[{"publication_identifier":{"issn":["2331-7019"]},"publication_status":"published","intvolume":" 17","citation":{"mla":"Gao, Wenlong, et al. “Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces.” Physical Review Applied, vol. 17, no. 4, 044022, American Physical Society (APS), 2022, doi:10.1103/physrevapplied.17.044022.","bibtex":"@article{Gao_Sain_Zentgraf_2022, title={Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces}, volume={17}, DOI={10.1103/physrevapplied.17.044022}, number={4044022}, journal={Physical Review Applied}, publisher={American Physical Society (APS)}, author={Gao, Wenlong and Sain, Basudeb and Zentgraf, Thomas}, year={2022} }","short":"W. Gao, B. Sain, T. Zentgraf, Physical Review Applied 17 (2022).","apa":"Gao, W., Sain, B., & Zentgraf, T. (2022). Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces. Physical Review Applied, 17(4), Article 044022. https://doi.org/10.1103/physrevapplied.17.044022","ama":"Gao W, Sain B, Zentgraf T. Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces. Physical Review Applied. 2022;17(4). doi:10.1103/physrevapplied.17.044022","chicago":"Gao, Wenlong, Basudeb Sain, and Thomas Zentgraf. “Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces.” Physical Review Applied 17, no. 4 (2022). https://doi.org/10.1103/physrevapplied.17.044022.","ieee":"W. Gao, B. Sain, and T. Zentgraf, “Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces,” Physical Review Applied, vol. 17, no. 4, Art. no. 044022, 2022, doi: 10.1103/physrevapplied.17.044022."},"volume":17,"author":[{"full_name":"Gao, Wenlong","last_name":"Gao","first_name":"Wenlong"},{"full_name":"Sain, Basudeb","last_name":"Sain","first_name":"Basudeb"},{"orcid":"0000-0002-8662-1101","last_name":"Zentgraf","full_name":"Zentgraf, Thomas","id":"30525","first_name":"Thomas"}],"date_updated":"2022-04-27T11:09:11Z","oa":"1","doi":"10.1103/physrevapplied.17.044022","main_file_link":[{"open_access":"1","url":"https://doi.org/10.48550/arXiv.2202.11980"}],"type":"journal_article","status":"public","department":[{"_id":"15"},{"_id":"230"},{"_id":"289"},{"_id":"623"}],"user_id":"30525","_id":"30964","article_number":"044022","article_type":"letter_note","issue":"4","quality_controlled":"1","year":"2022","date_created":"2022-04-27T11:07:03Z","publisher":"American Physical Society (APS)","title":"Spin-Orbit Interaction of Light Enabled by Negative Coupling in High-Quality-Factor Optical Metasurfaces","publication":"Physical Review Applied","language":[{"iso":"eng"}],"keyword":["General Physics and Astronomy"]},{"language":[{"iso":"eng"}],"article_number":"126756","keyword":["Materials Chemistry","Inorganic Chemistry","Condensed Matter Physics"],"user_id":"42514","department":[{"_id":"15"},{"_id":"230"}],"_id":"32108","status":"public","type":"journal_article","publication":"Journal of Crystal Growth","doi":"10.1016/j.jcrysgro.2022.126756","title":"Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates","date_created":"2022-06-23T06:17:32Z","author":[{"first_name":"T.","full_name":"Henksmeier, T.","last_name":"Henksmeier"},{"full_name":"Schulz, J.F.","last_name":"Schulz","first_name":"J.F."},{"full_name":"Kluth, E.","last_name":"Kluth","first_name":"E."},{"first_name":"M.","full_name":"Feneberg, M.","last_name":"Feneberg"},{"full_name":"Goldhahn, R.","last_name":"Goldhahn","first_name":"R."},{"first_name":"A.M.","full_name":"Sanchez, A.M.","last_name":"Sanchez"},{"full_name":"Voigt, M.","last_name":"Voigt","first_name":"M."},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"Dirk","id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter"}],"volume":593,"date_updated":"2022-06-23T06:18:32Z","publisher":"Elsevier BV","citation":{"apa":"Henksmeier, T., Schulz, J. F., Kluth, E., Feneberg, M., Goldhahn, R., Sanchez, A. M., Voigt, M., Grundmeier, G., & Reuter, D. (2022). Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates. Journal of Crystal Growth, 593, Article 126756. https://doi.org/10.1016/j.jcrysgro.2022.126756","short":"T. Henksmeier, J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez, M. Voigt, G. Grundmeier, D. Reuter, Journal of Crystal Growth 593 (2022).","bibtex":"@article{Henksmeier_Schulz_Kluth_Feneberg_Goldhahn_Sanchez_Voigt_Grundmeier_Reuter_2022, title={Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates}, volume={593}, DOI={10.1016/j.jcrysgro.2022.126756}, number={126756}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Henksmeier, T. and Schulz, J.F. and Kluth, E. and Feneberg, M. and Goldhahn, R. and Sanchez, A.M. and Voigt, M. and Grundmeier, Guido and Reuter, Dirk}, year={2022} }","mla":"Henksmeier, T., et al. “Remote Epitaxy of InxGa1-XAs (0 0 1) on Graphene Covered GaAs(0 0 1) Substrates.” Journal of Crystal Growth, vol. 593, 126756, Elsevier BV, 2022, doi:10.1016/j.jcrysgro.2022.126756.","ama":"Henksmeier T, Schulz JF, Kluth E, et al. Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates. Journal of Crystal Growth. 2022;593. doi:10.1016/j.jcrysgro.2022.126756","ieee":"T. Henksmeier et al., “Remote epitaxy of InxGa1-xAs (0 0 1) on graphene covered GaAs(0 0 1) substrates,” Journal of Crystal Growth, vol. 593, Art. no. 126756, 2022, doi: 10.1016/j.jcrysgro.2022.126756.","chicago":"Henksmeier, T., J.F. Schulz, E. Kluth, M. Feneberg, R. Goldhahn, A.M. Sanchez, M. Voigt, Guido Grundmeier, and Dirk Reuter. “Remote Epitaxy of InxGa1-XAs (0 0 1) on Graphene Covered GaAs(0 0 1) Substrates.” Journal of Crystal Growth 593 (2022). https://doi.org/10.1016/j.jcrysgro.2022.126756."},"intvolume":" 593","year":"2022","publication_status":"published","publication_identifier":{"issn":["0022-0248"]}},{"_id":"32432","department":[{"_id":"302"}],"user_id":"48864","keyword":["Electrochemistry","Spectroscopy","Surfaces and Interfaces","Condensed Matter Physics","General Materials Science"],"language":[{"iso":"eng"}],"publication":"Langmuir","type":"journal_article","status":"public","date_updated":"2022-08-08T06:39:04Z","publisher":"American Chemical Society (ACS)","volume":38,"author":[{"full_name":"Yang, Yu","last_name":"Yang","first_name":"Yu"},{"full_name":"Huang, Jingyuan","last_name":"Huang","first_name":"Jingyuan"},{"first_name":"Daniel","full_name":"Dornbusch, Daniel","last_name":"Dornbusch"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"first_name":"Karim","full_name":"Fahmy, Karim","last_name":"Fahmy"},{"first_name":"Adrian","id":"48864","full_name":"Keller, Adrian","last_name":"Keller","orcid":"0000-0001-7139-3110"},{"full_name":"Cheung, David L.","last_name":"Cheung","first_name":"David L."}],"date_created":"2022-07-27T07:45:51Z","title":"Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide","doi":"10.1021/acs.langmuir.2c01016","publication_identifier":{"issn":["0743-7463","1520-5827"]},"publication_status":"published","year":"2022","page":"9257–9265","intvolume":" 38","citation":{"apa":"Yang, Y., Huang, J., Dornbusch, D., Grundmeier, G., Fahmy, K., Keller, A., & Cheung, D. L. (2022). Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide. Langmuir, 38, 9257–9265. https://doi.org/10.1021/acs.langmuir.2c01016","bibtex":"@article{Yang_Huang_Dornbusch_Grundmeier_Fahmy_Keller_Cheung_2022, title={Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide}, volume={38}, DOI={10.1021/acs.langmuir.2c01016}, journal={Langmuir}, publisher={American Chemical Society (ACS)}, author={Yang, Yu and Huang, Jingyuan and Dornbusch, Daniel and Grundmeier, Guido and Fahmy, Karim and Keller, Adrian and Cheung, David L.}, year={2022}, pages={9257–9265} }","short":"Y. Yang, J. Huang, D. Dornbusch, G. Grundmeier, K. Fahmy, A. Keller, D.L. Cheung, Langmuir 38 (2022) 9257–9265.","mla":"Yang, Yu, et al. “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide.” Langmuir, vol. 38, American Chemical Society (ACS), 2022, pp. 9257–9265, doi:10.1021/acs.langmuir.2c01016.","ama":"Yang Y, Huang J, Dornbusch D, et al. Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide. Langmuir. 2022;38:9257–9265. doi:10.1021/acs.langmuir.2c01016","chicago":"Yang, Yu, Jingyuan Huang, Daniel Dornbusch, Guido Grundmeier, Karim Fahmy, Adrian Keller, and David L. Cheung. “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide.” Langmuir 38 (2022): 9257–9265. https://doi.org/10.1021/acs.langmuir.2c01016.","ieee":"Y. Yang et al., “Effect of Surface Hydrophobicity on the Adsorption of a Pilus-Derived Adhesin-like Peptide,” Langmuir, vol. 38, pp. 9257–9265, 2022, doi: 10.1021/acs.langmuir.2c01016."}},{"publisher":"Elsevier BV","date_updated":"2022-11-17T08:46:17Z","volume":3,"date_created":"2022-11-17T08:45:52Z","author":[{"first_name":"Maha","last_name":"Yusuf","full_name":"Yusuf, Maha"},{"last_name":"LaManna","full_name":"LaManna, Jacob M.","first_name":"Jacob M."},{"last_name":"Paul","full_name":"Paul, Partha P.","first_name":"Partha P."},{"first_name":"David N.","last_name":"Agyeman-Budu","full_name":"Agyeman-Budu, David N."},{"first_name":"Chuntian","last_name":"Cao","full_name":"Cao, Chuntian"},{"first_name":"Alison R.","last_name":"Dunlop","full_name":"Dunlop, Alison R."},{"last_name":"Jansen","full_name":"Jansen, Andrew N.","first_name":"Andrew N."},{"full_name":"Polzin, Bryant J.","last_name":"Polzin","first_name":"Bryant J."},{"first_name":"Stephen E.","full_name":"Trask, Stephen E.","last_name":"Trask"},{"first_name":"Tanvir R.","full_name":"Tanim, Tanvir R.","last_name":"Tanim"},{"full_name":"Dufek, Eric J.","last_name":"Dufek","first_name":"Eric J."},{"first_name":"Vivek","last_name":"Thampy","full_name":"Thampy, Vivek"},{"id":"84268","full_name":"Steinrück, Hans-Georg","orcid":"0000-0001-6373-0877","last_name":"Steinrück","first_name":"Hans-Georg"},{"first_name":"Michael F.","full_name":"Toney, Michael F.","last_name":"Toney"},{"first_name":"Johanna","full_name":"Nelson Weker, Johanna","last_name":"Nelson Weker"}],"title":"Simultaneous neutron and X-ray tomography for visualization of graphite electrode degradation in fast-charged lithium-ion batteries","doi":"10.1016/j.xcrp.2022.101145","publication_identifier":{"issn":["2666-3864"]},"publication_status":"published","issue":"11","year":"2022","intvolume":" 3","page":"101145","citation":{"ama":"Yusuf M, LaManna JM, Paul PP, et al. Simultaneous neutron and X-ray tomography for visualization of graphite electrode degradation in fast-charged lithium-ion batteries. Cell Reports Physical Science. 2022;3(11):101145. doi:10.1016/j.xcrp.2022.101145","ieee":"M. Yusuf et al., “Simultaneous neutron and X-ray tomography for visualization of graphite electrode degradation in fast-charged lithium-ion batteries,” Cell Reports Physical Science, vol. 3, no. 11, p. 101145, 2022, doi: 10.1016/j.xcrp.2022.101145.","chicago":"Yusuf, Maha, Jacob M. LaManna, Partha P. Paul, David N. Agyeman-Budu, Chuntian Cao, Alison R. Dunlop, Andrew N. Jansen, et al. “Simultaneous Neutron and X-Ray Tomography for Visualization of Graphite Electrode Degradation in Fast-Charged Lithium-Ion Batteries.” Cell Reports Physical Science 3, no. 11 (2022): 101145. https://doi.org/10.1016/j.xcrp.2022.101145.","apa":"Yusuf, M., LaManna, J. M., Paul, P. P., Agyeman-Budu, D. N., Cao, C., Dunlop, A. R., Jansen, A. N., Polzin, B. J., Trask, S. E., Tanim, T. R., Dufek, E. J., Thampy, V., Steinrück, H.-G., Toney, M. F., & Nelson Weker, J. (2022). Simultaneous neutron and X-ray tomography for visualization of graphite electrode degradation in fast-charged lithium-ion batteries. Cell Reports Physical Science, 3(11), 101145. https://doi.org/10.1016/j.xcrp.2022.101145","mla":"Yusuf, Maha, et al. “Simultaneous Neutron and X-Ray Tomography for Visualization of Graphite Electrode Degradation in Fast-Charged Lithium-Ion Batteries.” Cell Reports Physical Science, vol. 3, no. 11, Elsevier BV, 2022, p. 101145, doi:10.1016/j.xcrp.2022.101145.","bibtex":"@article{Yusuf_LaManna_Paul_Agyeman-Budu_Cao_Dunlop_Jansen_Polzin_Trask_Tanim_et al._2022, title={Simultaneous neutron and X-ray tomography for visualization of graphite electrode degradation in fast-charged lithium-ion batteries}, volume={3}, DOI={10.1016/j.xcrp.2022.101145}, number={11}, journal={Cell Reports Physical Science}, publisher={Elsevier BV}, author={Yusuf, Maha and LaManna, Jacob M. and Paul, Partha P. and Agyeman-Budu, David N. and Cao, Chuntian and Dunlop, Alison R. and Jansen, Andrew N. and Polzin, Bryant J. and Trask, Stephen E. and Tanim, Tanvir R. and et al.}, year={2022}, pages={101145} }","short":"M. Yusuf, J.M. LaManna, P.P. Paul, D.N. Agyeman-Budu, C. Cao, A.R. Dunlop, A.N. Jansen, B.J. Polzin, S.E. Trask, T.R. Tanim, E.J. Dufek, V. Thampy, H.-G. Steinrück, M.F. Toney, J. Nelson Weker, Cell Reports Physical Science 3 (2022) 101145."},"_id":"34098","department":[{"_id":"633"}],"user_id":"84268","keyword":["General Physics and Astronomy","General Energy","General Engineering","General Materials Science","General Chemistry"],"language":[{"iso":"eng"}],"publication":"Cell Reports Physical Science","type":"journal_article","status":"public"},{"publication":"Advanced Engineering Materials","type":"journal_article","status":"public","abstract":[{"text":"AlSi casting alloys combine excellent castability with high strength. Hence, this group of alloys is often used in the automotive sector. The challenge for this application is the brittle character of these alloys which leads to cracks during joint formation when mechanical joining technologies are used. A rise in ductility can be achieved by a considerable increase in the solidification rate which results in grain refinement. High solidification rates can be realized in twin–roll casting (TRC) by water-cooled rolls. Therefore, a hypoeutectic EN AC–AlSi9 (for European Norm - aluminum cast product) is manufactured by the TRC process and analyzed. Subsequently, joining investigations are performed on castings in as-cast and heat-treated condition using the self-piercing riveting process considering the joint formation and the load-bearing capacity. Due to the fine microstructure, the crack initiation can be avoided during joining, while maintaining the joining parameters, especially by specimens in heat treatment conditions. Furthermore, due to the extremely fine microstructure, the load-bearing capacity of the joint can be significantly increased in terms of the maximum load-bearing force and the energy absorbed.","lang":"eng"}],"user_id":"7850","_id":"34207","project":[{"grant_number":"418701707","name":"TRR 285: TRR 285","_id":"130"},{"_id":"131","name":"TRR 285 - A: TRR 285 - Project Area A"},{"name":"TRR 285 – A02: TRR 285 - Subproject A02","_id":"136"},{"_id":"133","name":"TRR 285 - C: TRR 285 - Project Area C"},{"_id":"146","name":"TRR 285 – C02: TRR 285 - Subproject C02"}],"language":[{"iso":"eng"}],"keyword":["Condensed Matter Physics","General Materials Science"],"article_number":"2200874","issue":"10","publication_identifier":{"issn":["1438-1656","1527-2648"]},"publication_status":"published","intvolume":" 24","citation":{"short":"M. Neuser, F. Kappe, J. Ostermeier, J.T. Krüger, M. Bobbert, G. Meschut, M. Schaper, O. Grydin, Advanced Engineering Materials 24 (2022).","bibtex":"@article{Neuser_Kappe_Ostermeier_Krüger_Bobbert_Meschut_Schaper_Grydin_2022, title={Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting}, volume={24}, DOI={10.1002/adem.202200874}, number={102200874}, journal={Advanced Engineering Materials}, publisher={Wiley}, author={Neuser, Moritz and Kappe, Fabian and Ostermeier, Jakob and Krüger, Jan Tobias and Bobbert, Mathias and Meschut, Gerson and Schaper, Mirko and Grydin, Olexandr}, year={2022} }","mla":"Neuser, Moritz, et al. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” Advanced Engineering Materials, vol. 24, no. 10, 2200874, Wiley, 2022, doi:10.1002/adem.202200874.","apa":"Neuser, M., Kappe, F., Ostermeier, J., Krüger, J. T., Bobbert, M., Meschut, G., Schaper, M., & Grydin, O. (2022). Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. Advanced Engineering Materials, 24(10), Article 2200874. https://doi.org/10.1002/adem.202200874","ama":"Neuser M, Kappe F, Ostermeier J, et al. Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting. Advanced Engineering Materials. 2022;24(10). doi:10.1002/adem.202200874","chicago":"Neuser, Moritz, Fabian Kappe, Jakob Ostermeier, Jan Tobias Krüger, Mathias Bobbert, Gerson Meschut, Mirko Schaper, and Olexandr Grydin. “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting.” Advanced Engineering Materials 24, no. 10 (2022). https://doi.org/10.1002/adem.202200874.","ieee":"M. Neuser et al., “Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting,” Advanced Engineering Materials, vol. 24, no. 10, Art. no. 2200874, 2022, doi: 10.1002/adem.202200874."},"year":"2022","volume":24,"date_created":"2022-12-05T20:07:55Z","author":[{"last_name":"Neuser","full_name":"Neuser, Moritz","first_name":"Moritz"},{"first_name":"Fabian","last_name":"Kappe","full_name":"Kappe, Fabian"},{"last_name":"Ostermeier","full_name":"Ostermeier, Jakob","first_name":"Jakob"},{"full_name":"Krüger, Jan Tobias","last_name":"Krüger","first_name":"Jan Tobias"},{"last_name":"Bobbert","full_name":"Bobbert, Mathias","first_name":"Mathias"},{"last_name":"Meschut","full_name":"Meschut, Gerson","first_name":"Gerson"},{"first_name":"Mirko","last_name":"Schaper","full_name":"Schaper, Mirko"},{"full_name":"Grydin, Olexandr","last_name":"Grydin","first_name":"Olexandr"}],"publisher":"Wiley","date_updated":"2022-12-05T20:09:50Z","doi":"10.1002/adem.202200874","title":"Mechanical Properties and Joinability of AlSi9 Alloy Manufactured by Twin‐Roll Casting"},{"status":"public","type":"journal_article","article_number":"29","user_id":"48864","department":[{"_id":"302"}],"_id":"34642","citation":{"ama":"Varghese J, Vieth P, Xie X, Grundmeier G. Enhanced corrosion resistance of epoxy-films on ultra-thin SiOx PECVD film coated laser surface melted Al-alloys. SN Applied Sciences. 2022;5(1). doi:10.1007/s42452-022-05244-0","chicago":"Varghese, J., P. Vieth, X. Xie, and Guido Grundmeier. “Enhanced Corrosion Resistance of Epoxy-Films on Ultra-Thin SiOx PECVD Film Coated Laser Surface Melted Al-Alloys.” SN Applied Sciences 5, no. 1 (2022). https://doi.org/10.1007/s42452-022-05244-0.","ieee":"J. Varghese, P. Vieth, X. Xie, and G. Grundmeier, “Enhanced corrosion resistance of epoxy-films on ultra-thin SiOx PECVD film coated laser surface melted Al-alloys,” SN Applied Sciences, vol. 5, no. 1, Art. no. 29, 2022, doi: 10.1007/s42452-022-05244-0.","short":"J. Varghese, P. Vieth, X. Xie, G. Grundmeier, SN Applied Sciences 5 (2022).","bibtex":"@article{Varghese_Vieth_Xie_Grundmeier_2022, title={Enhanced corrosion resistance of epoxy-films on ultra-thin SiOx PECVD film coated laser surface melted Al-alloys}, volume={5}, DOI={10.1007/s42452-022-05244-0}, number={129}, journal={SN Applied Sciences}, publisher={Springer Science and Business Media LLC}, author={Varghese, J. and Vieth, P. and Xie, X. and Grundmeier, Guido}, year={2022} }","mla":"Varghese, J., et al. “Enhanced Corrosion Resistance of Epoxy-Films on Ultra-Thin SiOx PECVD Film Coated Laser Surface Melted Al-Alloys.” SN Applied Sciences, vol. 5, no. 1, 29, Springer Science and Business Media LLC, 2022, doi:10.1007/s42452-022-05244-0.","apa":"Varghese, J., Vieth, P., Xie, X., & Grundmeier, G. (2022). Enhanced corrosion resistance of epoxy-films on ultra-thin SiOx PECVD film coated laser surface melted Al-alloys. SN Applied Sciences, 5(1), Article 29. https://doi.org/10.1007/s42452-022-05244-0"},"intvolume":" 5","publication_status":"published","publication_identifier":{"issn":["2523-3963","2523-3971"]},"doi":"10.1007/s42452-022-05244-0","author":[{"first_name":"J.","full_name":"Varghese, J.","last_name":"Varghese"},{"full_name":"Vieth, P.","last_name":"Vieth","first_name":"P."},{"first_name":"X.","last_name":"Xie","full_name":"Xie, X."},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"}],"volume":5,"date_updated":"2022-12-21T09:29:01Z","abstract":[{"text":"AbstractThe influence of ultra-thin SiOx plasma deposited films on the corrosion resistance of adhesive films on a laser surface melted 7075 aluminium alloy was investigated by means of complementary techniques in comparison to the just laser surface melted state. Laser surface melting (LSM) was performed using a continuous wave mode at a wavelength of 1064 nm. Ultra-thin plasma polymer films were deposited from a mixture of hexamethyldisilane (HMDSO), oxygen, and argon by means of an audio-frequency glow discharge. The surface morphology and surface chemistry compositions were investigated by employing field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy (EDX), diffuse reflection infrared Fourier transform spectroscopy, and X-ray photoelectron spectroscopy. The corrosion resistance of plasma polymer coated LSM Al-7075 alloy was studied using linear sweep voltammetry and electrochemical impedance spectroscopy in a chloride-containing electrolyte. The electrochemical studies showed an improved corrosion resistance for plasma film-coated alloys compared to the just laser surface melted state. To study the corresponding surface adhesive properties, the samples were coated with an epoxy amine adhesive. 90°-peel test under humid conditions confirmed the improvement of interfacial wet-adhesion corrosion tests showed a strong improvement of the delamination resistance of adhesives caused by the ultra-thin interfacial SiOx-films.","lang":"eng"}],"publication":"SN Applied Sciences","language":[{"iso":"eng"}],"keyword":["General Earth and Planetary Sciences","General Physics and Astronomy","General Engineering","General Environmental Science","General Materials Science","General Chemical Engineering"],"year":"2022","issue":"1","title":"Enhanced corrosion resistance of epoxy-films on ultra-thin SiOx PECVD film coated laser surface melted Al-alloys","date_created":"2022-12-21T09:28:38Z","publisher":"Springer Science and Business Media LLC"},{"issue":"4","publication_status":"published","publication_identifier":{"issn":["1612-8850","1612-8869"]},"citation":{"ama":"Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS. Plasma Processes and Polymers. 2022;19(4). doi:10.1002/ppap.202100174","ieee":"C. Hoppe et al., “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS,” Plasma Processes and Polymers, vol. 19, no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.","chicago":"Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Teresa Arcos, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO x Thin Films on PDMS.” Plasma Processes and Polymers 19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.","apa":"Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., Arcos, T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., & Grundmeier, G. (2022). Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS. Plasma Processes and Polymers, 19(4), Article 2100174. https://doi.org/10.1002/ppap.202100174","short":"C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","mla":"Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO x Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19, no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.","bibtex":"@article{Hoppe_Mitschker_Mai_Liedke_Arcos_Awakowicz_Devi_Attallah_Butterling_Wagner_et al._2022, title={Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174}, number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and Arcos, Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }"},"intvolume":" 19","year":"2022","date_created":"2022-12-21T09:32:52Z","author":[{"first_name":"Christian","full_name":"Hoppe, Christian","id":"27401","last_name":"Hoppe"},{"last_name":"Mitschker","full_name":"Mitschker, Felix","first_name":"Felix"},{"first_name":"Lukas","last_name":"Mai","full_name":"Mai, Lukas"},{"first_name":"Maciej Oskar","full_name":"Liedke, Maciej Oskar","last_name":"Liedke"},{"first_name":"Teresa","full_name":"Arcos, Teresa","last_name":"Arcos"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"},{"first_name":"Ahmed Gamal","full_name":"Attallah, Ahmed Gamal","last_name":"Attallah"},{"first_name":"Maik","last_name":"Butterling","full_name":"Butterling, Maik"},{"first_name":"Andreas","full_name":"Wagner, Andreas","last_name":"Wagner"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"}],"volume":19,"date_updated":"2022-12-21T09:33:14Z","publisher":"Wiley","doi":"10.1002/ppap.202100174","title":"Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS","type":"journal_article","publication":"Plasma Processes and Polymers","status":"public","user_id":"48864","department":[{"_id":"302"}],"_id":"34648","language":[{"iso":"eng"}],"article_number":"2100174","keyword":["Polymers and Plastics","Condensed Matter Physics"]},{"keyword":["Polymers and Plastics","Condensed Matter Physics"],"language":[{"iso":"eng"}],"publication":"Plasma Processes and Polymers","title":"Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation","publisher":"Wiley","date_created":"2022-12-21T09:33:54Z","year":"2022","issue":"11","article_number":"2200052","_id":"34650","user_id":"48864","department":[{"_id":"302"}],"status":"public","type":"journal_article","doi":"10.1002/ppap.202200052","date_updated":"2022-12-21T09:34:05Z","author":[{"last_name":"Xie","full_name":"Xie, Xiaofan","first_name":"Xiaofan"},{"first_name":"Teresa","last_name":"de los Arcos","full_name":"de los Arcos, Teresa"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"}],"volume":19,"citation":{"ama":"Xie X, de los Arcos T, Grundmeier G. Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052","chicago":"Xie, Xiaofan, Teresa de los Arcos, and Guido Grundmeier. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes and Polymers 19, no. 11 (2022). https://doi.org/10.1002/ppap.202200052.","ieee":"X. Xie, T. de los Arcos, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,” Plasma Processes and Polymers, vol. 19, no. 11, Art. no. 2200052, 2022, doi: 10.1002/ppap.202200052.","apa":"Xie, X., de los Arcos, T., & Grundmeier, G. (2022). Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. Plasma Processes and Polymers, 19(11), Article 2200052. https://doi.org/10.1002/ppap.202200052","short":"X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","bibtex":"@article{Xie_de los Arcos_Grundmeier_2022, title={Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052}, number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Xie, Xiaofan and de los Arcos, Teresa and Grundmeier, Guido}, year={2022} }","mla":"Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052."},"intvolume":" 19","publication_status":"published","publication_identifier":{"issn":["1612-8850","1612-8869"]}},{"publication":"Journal of Crystal Growth","type":"journal_article","status":"public","_id":"31241","department":[{"_id":"15"},{"_id":"230"}],"user_id":"42514","keyword":["Materials Chemistry","Inorganic Chemistry","Condensed Matter Physics"],"article_number":"126715","language":[{"iso":"eng"}],"publication_identifier":{"issn":["0022-0248"]},"publication_status":"published","year":"2022","citation":{"bibtex":"@article{Verma_Bopp_Finley_Jonas_Zrenner_Reuter_2022, title={Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy}, DOI={10.1016/j.jcrysgro.2022.126715}, number={126715}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Verma, A.K. and Bopp, F. and Finley, J.J. and Jonas, B. and Zrenner, A. and Reuter, Dirk}, year={2022} }","mla":"Verma, A. K., et al. “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy.” Journal of Crystal Growth, 126715, Elsevier BV, 2022, doi:10.1016/j.jcrysgro.2022.126715.","short":"A.K. Verma, F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, D. Reuter, Journal of Crystal Growth (2022).","apa":"Verma, A. K., Bopp, F., Finley, J. J., Jonas, B., Zrenner, A., & Reuter, D. (2022). Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy. Journal of Crystal Growth, Article 126715. https://doi.org/10.1016/j.jcrysgro.2022.126715","ama":"Verma AK, Bopp F, Finley JJ, Jonas B, Zrenner A, Reuter D. Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy. Journal of Crystal Growth. Published online 2022. doi:10.1016/j.jcrysgro.2022.126715","chicago":"Verma, A.K., F. Bopp, J.J. Finley, B. Jonas, A. Zrenner, and Dirk Reuter. “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy.” Journal of Crystal Growth, 2022. https://doi.org/10.1016/j.jcrysgro.2022.126715.","ieee":"A. K. Verma, F. Bopp, J. J. Finley, B. Jonas, A. Zrenner, and D. Reuter, “Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy,” Journal of Crystal Growth, Art. no. 126715, 2022, doi: 10.1016/j.jcrysgro.2022.126715."},"date_updated":"2022-05-13T06:12:40Z","publisher":"Elsevier BV","date_created":"2022-05-13T06:11:50Z","author":[{"first_name":"A.K.","full_name":"Verma, A.K.","last_name":"Verma"},{"first_name":"F.","full_name":"Bopp, F.","last_name":"Bopp"},{"first_name":"J.J.","last_name":"Finley","full_name":"Finley, J.J."},{"full_name":"Jonas, B.","last_name":"Jonas","first_name":"B."},{"first_name":"A.","full_name":"Zrenner, A.","last_name":"Zrenner"},{"first_name":"Dirk","id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter"}],"title":"Low Areal Densities of InAs Quantum Dots on GaAs(100) Prepared by Molecular Beam Epitaxy","doi":"10.1016/j.jcrysgro.2022.126715"},{"_id":"31480","department":[{"_id":"15"},{"_id":"230"},{"_id":"289"},{"_id":"623"}],"user_id":"30525","keyword":["Physics and Astronomy (miscellaneous)"],"article_number":"211702","language":[{"iso":"eng"}],"publication":"Applied Physics Letters","type":"journal_article","abstract":[{"text":"Optical geometric phase encoded by in-plane spatial orientation of microstructures has promoted the rapid development of numerous functional meta-devices. However, pushing the concept of the geometric phase toward the acoustic community still faces challenges. In this work, we utilize two acoustic nonlocal metagratings that could support a direct conversion between an acoustic plane wave and a designated vortex mode to obtain the acoustic geometric phase, in which an orbital angular momentum conversion process plays a vital role. In addition, we realize the acoustic geometric phases of different orders by merely varying the orientation angle of the acoustic nonlocal metagratings. Intriguingly, according to our developed theory, we reveal that the reflective acoustic geometric phase, which is twice the transmissive one, can be readily realized by transferring the transmitted configuration to a reflected one. Both the theoretical study and experimental measurements verify the announced transmissive and reflective acoustic geometric phases. Moreover, the reconfigurability and continuous phase modulation that covers the 2π range shown by the acoustic geometric phases provide us with the alternatives in advanced acoustic wavefront control.","lang":"eng"}],"status":"public","date_updated":"2022-05-27T12:36:43Z","publisher":"AIP Publishing","volume":120,"date_created":"2022-05-27T12:35:53Z","author":[{"first_name":"Bingyi","full_name":"Liu, Bingyi","last_name":"Liu"},{"last_name":"Zhou","full_name":"Zhou, Zhiling","first_name":"Zhiling"},{"first_name":"Yongtian","full_name":"Wang, Yongtian","last_name":"Wang"},{"first_name":"Thomas","full_name":"Zentgraf, Thomas","id":"30525","orcid":"0000-0002-8662-1101","last_name":"Zentgraf"},{"first_name":"Yong","full_name":"Li, Yong","last_name":"Li"},{"last_name":"Huang","full_name":"Huang, Lingling","first_name":"Lingling"}],"title":"Experimental verification of the acoustic geometric phase","doi":"10.1063/5.0091474","publication_identifier":{"issn":["0003-6951","1077-3118"]},"publication_status":"published","issue":"21","year":"2022","intvolume":" 120","citation":{"short":"B. Liu, Z. Zhou, Y. Wang, T. Zentgraf, Y. Li, L. Huang, Applied Physics Letters 120 (2022).","bibtex":"@article{Liu_Zhou_Wang_Zentgraf_Li_Huang_2022, title={Experimental verification of the acoustic geometric phase}, volume={120}, DOI={10.1063/5.0091474}, number={21211702}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Liu, Bingyi and Zhou, Zhiling and Wang, Yongtian and Zentgraf, Thomas and Li, Yong and Huang, Lingling}, year={2022} }","mla":"Liu, Bingyi, et al. “Experimental Verification of the Acoustic Geometric Phase.” Applied Physics Letters, vol. 120, no. 21, 211702, AIP Publishing, 2022, doi:10.1063/5.0091474.","apa":"Liu, B., Zhou, Z., Wang, Y., Zentgraf, T., Li, Y., & Huang, L. (2022). Experimental verification of the acoustic geometric phase. Applied Physics Letters, 120(21), Article 211702. https://doi.org/10.1063/5.0091474","ama":"Liu B, Zhou Z, Wang Y, Zentgraf T, Li Y, Huang L. Experimental verification of the acoustic geometric phase. Applied Physics Letters. 2022;120(21). doi:10.1063/5.0091474","ieee":"B. Liu, Z. Zhou, Y. Wang, T. Zentgraf, Y. Li, and L. Huang, “Experimental verification of the acoustic geometric phase,” Applied Physics Letters, vol. 120, no. 21, Art. no. 211702, 2022, doi: 10.1063/5.0091474.","chicago":"Liu, Bingyi, Zhiling Zhou, Yongtian Wang, Thomas Zentgraf, Yong Li, and Lingling Huang. “Experimental Verification of the Acoustic Geometric Phase.” Applied Physics Letters 120, no. 21 (2022). https://doi.org/10.1063/5.0091474."}},{"department":[{"_id":"15"},{"_id":"230"}],"user_id":"42514","_id":"31541","article_number":"157401","type":"journal_article","status":"public","volume":128,"author":[{"first_name":"Michal","full_name":"Kobecki, Michal","last_name":"Kobecki"},{"last_name":"Scherbakov","full_name":"Scherbakov, Alexey V.","first_name":"Alexey V."},{"last_name":"Kukhtaruk","full_name":"Kukhtaruk, Serhii M.","first_name":"Serhii M."},{"first_name":"Dmytro D.","full_name":"Yaremkevich, Dmytro D.","last_name":"Yaremkevich"},{"last_name":"Henksmeier","full_name":"Henksmeier, Tobias","first_name":"Tobias"},{"first_name":"Alexander","full_name":"Trapp, Alexander","last_name":"Trapp"},{"first_name":"Dirk","id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter"},{"first_name":"Vitalyi E.","last_name":"Gusev","full_name":"Gusev, Vitalyi E."},{"full_name":"Akimov, Andrey V.","last_name":"Akimov","first_name":"Andrey V."},{"full_name":"Bayer, Manfred","last_name":"Bayer","first_name":"Manfred"}],"date_updated":"2022-05-31T05:47:21Z","doi":"10.1103/physrevlett.128.157401","publication_identifier":{"issn":["0031-9007","1079-7114"]},"publication_status":"published","intvolume":" 128","citation":{"apa":"Kobecki, M., Scherbakov, A. V., Kukhtaruk, S. M., Yaremkevich, D. D., Henksmeier, T., Trapp, A., Reuter, D., Gusev, V. E., Akimov, A. V., & Bayer, M. (2022). Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity. Physical Review Letters, 128(15), Article 157401. https://doi.org/10.1103/physrevlett.128.157401","short":"M. Kobecki, A.V. Scherbakov, S.M. Kukhtaruk, D.D. Yaremkevich, T. Henksmeier, A. Trapp, D. Reuter, V.E. Gusev, A.V. Akimov, M. Bayer, Physical Review Letters 128 (2022).","bibtex":"@article{Kobecki_Scherbakov_Kukhtaruk_Yaremkevich_Henksmeier_Trapp_Reuter_Gusev_Akimov_Bayer_2022, title={Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity}, volume={128}, DOI={10.1103/physrevlett.128.157401}, number={15157401}, journal={Physical Review Letters}, publisher={American Physical Society (APS)}, author={Kobecki, Michal and Scherbakov, Alexey V. and Kukhtaruk, Serhii M. and Yaremkevich, Dmytro D. and Henksmeier, Tobias and Trapp, Alexander and Reuter, Dirk and Gusev, Vitalyi E. and Akimov, Andrey V. and Bayer, Manfred}, year={2022} }","mla":"Kobecki, Michal, et al. “Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity.” Physical Review Letters, vol. 128, no. 15, 157401, American Physical Society (APS), 2022, doi:10.1103/physrevlett.128.157401.","ama":"Kobecki M, Scherbakov AV, Kukhtaruk SM, et al. Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity. Physical Review Letters. 2022;128(15). doi:10.1103/physrevlett.128.157401","chicago":"Kobecki, Michal, Alexey V. Scherbakov, Serhii M. Kukhtaruk, Dmytro D. Yaremkevich, Tobias Henksmeier, Alexander Trapp, Dirk Reuter, Vitalyi E. Gusev, Andrey V. Akimov, and Manfred Bayer. “Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity.” Physical Review Letters 128, no. 15 (2022). https://doi.org/10.1103/physrevlett.128.157401.","ieee":"M. Kobecki et al., “Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity,” Physical Review Letters, vol. 128, no. 15, Art. no. 157401, 2022, doi: 10.1103/physrevlett.128.157401."},"language":[{"iso":"eng"}],"keyword":["General Physics and Astronomy"],"publication":"Physical Review Letters","date_created":"2022-05-31T05:46:35Z","publisher":"American Physical Society (APS)","title":"Giant Photoelasticity of Polaritons for Detection of Coherent Phonons in a Superlattice with Quantum Sensitivity","issue":"15","year":"2022"},{"year":"2022","issue":"4","title":"Amplified steady state bifurcations in feedforward networks","publisher":"IOP Publishing","date_created":"2022-09-06T11:38:15Z","abstract":[{"lang":"eng","text":"We investigate bifurcations in feedforward coupled cell networks. Feedforward structure (the absence of feedback) can be defined by a partial order on the cells. We use this property to study generic one-parameter steady state bifurcations for such networks. Branching solutions and their asymptotics are described in terms of Taylor coefficients of the internal dynamics. They can be determined via an algorithm that only exploits the network structure. Similar to previous results on feedforward chains, we observe amplifications of the growth rates of steady state branches induced by the feedforward structure. However, contrary to these earlier results, as the interaction scenarios can be more complicated in general feedforward networks, different branching patterns and different amplifications can occur for different regions in the space of Taylor coefficients."}],"publication":"Nonlinearity","keyword":["Applied Mathematics","General Physics and Astronomy","Mathematical Physics","Statistical and Nonlinear Physics"],"language":[{"iso":"eng"}],"external_id":{"arxiv":["2105.02547"]},"page":"2073-2120","intvolume":" 35","citation":{"ama":"von der Gracht S, Nijholt E, Rink B. Amplified steady state bifurcations in feedforward networks. Nonlinearity. 2022;35(4):2073-2120. doi:10.1088/1361-6544/ac5463","ieee":"S. von der Gracht, E. Nijholt, and B. Rink, “Amplified steady state bifurcations in feedforward networks,” Nonlinearity, vol. 35, no. 4, pp. 2073–2120, 2022, doi: 10.1088/1361-6544/ac5463.","chicago":"Gracht, Sören von der, Eddie Nijholt, and Bob Rink. “Amplified Steady State Bifurcations in Feedforward Networks.” Nonlinearity 35, no. 4 (2022): 2073–2120. https://doi.org/10.1088/1361-6544/ac5463.","mla":"von der Gracht, Sören, et al. “Amplified Steady State Bifurcations in Feedforward Networks.” Nonlinearity, vol. 35, no. 4, IOP Publishing, 2022, pp. 2073–120, doi:10.1088/1361-6544/ac5463.","short":"S. von der Gracht, E. Nijholt, B. Rink, Nonlinearity 35 (2022) 2073–2120.","bibtex":"@article{von der Gracht_Nijholt_Rink_2022, title={Amplified steady state bifurcations in feedforward networks}, volume={35}, DOI={10.1088/1361-6544/ac5463}, number={4}, journal={Nonlinearity}, publisher={IOP Publishing}, author={von der Gracht, Sören and Nijholt, Eddie and Rink, Bob}, year={2022}, pages={2073–2120} }","apa":"von der Gracht, S., Nijholt, E., & Rink, B. (2022). Amplified steady state bifurcations in feedforward networks. Nonlinearity, 35(4), 2073–2120. https://doi.org/10.1088/1361-6544/ac5463"},"publication_identifier":{"issn":["0951-7715","1361-6544"]},"publication_status":"published","doi":"10.1088/1361-6544/ac5463","date_updated":"2022-09-07T08:36:46Z","volume":35,"author":[{"first_name":"Sören","orcid":"0000-0002-8054-2058","last_name":"von der Gracht","full_name":"von der Gracht, Sören","id":"97359"},{"full_name":"Nijholt, Eddie","last_name":"Nijholt","first_name":"Eddie"},{"first_name":"Bob","last_name":"Rink","full_name":"Rink, Bob"}],"status":"public","type":"journal_article","extern":"1","_id":"33264","user_id":"97359"},{"publication_identifier":{"issn":["2511-9044","2511-9044"]},"publication_status":"published","citation":{"apa":"Bopp, F., Rojas, J., Revenga, N., Riedl, H., Sbresny, F., Boos, K., Simmet, T., Ahmadi, A., Gershoni, D., Kasprzak, J., Ludwig, A., Reitzenstein, S., Wieck, A., Reuter, D., Müller, K., & Finley, J. J. (2022). Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling. Advanced Quantum Technologies, Article 2200049. https://doi.org/10.1002/qute.202200049","bibtex":"@article{Bopp_Rojas_Revenga_Riedl_Sbresny_Boos_Simmet_Ahmadi_Gershoni_Kasprzak_et al._2022, title={Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling}, DOI={10.1002/qute.202200049}, number={2200049}, journal={Advanced Quantum Technologies}, publisher={Wiley}, author={Bopp, Frederik and Rojas, Jonathan and Revenga, Natalia and Riedl, Hubert and Sbresny, Friedrich and Boos, Katarina and Simmet, Tobias and Ahmadi, Arash and Gershoni, David and Kasprzak, Jacek and et al.}, year={2022} }","short":"F. Bopp, J. Rojas, N. Revenga, H. Riedl, F. Sbresny, K. Boos, T. Simmet, A. Ahmadi, D. Gershoni, J. Kasprzak, A. Ludwig, S. Reitzenstein, A. Wieck, D. Reuter, K. Müller, J.J. Finley, Advanced Quantum Technologies (2022).","mla":"Bopp, Frederik, et al. “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling.” Advanced Quantum Technologies, 2200049, Wiley, 2022, doi:10.1002/qute.202200049.","chicago":"Bopp, Frederik, Jonathan Rojas, Natalia Revenga, Hubert Riedl, Friedrich Sbresny, Katarina Boos, Tobias Simmet, et al. “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling.” Advanced Quantum Technologies, 2022. https://doi.org/10.1002/qute.202200049.","ieee":"F. Bopp et al., “Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling,” Advanced Quantum Technologies, Art. no. 2200049, 2022, doi: 10.1002/qute.202200049.","ama":"Bopp F, Rojas J, Revenga N, et al. Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling. Advanced Quantum Technologies. Published online 2022. doi:10.1002/qute.202200049"},"year":"2022","date_created":"2022-09-12T07:17:26Z","author":[{"first_name":"Frederik","last_name":"Bopp","full_name":"Bopp, Frederik"},{"full_name":"Rojas, Jonathan","last_name":"Rojas","first_name":"Jonathan"},{"first_name":"Natalia","last_name":"Revenga","full_name":"Revenga, Natalia"},{"first_name":"Hubert","full_name":"Riedl, Hubert","last_name":"Riedl"},{"first_name":"Friedrich","last_name":"Sbresny","full_name":"Sbresny, Friedrich"},{"full_name":"Boos, Katarina","last_name":"Boos","first_name":"Katarina"},{"full_name":"Simmet, Tobias","last_name":"Simmet","first_name":"Tobias"},{"full_name":"Ahmadi, Arash","last_name":"Ahmadi","first_name":"Arash"},{"last_name":"Gershoni","full_name":"Gershoni, David","first_name":"David"},{"last_name":"Kasprzak","full_name":"Kasprzak, Jacek","first_name":"Jacek"},{"first_name":"Arne","full_name":"Ludwig, Arne","last_name":"Ludwig"},{"first_name":"Stephan","last_name":"Reitzenstein","full_name":"Reitzenstein, Stephan"},{"first_name":"Andreas","last_name":"Wieck","full_name":"Wieck, Andreas"},{"first_name":"Dirk","id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter"},{"last_name":"Müller","full_name":"Müller, Kai","first_name":"Kai"},{"full_name":"Finley, Jonathan J.","last_name":"Finley","first_name":"Jonathan J."}],"date_updated":"2022-09-12T07:18:06Z","publisher":"Wiley","doi":"10.1002/qute.202200049","title":"Quantum Dot Molecule Devices with Optical Control of Charge Status and Electronic Control of Coupling","publication":"Advanced Quantum Technologies","type":"journal_article","status":"public","department":[{"_id":"15"},{"_id":"230"}],"user_id":"42514","_id":"33332","language":[{"iso":"eng"}],"keyword":["Electrical and Electronic Engineering","Computational Theory and Mathematics","Condensed Matter Physics","Mathematical Physics","Nuclear and High Energy Physics","Electronic","Optical and Magnetic Materials","Statistical and Nonlinear Physics"],"article_number":"2200049"},{"issue":"20","publication_status":"published","publication_identifier":{"issn":["1616-301X","1616-3028"]},"citation":{"bibtex":"@article{Khazaei_Ranjbar_Kang_Liang_Khaledialidusti_Bae_Raebiger_Wang_Han_Mizoguchi_et al._2022, title={Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators}, volume={32}, DOI={10.1002/adfm.202110930}, number={202110930}, journal={Advanced Functional Materials}, publisher={Wiley}, author={Khazaei, Mohammad and Ranjbar, Ahmad and Kang, Yoon‐Gu and Liang, Yunye and Khaledialidusti, Rasoul and Bae, Soungmin and Raebiger, Hannes and Wang, Vei and Han, Myung Joon and Mizoguchi, Hiroshi and et al.}, year={2022} }","short":"M. Khazaei, A. Ranjbar, Y. Kang, Y. Liang, R. Khaledialidusti, S. Bae, H. Raebiger, V. Wang, M.J. Han, H. Mizoguchi, M.S. Bahramy, T. Kühne, R.V. Belosludov, K. Ohno, H. Hosono, Advanced Functional Materials 32 (2022).","mla":"Khazaei, Mohammad, et al. “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators.” Advanced Functional Materials, vol. 32, no. 20, 2110930, Wiley, 2022, doi:10.1002/adfm.202110930.","apa":"Khazaei, M., Ranjbar, A., Kang, Y., Liang, Y., Khaledialidusti, R., Bae, S., Raebiger, H., Wang, V., Han, M. J., Mizoguchi, H., Bahramy, M. S., Kühne, T., Belosludov, R. V., Ohno, K., & Hosono, H. (2022). Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators. Advanced Functional Materials, 32(20), Article 2110930. https://doi.org/10.1002/adfm.202110930","ama":"Khazaei M, Ranjbar A, Kang Y, et al. Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators. Advanced Functional Materials. 2022;32(20). doi:10.1002/adfm.202110930","ieee":"M. Khazaei et al., “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators,” Advanced Functional Materials, vol. 32, no. 20, Art. no. 2110930, 2022, doi: 10.1002/adfm.202110930.","chicago":"Khazaei, Mohammad, Ahmad Ranjbar, Yoon‐Gu Kang, Yunye Liang, Rasoul Khaledialidusti, Soungmin Bae, Hannes Raebiger, et al. “Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators.” Advanced Functional Materials 32, no. 20 (2022). https://doi.org/10.1002/adfm.202110930."},"intvolume":" 32","year":"2022","date_created":"2022-10-11T08:15:11Z","author":[{"last_name":"Khazaei","full_name":"Khazaei, Mohammad","first_name":"Mohammad"},{"first_name":"Ahmad","full_name":"Ranjbar, Ahmad","last_name":"Ranjbar"},{"first_name":"Yoon‐Gu","last_name":"Kang","full_name":"Kang, Yoon‐Gu"},{"first_name":"Yunye","last_name":"Liang","full_name":"Liang, Yunye"},{"first_name":"Rasoul","last_name":"Khaledialidusti","full_name":"Khaledialidusti, Rasoul"},{"first_name":"Soungmin","full_name":"Bae, Soungmin","last_name":"Bae"},{"first_name":"Hannes","full_name":"Raebiger, Hannes","last_name":"Raebiger"},{"last_name":"Wang","full_name":"Wang, Vei","first_name":"Vei"},{"last_name":"Han","full_name":"Han, Myung Joon","first_name":"Myung Joon"},{"first_name":"Hiroshi","full_name":"Mizoguchi, Hiroshi","last_name":"Mizoguchi"},{"first_name":"Mohammad S.","full_name":"Bahramy, Mohammad S.","last_name":"Bahramy"},{"first_name":"Thomas","last_name":"Kühne","full_name":"Kühne, Thomas","id":"49079"},{"last_name":"Belosludov","full_name":"Belosludov, Rodion V.","first_name":"Rodion V."},{"first_name":"Kaoru","last_name":"Ohno","full_name":"Ohno, Kaoru"},{"first_name":"Hideo","last_name":"Hosono","full_name":"Hosono, Hideo"}],"volume":32,"publisher":"Wiley","date_updated":"2022-10-11T08:15:28Z","doi":"10.1002/adfm.202110930","title":"Electronic Structures of Group III–V Element Haeckelite Compounds: A Novel Family of Semiconductors, Dirac Semimetals, and Topological Insulators","type":"journal_article","publication":"Advanced Functional Materials","status":"public","user_id":"71051","department":[{"_id":"613"}],"_id":"33682","language":[{"iso":"eng"}],"article_number":"2110930","keyword":["Electrochemistry","Condensed Matter Physics","Biomaterials","Electronic","Optical and Magnetic Materials"]},{"date_updated":"2022-10-11T08:09:52Z","volume":16,"author":[{"last_name":"Schulze Lammers","full_name":"Schulze Lammers, Bertram","first_name":"Bertram"},{"first_name":"Nieves","full_name":"López-Salas, Nieves","last_name":"López-Salas"},{"first_name":"Julya","last_name":"Stein Siena","full_name":"Stein Siena, Julya"},{"first_name":"Hossein","full_name":"Mirhosseini, Hossein","id":"71051","last_name":"Mirhosseini","orcid":"0000-0001-6179-1545"},{"first_name":"Damla","full_name":"Yesilpinar, Damla","last_name":"Yesilpinar"},{"last_name":"Heske","id":"53238","full_name":"Heske, Julian Joachim","first_name":"Julian Joachim"},{"first_name":"Thomas","last_name":"Kühne","id":"49079","full_name":"Kühne, Thomas"},{"full_name":"Fuchs, Harald","last_name":"Fuchs","first_name":"Harald"},{"full_name":"Antonietti, Markus","last_name":"Antonietti","first_name":"Markus"},{"full_name":"Mönig, Harry","last_name":"Mönig","first_name":"Harry"}],"doi":"10.1021/acsnano.2c04439","publication_identifier":{"issn":["1936-0851","1936-086X"]},"publication_status":"published","intvolume":" 16","page":"14284-14296","citation":{"apa":"Schulze Lammers, B., López-Salas, N., Stein Siena, J., Mirhosseini, H., Yesilpinar, D., Heske, J. J., Kühne, T., Fuchs, H., Antonietti, M., & Mönig, H. (2022). Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks. ACS Nano, 16(9), 14284–14296. https://doi.org/10.1021/acsnano.2c04439","short":"B. Schulze Lammers, N. López-Salas, J. Stein Siena, H. Mirhosseini, D. Yesilpinar, J.J. Heske, T. Kühne, H. Fuchs, M. Antonietti, H. Mönig, ACS Nano 16 (2022) 14284–14296.","mla":"Schulze Lammers, Bertram, et al. “Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks.” ACS Nano, vol. 16, no. 9, American Chemical Society (ACS), 2022, pp. 14284–96, doi:10.1021/acsnano.2c04439.","bibtex":"@article{Schulze Lammers_López-Salas_Stein Siena_Mirhosseini_Yesilpinar_Heske_Kühne_Fuchs_Antonietti_Mönig_2022, title={Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks}, volume={16}, DOI={10.1021/acsnano.2c04439}, number={9}, journal={ACS Nano}, publisher={American Chemical Society (ACS)}, author={Schulze Lammers, Bertram and López-Salas, Nieves and Stein Siena, Julya and Mirhosseini, Hossein and Yesilpinar, Damla and Heske, Julian Joachim and Kühne, Thomas and Fuchs, Harald and Antonietti, Markus and Mönig, Harry}, year={2022}, pages={14284–14296} }","ieee":"B. Schulze Lammers et al., “Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks,” ACS Nano, vol. 16, no. 9, pp. 14284–14296, 2022, doi: 10.1021/acsnano.2c04439.","chicago":"Schulze Lammers, Bertram, Nieves López-Salas, Julya Stein Siena, Hossein Mirhosseini, Damla Yesilpinar, Julian Joachim Heske, Thomas Kühne, Harald Fuchs, Markus Antonietti, and Harry Mönig. “Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks.” ACS Nano 16, no. 9 (2022): 14284–96. https://doi.org/10.1021/acsnano.2c04439.","ama":"Schulze Lammers B, López-Salas N, Stein Siena J, et al. Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks. ACS Nano. 2022;16(9):14284-14296. doi:10.1021/acsnano.2c04439"},"_id":"33676","department":[{"_id":"613"}],"user_id":"71051","type":"journal_article","status":"public","publisher":"American Chemical Society (ACS)","date_created":"2022-10-11T08:09:28Z","title":"Real-Space Identification of Non-Noble Single Atomic Catalytic Sites within Metal-Coordinated Supramolecular Networks","issue":"9","year":"2022","keyword":["General Physics and Astronomy","General Engineering","General Materials Science"],"language":[{"iso":"eng"}],"publication":"ACS Nano"},{"publication":"Advanced Science","language":[{"iso":"eng"}],"keyword":["General Physics and Astronomy","General Engineering","Biochemistry","Genetics and Molecular Biology (miscellaneous)","General Materials Science","General Chemical Engineering","Medicine (miscellaneous)"],"year":"2022","issue":"24","title":"Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice","date_created":"2022-10-20T12:23:54Z","publisher":"Wiley","status":"public","type":"journal_article","user_id":"84268","department":[{"_id":"633"}],"_id":"33833","citation":{"ama":"Kim S, Pathak S, Rhim SH, et al. Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice. Advanced Science. 2022;9(24):2201749. doi:10.1002/advs.202201749","ieee":"S. Kim et al., “Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice,” Advanced Science, vol. 9, no. 24, p. 2201749, 2022, doi: 10.1002/advs.202201749.","chicago":"Kim, Sanghoon, Sachin Pathak, Sonny H. Rhim, Jongin Cha, Soyoung Jekal, Soon Cheol Hong, Hyun Hwi Lee, et al. “Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice.” Advanced Science 9, no. 24 (2022): 2201749. https://doi.org/10.1002/advs.202201749.","short":"S. Kim, S. Pathak, S.H. Rhim, J. Cha, S. Jekal, S.C. Hong, H.H. Lee, S. Park, H. Lee, J. Park, S. Lee, H.-G. Steinrück, A. Mehta, S.X. Wang, J. Hong, Advanced Science 9 (2022) 2201749.","mla":"Kim, Sanghoon, et al. “Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice.” Advanced Science, vol. 9, no. 24, Wiley, 2022, p. 2201749, doi:10.1002/advs.202201749.","bibtex":"@article{Kim_Pathak_Rhim_Cha_Jekal_Hong_Lee_Park_Lee_Park_et al._2022, title={Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice}, volume={9}, DOI={10.1002/advs.202201749}, number={24}, journal={Advanced Science}, publisher={Wiley}, author={Kim, Sanghoon and Pathak, Sachin and Rhim, Sonny H. and Cha, Jongin and Jekal, Soyoung and Hong, Soon Cheol and Lee, Hyun Hwi and Park, Sung‐Hun and Lee, Han‐Koo and Park, Jae‐Hoon and et al.}, year={2022}, pages={2201749} }","apa":"Kim, S., Pathak, S., Rhim, S. H., Cha, J., Jekal, S., Hong, S. C., Lee, H. H., Park, S., Lee, H., Park, J., Lee, S., Steinrück, H.-G., Mehta, A., Wang, S. X., & Hong, J. (2022). Giant Orbital Anisotropy with Strong Spin–Orbit Coupling Established at the Pseudomorphic Interface of the Co/Pd Superlattice. Advanced Science, 9(24), 2201749. https://doi.org/10.1002/advs.202201749"},"page":"2201749","intvolume":" 9","publication_status":"published","publication_identifier":{"issn":["2198-3844","2198-3844"]},"doi":"10.1002/advs.202201749","author":[{"full_name":"Kim, Sanghoon","last_name":"Kim","first_name":"Sanghoon"},{"first_name":"Sachin","full_name":"Pathak, Sachin","last_name":"Pathak"},{"first_name":"Sonny H.","last_name":"Rhim","full_name":"Rhim, Sonny H."},{"last_name":"Cha","full_name":"Cha, Jongin","first_name":"Jongin"},{"full_name":"Jekal, Soyoung","last_name":"Jekal","first_name":"Soyoung"},{"first_name":"Soon Cheol","full_name":"Hong, Soon Cheol","last_name":"Hong"},{"first_name":"Hyun Hwi","full_name":"Lee, Hyun Hwi","last_name":"Lee"},{"last_name":"Park","full_name":"Park, Sung‐Hun","first_name":"Sung‐Hun"},{"first_name":"Han‐Koo","last_name":"Lee","full_name":"Lee, Han‐Koo"},{"full_name":"Park, Jae‐Hoon","last_name":"Park","first_name":"Jae‐Hoon"},{"first_name":"Soogil","last_name":"Lee","full_name":"Lee, Soogil"},{"first_name":"Hans-Georg","full_name":"Steinrück, Hans-Georg","id":"84268","orcid":"0000-0001-6373-0877","last_name":"Steinrück"},{"full_name":"Mehta, Apurva","last_name":"Mehta","first_name":"Apurva"},{"first_name":"Shan X.","last_name":"Wang","full_name":"Wang, Shan X."},{"first_name":"Jongill","full_name":"Hong, Jongill","last_name":"Hong"}],"volume":9,"date_updated":"2022-10-20T12:25:35Z"},{"keyword":["Metals and Alloys","Mechanics of Materials","Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"language":[{"iso":"eng"}],"_id":"33694","user_id":"66695","abstract":[{"lang":"eng","text":"Abstract\r\n The round robin test investigated the reliability users can expect for AlSi10Mg additive manufactured specimens by laser powder bed fusion through examining powder quality, process parameter, microstructure defects, strength and fatigue. Besides for one outlier, expected static material properties could be found. Optical microstructure inspection was beneficial to determine true porosity and porosity types to explain the occurring scatter in properties. Fractographic analyses reveal that the fatigue crack propagation starts at the rough as-built surface for all specimens. Statistical analysis of the scatter in fatigue using statistical derived safety factors concludes that at a stress of 36.87 MPa the fatigue limit of 107 cycles could be reached for all specimen with a survival probability of 99.999 %."}],"status":"public","publication":"Practical Metallography","type":"journal_article","title":"Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy","doi":"10.1515/pm-2022-1018","publisher":"Walter de Gruyter GmbH","date_updated":"2023-01-04T14:48:17Z","volume":59,"author":[{"last_name":"Schneider","full_name":"Schneider, M.","first_name":"M."},{"full_name":"Bettge, D.","last_name":"Bettge","first_name":"D."},{"last_name":"Binder","full_name":"Binder, M.","first_name":"M."},{"last_name":"Dollmeier","full_name":"Dollmeier, K.","first_name":"K."},{"first_name":"Malte","last_name":"Dreyer","orcid":"0000-0001-9560-9510","full_name":"Dreyer, Malte","id":"66695"},{"last_name":"Hilgenberg","full_name":"Hilgenberg, K.","first_name":"K."},{"first_name":"B.","full_name":"Klöden, B.","last_name":"Klöden"},{"last_name":"Schlingmann","full_name":"Schlingmann, T.","first_name":"T."},{"last_name":"Schmidt","full_name":"Schmidt, J.","first_name":"J."}],"date_created":"2022-10-11T13:15:48Z","year":"2022","page":"580-614","intvolume":" 59","citation":{"ama":"Schneider M, Bettge D, Binder M, et al. Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy. Practical Metallography. 2022;59(10):580-614. doi:10.1515/pm-2022-1018","ieee":"M. Schneider et al., “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy,” Practical Metallography, vol. 59, no. 10, pp. 580–614, 2022, doi: 10.1515/pm-2022-1018.","chicago":"Schneider, M., D. Bettge, M. Binder, K. Dollmeier, Malte Dreyer, K. Hilgenberg, B. Klöden, T. Schlingmann, and J. Schmidt. “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.” Practical Metallography 59, no. 10 (2022): 580–614. https://doi.org/10.1515/pm-2022-1018.","apa":"Schneider, M., Bettge, D., Binder, M., Dollmeier, K., Dreyer, M., Hilgenberg, K., Klöden, B., Schlingmann, T., & Schmidt, J. (2022). Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy. Practical Metallography, 59(10), 580–614. https://doi.org/10.1515/pm-2022-1018","bibtex":"@article{Schneider_Bettge_Binder_Dollmeier_Dreyer_Hilgenberg_Klöden_Schlingmann_Schmidt_2022, title={Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy}, volume={59}, DOI={10.1515/pm-2022-1018}, number={10}, journal={Practical Metallography}, publisher={Walter de Gruyter GmbH}, author={Schneider, M. and Bettge, D. and Binder, M. and Dollmeier, K. and Dreyer, Malte and Hilgenberg, K. and Klöden, B. and Schlingmann, T. and Schmidt, J.}, year={2022}, pages={580–614} }","mla":"Schneider, M., et al. “Reproducibility and Scattering in Additive Manufacturing: Results from a Round Robin on PBF-LB/M AlSi10Mg Alloy.” Practical Metallography, vol. 59, no. 10, Walter de Gruyter GmbH, 2022, pp. 580–614, doi:10.1515/pm-2022-1018.","short":"M. Schneider, D. Bettge, M. Binder, K. Dollmeier, M. Dreyer, K. Hilgenberg, B. Klöden, T. Schlingmann, J. Schmidt, Practical Metallography 59 (2022) 580–614."},"publication_identifier":{"issn":["2195-8599","0032-678X"]},"publication_status":"published","issue":"10"},{"publication":"physica status solidi (b)","type":"journal_article","status":"public","department":[{"_id":"15"}],"user_id":"77496","_id":"35232","language":[{"iso":"eng"}],"keyword":["Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"article_number":"2200508","publication_identifier":{"issn":["0370-1972","1521-3951"]},"publication_status":"published","citation":{"bibtex":"@article{Meier_Littmann_Bürger_Riedl_Kool_Lindner_Reuter_As_2022, title={Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks}, DOI={10.1002/pssb.202200508}, number={2200508}, journal={physica status solidi (b)}, publisher={Wiley}, author={Meier, Falco and Littmann, Mario and Bürger, Julius and Riedl, Thomas and Kool, Daniel and Lindner, Jörg and Reuter, Dirk and As, Donat Josef}, year={2022} }","short":"F. Meier, M. Littmann, J. Bürger, T. Riedl, D. Kool, J. Lindner, D. Reuter, D.J. As, Physica Status Solidi (b) (2022).","mla":"Meier, Falco, et al. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” Physica Status Solidi (b), 2200508, Wiley, 2022, doi:10.1002/pssb.202200508.","apa":"Meier, F., Littmann, M., Bürger, J., Riedl, T., Kool, D., Lindner, J., Reuter, D., & As, D. J. (2022). Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. Physica Status Solidi (b), Article 2200508. https://doi.org/10.1002/pssb.202200508","chicago":"Meier, Falco, Mario Littmann, Julius Bürger, Thomas Riedl, Daniel Kool, Jörg Lindner, Dirk Reuter, and Donat Josef As. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” Physica Status Solidi (b), 2022. https://doi.org/10.1002/pssb.202200508.","ieee":"F. Meier et al., “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks,” physica status solidi (b), Art. no. 2200508, 2022, doi: 10.1002/pssb.202200508.","ama":"Meier F, Littmann M, Bürger J, et al. Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. physica status solidi (b). Published online 2022. doi:10.1002/pssb.202200508"},"year":"2022","date_created":"2023-01-04T14:51:51Z","author":[{"full_name":"Meier, Falco","last_name":"Meier","first_name":"Falco"},{"first_name":"Mario","last_name":"Littmann","full_name":"Littmann, Mario"},{"id":"46952","full_name":"Bürger, Julius","last_name":"Bürger","first_name":"Julius"},{"last_name":"Riedl","full_name":"Riedl, Thomas","id":"36950","first_name":"Thomas"},{"last_name":"Kool","full_name":"Kool, Daniel","id":"44586","first_name":"Daniel"},{"first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner"},{"last_name":"Reuter","id":"37763","full_name":"Reuter, Dirk","first_name":"Dirk"},{"first_name":"Donat Josef","orcid":"0000-0003-1121-3565","last_name":"As","id":"14","full_name":"As, Donat Josef"}],"publisher":"Wiley","date_updated":"2023-01-04T14:53:24Z","doi":"10.1002/pssb.202200508","title":"Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks"},{"doi":"10.1063/5.0121559","date_updated":"2023-01-10T12:08:26Z","volume":132,"author":[{"last_name":"Riedl","id":"36950","full_name":"Riedl, Thomas","first_name":"Thomas"},{"full_name":"Kunnathully, Vinay S.","last_name":"Kunnathully","first_name":"Vinay S."},{"id":"72998","full_name":"Verma, Akshay Kumar","last_name":"Verma","first_name":"Akshay Kumar"},{"first_name":"Timo","full_name":"Langer, Timo","last_name":"Langer"},{"last_name":"Reuter","full_name":"Reuter, Dirk","id":"37763","first_name":"Dirk"},{"last_name":"Büker","full_name":"Büker, Björn","first_name":"Björn"},{"full_name":"Hütten, Andreas","last_name":"Hütten","first_name":"Andreas"},{"full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner","first_name":"Jörg"}],"intvolume":" 132","citation":{"apa":"Riedl, T., Kunnathully, V. S., Verma, A. K., Langer, T., Reuter, D., Büker, B., Hütten, A., & Lindner, J. (2022). Selective area heteroepitaxy of InAs nanostructures on nanopillar-patterned GaAs(111)A. Journal of Applied Physics, 132(18), Article 185701. https://doi.org/10.1063/5.0121559","short":"T. Riedl, V.S. Kunnathully, A.K. Verma, T. Langer, D. Reuter, B. Büker, A. Hütten, J. Lindner, Journal of Applied Physics 132 (2022).","mla":"Riedl, Thomas, et al. “Selective Area Heteroepitaxy of InAs Nanostructures on Nanopillar-Patterned GaAs(111)A.” Journal of Applied Physics, vol. 132, no. 18, 185701, AIP Publishing, 2022, doi:10.1063/5.0121559.","bibtex":"@article{Riedl_Kunnathully_Verma_Langer_Reuter_Büker_Hütten_Lindner_2022, title={Selective area heteroepitaxy of InAs nanostructures on nanopillar-patterned GaAs(111)A}, volume={132}, DOI={10.1063/5.0121559}, number={18185701}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Riedl, Thomas and Kunnathully, Vinay S. and Verma, Akshay Kumar and Langer, Timo and Reuter, Dirk and Büker, Björn and Hütten, Andreas and Lindner, Jörg}, year={2022} }","chicago":"Riedl, Thomas, Vinay S. Kunnathully, Akshay Kumar Verma, Timo Langer, Dirk Reuter, Björn Büker, Andreas Hütten, and Jörg Lindner. “Selective Area Heteroepitaxy of InAs Nanostructures on Nanopillar-Patterned GaAs(111)A.” Journal of Applied Physics 132, no. 18 (2022). https://doi.org/10.1063/5.0121559.","ieee":"T. Riedl et al., “Selective area heteroepitaxy of InAs nanostructures on nanopillar-patterned GaAs(111)A,” Journal of Applied Physics, vol. 132, no. 18, Art. no. 185701, 2022, doi: 10.1063/5.0121559.","ama":"Riedl T, Kunnathully VS, Verma AK, et al. Selective area heteroepitaxy of InAs nanostructures on nanopillar-patterned GaAs(111)A. Journal of Applied Physics. 2022;132(18). doi:10.1063/5.0121559"},"publication_identifier":{"issn":["0021-8979","1089-7550"]},"publication_status":"published","article_number":"185701","_id":"34056","department":[{"_id":"15"},{"_id":"230"}],"user_id":"77496","status":"public","type":"journal_article","title":"Selective area heteroepitaxy of InAs nanostructures on nanopillar-patterned GaAs(111)A","publisher":"AIP Publishing","date_created":"2022-11-10T14:19:21Z","year":"2022","issue":"18","keyword":["General Physics and Astronomy"],"language":[{"iso":"eng"}],"abstract":[{"text":" A process sequence enabling the large-area fabrication of nanopillar-patterned semiconductor templates for selective-area heteroepitaxy is developed. Herein, the nanopillar tops surrounded by a SiNx mask film serve as nanoscale growth areas. The molecular beam epitaxial growth of InAs on such patterned GaAs[Formula: see text]A templates is investigated by means of electron microscopy. It is found that defect-free nanoscale InAs islands grow selectively on the nanopillar tops at a substrate temperature of 425 °C. High-angle annular dark-field scanning transmission electron microscopy imaging reveals that for a growth temperature of 400 °C, the InAs islands show a tendency to form wurtzite phase arms extending along the lateral [Formula: see text] directions from the central zinc blende region of the islands. This is ascribed to a temporary self-catalyzed vapor–liquid–solid growth on [Formula: see text] B facets, which leads to a kinetically induced preference for the nucleation of the wurtzite phase driven by the local, instantaneous V/III ratio, and to a concomitant reduction of surface energy of the nanoscale diameter arms. ","lang":"eng"}],"publication":"Journal of Applied Physics"},{"type":"journal_article","status":"public","_id":"36414","user_id":"59416","article_number":"201103","publication_status":"published","publication_identifier":{"issn":["0003-6951","1077-3118"]},"citation":{"short":"Y. Gao, Y. Li, X. Ma, M. Gao, H. Dai, S. Schumacher, T. Gao, Applied Physics Letters 121 (2022).","bibtex":"@article{Gao_Li_Ma_Gao_Dai_Schumacher_Gao_2022, title={Tilting nondispersive bands in an empty microcavity}, volume={121}, DOI={10.1063/5.0093908}, number={20201103}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Gao, Ying and Li, Yao and Ma, Xuekai and Gao, Meini and Dai, Haitao and Schumacher, Stefan and Gao, Tingge}, year={2022} }","mla":"Gao, Ying, et al. “Tilting Nondispersive Bands in an Empty Microcavity.” Applied Physics Letters, vol. 121, no. 20, 201103, AIP Publishing, 2022, doi:10.1063/5.0093908.","apa":"Gao, Y., Li, Y., Ma, X., Gao, M., Dai, H., Schumacher, S., & Gao, T. (2022). Tilting nondispersive bands in an empty microcavity. Applied Physics Letters, 121(20), Article 201103. https://doi.org/10.1063/5.0093908","ama":"Gao Y, Li Y, Ma X, et al. Tilting nondispersive bands in an empty microcavity. Applied Physics Letters. 2022;121(20). doi:10.1063/5.0093908","chicago":"Gao, Ying, Yao Li, Xuekai Ma, Meini Gao, Haitao Dai, Stefan Schumacher, and Tingge Gao. “Tilting Nondispersive Bands in an Empty Microcavity.” Applied Physics Letters 121, no. 20 (2022). https://doi.org/10.1063/5.0093908.","ieee":"Y. Gao et al., “Tilting nondispersive bands in an empty microcavity,” Applied Physics Letters, vol. 121, no. 20, Art. no. 201103, 2022, doi: 10.1063/5.0093908."},"intvolume":" 121","date_updated":"2023-01-12T12:06:03Z","author":[{"first_name":"Ying","full_name":"Gao, Ying","last_name":"Gao"},{"first_name":"Yao","full_name":"Li, Yao","last_name":"Li"},{"first_name":"Xuekai","full_name":"Ma, Xuekai","last_name":"Ma"},{"last_name":"Gao","full_name":"Gao, Meini","first_name":"Meini"},{"last_name":"Dai","full_name":"Dai, Haitao","first_name":"Haitao"},{"first_name":"Stefan","last_name":"Schumacher","full_name":"Schumacher, Stefan"},{"first_name":"Tingge","full_name":"Gao, Tingge","last_name":"Gao"}],"volume":121,"doi":"10.1063/5.0093908","publication":"Applied Physics Letters","abstract":[{"lang":"eng","text":" Recently, microcavities with anisotropic materials were shown to be able to create bands with non-zero local Berry curvature. The anisotropic refractive index of the cavity layer is believed to be critical in opening an energy gap at the tilted Dirac points. In this work, we show that the anticrossing between a cavity mode and a Bragg mode can also be realized within an empty microcavity without any birefringent materials in the cavity layer. Nondispersive bands are observed within the energy gap due to the particular refractive index distribution of the sample. The intrinsic TE-TM splitting and XY splitting of DBR mirrors induce the squeezing of the cavity modes in momentum space, so that the nondispersive bands are tilted and spin-dependent. Our results pave the way to investigate interesting physical phenomena of photonic modes close to or in the nondispersive bands without anisotropic cavity layers. "}],"keyword":["Physics and Astronomy (miscellaneous)"],"language":[{"iso":"eng"}],"issue":"20","year":"2022","publisher":"AIP Publishing","date_created":"2023-01-12T12:03:49Z","title":"Tilting nondispersive bands in an empty microcavity"}]