimated and the main products of their thermal decomposition, acetylacetone, acetylallene and acetone are characterized unambiguously and isomer-selectively. Based on all detected intermediates, we deduce the predominant pyrolysis pathways of the precursor in the temperature range from 400 to 900 K. Our findings are complemented by numerical simulations of the flow field in the microreactor, which show that the choice of dilution gas significantly influences the temperature profile and residence times in the microreactor, such that helium provides a more uniform flow field than argon and should preferentially be used.</jats:p>\r\n                <jats:p><jats:bold>Graphical abstract</jats:bold></jats:p>\r\n                <jats:p>Using a soft ionization method coupled to velocity map imaging (VMI), leads to valuable insights in the thermal decomposition of Zr(C<jats:sub>5</jats:sub>H<jats:sub>7</jats:sub>O<jats:sub>2</jats:sub>)<jats:sub>4</jats:sub>, used in the synthesis of functional nanomaterials and ceramic coatings. Thanks to the use of a microreactor, important gas</jats:p>"}],"publication":"Journal of Materials Research","language":[{"iso":"eng"}],"keyword":["Mechanical Engineering","Mechanics of Materials","Condensed Matter Physics","General Materials Science"],"year":"2022","issue":"9","title":"Insights into the decomposition of zirconium acetylacetonate using synchrotron radiation: Routes to the formation of volatile Zr-intermediates","date_created":"2024-03-27T17:48:20Z","publisher":"Springer Science and Business Media LLC"},{"extern":"1","user_id":"101499","_id":"47552","status":"public","type":"journal_article","doi":"10.1016/j.ijhydene.2022.12.122","author":[{"last_name":"Herrmann","full_name":"Herrmann, Felix","first_name":"Felix"},{"first_name":"Marcus","last_name":"Grünewald","full_name":"Grünewald, Marcus"},{"last_name":"Riese","orcid":"0000-0002-3053-0534","id":"101499","full_name":"Riese, Julia","first_name":"Julia"}],"volume":48,"date_updated":"2024-03-28T13:39:32Z","citation":{"ama":"Herrmann F, Grünewald M, Riese J. Model-based design of a segmented reactor for the flexible operation of the methanation of CO2. <i>International Journal of Hydrogen Energy</i>. 2022;48(25):9377-9389. doi:<a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">10.1016/j.ijhydene.2022.12.122</a>","ieee":"F. Herrmann, M. Grünewald, and J. Riese, “Model-based design of a segmented reactor for the flexible operation of the methanation of CO2,” <i>International Journal of Hydrogen Energy</i>, vol. 48, no. 25, pp. 9377–9389, 2022, doi: <a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">10.1016/j.ijhydene.2022.12.122</a>.","chicago":"Herrmann, Felix, Marcus Grünewald, and Julia Riese. “Model-Based Design of a Segmented Reactor for the Flexible Operation of the Methanation of CO2.” <i>International Journal of Hydrogen Energy</i> 48, no. 25 (2022): 9377–89. <a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">https://doi.org/10.1016/j.ijhydene.2022.12.122</a>.","mla":"Herrmann, Felix, et al. “Model-Based Design of a Segmented Reactor for the Flexible Operation of the Methanation of CO2.” <i>International Journal of Hydrogen Energy</i>, vol. 48, no. 25, Elsevier BV, 2022, pp. 9377–89, doi:<a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">10.1016/j.ijhydene.2022.12.122</a>.","short":"F. Herrmann, M. Grünewald, J. Riese, International Journal of Hydrogen Energy 48 (2022) 9377–9389.","bibtex":"@article{Herrmann_Grünewald_Riese_2022, title={Model-based design of a segmented reactor for the flexible operation of the methanation of CO2}, volume={48}, DOI={<a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">10.1016/j.ijhydene.2022.12.122</a>}, number={25}, journal={International Journal of Hydrogen Energy}, publisher={Elsevier BV}, author={Herrmann, Felix and Grünewald, Marcus and Riese, Julia}, year={2022}, pages={9377–9389} }","apa":"Herrmann, F., Grünewald, M., &#38; Riese, J. (2022). Model-based design of a segmented reactor for the flexible operation of the methanation of CO2. <i>International Journal of Hydrogen Energy</i>, <i>48</i>(25), 9377–9389. <a href=\"https://doi.org/10.1016/j.ijhydene.2022.12.122\">https://doi.org/10.1016/j.ijhydene.2022.12.122</a>"},"page":"9377-9389","intvolume":"        48","publication_status":"published","publication_identifier":{"issn":["0360-3199"]},"language":[{"iso":"eng"}],"keyword":["Energy Engineering and Power Technology","Condensed Matter Physics","Fuel Technology","Renewable Energy","Sustainability and the Environment"],"publication":"International Journal of Hydrogen Energy","title":"Model-based design of a segmented reactor for the flexible operation of the methanation of CO2","date_created":"2023-10-04T14:12:06Z","publisher":"Elsevier BV","year":"2022","issue":"25","quality_controlled":"1"},{"language":[{"iso":"eng"}],"article_number":"155355","keyword":["Surfaces","Coatings and Films","Condensed Matter Physics","Surfaces and Interfaces","General Physics and Astronomy","General Chemistry"],"user_id":"48864","department":[{"_id":"302"}],"_id":"36874","status":"public","type":"journal_article","publication":"Applied Surface Science","doi":"10.1016/j.apsusc.2022.155355","title":"Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces","date_created":"2023-01-16T08:57:02Z","author":[{"first_name":"Jiangling","full_name":"Su, Jiangling","last_name":"Su"},{"first_name":"Alejandro","full_name":"González Orive, Alejandro","last_name":"González Orive"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"}],"volume":609,"date_updated":"2023-01-16T08:57:20Z","publisher":"Elsevier BV","citation":{"chicago":"Su, Jiangling, Alejandro González Orive, and Guido Grundmeier. “Nano-FTIR and Chemical Force Analysis of Electrografted Aryldiazonium Salts on ODT-Microcontact Printed Au-Surfaces.” <i>Applied Surface Science</i> 609 (2022). <a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">https://doi.org/10.1016/j.apsusc.2022.155355</a>.","ieee":"J. Su, A. González Orive, and G. Grundmeier, “Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces,” <i>Applied Surface Science</i>, vol. 609, Art. no. 155355, 2022, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">10.1016/j.apsusc.2022.155355</a>.","ama":"Su J, González Orive A, Grundmeier G. Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces. <i>Applied Surface Science</i>. 2022;609. doi:<a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">10.1016/j.apsusc.2022.155355</a>","apa":"Su, J., González Orive, A., &#38; Grundmeier, G. (2022). Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces. <i>Applied Surface Science</i>, <i>609</i>, Article 155355. <a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">https://doi.org/10.1016/j.apsusc.2022.155355</a>","mla":"Su, Jiangling, et al. “Nano-FTIR and Chemical Force Analysis of Electrografted Aryldiazonium Salts on ODT-Microcontact Printed Au-Surfaces.” <i>Applied Surface Science</i>, vol. 609, 155355, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">10.1016/j.apsusc.2022.155355</a>.","bibtex":"@article{Su_González Orive_Grundmeier_2022, title={Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces}, volume={609}, DOI={<a href=\"https://doi.org/10.1016/j.apsusc.2022.155355\">10.1016/j.apsusc.2022.155355</a>}, number={155355}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Su, Jiangling and González Orive, Alejandro and Grundmeier, Guido}, year={2022} }","short":"J. Su, A. González Orive, G. Grundmeier, Applied Surface Science 609 (2022)."},"intvolume":"       609","year":"2022","publication_status":"published","publication_identifier":{"issn":["0169-4332"]}},{"citation":{"apa":"Bobzin, K., Kalscheuer, C., Grundmeier, G., de los Arcos, T., Kollmann, S., &#38; Carlet, M. (2022). Oxidation stability of chromium aluminum oxynitride hard coatings. <i>Surface and Coatings Technology</i>, <i>449</i>, Article 128927. <a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">https://doi.org/10.1016/j.surfcoat.2022.128927</a>","short":"K. Bobzin, C. Kalscheuer, G. Grundmeier, T. de los Arcos, S. Kollmann, M. Carlet, Surface and Coatings Technology 449 (2022).","mla":"Bobzin, K., et al. “Oxidation Stability of Chromium Aluminum Oxynitride Hard Coatings.” <i>Surface and Coatings Technology</i>, vol. 449, 128927, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>.","bibtex":"@article{Bobzin_Kalscheuer_Grundmeier_de los Arcos_Kollmann_Carlet_2022, title={Oxidation stability of chromium aluminum oxynitride hard coatings}, volume={449}, DOI={<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>}, number={128927}, journal={Surface and Coatings Technology}, publisher={Elsevier BV}, author={Bobzin, K. and Kalscheuer, C. and Grundmeier, Guido and de los Arcos, T. and Kollmann, S. and Carlet, M.}, year={2022} }","ama":"Bobzin K, Kalscheuer C, Grundmeier G, de los Arcos T, Kollmann S, Carlet M. Oxidation stability of chromium aluminum oxynitride hard coatings. <i>Surface and Coatings Technology</i>. 2022;449. doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>","ieee":"K. Bobzin, C. Kalscheuer, G. Grundmeier, T. de los Arcos, S. Kollmann, and M. Carlet, “Oxidation stability of chromium aluminum oxynitride hard coatings,” <i>Surface and Coatings Technology</i>, vol. 449, Art. no. 128927, 2022, doi: <a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>.","chicago":"Bobzin, K., C. Kalscheuer, Guido Grundmeier, T. de los Arcos, S. Kollmann, and M. Carlet. “Oxidation Stability of Chromium Aluminum Oxynitride Hard Coatings.” <i>Surface and Coatings Technology</i> 449 (2022). <a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">https://doi.org/10.1016/j.surfcoat.2022.128927</a>."},"intvolume":"       449","year":"2022","publication_status":"published","publication_identifier":{"issn":["0257-8972"]},"doi":"10.1016/j.surfcoat.2022.128927","title":"Oxidation stability of chromium aluminum oxynitride hard coatings","author":[{"first_name":"K.","last_name":"Bobzin","full_name":"Bobzin, K."},{"full_name":"Kalscheuer, C.","last_name":"Kalscheuer","first_name":"C."},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"last_name":"de los Arcos","full_name":"de los Arcos, T.","first_name":"T."},{"first_name":"S.","full_name":"Kollmann, S.","last_name":"Kollmann"},{"full_name":"Carlet, M.","last_name":"Carlet","first_name":"M."}],"date_created":"2023-01-16T08:55:49Z","volume":449,"date_updated":"2023-01-16T08:56:13Z","publisher":"Elsevier BV","status":"public","type":"journal_article","publication":"Surface and Coatings Technology","language":[{"iso":"eng"}],"article_number":"128927","keyword":["Materials Chemistry","Surfaces","Coatings and Films","Surfaces and Interfaces","Condensed Matter Physics","General Chemistry"],"user_id":"48864","department":[{"_id":"302"}],"_id":"36872"},{"_id":"35977","user_id":"54556","department":[{"_id":"302"}],"article_number":"2100174","keyword":["Polymers and Plastics","Condensed Matter Physics"],"language":[{"iso":"eng"}],"type":"journal_article","publication":"Plasma Processes and Polymers","status":"public","publisher":"Wiley","date_updated":"2023-01-24T08:07:46Z","date_created":"2023-01-11T10:10:09Z","author":[{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"first_name":"Felix","full_name":"Mitschker, Felix","last_name":"Mitschker"},{"first_name":"Lukas","full_name":"Mai, Lukas","last_name":"Mai"},{"full_name":"Liedke, Maciej Oskar","last_name":"Liedke","first_name":"Maciej Oskar"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"},{"last_name":"Attallah","full_name":"Attallah, Ahmed Gamal","first_name":"Ahmed Gamal"},{"first_name":"Maik","full_name":"Butterling, Maik","last_name":"Butterling"},{"full_name":"Wagner, Andreas","last_name":"Wagner","first_name":"Andreas"},{"first_name":"Guido","full_name":"Grundmeier, Guido","last_name":"Grundmeier"}],"volume":19,"title":"Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS","doi":"10.1002/ppap.202100174","publication_status":"published","publication_identifier":{"issn":["1612-8850","1612-8869"]},"issue":"4","year":"2022","citation":{"mla":"Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, 2100174, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","short":"C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","bibtex":"@article{Hoppe_Mitschker_Mai_Liedke_de los Arcos de Pedro_Awakowicz_Devi_Attallah_Butterling_Wagner_et al._2022, title={Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}, volume={19}, DOI={<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>}, number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }","apa":"Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., de los Arcos de Pedro, M. T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &#38; Grundmeier, G. (2022). Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>, <i>19</i>(4), Article 2100174. <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>","ieee":"C. Hoppe <i>et al.</i>, “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS,” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, Art. no. 2100174, 2022, doi: <a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","chicago":"Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Maria Teresa de los Arcos de Pedro, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i> 19, no. 4 (2022). <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>.","ama":"Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>. 2022;19(4). doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>"},"intvolume":"        19"}]