---
_id: '52802'
abstract:
- lang: eng
text: AbstractCurrently, the fused deposition modeling
(FDM) process is the most common additive manufacturing technology. The principle
of the FDM process is the strand wise deposition of molten thermoplastic polymers,
by feeding a filament trough a heated nozzle. Due to the strand and layer wise
deposition the cooling of the manufactured component is not uniform. This leads
to dimensional deviations which may cause the component to be unusable for the
desired application. In this paper, a method is described which is based on the
shrinkage compensation through the adaption of every single raster line in components
manufactured with the FDM process. The shrinkage compensation is based on a model
resulting from a DOE which considers the main influencing factors on the shrinkage
behavior of raster lines in the FDM process. An in‐house developed software analyzes
the component and locally applies the shrinkage compensation with consideration
of the boundary conditions, e.g., the position of the raster line in the component
and the process parameters. Following, a validation using a simple geometry is
conducted to show the effect of the presented adaptive scaling method.
author:
- first_name: Elmar
full_name: Moritzer, Elmar
id: '20531'
last_name: Moritzer
- first_name: Felix
full_name: Hecker, Felix
id: '45537'
last_name: Hecker
citation:
ama: Moritzer E, Hecker F. Adaptive Scaling of Components in the Fused Deposition
Modeling Process. Macromolecular Symposia. 2023;411(1). doi:10.1002/masy.202200181
apa: Moritzer, E., & Hecker, F. (2023). Adaptive Scaling of Components in the
Fused Deposition Modeling Process. Macromolecular Symposia, 411(1).
https://doi.org/10.1002/masy.202200181
bibtex: '@article{Moritzer_Hecker_2023, title={Adaptive Scaling of Components in
the Fused Deposition Modeling Process}, volume={411}, DOI={10.1002/masy.202200181},
number={1}, journal={Macromolecular Symposia}, publisher={Wiley}, author={Moritzer,
Elmar and Hecker, Felix}, year={2023} }'
chicago: Moritzer, Elmar, and Felix Hecker. “Adaptive Scaling of Components in the
Fused Deposition Modeling Process.” Macromolecular Symposia 411, no. 1
(2023). https://doi.org/10.1002/masy.202200181.
ieee: 'E. Moritzer and F. Hecker, “Adaptive Scaling of Components in the Fused Deposition
Modeling Process,” Macromolecular Symposia, vol. 411, no. 1, 2023, doi:
10.1002/masy.202200181.'
mla: Moritzer, Elmar, and Felix Hecker. “Adaptive Scaling of Components in the Fused
Deposition Modeling Process.” Macromolecular Symposia, vol. 411, no. 1,
Wiley, 2023, doi:10.1002/masy.202200181.
short: E. Moritzer, F. Hecker, Macromolecular Symposia 411 (2023).
date_created: 2024-03-25T09:16:46Z
date_updated: 2024-03-25T09:17:03Z
department:
- _id: '9'
- _id: '367'
- _id: '321'
doi: 10.1002/masy.202200181
intvolume: ' 411'
issue: '1'
keyword:
- Materials Chemistry
- Polymers and Plastics
- Organic Chemistry
- Condensed Matter Physics
language:
- iso: eng
publication: Macromolecular Symposia
publication_identifier:
issn:
- 1022-1360
- 1521-3900
publication_status: published
publisher: Wiley
quality_controlled: '1'
status: public
title: Adaptive Scaling of Components in the Fused Deposition Modeling Process
type: journal_article
user_id: '44116'
volume: 411
year: '2023'
...
---
_id: '29809'
article_number: '142780'
author:
- first_name: A.
full_name: Reitz, A.
last_name: Reitz
- first_name: O.
full_name: Grydin, O.
last_name: Grydin
- first_name: M.
full_name: Schaper, M.
last_name: Schaper
citation:
ama: 'Reitz A, Grydin O, Schaper M. Influence of thermomechanical processing on
the microstructural and mechanical properties of steel 22MnB5. Materials Science
and Engineering: A. 2022;838. doi:10.1016/j.msea.2022.142780'
apa: 'Reitz, A., Grydin, O., & Schaper, M. (2022). Influence of thermomechanical
processing on the microstructural and mechanical properties of steel 22MnB5. Materials
Science and Engineering: A, 838, Article 142780. https://doi.org/10.1016/j.msea.2022.142780'
bibtex: '@article{Reitz_Grydin_Schaper_2022, title={Influence of thermomechanical
processing on the microstructural and mechanical properties of steel 22MnB5},
volume={838}, DOI={10.1016/j.msea.2022.142780},
number={142780}, journal={Materials Science and Engineering: A}, publisher={Elsevier
BV}, author={Reitz, A. and Grydin, O. and Schaper, M.}, year={2022} }'
chicago: 'Reitz, A., O. Grydin, and M. Schaper. “Influence of Thermomechanical Processing
on the Microstructural and Mechanical Properties of Steel 22MnB5.” Materials
Science and Engineering: A 838 (2022). https://doi.org/10.1016/j.msea.2022.142780.'
ieee: 'A. Reitz, O. Grydin, and M. Schaper, “Influence of thermomechanical processing
on the microstructural and mechanical properties of steel 22MnB5,” Materials
Science and Engineering: A, vol. 838, Art. no. 142780, 2022, doi: 10.1016/j.msea.2022.142780.'
mla: 'Reitz, A., et al. “Influence of Thermomechanical Processing on the Microstructural
and Mechanical Properties of Steel 22MnB5.” Materials Science and Engineering:
A, vol. 838, 142780, Elsevier BV, 2022, doi:10.1016/j.msea.2022.142780.'
short: 'A. Reitz, O. Grydin, M. Schaper, Materials Science and Engineering: A 838
(2022).'
date_created: 2022-02-11T17:17:40Z
date_updated: 2022-02-11T17:24:05Z
doi: 10.1016/j.msea.2022.142780
intvolume: ' 838'
keyword:
- Mechanical Engineering
- Mechanics of Materials
- Condensed Matter Physics
- General Materials Science
language:
- iso: eng
publication: 'Materials Science and Engineering: A'
publication_identifier:
issn:
- 0921-5093
publication_status: published
publisher: Elsevier BV
status: public
title: Influence of thermomechanical processing on the microstructural and mechanical
properties of steel 22MnB5
type: journal_article
user_id: '43822'
volume: 838
year: '2022'
...
---
_id: '30920'
abstract:
- lang: eng
text: "Abstract\r\n Batteries capable
of extreme fast-charging (XFC) are a necessity for the deployment of electric
vehicles. Material properties of electrodes and electrolytes along with cell parameters
such as stack pressure and temperature have coupled, synergistic, and sometimes
deleterious effects on fast-charging performance. We develop a new experimental
testbed that allows precise and conformal application of electrode stack pressure.
We focus on cell capacity degradation using single-layer pouch cells with graphite
anodes, LiNi0.5Mn0.3Co0.2O2 (NMC532) cathodes, and carbonate-based electrolyte.
In the tested range (10 – 125 psi), cells cycled at higher pressure show higher
capacity and less capacity fading. Additionally, Li plating decreases with increasing
pressure as observed with scanning electron microscopy (SEM) and optical imaging.
While the loss of Li inventory from Li plating is the largest contributor to capacity
fade, electrochemical and SEM examination of the NMC cathodes after XFC experiments
show increased secondary particle damage at lower pressure. We infer that the
better performance at higher pressure is due to more homogenous reactions of active
materials across the electrode and less polarization through the electrode thickness.
Our study emphasizes the importance of electrode stack pressure in XFC batteries
and highlights its subtle role in cell conditions."
author:
- first_name: Chuntian
full_name: Cao, Chuntian
last_name: Cao
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Partha P
full_name: Paul, Partha P
last_name: Paul
- first_name: Alison R.
full_name: Dunlop, Alison R.
last_name: Dunlop
- first_name: Stephen E.
full_name: Trask, Stephen E.
last_name: Trask
- first_name: Andrew
full_name: Jansen, Andrew
last_name: Jansen
- first_name: Robert M
full_name: Kasse, Robert M
last_name: Kasse
- first_name: Vivek
full_name: Thampy, Vivek
last_name: Thampy
- first_name: Maha
full_name: Yusuf, Maha
last_name: Yusuf
- first_name: Johanna
full_name: Nelson Weker, Johanna
last_name: Nelson Weker
- first_name: Badri
full_name: Shyam, Badri
last_name: Shyam
- first_name: Ram
full_name: Subbaraman, Ram
last_name: Subbaraman
- first_name: Kelly
full_name: Davis, Kelly
last_name: Davis
- first_name: Christina M
full_name: Johnston, Christina M
last_name: Johnston
- first_name: Christopher J
full_name: Takacs, Christopher J
last_name: Takacs
- first_name: Michael
full_name: Toney, Michael
last_name: Toney
citation:
ama: Cao C, Steinrück H-G, Paul PP, et al. Conformal Pressure and Fast-Charging
Li-Ion Batteries. Journal of The Electrochemical Society. 2022;169:040540.
doi:10.1149/1945-7111/ac653f
apa: Cao, C., Steinrück, H.-G., Paul, P. P., Dunlop, A. R., Trask, S. E., Jansen,
A., Kasse, R. M., Thampy, V., Yusuf, M., Nelson Weker, J., Shyam, B., Subbaraman,
R., Davis, K., Johnston, C. M., Takacs, C. J., & Toney, M. (2022). Conformal
Pressure and Fast-Charging Li-Ion Batteries. Journal of The Electrochemical
Society, 169, 040540. https://doi.org/10.1149/1945-7111/ac653f
bibtex: '@article{Cao_Steinrück_Paul_Dunlop_Trask_Jansen_Kasse_Thampy_Yusuf_Nelson
Weker_et al._2022, title={Conformal Pressure and Fast-Charging Li-Ion Batteries},
volume={169}, DOI={10.1149/1945-7111/ac653f},
journal={Journal of The Electrochemical Society}, publisher={The Electrochemical
Society}, author={Cao, Chuntian and Steinrück, Hans-Georg and Paul, Partha P and
Dunlop, Alison R. and Trask, Stephen E. and Jansen, Andrew and Kasse, Robert M
and Thampy, Vivek and Yusuf, Maha and Nelson Weker, Johanna and et al.}, year={2022},
pages={040540} }'
chicago: 'Cao, Chuntian, Hans-Georg Steinrück, Partha P Paul, Alison R. Dunlop,
Stephen E. Trask, Andrew Jansen, Robert M Kasse, et al. “Conformal Pressure and
Fast-Charging Li-Ion Batteries.” Journal of The Electrochemical Society
169 (2022): 040540. https://doi.org/10.1149/1945-7111/ac653f.'
ieee: 'C. Cao et al., “Conformal Pressure and Fast-Charging Li-Ion Batteries,”
Journal of The Electrochemical Society, vol. 169, p. 040540, 2022, doi:
10.1149/1945-7111/ac653f.'
mla: Cao, Chuntian, et al. “Conformal Pressure and Fast-Charging Li-Ion Batteries.”
Journal of The Electrochemical Society, vol. 169, The Electrochemical Society,
2022, p. 040540, doi:10.1149/1945-7111/ac653f.
short: C. Cao, H.-G. Steinrück, P.P. Paul, A.R. Dunlop, S.E. Trask, A. Jansen, R.M.
Kasse, V. Thampy, M. Yusuf, J. Nelson Weker, B. Shyam, R. Subbaraman, K. Davis,
C.M. Johnston, C.J. Takacs, M. Toney, Journal of The Electrochemical Society 169
(2022) 040540.
date_created: 2022-04-20T06:37:40Z
date_updated: 2022-04-20T06:38:37Z
department:
- _id: '633'
doi: 10.1149/1945-7111/ac653f
intvolume: ' 169'
keyword:
- Materials Chemistry
- Electrochemistry
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Renewable Energy
- Sustainability and the Environment
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: '040540'
publication: Journal of The Electrochemical Society
publication_identifier:
issn:
- 0013-4651
- 1945-7111
publication_status: published
publisher: The Electrochemical Society
status: public
title: Conformal Pressure and Fast-Charging Li-Ion Batteries
type: journal_article
user_id: '84268'
volume: 169
year: '2022'
...
---
_id: '32108'
article_number: '126756'
author:
- first_name: T.
full_name: Henksmeier, T.
last_name: Henksmeier
- first_name: J.F.
full_name: Schulz, J.F.
last_name: Schulz
- first_name: E.
full_name: Kluth, E.
last_name: Kluth
- first_name: M.
full_name: Feneberg, M.
last_name: Feneberg
- first_name: R.
full_name: Goldhahn, R.
last_name: Goldhahn
- first_name: A.M.
full_name: Sanchez, A.M.
last_name: Sanchez
- first_name: M.
full_name: Voigt, M.
last_name: Voigt
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Dirk
full_name: Reuter, Dirk
id: '37763'
last_name: Reuter
citation:
ama: Henksmeier T, Schulz JF, Kluth E, et al. Remote epitaxy of InxGa1-xAs (0 0
1) on graphene covered GaAs(0 0 1) substrates. Journal of Crystal Growth.
2022;593. doi:10.1016/j.jcrysgro.2022.126756
apa: Henksmeier, T., Schulz, J. F., Kluth, E., Feneberg, M., Goldhahn, R., Sanchez,
A. M., Voigt, M., Grundmeier, G., & Reuter, D. (2022). Remote epitaxy of InxGa1-xAs
(0 0 1) on graphene covered GaAs(0 0 1) substrates. Journal of Crystal Growth,
593, Article 126756. https://doi.org/10.1016/j.jcrysgro.2022.126756
bibtex: '@article{Henksmeier_Schulz_Kluth_Feneberg_Goldhahn_Sanchez_Voigt_Grundmeier_Reuter_2022,
title={Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates},
volume={593}, DOI={10.1016/j.jcrysgro.2022.126756},
number={126756}, journal={Journal of Crystal Growth}, publisher={Elsevier BV},
author={Henksmeier, T. and Schulz, J.F. and Kluth, E. and Feneberg, M. and Goldhahn,
R. and Sanchez, A.M. and Voigt, M. and Grundmeier, Guido and Reuter, Dirk}, year={2022}
}'
chicago: Henksmeier, T., J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez,
M. Voigt, Guido Grundmeier, and Dirk Reuter. “Remote Epitaxy of InxGa1-XAs (0
0 1) on Graphene Covered GaAs(0 0 1) Substrates.” Journal of Crystal Growth
593 (2022). https://doi.org/10.1016/j.jcrysgro.2022.126756.
ieee: 'T. Henksmeier et al., “Remote epitaxy of InxGa1-xAs (0 0 1) on graphene
covered GaAs(0 0 1) substrates,” Journal of Crystal Growth, vol. 593, Art.
no. 126756, 2022, doi: 10.1016/j.jcrysgro.2022.126756.'
mla: Henksmeier, T., et al. “Remote Epitaxy of InxGa1-XAs (0 0 1) on Graphene Covered
GaAs(0 0 1) Substrates.” Journal of Crystal Growth, vol. 593, 126756, Elsevier
BV, 2022, doi:10.1016/j.jcrysgro.2022.126756.
short: T. Henksmeier, J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez,
M. Voigt, G. Grundmeier, D. Reuter, Journal of Crystal Growth 593 (2022).
date_created: 2022-06-23T06:17:32Z
date_updated: 2022-06-23T06:18:32Z
department:
- _id: '15'
- _id: '230'
doi: 10.1016/j.jcrysgro.2022.126756
intvolume: ' 593'
keyword:
- Materials Chemistry
- Inorganic Chemistry
- Condensed Matter Physics
language:
- iso: eng
publication: Journal of Crystal Growth
publication_identifier:
issn:
- 0022-0248
publication_status: published
publisher: Elsevier BV
status: public
title: Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates
type: journal_article
user_id: '42514'
volume: 593
year: '2022'
...
---
_id: '32432'
author:
- first_name: Yu
full_name: Yang, Yu
last_name: Yang
- first_name: Jingyuan
full_name: Huang, Jingyuan
last_name: Huang
- first_name: Daniel
full_name: Dornbusch, Daniel
last_name: Dornbusch
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Karim
full_name: Fahmy, Karim
last_name: Fahmy
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: David L.
full_name: Cheung, David L.
last_name: Cheung
citation:
ama: Yang Y, Huang J, Dornbusch D, et al. Effect of Surface Hydrophobicity on the
Adsorption of a Pilus-Derived Adhesin-like Peptide. Langmuir. 2022;38:9257–9265.
doi:10.1021/acs.langmuir.2c01016
apa: Yang, Y., Huang, J., Dornbusch, D., Grundmeier, G., Fahmy, K., Keller, A.,
& Cheung, D. L. (2022). Effect of Surface Hydrophobicity on the Adsorption
of a Pilus-Derived Adhesin-like Peptide. Langmuir, 38, 9257–9265.
https://doi.org/10.1021/acs.langmuir.2c01016
bibtex: '@article{Yang_Huang_Dornbusch_Grundmeier_Fahmy_Keller_Cheung_2022, title={Effect
of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide},
volume={38}, DOI={10.1021/acs.langmuir.2c01016},
journal={Langmuir}, publisher={American Chemical Society (ACS)}, author={Yang,
Yu and Huang, Jingyuan and Dornbusch, Daniel and Grundmeier, Guido and Fahmy,
Karim and Keller, Adrian and Cheung, David L.}, year={2022}, pages={9257–9265}
}'
chicago: 'Yang, Yu, Jingyuan Huang, Daniel Dornbusch, Guido Grundmeier, Karim Fahmy,
Adrian Keller, and David L. Cheung. “Effect of Surface Hydrophobicity on the Adsorption
of a Pilus-Derived Adhesin-like Peptide.” Langmuir 38 (2022): 9257–9265.
https://doi.org/10.1021/acs.langmuir.2c01016.'
ieee: 'Y. Yang et al., “Effect of Surface Hydrophobicity on the Adsorption
of a Pilus-Derived Adhesin-like Peptide,” Langmuir, vol. 38, pp. 9257–9265,
2022, doi: 10.1021/acs.langmuir.2c01016.'
mla: Yang, Yu, et al. “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived
Adhesin-like Peptide.” Langmuir, vol. 38, American Chemical Society (ACS),
2022, pp. 9257–9265, doi:10.1021/acs.langmuir.2c01016.
short: Y. Yang, J. Huang, D. Dornbusch, G. Grundmeier, K. Fahmy, A. Keller, D.L.
Cheung, Langmuir 38 (2022) 9257–9265.
date_created: 2022-07-27T07:45:51Z
date_updated: 2022-08-08T06:39:04Z
department:
- _id: '302'
doi: 10.1021/acs.langmuir.2c01016
intvolume: ' 38'
keyword:
- Electrochemistry
- Spectroscopy
- Surfaces and Interfaces
- Condensed Matter Physics
- General Materials Science
language:
- iso: eng
page: 9257–9265
publication: Langmuir
publication_identifier:
issn:
- 0743-7463
- 1520-5827
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like
Peptide
type: journal_article
user_id: '48864'
volume: 38
year: '2022'
...
---
_id: '34207'
abstract:
- lang: eng
text: AlSi casting alloys combine excellent castability with high strength. Hence,
this group of alloys is often used in the automotive sector. The challenge for
this application is the brittle character of these alloys which leads to cracks
during joint formation when mechanical joining technologies are used. A rise in
ductility can be achieved by a considerable increase in the solidification rate
which results in grain refinement. High solidification rates can be realized in
twin–roll casting (TRC) by water-cooled rolls. Therefore, a hypoeutectic EN AC–AlSi9
(for European Norm - aluminum cast product) is manufactured by the TRC process
and analyzed. Subsequently, joining investigations are performed on castings in
as-cast and heat-treated condition using the self-piercing riveting process considering
the joint formation and the load-bearing capacity. Due to the fine microstructure,
the crack initiation can be avoided during joining, while maintaining the joining
parameters, especially by specimens in heat treatment conditions. Furthermore,
due to the extremely fine microstructure, the load-bearing capacity of the joint
can be significantly increased in terms of the maximum load-bearing force and
the energy absorbed.
article_number: '2200874'
author:
- first_name: Moritz
full_name: Neuser, Moritz
last_name: Neuser
- first_name: Fabian
full_name: Kappe, Fabian
last_name: Kappe
- first_name: Jakob
full_name: Ostermeier, Jakob
last_name: Ostermeier
- first_name: Jan Tobias
full_name: Krüger, Jan Tobias
last_name: Krüger
- first_name: Mathias
full_name: Bobbert, Mathias
last_name: Bobbert
- first_name: Gerson
full_name: Meschut, Gerson
last_name: Meschut
- first_name: Mirko
full_name: Schaper, Mirko
last_name: Schaper
- first_name: Olexandr
full_name: Grydin, Olexandr
last_name: Grydin
citation:
ama: Neuser M, Kappe F, Ostermeier J, et al. Mechanical Properties and Joinability
of AlSi9 Alloy Manufactured by Twin‐Roll Casting. Advanced Engineering Materials.
2022;24(10). doi:10.1002/adem.202200874
apa: Neuser, M., Kappe, F., Ostermeier, J., Krüger, J. T., Bobbert, M., Meschut,
G., Schaper, M., & Grydin, O. (2022). Mechanical Properties and Joinability
of AlSi9 Alloy Manufactured by Twin‐Roll Casting. Advanced Engineering Materials,
24(10), Article 2200874. https://doi.org/10.1002/adem.202200874
bibtex: '@article{Neuser_Kappe_Ostermeier_Krüger_Bobbert_Meschut_Schaper_Grydin_2022,
title={Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll
Casting}, volume={24}, DOI={10.1002/adem.202200874},
number={102200874}, journal={Advanced Engineering Materials}, publisher={Wiley},
author={Neuser, Moritz and Kappe, Fabian and Ostermeier, Jakob and Krüger, Jan
Tobias and Bobbert, Mathias and Meschut, Gerson and Schaper, Mirko and Grydin,
Olexandr}, year={2022} }'
chicago: Neuser, Moritz, Fabian Kappe, Jakob Ostermeier, Jan Tobias Krüger, Mathias
Bobbert, Gerson Meschut, Mirko Schaper, and Olexandr Grydin. “Mechanical Properties
and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” Advanced
Engineering Materials 24, no. 10 (2022). https://doi.org/10.1002/adem.202200874.
ieee: 'M. Neuser et al., “Mechanical Properties and Joinability of AlSi9
Alloy Manufactured by Twin‐Roll Casting,” Advanced Engineering Materials,
vol. 24, no. 10, Art. no. 2200874, 2022, doi: 10.1002/adem.202200874.'
mla: Neuser, Moritz, et al. “Mechanical Properties and Joinability of AlSi9 Alloy
Manufactured by Twin‐Roll Casting.” Advanced Engineering Materials, vol.
24, no. 10, 2200874, Wiley, 2022, doi:10.1002/adem.202200874.
short: M. Neuser, F. Kappe, J. Ostermeier, J.T. Krüger, M. Bobbert, G. Meschut,
M. Schaper, O. Grydin, Advanced Engineering Materials 24 (2022).
date_created: 2022-12-05T20:07:55Z
date_updated: 2022-12-05T20:09:50Z
doi: 10.1002/adem.202200874
intvolume: ' 24'
issue: '10'
keyword:
- Condensed Matter Physics
- General Materials Science
language:
- iso: eng
project:
- _id: '130'
grant_number: '418701707'
name: 'TRR 285: TRR 285'
- _id: '131'
name: 'TRR 285 - A: TRR 285 - Project Area A'
- _id: '136'
name: 'TRR 285 – A02: TRR 285 - Subproject A02'
- _id: '133'
name: 'TRR 285 - C: TRR 285 - Project Area C'
- _id: '146'
name: 'TRR 285 – C02: TRR 285 - Subproject C02'
publication: Advanced Engineering Materials
publication_identifier:
issn:
- 1438-1656
- 1527-2648
publication_status: published
publisher: Wiley
status: public
title: Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll
Casting
type: journal_article
user_id: '7850'
volume: 24
year: '2022'
...
---
_id: '34648'
article_number: '2100174'
author:
- first_name: Christian
full_name: Hoppe, Christian
id: '27401'
last_name: Hoppe
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Lukas
full_name: Mai, Lukas
last_name: Mai
- first_name: Maciej Oskar
full_name: Liedke, Maciej Oskar
last_name: Liedke
- first_name: Teresa
full_name: Arcos, Teresa
last_name: Arcos
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Ahmed Gamal
full_name: Attallah, Ahmed Gamal
last_name: Attallah
- first_name: Maik
full_name: Butterling, Maik
last_name: Butterling
- first_name: Andreas
full_name: Wagner, Andreas
last_name: Wagner
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the
microporosity of PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers.
2022;19(4). doi:10.1002/ppap.202100174
apa: Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., Arcos, T., Awakowicz, P.,
Devi, A., Attallah, A. G., Butterling, M., Wagner, A., & Grundmeier, G. (2022).
Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO
x thin films
on PDMS. Plasma Processes and Polymers, 19(4), Article 2100174.
https://doi.org/10.1002/ppap.202100174
bibtex: '@article{Hoppe_Mitschker_Mai_Liedke_Arcos_Awakowicz_Devi_Attallah_Butterling_Wagner_et
al._2022, title={Influence of surface activation on the microporosity of PE‐CVD
and PE‐ALD SiO x
thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174},
number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej
Oskar and Arcos, Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed
Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }'
chicago: Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Teresa
Arcos, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on
the Microporosity of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers
19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.
ieee: 'C. Hoppe et al., “Influence of surface activation on the microporosity
of PE‐CVD and PE‐ALD SiO x
thin films on PDMS,” Plasma Processes and Polymers, vol. 19,
no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.'
mla: Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity
of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19,
no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.
short: C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi,
A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers
19 (2022).
date_created: 2022-12-21T09:32:52Z
date_updated: 2022-12-21T09:33:14Z
department:
- _id: '302'
doi: 10.1002/ppap.202100174
intvolume: ' 19'
issue: '4'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin
films on PDMS
type: journal_article
user_id: '48864'
volume: 19
year: '2022'
...
---
_id: '34650'
article_number: '2200052'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: Teresa
full_name: de los Arcos, Teresa
last_name: de los Arcos
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Xie X, de los Arcos T, Grundmeier G. Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation.
Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052
apa: Xie, X., de los Arcos, T., & Grundmeier, G. (2022). Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation. Plasma Processes and Polymers, 19(11),
Article 2200052. https://doi.org/10.1002/ppap.202200052
bibtex: '@article{Xie_de los Arcos_Grundmeier_2022, title={Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052},
number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Xie, Xiaofan and de los Arcos, Teresa and Grundmeier, Guido}, year={2022}
}'
chicago: Xie, Xiaofan, Teresa de los Arcos, and Guido Grundmeier. “Comparative Analysis
of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before
and after Plasma Oxidation.” Plasma Processes and Polymers 19, no. 11 (2022).
https://doi.org/10.1002/ppap.202200052.
ieee: 'X. Xie, T. de los Arcos, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,”
Plasma Processes and Polymers, vol. 19, no. 11, Art. no. 2200052, 2022,
doi: 10.1002/ppap.202200052.'
mla: Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane
Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes
and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052.
short: X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19
(2022).
date_created: 2022-12-21T09:33:54Z
date_updated: 2022-12-21T09:34:05Z
department:
- _id: '302'
doi: 10.1002/ppap.202200052
intvolume: ' 19'
issue: '11'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma
polymer thin films before and after plasma oxidation
type: journal_article
user_id: '48864'
volume: 19
year: '2022'
...
---
_id: '31241'
article_number: '126715'
author:
- first_name: A.K.
full_name: Verma, A.K.
last_name: Verma
- first_name: F.
full_name: Bopp, F.
last_name: Bopp
- first_name: J.J.
full_name: Finley, J.J.
last_name: Finley
- first_name: B.
full_name: Jonas, B.
last_name: Jonas
- first_name: A.
full_name: Zrenner, A.
last_name: Zrenner
- first_name: Dirk
full_name: Reuter, Dirk
id: '37763'
last_name: Reuter
citation:
ama: Verma AK, Bopp F, Finley JJ, Jonas B, Zrenner A, Reuter D. Low Areal Densities
of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy. Journal
of Crystal Growth. Published online 2022. doi:10.1016/j.jcrysgro.2022.126715
apa: Verma, A. K., Bopp, F., Finley, J. J., Jonas, B., Zrenner, A., & Reuter,
D. (2022). Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular
Beam Epitaxy. Journal of Crystal Growth, Article 126715. https://doi.org/10.1016/j.jcrysgro.2022.126715
bibtex: '@article{Verma_Bopp_Finley_Jonas_Zrenner_Reuter_2022, title={Low Areal
Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy},
DOI={10.1016/j.jcrysgro.2022.126715},
number={126715}, journal={Journal of Crystal Growth}, publisher={Elsevier BV},
author={Verma, A.K. and Bopp, F. and Finley, J.J. and Jonas, B. and Zrenner, A.
and Reuter, Dirk}, year={2022} }'
chicago: Verma, A.K., F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, and Dirk Reuter.
“Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam
Epitaxy.” Journal of Crystal Growth, 2022. https://doi.org/10.1016/j.jcrysgro.2022.126715.
ieee: 'A. K. Verma, F. Bopp, J. J. Finley, B. Jonas, A. Zrenner, and D. Reuter,
“Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam
Epitaxy,” Journal of Crystal Growth, Art. no. 126715, 2022, doi: 10.1016/j.jcrysgro.2022.126715.'
mla: Verma, A. K., et al. “Low Areal Densities of InAs Quantum Dots on GaAs(100)
Prepared by Molecular Beam Epitaxy.” Journal of Crystal Growth, 126715,
Elsevier BV, 2022, doi:10.1016/j.jcrysgro.2022.126715.
short: A.K. Verma, F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, D. Reuter, Journal
of Crystal Growth (2022).
date_created: 2022-05-13T06:11:50Z
date_updated: 2022-05-13T06:12:40Z
department:
- _id: '15'
- _id: '230'
doi: 10.1016/j.jcrysgro.2022.126715
keyword:
- Materials Chemistry
- Inorganic Chemistry
- Condensed Matter Physics
language:
- iso: eng
publication: Journal of Crystal Growth
publication_identifier:
issn:
- 0022-0248
publication_status: published
publisher: Elsevier BV
status: public
title: Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular
Beam Epitaxy
type: journal_article
user_id: '42514'
year: '2022'
...
---
_id: '33332'
article_number: '2200049'
author:
- first_name: Frederik
full_name: Bopp, Frederik
last_name: Bopp
- first_name: Jonathan
full_name: Rojas, Jonathan
last_name: Rojas
- first_name: Natalia
full_name: Revenga, Natalia
last_name: Revenga
- first_name: Hubert
full_name: Riedl, Hubert
last_name: Riedl
- first_name: Friedrich
full_name: Sbresny, Friedrich
last_name: Sbresny
- first_name: Katarina
full_name: Boos, Katarina
last_name: Boos
- first_name: Tobias
full_name: Simmet, Tobias
last_name: Simmet
- first_name: Arash
full_name: Ahmadi, Arash
last_name: Ahmadi
- first_name: David
full_name: Gershoni, David
last_name: Gershoni
- first_name: Jacek
full_name: Kasprzak, Jacek
last_name: Kasprzak
- first_name: Arne
full_name: Ludwig, Arne
last_name: Ludwig
- first_name: Stephan
full_name: Reitzenstein, Stephan
last_name: Reitzenstein
- first_name: Andreas
full_name: Wieck, Andreas
last_name: Wieck
- first_name: Dirk
full_name: Reuter, Dirk
id: '37763'
last_name: Reuter
- first_name: Kai
full_name: Müller, Kai
last_name: Müller
- first_name: Jonathan J.
full_name: Finley, Jonathan J.
last_name: Finley
citation:
ama: Bopp F, Rojas J, Revenga N, et al. Quantum Dot Molecule Devices with Optical
Control of Charge Status and Electronic Control of Coupling. Advanced Quantum
Technologies. Published online 2022. doi:10.1002/qute.202200049
apa: Bopp, F., Rojas, J., Revenga, N., Riedl, H., Sbresny, F., Boos, K., Simmet,
T., Ahmadi, A., Gershoni, D., Kasprzak, J., Ludwig, A., Reitzenstein, S., Wieck,
A., Reuter, D., Müller, K., & Finley, J. J. (2022). Quantum Dot Molecule Devices
with Optical Control of Charge Status and Electronic Control of Coupling. Advanced
Quantum Technologies, Article 2200049. https://doi.org/10.1002/qute.202200049
bibtex: '@article{Bopp_Rojas_Revenga_Riedl_Sbresny_Boos_Simmet_Ahmadi_Gershoni_Kasprzak_et
al._2022, title={Quantum Dot Molecule Devices with Optical Control of Charge Status
and Electronic Control of Coupling}, DOI={10.1002/qute.202200049},
number={2200049}, journal={Advanced Quantum Technologies}, publisher={Wiley},
author={Bopp, Frederik and Rojas, Jonathan and Revenga, Natalia and Riedl, Hubert
and Sbresny, Friedrich and Boos, Katarina and Simmet, Tobias and Ahmadi, Arash
and Gershoni, David and Kasprzak, Jacek and et al.}, year={2022} }'
chicago: Bopp, Frederik, Jonathan Rojas, Natalia Revenga, Hubert Riedl, Friedrich
Sbresny, Katarina Boos, Tobias Simmet, et al. “Quantum Dot Molecule Devices with
Optical Control of Charge Status and Electronic Control of Coupling.” Advanced
Quantum Technologies, 2022. https://doi.org/10.1002/qute.202200049.
ieee: 'F. Bopp et al., “Quantum Dot Molecule Devices with Optical Control
of Charge Status and Electronic Control of Coupling,” Advanced Quantum Technologies,
Art. no. 2200049, 2022, doi: 10.1002/qute.202200049.'
mla: Bopp, Frederik, et al. “Quantum Dot Molecule Devices with Optical Control of
Charge Status and Electronic Control of Coupling.” Advanced Quantum Technologies,
2200049, Wiley, 2022, doi:10.1002/qute.202200049.
short: F. Bopp, J. Rojas, N. Revenga, H. Riedl, F. Sbresny, K. Boos, T. Simmet,
A. Ahmadi, D. Gershoni, J. Kasprzak, A. Ludwig, S. Reitzenstein, A. Wieck, D.
Reuter, K. Müller, J.J. Finley, Advanced Quantum Technologies (2022).
date_created: 2022-09-12T07:17:26Z
date_updated: 2022-09-12T07:18:06Z
department:
- _id: '15'
- _id: '230'
doi: 10.1002/qute.202200049
keyword:
- Electrical and Electronic Engineering
- Computational Theory and Mathematics
- Condensed Matter Physics
- Mathematical Physics
- Nuclear and High Energy Physics
- Electronic
- Optical and Magnetic Materials
- Statistical and Nonlinear Physics
language:
- iso: eng
publication: Advanced Quantum Technologies
publication_identifier:
issn:
- 2511-9044
- 2511-9044
publication_status: published
publisher: Wiley
status: public
title: Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic
Control of Coupling
type: journal_article
user_id: '42514'
year: '2022'
...
---
_id: '33682'
article_number: '2110930'
author:
- first_name: Mohammad
full_name: Khazaei, Mohammad
last_name: Khazaei
- first_name: Ahmad
full_name: Ranjbar, Ahmad
last_name: Ranjbar
- first_name: Yoon‐Gu
full_name: Kang, Yoon‐Gu
last_name: Kang
- first_name: Yunye
full_name: Liang, Yunye
last_name: Liang
- first_name: Rasoul
full_name: Khaledialidusti, Rasoul
last_name: Khaledialidusti
- first_name: Soungmin
full_name: Bae, Soungmin
last_name: Bae
- first_name: Hannes
full_name: Raebiger, Hannes
last_name: Raebiger
- first_name: Vei
full_name: Wang, Vei
last_name: Wang
- first_name: Myung Joon
full_name: Han, Myung Joon
last_name: Han
- first_name: Hiroshi
full_name: Mizoguchi, Hiroshi
last_name: Mizoguchi
- first_name: Mohammad S.
full_name: Bahramy, Mohammad S.
last_name: Bahramy
- first_name: Thomas
full_name: Kühne, Thomas
id: '49079'
last_name: Kühne
- first_name: Rodion V.
full_name: Belosludov, Rodion V.
last_name: Belosludov
- first_name: Kaoru
full_name: Ohno, Kaoru
last_name: Ohno
- first_name: Hideo
full_name: Hosono, Hideo
last_name: Hosono
citation:
ama: 'Khazaei M, Ranjbar A, Kang Y, et al. Electronic Structures of Group III–V
Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals,
and Topological Insulators. Advanced Functional Materials. 2022;32(20).
doi:10.1002/adfm.202110930'
apa: 'Khazaei, M., Ranjbar, A., Kang, Y., Liang, Y., Khaledialidusti, R., Bae, S.,
Raebiger, H., Wang, V., Han, M. J., Mizoguchi, H., Bahramy, M. S., Kühne, T.,
Belosludov, R. V., Ohno, K., & Hosono, H. (2022). Electronic Structures of
Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac
Semimetals, and Topological Insulators. Advanced Functional Materials,
32(20), Article 2110930. https://doi.org/10.1002/adfm.202110930'
bibtex: '@article{Khazaei_Ranjbar_Kang_Liang_Khaledialidusti_Bae_Raebiger_Wang_Han_Mizoguchi_et
al._2022, title={Electronic Structures of Group III–V Element Haeckelite Compounds:
A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators},
volume={32}, DOI={10.1002/adfm.202110930},
number={202110930}, journal={Advanced Functional Materials}, publisher={Wiley},
author={Khazaei, Mohammad and Ranjbar, Ahmad and Kang, Yoon‐Gu and Liang, Yunye
and Khaledialidusti, Rasoul and Bae, Soungmin and Raebiger, Hannes and Wang, Vei
and Han, Myung Joon and Mizoguchi, Hiroshi and et al.}, year={2022} }'
chicago: 'Khazaei, Mohammad, Ahmad Ranjbar, Yoon‐Gu Kang, Yunye Liang, Rasoul Khaledialidusti,
Soungmin Bae, Hannes Raebiger, et al. “Electronic Structures of Group III–V Element
Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and
Topological Insulators.” Advanced Functional Materials 32, no. 20 (2022).
https://doi.org/10.1002/adfm.202110930.'
ieee: 'M. Khazaei et al., “Electronic Structures of Group III–V Element Haeckelite
Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological
Insulators,” Advanced Functional Materials, vol. 32, no. 20, Art. no. 2110930,
2022, doi: 10.1002/adfm.202110930.'
mla: 'Khazaei, Mohammad, et al. “Electronic Structures of Group III–V Element Haeckelite
Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological
Insulators.” Advanced Functional Materials, vol. 32, no. 20, 2110930, Wiley,
2022, doi:10.1002/adfm.202110930.'
short: M. Khazaei, A. Ranjbar, Y. Kang, Y. Liang, R. Khaledialidusti, S. Bae, H.
Raebiger, V. Wang, M.J. Han, H. Mizoguchi, M.S. Bahramy, T. Kühne, R.V. Belosludov,
K. Ohno, H. Hosono, Advanced Functional Materials 32 (2022).
date_created: 2022-10-11T08:15:11Z
date_updated: 2022-10-11T08:15:28Z
department:
- _id: '613'
doi: 10.1002/adfm.202110930
intvolume: ' 32'
issue: '20'
keyword:
- Electrochemistry
- Condensed Matter Physics
- Biomaterials
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
publication: Advanced Functional Materials
publication_identifier:
issn:
- 1616-301X
- 1616-3028
publication_status: published
publisher: Wiley
status: public
title: 'Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel
Family of Semiconductors, Dirac Semimetals, and Topological Insulators'
type: journal_article
user_id: '71051'
volume: 32
year: '2022'
...
---
_id: '33694'
abstract:
- lang: eng
text: "Abstract\r\n The round robin
test investigated the reliability users can expect for AlSi10Mg additive manufactured
specimens by laser powder bed fusion through examining powder quality, process
parameter, microstructure defects, strength and fatigue. Besides for one outlier,
expected static material properties could be found. Optical microstructure inspection
was beneficial to determine true porosity and porosity types to explain the occurring
scatter in properties. Fractographic analyses reveal that the fatigue crack propagation
starts at the rough as-built surface for all specimens. Statistical analysis of
the scatter in fatigue using statistical derived safety factors concludes that
at a stress of 36.87 MPa the fatigue limit of 107 cycles
could be reached for all specimen with a survival probability of 99.999 %."
author:
- first_name: M.
full_name: Schneider, M.
last_name: Schneider
- first_name: D.
full_name: Bettge, D.
last_name: Bettge
- first_name: M.
full_name: Binder, M.
last_name: Binder
- first_name: K.
full_name: Dollmeier, K.
last_name: Dollmeier
- first_name: Malte
full_name: Dreyer, Malte
id: '66695'
last_name: Dreyer
orcid: 0000-0001-9560-9510
- first_name: K.
full_name: Hilgenberg, K.
last_name: Hilgenberg
- first_name: B.
full_name: Klöden, B.
last_name: Klöden
- first_name: T.
full_name: Schlingmann, T.
last_name: Schlingmann
- first_name: J.
full_name: Schmidt, J.
last_name: Schmidt
citation:
ama: 'Schneider M, Bettge D, Binder M, et al. Reproducibility and Scattering in
Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.
Practical Metallography. 2022;59(10):580-614. doi:10.1515/pm-2022-1018'
apa: 'Schneider, M., Bettge, D., Binder, M., Dollmeier, K., Dreyer, M., Hilgenberg,
K., Klöden, B., Schlingmann, T., & Schmidt, J. (2022). Reproducibility and
Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg
Alloy. Practical Metallography, 59(10), 580–614. https://doi.org/10.1515/pm-2022-1018'
bibtex: '@article{Schneider_Bettge_Binder_Dollmeier_Dreyer_Hilgenberg_Klöden_Schlingmann_Schmidt_2022,
title={Reproducibility and Scattering in Additive Manufacturing: Results from
a Round Robin on PBF-LB/M AlSi10Mg Alloy}, volume={59}, DOI={10.1515/pm-2022-1018},
number={10}, journal={Practical Metallography}, publisher={Walter de Gruyter GmbH},
author={Schneider, M. and Bettge, D. and Binder, M. and Dollmeier, K. and Dreyer,
Malte and Hilgenberg, K. and Klöden, B. and Schlingmann, T. and Schmidt, J.},
year={2022}, pages={580–614} }'
chicago: 'Schneider, M., D. Bettge, M. Binder, K. Dollmeier, Malte Dreyer, K. Hilgenberg,
B. Klöden, T. Schlingmann, and J. Schmidt. “Reproducibility and Scattering in
Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.”
Practical Metallography 59, no. 10 (2022): 580–614. https://doi.org/10.1515/pm-2022-1018.'
ieee: 'M. Schneider et al., “Reproducibility and Scattering in Additive Manufacturing:
Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy,” Practical Metallography,
vol. 59, no. 10, pp. 580–614, 2022, doi: 10.1515/pm-2022-1018.'
mla: 'Schneider, M., et al. “Reproducibility and Scattering in Additive Manufacturing:
Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.” Practical Metallography,
vol. 59, no. 10, Walter de Gruyter GmbH, 2022, pp. 580–614, doi:10.1515/pm-2022-1018.'
short: M. Schneider, D. Bettge, M. Binder, K. Dollmeier, M. Dreyer, K. Hilgenberg,
B. Klöden, T. Schlingmann, J. Schmidt, Practical Metallography 59 (2022) 580–614.
date_created: 2022-10-11T13:15:48Z
date_updated: 2023-01-04T14:48:17Z
doi: 10.1515/pm-2022-1018
intvolume: ' 59'
issue: '10'
keyword:
- Metals and Alloys
- Mechanics of Materials
- Condensed Matter Physics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
page: 580-614
publication: Practical Metallography
publication_identifier:
issn:
- 2195-8599
- 0032-678X
publication_status: published
publisher: Walter de Gruyter GmbH
status: public
title: 'Reproducibility and Scattering in Additive Manufacturing: Results from a Round
Robin on PBF-LB/M AlSi10Mg Alloy'
type: journal_article
user_id: '66695'
volume: 59
year: '2022'
...
---
_id: '35232'
article_number: '2200508'
author:
- first_name: Falco
full_name: Meier, Falco
last_name: Meier
- first_name: Mario
full_name: Littmann, Mario
last_name: Littmann
- first_name: Julius
full_name: Bürger, Julius
id: '46952'
last_name: Bürger
- first_name: Thomas
full_name: Riedl, Thomas
id: '36950'
last_name: Riedl
- first_name: Daniel
full_name: Kool, Daniel
id: '44586'
last_name: Kool
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
- first_name: Dirk
full_name: Reuter, Dirk
id: '37763'
last_name: Reuter
- first_name: Donat Josef
full_name: As, Donat Josef
id: '14'
last_name: As
orcid: 0000-0003-1121-3565
citation:
ama: Meier F, Littmann M, Bürger J, et al. Selective Area Growth of Cubic Gallium
Nitride in Nanoscopic Silicon Dioxide Masks. physica status solidi (b).
Published online 2022. doi:10.1002/pssb.202200508
apa: Meier, F., Littmann, M., Bürger, J., Riedl, T., Kool, D., Lindner, J., Reuter,
D., & As, D. J. (2022). Selective Area Growth of Cubic Gallium Nitride in
Nanoscopic Silicon Dioxide Masks. Physica Status Solidi (b), Article 2200508.
https://doi.org/10.1002/pssb.202200508
bibtex: '@article{Meier_Littmann_Bürger_Riedl_Kool_Lindner_Reuter_As_2022, title={Selective
Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks}, DOI={10.1002/pssb.202200508}, number={2200508},
journal={physica status solidi (b)}, publisher={Wiley}, author={Meier, Falco and
Littmann, Mario and Bürger, Julius and Riedl, Thomas and Kool, Daniel and Lindner,
Jörg and Reuter, Dirk and As, Donat Josef}, year={2022} }'
chicago: Meier, Falco, Mario Littmann, Julius Bürger, Thomas Riedl, Daniel Kool,
Jörg Lindner, Dirk Reuter, and Donat Josef As. “Selective Area Growth of Cubic
Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” Physica Status Solidi
(b), 2022. https://doi.org/10.1002/pssb.202200508.
ieee: 'F. Meier et al., “Selective Area Growth of Cubic Gallium Nitride in
Nanoscopic Silicon Dioxide Masks,” physica status solidi (b), Art. no.
2200508, 2022, doi: 10.1002/pssb.202200508.'
mla: Meier, Falco, et al. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic
Silicon Dioxide Masks.” Physica Status Solidi (b), 2200508, Wiley, 2022,
doi:10.1002/pssb.202200508.
short: F. Meier, M. Littmann, J. Bürger, T. Riedl, D. Kool, J. Lindner, D. Reuter,
D.J. As, Physica Status Solidi (b) (2022).
date_created: 2023-01-04T14:51:51Z
date_updated: 2023-01-04T14:53:24Z
department:
- _id: '15'
doi: 10.1002/pssb.202200508
keyword:
- Condensed Matter Physics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
publication: physica status solidi (b)
publication_identifier:
issn:
- 0370-1972
- 1521-3951
publication_status: published
publisher: Wiley
status: public
title: Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide
Masks
type: journal_article
user_id: '77496'
year: '2022'
...
---
_id: '33671'
abstract:
- lang: eng
text: "Abstract\r\n We demonstrate
the fabrication of micron-wide tungsten silicide superconducting nanowire single-photon
detectors on a silicon substrate using laser lithography. We show saturated internal
detection efficiencies with wire widths ranging from 0.59 µm
to 1.43 µm under illumination at 1550 nm. We demonstrate
both straight wires, as well as meandered structures. Single-photon sensitivity
is shown in devices up to 4 mm in length. Laser-lithographically written devices
allow for fast and easy structuring of large areas while maintaining a saturated
internal efficiency for wire widths around 1 µm."
article_number: '055005'
author:
- first_name: Maximilian
full_name: Protte, Maximilian
id: '46170'
last_name: Protte
- first_name: Varun B
full_name: Verma, Varun B
last_name: Verma
- first_name: Jan Philipp
full_name: Höpker, Jan Philipp
id: '33913'
last_name: Höpker
- first_name: Richard P
full_name: Mirin, Richard P
last_name: Mirin
- first_name: Sae
full_name: Woo Nam, Sae
last_name: Woo Nam
- first_name: Tim
full_name: Bartley, Tim
id: '49683'
last_name: Bartley
citation:
ama: Protte M, Verma VB, Höpker JP, Mirin RP, Woo Nam S, Bartley T. Laser-lithographically
written micron-wide superconducting nanowire single-photon detectors. Superconductor
Science and Technology. 2022;35(5). doi:10.1088/1361-6668/ac5338
apa: Protte, M., Verma, V. B., Höpker, J. P., Mirin, R. P., Woo Nam, S., & Bartley,
T. (2022). Laser-lithographically written micron-wide superconducting nanowire
single-photon detectors. Superconductor Science and Technology, 35(5),
Article 055005. https://doi.org/10.1088/1361-6668/ac5338
bibtex: '@article{Protte_Verma_Höpker_Mirin_Woo Nam_Bartley_2022, title={Laser-lithographically
written micron-wide superconducting nanowire single-photon detectors}, volume={35},
DOI={10.1088/1361-6668/ac5338},
number={5055005}, journal={Superconductor Science and Technology}, publisher={IOP
Publishing}, author={Protte, Maximilian and Verma, Varun B and Höpker, Jan Philipp
and Mirin, Richard P and Woo Nam, Sae and Bartley, Tim}, year={2022} }'
chicago: Protte, Maximilian, Varun B Verma, Jan Philipp Höpker, Richard P Mirin,
Sae Woo Nam, and Tim Bartley. “Laser-Lithographically Written Micron-Wide Superconducting
Nanowire Single-Photon Detectors.” Superconductor Science and Technology
35, no. 5 (2022). https://doi.org/10.1088/1361-6668/ac5338.
ieee: 'M. Protte, V. B. Verma, J. P. Höpker, R. P. Mirin, S. Woo Nam, and T. Bartley,
“Laser-lithographically written micron-wide superconducting nanowire single-photon
detectors,” Superconductor Science and Technology, vol. 35, no. 5, Art.
no. 055005, 2022, doi: 10.1088/1361-6668/ac5338.'
mla: Protte, Maximilian, et al. “Laser-Lithographically Written Micron-Wide Superconducting
Nanowire Single-Photon Detectors.” Superconductor Science and Technology,
vol. 35, no. 5, 055005, IOP Publishing, 2022, doi:10.1088/1361-6668/ac5338.
short: M. Protte, V.B. Verma, J.P. Höpker, R.P. Mirin, S. Woo Nam, T. Bartley, Superconductor
Science and Technology 35 (2022).
date_created: 2022-10-11T07:14:11Z
date_updated: 2023-01-12T13:02:52Z
department:
- _id: '15'
- _id: '230'
- _id: '623'
doi: 10.1088/1361-6668/ac5338
intvolume: ' 35'
issue: '5'
keyword:
- Materials Chemistry
- Electrical and Electronic Engineering
- Metals and Alloys
- Condensed Matter Physics
- Ceramics and Composites
language:
- iso: eng
publication: Superconductor Science and Technology
publication_identifier:
issn:
- 0953-2048
- 1361-6668
publication_status: published
publisher: IOP Publishing
status: public
title: Laser-lithographically written micron-wide superconducting nanowire single-photon
detectors
type: journal_article
user_id: '33913'
volume: 35
year: '2022'
...
---
_id: '36874'
article_number: '155355'
author:
- first_name: Jiangling
full_name: Su, Jiangling
last_name: Su
- first_name: Alejandro
full_name: González Orive, Alejandro
last_name: González Orive
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Su J, González Orive A, Grundmeier G. Nano-FTIR and chemical force analysis
of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces.
Applied Surface Science. 2022;609. doi:10.1016/j.apsusc.2022.155355
apa: Su, J., González Orive, A., & Grundmeier, G. (2022). Nano-FTIR and chemical
force analysis of electrografted aryldiazonium salts on ODT-microcontact printed
Au-surfaces. Applied Surface Science, 609, Article 155355. https://doi.org/10.1016/j.apsusc.2022.155355
bibtex: '@article{Su_González Orive_Grundmeier_2022, title={Nano-FTIR and chemical
force analysis of electrografted aryldiazonium salts on ODT-microcontact printed
Au-surfaces}, volume={609}, DOI={10.1016/j.apsusc.2022.155355},
number={155355}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Su,
Jiangling and González Orive, Alejandro and Grundmeier, Guido}, year={2022} }'
chicago: Su, Jiangling, Alejandro González Orive, and Guido Grundmeier. “Nano-FTIR
and Chemical Force Analysis of Electrografted Aryldiazonium Salts on ODT-Microcontact
Printed Au-Surfaces.” Applied Surface Science 609 (2022). https://doi.org/10.1016/j.apsusc.2022.155355.
ieee: 'J. Su, A. González Orive, and G. Grundmeier, “Nano-FTIR and chemical force
analysis of electrografted aryldiazonium salts on ODT-microcontact printed Au-surfaces,”
Applied Surface Science, vol. 609, Art. no. 155355, 2022, doi: 10.1016/j.apsusc.2022.155355.'
mla: Su, Jiangling, et al. “Nano-FTIR and Chemical Force Analysis of Electrografted
Aryldiazonium Salts on ODT-Microcontact Printed Au-Surfaces.” Applied Surface
Science, vol. 609, 155355, Elsevier BV, 2022, doi:10.1016/j.apsusc.2022.155355.
short: J. Su, A. González Orive, G. Grundmeier, Applied Surface Science 609 (2022).
date_created: 2023-01-16T08:57:02Z
date_updated: 2023-01-16T08:57:20Z
department:
- _id: '302'
doi: 10.1016/j.apsusc.2022.155355
intvolume: ' 609'
keyword:
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
- General Physics and Astronomy
- General Chemistry
language:
- iso: eng
publication: Applied Surface Science
publication_identifier:
issn:
- 0169-4332
publication_status: published
publisher: Elsevier BV
status: public
title: Nano-FTIR and chemical force analysis of electrografted aryldiazonium salts
on ODT-microcontact printed Au-surfaces
type: journal_article
user_id: '48864'
volume: 609
year: '2022'
...
---
_id: '36872'
article_number: '128927'
author:
- first_name: K.
full_name: Bobzin, K.
last_name: Bobzin
- first_name: C.
full_name: Kalscheuer, C.
last_name: Kalscheuer
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: T.
full_name: de los Arcos, T.
last_name: de los Arcos
- first_name: S.
full_name: Kollmann, S.
last_name: Kollmann
- first_name: M.
full_name: Carlet, M.
last_name: Carlet
citation:
ama: Bobzin K, Kalscheuer C, Grundmeier G, de los Arcos T, Kollmann S, Carlet M.
Oxidation stability of chromium aluminum oxynitride hard coatings. Surface
and Coatings Technology. 2022;449. doi:10.1016/j.surfcoat.2022.128927
apa: Bobzin, K., Kalscheuer, C., Grundmeier, G., de los Arcos, T., Kollmann, S.,
& Carlet, M. (2022). Oxidation stability of chromium aluminum oxynitride hard
coatings. Surface and Coatings Technology, 449, Article 128927.
https://doi.org/10.1016/j.surfcoat.2022.128927
bibtex: '@article{Bobzin_Kalscheuer_Grundmeier_de los Arcos_Kollmann_Carlet_2022,
title={Oxidation stability of chromium aluminum oxynitride hard coatings}, volume={449},
DOI={10.1016/j.surfcoat.2022.128927},
number={128927}, journal={Surface and Coatings Technology}, publisher={Elsevier
BV}, author={Bobzin, K. and Kalscheuer, C. and Grundmeier, Guido and de los Arcos,
T. and Kollmann, S. and Carlet, M.}, year={2022} }'
chicago: Bobzin, K., C. Kalscheuer, Guido Grundmeier, T. de los Arcos, S. Kollmann,
and M. Carlet. “Oxidation Stability of Chromium Aluminum Oxynitride Hard Coatings.”
Surface and Coatings Technology 449 (2022). https://doi.org/10.1016/j.surfcoat.2022.128927.
ieee: 'K. Bobzin, C. Kalscheuer, G. Grundmeier, T. de los Arcos, S. Kollmann, and
M. Carlet, “Oxidation stability of chromium aluminum oxynitride hard coatings,”
Surface and Coatings Technology, vol. 449, Art. no. 128927, 2022, doi:
10.1016/j.surfcoat.2022.128927.'
mla: Bobzin, K., et al. “Oxidation Stability of Chromium Aluminum Oxynitride Hard
Coatings.” Surface and Coatings Technology, vol. 449, 128927, Elsevier
BV, 2022, doi:10.1016/j.surfcoat.2022.128927.
short: K. Bobzin, C. Kalscheuer, G. Grundmeier, T. de los Arcos, S. Kollmann, M.
Carlet, Surface and Coatings Technology 449 (2022).
date_created: 2023-01-16T08:55:49Z
date_updated: 2023-01-16T08:56:13Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2022.128927
intvolume: ' 449'
keyword:
- Materials Chemistry
- Surfaces
- Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- General Chemistry
language:
- iso: eng
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
publisher: Elsevier BV
status: public
title: Oxidation stability of chromium aluminum oxynitride hard coatings
type: journal_article
user_id: '48864'
volume: 449
year: '2022'
...
---
_id: '35977'
article_number: '2100174'
author:
- first_name: Christian
full_name: Hoppe, Christian
last_name: Hoppe
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Lukas
full_name: Mai, Lukas
last_name: Mai
- first_name: Maciej Oskar
full_name: Liedke, Maciej Oskar
last_name: Liedke
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Ahmed Gamal
full_name: Attallah, Ahmed Gamal
last_name: Attallah
- first_name: Maik
full_name: Butterling, Maik
last_name: Butterling
- first_name: Andreas
full_name: Wagner, Andreas
last_name: Wagner
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the
microporosity of PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers.
2022;19(4). doi:10.1002/ppap.202100174
apa: Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., de los Arcos de Pedro, M.
T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &
Grundmeier, G. (2022). Influence of surface activation on the microporosity of
PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers, 19(4),
Article 2100174. https://doi.org/10.1002/ppap.202100174
bibtex: '@article{Hoppe_Mitschker_Mai_Liedke_de los Arcos de Pedro_Awakowicz_Devi_Attallah_Butterling_Wagner_et
al._2022, title={Influence of surface activation on the microporosity of PE‐CVD
and PE‐ALD SiO x
thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174},
number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej
Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana
and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.},
year={2022} }'
chicago: Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Maria
Teresa de los Arcos de Pedro, Peter Awakowicz, Anjana Devi, et al. “Influence
of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO
x Thin Films on PDMS.”
Plasma Processes and Polymers 19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.
ieee: 'C. Hoppe et al., “Influence of surface activation on the microporosity
of PE‐CVD and PE‐ALD SiO x
thin films on PDMS,” Plasma Processes and Polymers, vol. 19,
no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.'
mla: Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity
of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19,
no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.
short: C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro,
P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier,
Plasma Processes and Polymers 19 (2022).
date_created: 2023-01-11T10:10:09Z
date_updated: 2023-01-24T08:07:46Z
department:
- _id: '302'
doi: 10.1002/ppap.202100174
intvolume: ' 19'
issue: '4'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin
films on PDMS
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '35976'
article_number: '154525'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Christian
full_name: Weinberger, Christian
last_name: Weinberger
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Varun
full_name: Raj Damerla, Varun
last_name: Raj Damerla
- first_name: Sabrina
full_name: Kollmann, Sabrina
last_name: Kollmann
- first_name: Pascal
full_name: Vieth, Pascal
last_name: Vieth
- first_name: Michael
full_name: Tiemann, Michael
last_name: Tiemann
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: de los Arcos de Pedro MT, Weinberger C, Zysk F, et al. Challenges in the interpretation
of gas core levels for the determination of gas-solid interactions within dielectric
porous films by ambient pressure XPS. Applied Surface Science. 2022;604.
doi:10.1016/j.apsusc.2022.154525
apa: de los Arcos de Pedro, M. T., Weinberger, C., Zysk, F., Raj Damerla, V., Kollmann,
S., Vieth, P., Tiemann, M., Kühne, T. D., & Grundmeier, G. (2022). Challenges
in the interpretation of gas core levels for the determination of gas-solid interactions
within dielectric porous films by ambient pressure XPS. Applied Surface Science,
604, Article 154525. https://doi.org/10.1016/j.apsusc.2022.154525
bibtex: '@article{de los Arcos de Pedro_Weinberger_Zysk_Raj Damerla_Kollmann_Vieth_Tiemann_Kühne_Grundmeier_2022,
title={Challenges in the interpretation of gas core levels for the determination
of gas-solid interactions within dielectric porous films by ambient pressure XPS},
volume={604}, DOI={10.1016/j.apsusc.2022.154525},
number={154525}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={de
los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Zysk, Frederik
and Raj Damerla, Varun and Kollmann, Sabrina and Vieth, Pascal and Tiemann, Michael
and Kühne, Thomas D. and Grundmeier, Guido}, year={2022} }'
chicago: Arcos de Pedro, Maria Teresa de los, Christian Weinberger, Frederik Zysk,
Varun Raj Damerla, Sabrina Kollmann, Pascal Vieth, Michael Tiemann, Thomas D.
Kühne, and Guido Grundmeier. “Challenges in the Interpretation of Gas Core Levels
for the Determination of Gas-Solid Interactions within Dielectric Porous Films
by Ambient Pressure XPS.” Applied Surface Science 604 (2022). https://doi.org/10.1016/j.apsusc.2022.154525.
ieee: 'M. T. de los Arcos de Pedro et al., “Challenges in the interpretation
of gas core levels for the determination of gas-solid interactions within dielectric
porous films by ambient pressure XPS,” Applied Surface Science, vol. 604,
Art. no. 154525, 2022, doi: 10.1016/j.apsusc.2022.154525.'
mla: de los Arcos de Pedro, Maria Teresa, et al. “Challenges in the Interpretation
of Gas Core Levels for the Determination of Gas-Solid Interactions within Dielectric
Porous Films by Ambient Pressure XPS.” Applied Surface Science, vol. 604,
154525, Elsevier BV, 2022, doi:10.1016/j.apsusc.2022.154525.
short: M.T. de los Arcos de Pedro, C. Weinberger, F. Zysk, V. Raj Damerla, S. Kollmann,
P. Vieth, M. Tiemann, T.D. Kühne, G. Grundmeier, Applied Surface Science 604 (2022).
date_created: 2023-01-11T10:09:49Z
date_updated: 2023-01-24T08:10:06Z
department:
- _id: '302'
doi: 10.1016/j.apsusc.2022.154525
intvolume: ' 604'
keyword:
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
- General Physics and Astronomy
- General Chemistry
language:
- iso: eng
publication: Applied Surface Science
publication_identifier:
issn:
- 0169-4332
publication_status: published
publisher: Elsevier BV
status: public
title: Challenges in the interpretation of gas core levels for the determination of
gas-solid interactions within dielectric porous films by ambient pressure XPS
type: journal_article
user_id: '54556'
volume: 604
year: '2022'
...
---
_id: '35974'
article_number: '2200052'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Xie X, de los Arcos de Pedro MT, Grundmeier G. Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation.
Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052
apa: Xie, X., de los Arcos de Pedro, M. T., & Grundmeier, G. (2022). Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation. Plasma Processes and Polymers,
19(11), Article 2200052. https://doi.org/10.1002/ppap.202200052
bibtex: '@article{Xie_de los Arcos de Pedro_Grundmeier_2022, title={Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052},
number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Xie, Xiaofan and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido},
year={2022} }'
chicago: Xie, Xiaofan, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier.
“Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma
Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes and
Polymers 19, no. 11 (2022). https://doi.org/10.1002/ppap.202200052.
ieee: 'X. Xie, M. T. de los Arcos de Pedro, and G. Grundmeier, “Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation,” Plasma Processes and Polymers, vol. 19, no.
11, Art. no. 2200052, 2022, doi: 10.1002/ppap.202200052.'
mla: Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane
Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes
and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052.
short: X. Xie, M.T. de los Arcos de Pedro, G. Grundmeier, Plasma Processes and Polymers
19 (2022).
date_created: 2023-01-11T10:08:25Z
date_updated: 2023-01-24T08:48:44Z
department:
- _id: '302'
doi: 10.1002/ppap.202200052
intvolume: ' 19'
issue: '11'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma
polymer thin films before and after plasma oxidation
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '40984'
abstract:
- lang: eng
text: A two-step seeded-growth method was refined to synthesize Au@Pd core@shell
nanoparticles with thin Pd shells, which were then deposited onto alumina to obtain
a supported Au@Pd/Al2O3 catalyst active for prototypical CO oxidation. By the
strict control of temperature and Pd/Au molar ratio and the use of l-ascorbic
acid for making both Au cores and Pd shells, a 1.5 nm Pd layer is formed around
the Au core, as evidenced by transmission electron microscopy and energy-dispersive
spectroscopy. The core@shell structure and the Pd shell remain intact upon deposition
onto alumina and after being used for CO oxidation, as revealed by additional
X-ray diffraction and X-ray photoemission spectroscopy before and after the reaction.
The Pd shell surface was characterized with in situ infrared (IR) spectroscopy
using CO as a chemical probe during CO adsorption–desorption. The IR bands for
CO ad-species on the Pd shell suggest that the shell exposes mostly low-index
surfaces, likely Pd(111) as the majority facet. Generally, the IR bands are blue-shifted
as compared to conventional Pd/alumina catalysts, which may be due to the different
support materials for Pd, Au versus Al2O3, and/or less strain of the Pd shell.
Frequencies obtained from density functional calculations suggest the latter to
be significant. Further, the catalytic CO oxidation ignition-extinction processes
were followed by in situ IR, which shows the common CO poisoning and kinetic behavior
associated with competitive adsorption of CO and O2 that is typically observed
for noble metal catalysts.
author:
- first_name: Yanyue
full_name: Feng, Yanyue
last_name: Feng
- first_name: Andreas
full_name: Schaefer, Andreas
last_name: Schaefer
- first_name: Anders
full_name: Hellman, Anders
last_name: Hellman
- first_name: Mengqiao
full_name: Di, Mengqiao
last_name: Di
- first_name: Hanna
full_name: Härelind, Hanna
last_name: Härelind
- first_name: Matthias
full_name: Bauer, Matthias
id: '47241'
last_name: Bauer
orcid: 0000-0002-9294-6076
- first_name: Per-Anders
full_name: Carlsson, Per-Anders
last_name: Carlsson
citation:
ama: Feng Y, Schaefer A, Hellman A, et al. Synthesis and Characterization of Catalytically
Active Au Core─Pd Shell Nanoparticles Supported on Alumina. Langmuir. 2022;38(42):12859-12870.
doi:10.1021/acs.langmuir.2c01834
apa: Feng, Y., Schaefer, A., Hellman, A., Di, M., Härelind, H., Bauer, M., &
Carlsson, P.-A. (2022). Synthesis and Characterization of Catalytically Active
Au Core─Pd Shell Nanoparticles Supported on Alumina. Langmuir, 38(42),
12859–12870. https://doi.org/10.1021/acs.langmuir.2c01834
bibtex: '@article{Feng_Schaefer_Hellman_Di_Härelind_Bauer_Carlsson_2022, title={Synthesis
and Characterization of Catalytically Active Au Core─Pd Shell Nanoparticles Supported
on Alumina}, volume={38}, DOI={10.1021/acs.langmuir.2c01834},
number={42}, journal={Langmuir}, publisher={American Chemical Society (ACS)},
author={Feng, Yanyue and Schaefer, Andreas and Hellman, Anders and Di, Mengqiao
and Härelind, Hanna and Bauer, Matthias and Carlsson, Per-Anders}, year={2022},
pages={12859–12870} }'
chicago: 'Feng, Yanyue, Andreas Schaefer, Anders Hellman, Mengqiao Di, Hanna Härelind,
Matthias Bauer, and Per-Anders Carlsson. “Synthesis and Characterization of Catalytically
Active Au Core─Pd Shell Nanoparticles Supported on Alumina.” Langmuir 38,
no. 42 (2022): 12859–70. https://doi.org/10.1021/acs.langmuir.2c01834.'
ieee: 'Y. Feng et al., “Synthesis and Characterization of Catalytically Active
Au Core─Pd Shell Nanoparticles Supported on Alumina,” Langmuir, vol. 38,
no. 42, pp. 12859–12870, 2022, doi: 10.1021/acs.langmuir.2c01834.'
mla: Feng, Yanyue, et al. “Synthesis and Characterization of Catalytically Active
Au Core─Pd Shell Nanoparticles Supported on Alumina.” Langmuir, vol. 38,
no. 42, American Chemical Society (ACS), 2022, pp. 12859–70, doi:10.1021/acs.langmuir.2c01834.
short: Y. Feng, A. Schaefer, A. Hellman, M. Di, H. Härelind, M. Bauer, P.-A. Carlsson,
Langmuir 38 (2022) 12859–12870.
date_created: 2023-01-30T16:22:57Z
date_updated: 2023-01-31T08:00:11Z
department:
- _id: '35'
- _id: '306'
doi: 10.1021/acs.langmuir.2c01834
intvolume: ' 38'
issue: '42'
keyword:
- Electrochemistry
- Spectroscopy
- Surfaces and Interfaces
- Condensed Matter Physics
- General Materials Science
language:
- iso: eng
page: 12859-12870
publication: Langmuir
publication_identifier:
issn:
- 0743-7463
- 1520-5827
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: Synthesis and Characterization of Catalytically Active Au Core─Pd Shell Nanoparticles
Supported on Alumina
type: journal_article
user_id: '48467'
volume: 38
year: '2022'
...