[{"type":"journal_article","keyword":["Integrated circuit modeling","Capacitance","Silicon","Modulation","Adaptation models","Semiconductor device modeling","Bandwidth","Data communication","electrooptical transmitter","equalization","free-carrier-plasma dispersion effect","modelling","optical modulator","phase shifter","silicon photonics"],"department":[{"_id":"58"}],"date_created":"2025-11-27T07:14:34Z","issue":"1","publication":"Journal of Lightwave Technology","citation":{"ieee":"T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, and J. C. Scheytt, “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology,” <i>Journal of Lightwave Technology</i>, vol. 43, no. 1, pp. 255–270, 2025, doi: <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>.","apa":"Schwabe, T., Kress, C., Kruse, S., Weizel, M., Rhee, H., &#38; Scheytt, J. C. (2025). Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology. <i>Journal of Lightwave Technology</i>, <i>43</i>(1), 255–270. <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">https://doi.org/10.1109/JLT.2024.3450949</a>","mla":"Schwabe, Tobias, et al. “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.” <i>Journal of Lightwave Technology</i>, vol. 43, no. 1, 2025, pp. 255–70, doi:<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>.","bibtex":"@article{Schwabe_Kress_Kruse_Weizel_Rhee_Scheytt_2025, title={Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology}, volume={43}, DOI={<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>}, number={1}, journal={Journal of Lightwave Technology}, author={Schwabe, Tobias and Kress, Christian and Kruse, Stephan and Weizel, Maxim and Rhee, Hanjo and Scheytt, J. Christoph}, year={2025}, pages={255–270} }","chicago":"Schwabe, Tobias, Christian Kress, Stephan Kruse, Maxim Weizel, Hanjo Rhee, and J. Christoph Scheytt. “Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 Nm EPIC BiCMOS Technology.” <i>Journal of Lightwave Technology</i> 43, no. 1 (2025): 255–70. <a href=\"https://doi.org/10.1109/JLT.2024.3450949\">https://doi.org/10.1109/JLT.2024.3450949</a>.","ama":"Schwabe T, Kress C, Kruse S, Weizel M, Rhee H, Scheytt JC. Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology. <i>Journal of Lightwave Technology</i>. 2025;43(1):255-270. doi:<a href=\"https://doi.org/10.1109/JLT.2024.3450949\">10.1109/JLT.2024.3450949</a>","short":"T. Schwabe, C. Kress, S. Kruse, M. Weizel, H. Rhee, J.C. Scheytt, Journal of Lightwave Technology 43 (2025) 255–270."},"doi":"10.1109/JLT.2024.3450949","user_id":"38254","volume":43,"page":"255-270","language":[{"iso":"eng"}],"_id":"62643","date_updated":"2025-11-27T07:16:01Z","intvolume":"        43","status":"public","title":"Forward-Biased Silicon Phase Shifter Modeling for Electronic-Photonic Co-Simulation and Validation in a 250 nm EPIC BiCMOS Technology","year":"2025","author":[{"id":"39217","first_name":"Tobias","last_name":"Schwabe","full_name":"Schwabe, Tobias"},{"id":"13256","full_name":"Kress, Christian","last_name":"Kress","first_name":"Christian","orcid":"0000-0002-4403-2237"},{"last_name":"Kruse","first_name":"Stephan","full_name":"Kruse, Stephan","id":"38254"},{"full_name":"Weizel, Maxim","orcid":"0000-0003-2699-9839","first_name":"Maxim","last_name":"Weizel","id":"44271"},{"last_name":"Rhee","first_name":"Hanjo","full_name":"Rhee, Hanjo"},{"id":"37144","last_name":"Scheytt","orcid":"0000-0002-5950-6618 ","first_name":"J. Christoph","full_name":"Scheytt, J. Christoph"}]},{"doi":"10.1109/ACCESS.2025.3629385","user_id":"38254","volume":13,"page":"192433-192450","_id":"62644","language":[{"iso":"eng"}],"date_updated":"2025-11-27T07:16:06Z","intvolume":"        13","title":"Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits","year":"2025","status":"public","author":[{"id":"39217","first_name":"Tobias","last_name":"Schwabe","full_name":"Schwabe, Tobias"},{"full_name":"Kress, Christian","last_name":"Kress","first_name":"Christian","orcid":"0000-0002-4403-2237","id":"13256"},{"last_name":"Sadiye","first_name":"Babak","full_name":"Sadiye, Babak","id":"93634"},{"id":"38254","full_name":"Kruse, Stephan","first_name":"Stephan","last_name":"Kruse"},{"last_name":"Scheytt","orcid":"0000-0002-5950-6618 ","first_name":"J. Christoph","full_name":"Scheytt, J. Christoph","id":"37144"}],"keyword":["Optical attenuators","Equalizers","Phase shifters","Optical modulation","Electro-optic modulators","Optical amplifiers","Circuits","Silicon photonics","Optical saturation","Integrated circuit modeling","Data communication","equalization","electro-optical transmitter","silicon photonics","phase shifter","optical modulator","free-carrier plasma dispersion effect","driver architectures","biasing schemes"],"type":"journal_article","department":[{"_id":"58"}],"date_created":"2025-11-27T07:14:48Z","publication":"IEEE Access","citation":{"short":"T. Schwabe, C. Kress, B. Sadiye, S. Kruse, J.C. Scheytt, IEEE Access 13 (2025) 192433–192450.","chicago":"Schwabe, Tobias, Christian Kress, Babak Sadiye, Stephan Kruse, and J. Christoph Scheytt. “Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits.” <i>IEEE Access</i> 13 (2025): 192433–50. <a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">https://doi.org/10.1109/ACCESS.2025.3629385</a>.","ieee":"T. Schwabe, C. Kress, B. Sadiye, S. Kruse, and J. C. Scheytt, “Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits,” <i>IEEE Access</i>, vol. 13, pp. 192433–192450, 2025, doi: <a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">10.1109/ACCESS.2025.3629385</a>.","apa":"Schwabe, T., Kress, C., Sadiye, B., Kruse, S., &#38; Scheytt, J. C. (2025). Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits. <i>IEEE Access</i>, <i>13</i>, 192433–192450. <a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">https://doi.org/10.1109/ACCESS.2025.3629385</a>","bibtex":"@article{Schwabe_Kress_Sadiye_Kruse_Scheytt_2025, title={Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits}, volume={13}, DOI={<a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">10.1109/ACCESS.2025.3629385</a>}, journal={IEEE Access}, author={Schwabe, Tobias and Kress, Christian and Sadiye, Babak and Kruse, Stephan and Scheytt, J. Christoph}, year={2025}, pages={192433–192450} }","ama":"Schwabe T, Kress C, Sadiye B, Kruse S, Scheytt JC. Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits. <i>IEEE Access</i>. 2025;13:192433-192450. doi:<a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">10.1109/ACCESS.2025.3629385</a>","mla":"Schwabe, Tobias, et al. “Analysis and Design of Forward Biased Silicon Photonics Phase Shifter Equalizer Circuits.” <i>IEEE Access</i>, vol. 13, 2025, pp. 192433–50, doi:<a href=\"https://doi.org/10.1109/ACCESS.2025.3629385\">10.1109/ACCESS.2025.3629385</a>."}},{"citation":{"ama":"Moritzer E, Rauen D, Hoppe J. Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften. <i>Magazin für Oberflächentechnik</i>. 2025;2025(10).","bibtex":"@article{Moritzer_Rauen_Hoppe_2025, title={Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften}, volume={2025}, number={10}, journal={Magazin für Oberflächentechnik}, author={Moritzer, Elmar and Rauen, Dennis and Hoppe, Justin}, year={2025} }","mla":"Moritzer, Elmar, et al. “Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften.” <i>Magazin für Oberflächentechnik</i>, vol. 2025, no. 10, 2025.","short":"E. Moritzer, D. Rauen, J. Hoppe, Magazin für Oberflächentechnik 2025 (2025).","chicago":"Moritzer, Elmar, Dennis Rauen, and Justin Hoppe. “Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften.” <i>Magazin für Oberflächentechnik</i> 2025, no. 10 (2025).","apa":"Moritzer, E., Rauen, D., &#38; Hoppe, J. (2025). Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften. <i>Magazin für Oberflächentechnik</i>, <i>2025</i>(10).","ieee":"E. Moritzer, D. Rauen, and J. Hoppe, “Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften,” <i>Magazin für Oberflächentechnik</i>, vol. 2025, no. 10, 2025."},"publication":"Magazin für Oberflächentechnik","issue":"10","department":[{"_id":"9"},{"_id":"321"},{"_id":"367"}],"type":"journal_article","keyword":["Plasma","Plasmaaktivierung","Werkzeugstahl"],"date_created":"2026-01-05T08:42:56Z","intvolume":"      2025","date_updated":"2026-01-05T12:15:16Z","author":[{"full_name":"Moritzer, Elmar","first_name":"Elmar","last_name":"Moritzer","id":"20531"},{"full_name":"Rauen, Dennis","last_name":"Rauen","first_name":"Dennis","id":"62033"},{"first_name":"Justin","last_name":"Hoppe","full_name":"Hoppe, Justin"}],"title":"Atmosphärendruckplasma: Grenzflächenmodifikation von Werkzeugstahl: Plasma trifft Stahl: Möglichkeiten zur Modifikation und Verbesserung von Oberflächeneigenschaften","status":"public","year":"2025","volume":2025,"user_id":"59363","_id":"63444","language":[{"iso":"ger"}]}]