@article{34651,
  author       = {{Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos, Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg K.N.}},
  issn         = {{2196-7350}},
  journal      = {{Advanced Materials Interfaces}},
  keywords     = {{General Medicine}},
  number       = {{26}},
  publisher    = {{Wiley}},
  title        = {{{High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}}},
  doi          = {{10.1002/admi.202200962}},
  volume       = {{9}},
  year         = {{2022}},
}

@article{35232,
  author       = {{Meier, Falco and Littmann, Mario and Bürger, Julius and Riedl, Thomas and Kool, Daniel and Lindner, Jörg and Reuter, Dirk and As, Donat Josef}},
  issn         = {{0370-1972}},
  journal      = {{physica status solidi (b)}},
  keywords     = {{Condensed Matter Physics, Electronic, Optical and Magnetic Materials}},
  publisher    = {{Wiley}},
  title        = {{{Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks}}},
  doi          = {{10.1002/pssb.202200508}},
  year         = {{2022}},
}

@article{34086,
  author       = {{Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos de Pedro, Maria Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg}},
  issn         = {{2196-7350}},
  journal      = {{Advanced Materials Interfaces}},
  keywords     = {{General Medicine}},
  number       = {{26}},
  publisher    = {{Wiley}},
  title        = {{{High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}}},
  doi          = {{10.1002/admi.202200962}},
  volume       = {{9}},
  year         = {{2022}},
}

@article{34092,
  abstract     = {{<jats:p>Block copolymer (BCP) self-assembly is a promising tool for next generation lithography as microphase separated polymer domains in thin films can act as templates for surface nanopatterning with sub-20 nm features. The replicated patterns can, however, only be as precise as their templates. Thus, the investigation of the morphology of polymer domains is of great importance. Commonly used analytical techniques (neutron scattering, scanning force microscopy) either lack spatial information or nanoscale resolution. Using advanced analytical (scanning) transmission electron microscopy ((S)TEM), we provide real space information on polymer domain morphology and interfaces between polystyrene (PS) and polymethylmethacrylate (PMMA) in cylinder- and lamellae-forming BCPs at highest resolution. This allows us to correlate the internal structure of polymer domains with line edge roughnesses, interface widths and domain sizes. STEM is employed for high-resolution imaging, electron energy loss spectroscopy and energy filtered TEM (EFTEM) spectroscopic imaging for material identification and EFTEM thickness mapping for visualisation of material densities at defects. The volume fraction of non-phase separated polymer species can be analysed by EFTEM. These methods give new insights into the morphology of polymer domains the exact knowledge of which will allow to improve pattern quality for nanolithography.</jats:p>}},
  author       = {{Bürger, Julius and Kunnathully, Vinay and Kool, Daniel and Lindner, Jörg and Brassat, Katharina}},
  issn         = {{2079-4991}},
  journal      = {{Nanomaterials}},
  keywords     = {{General Materials Science, General Chemical Engineering}},
  number       = {{1}},
  publisher    = {{MDPI AG}},
  title        = {{{Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM}}},
  doi          = {{10.3390/nano10010141}},
  volume       = {{10}},
  year         = {{2020}},
}

@article{4444,
  author       = {{Brassat, Katharina and Kool, Daniel and Lindner, Jörg}},
  journal      = {{To be submitted}},
  title        = {{{Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes}}},
  year         = {{2018}},
}

@article{3921,
  abstract     = {{Bottom-up patterning techniques allow for the creation of surfaces with ordered arrays of nanoscale features
on large areas. Two bottom-up techniques suitable for the formation of regular nanopatterns on
different length scales are nanosphere lithography (NSL) and block copolymer (BCP) lithography. In this
paper it is shown that NSL and BCP lithography can be combined to easily design hierarchically nanopatterned
surfaces of different materials. Nanosphere lithography is used for the pre-patterning of
surfaces with antidots, i.e. hexagonally arranged cylindrical holes in thin films of Au, Pt and TiO2 on SiO2,
providing a periodic chemical and topographical contrast on the surface suitable for templating in subsequent
BCP lithography. PS-b-PMMA BCP is used in the second self-assembly step to form hexagonally
arranged nanopores with sub-20 nm diameter within the antidots upon microphase separation. To
achieve this the microphase separation of BCP on planar surfaces is studied, too, and it is demonstrated
for the first time that vertical BCP nanopores can be formed on TiO2, Au and Pt films without using any
neutralization layers. To explain this the influence of surface energy, polarity and roughness on the microphase
separation is investigated and discussed along with the wetting state of BCP on NSL-pre-patterned
surfaces. The presented novel route for the creation of advanced hierarchical nanopatterns is easily applicable
on large-area surfaces of different materials. This flexibility makes it suitable for a broad range of
applications, from the morphological design of biocompatible surfaces for life science to complex
pre-patterns for nanoparticle placement in semiconductor technology.}},
  author       = {{Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg}},
  issn         = {{2040-3364}},
  journal      = {{Nanoscale}},
  number       = {{21}},
  pages        = {{10005--10017}},
  publisher    = {{Royal Society of Chemistry (RSC)}},
  title        = {{{Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography}}},
  doi          = {{10.1039/c8nr01397g}},
  volume       = {{10}},
  year         = {{2018}},
}

@inproceedings{3929,
  author       = {{Brassat, Katharina and Kool, Daniel and Lindner, Jörg}},
  location     = {{Warsaw, Poland}},
  title        = {{{Hierarchical nanopore and nanoring arrays by self-assembly techniques}}},
  year         = {{2018}},
}

@inproceedings{3930,
  author       = {{Brassat, Katharina and Taube, A. and Kool, Daniel and Tasche, L. and Hoyer, K.P. and Schaper, Mirko and Lindner, Jörg}},
  location     = {{Warsaw, Poland}},
  title        = {{{Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly}}},
  year         = {{2018}},
}

@inproceedings{3943,
  author       = {{Brassat, Katharina and Kool, Daniel and Taube, A. and Schaper, Mirko and Lindner, Jörg}},
  location     = {{Straßburg, France}},
  title        = {{{Morphology investigation of nanopores by block copolymer lithography on different material surfaces}}},
  year         = {{2018}},
}

@inproceedings{3952,
  author       = {{Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques}}},
  year         = {{2017}},
}

@inproceedings{4007,
  author       = {{Brassat, Katharina and Kool, Daniel and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography }}},
  year         = {{2016}},
}