[{"keyword":["General Medicine"],"language":[{"iso":"eng"}],"publication":"Advanced Materials Interfaces","publisher":"Wiley","date_created":"2022-12-21T09:34:18Z","title":"High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development","issue":"26","year":"2022","_id":"34651","user_id":"48864","department":[{"_id":"302"}],"article_number":"2200962","type":"journal_article","status":"public","date_updated":"2022-12-21T09:35:03Z","author":[{"full_name":"Bürger, Julius","id":"46952","last_name":"Bürger","first_name":"Julius"},{"first_name":"Harikrishnan","last_name":"Venugopal","full_name":"Venugopal, Harikrishnan"},{"first_name":"Daniel","last_name":"Kool","full_name":"Kool, Daniel","id":"44586"},{"first_name":"Teresa","full_name":"de los Arcos, Teresa","last_name":"de los Arcos"},{"first_name":"Alejandro","last_name":"Gonzalez Orive","full_name":"Gonzalez Orive, Alejandro"},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"},{"full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat","first_name":"Katharina"},{"first_name":"Jörg K.N.","full_name":"Lindner, Jörg K.N.","last_name":"Lindner"}],"volume":9,"doi":"10.1002/admi.202200962","publication_status":"published","publication_identifier":{"issn":["2196-7350","2196-7350"]},"citation":{"ieee":"J. Bürger <i>et al.</i>, “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development,” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, Art. no. 2200962, 2022, doi: <a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","chicago":"Bürger, Julius, Harikrishnan Venugopal, Daniel Kool, Teresa de los Arcos, Alejandro Gonzalez Orive, Guido Grundmeier, Katharina Brassat, and Jörg K.N. Lindner. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i> 9, no. 26 (2022). <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>.","ama":"Bürger J, Venugopal H, Kool D, et al. High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>. 2022;9(26). doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>","short":"J. Bürger, H. Venugopal, D. Kool, T. de los Arcos, A. Gonzalez Orive, G. Grundmeier, K. Brassat, J.K.N. Lindner, Advanced Materials Interfaces 9 (2022).","mla":"Bürger, Julius, et al. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, 2200962, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","bibtex":"@article{Bürger_Venugopal_Kool_de los Arcos_Gonzalez Orive_Grundmeier_Brassat_Lindner_2022, title={High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}, volume={9}, DOI={<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>}, number={262200962}, journal={Advanced Materials Interfaces}, publisher={Wiley}, author={Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos, Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg K.N.}, year={2022} }","apa":"Bürger, J., Venugopal, H., Kool, D., de los Arcos, T., Gonzalez Orive, A., Grundmeier, G., Brassat, K., &#38; Lindner, J. K. N. (2022). High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>, <i>9</i>(26), Article 2200962. <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>"},"intvolume":"         9"},{"year":"2022","citation":{"apa":"Meier, F., Littmann, M., Bürger, J., Riedl, T., Kool, D., Lindner, J., Reuter, D., &#38; As, D. J. (2022). Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. <i>Physica Status Solidi (b)</i>, Article 2200508. <a href=\"https://doi.org/10.1002/pssb.202200508\">https://doi.org/10.1002/pssb.202200508</a>","bibtex":"@article{Meier_Littmann_Bürger_Riedl_Kool_Lindner_Reuter_As_2022, title={Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks}, DOI={<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>}, number={2200508}, journal={physica status solidi (b)}, publisher={Wiley}, author={Meier, Falco and Littmann, Mario and Bürger, Julius and Riedl, Thomas and Kool, Daniel and Lindner, Jörg and Reuter, Dirk and As, Donat Josef}, year={2022} }","mla":"Meier, Falco, et al. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” <i>Physica Status Solidi (b)</i>, 2200508, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>.","short":"F. Meier, M. Littmann, J. Bürger, T. Riedl, D. Kool, J. Lindner, D. Reuter, D.J. As, Physica Status Solidi (b) (2022).","ieee":"F. Meier <i>et al.</i>, “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks,” <i>physica status solidi (b)</i>, Art. no. 2200508, 2022, doi: <a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>.","chicago":"Meier, Falco, Mario Littmann, Julius Bürger, Thomas Riedl, Daniel Kool, Jörg Lindner, Dirk Reuter, and Donat Josef As. “Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks.” <i>Physica Status Solidi (b)</i>, 2022. <a href=\"https://doi.org/10.1002/pssb.202200508\">https://doi.org/10.1002/pssb.202200508</a>.","ama":"Meier F, Littmann M, Bürger J, et al. Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. <i>physica status solidi (b)</i>. Published online 2022. doi:<a href=\"https://doi.org/10.1002/pssb.202200508\">10.1002/pssb.202200508</a>"},"publication_identifier":{"issn":["0370-1972","1521-3951"]},"publication_status":"published","title":"Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks","doi":"10.1002/pssb.202200508","publisher":"Wiley","date_updated":"2023-01-04T14:53:24Z","date_created":"2023-01-04T14:51:51Z","author":[{"last_name":"Meier","full_name":"Meier, Falco","first_name":"Falco"},{"full_name":"Littmann, Mario","last_name":"Littmann","first_name":"Mario"},{"first_name":"Julius","last_name":"Bürger","id":"46952","full_name":"Bürger, Julius"},{"first_name":"Thomas","id":"36950","full_name":"Riedl, Thomas","last_name":"Riedl"},{"first_name":"Daniel","full_name":"Kool, Daniel","id":"44586","last_name":"Kool"},{"full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner","first_name":"Jörg"},{"full_name":"Reuter, Dirk","id":"37763","last_name":"Reuter","first_name":"Dirk"},{"first_name":"Donat Josef","last_name":"As","orcid":"0000-0003-1121-3565","full_name":"As, Donat Josef","id":"14"}],"status":"public","publication":"physica status solidi (b)","type":"journal_article","keyword":["Condensed Matter Physics","Electronic","Optical and Magnetic Materials"],"article_number":"2200508","language":[{"iso":"eng"}],"_id":"35232","department":[{"_id":"15"}],"user_id":"77496"},{"language":[{"iso":"eng"}],"article_number":"2200962","keyword":["General Medicine"],"user_id":"54556","department":[{"_id":"15"},{"_id":"230"}],"_id":"34086","status":"public","type":"journal_article","publication":"Advanced Materials Interfaces","doi":"10.1002/admi.202200962","title":"High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development","author":[{"first_name":"Julius","last_name":"Bürger","id":"46952","full_name":"Bürger, Julius"},{"first_name":"Harikrishnan","last_name":"Venugopal","full_name":"Venugopal, Harikrishnan"},{"last_name":"Kool","id":"44586","full_name":"Kool, Daniel","first_name":"Daniel"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Alejandro","last_name":"Gonzalez Orive","full_name":"Gonzalez Orive, Alejandro"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305","first_name":"Katharina"},{"first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner"}],"date_created":"2022-11-15T14:00:19Z","volume":9,"date_updated":"2023-01-11T10:10:59Z","publisher":"Wiley","citation":{"ama":"Bürger J, Venugopal H, Kool D, et al. High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>. 2022;9(26). doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>","chicago":"Bürger, Julius, Harikrishnan Venugopal, Daniel Kool, Maria Teresa de los Arcos de Pedro, Alejandro Gonzalez Orive, Guido Grundmeier, Katharina Brassat, and Jörg Lindner. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i> 9, no. 26 (2022). <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>.","ieee":"J. Bürger <i>et al.</i>, “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development,” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, Art. no. 2200962, 2022, doi: <a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","apa":"Bürger, J., Venugopal, H., Kool, D., de los Arcos de Pedro, M. T., Gonzalez Orive, A., Grundmeier, G., Brassat, K., &#38; Lindner, J. (2022). High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>, <i>9</i>(26), Article 2200962. <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>","mla":"Bürger, Julius, et al. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, 2200962, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","short":"J. Bürger, H. Venugopal, D. Kool, M.T. de los Arcos de Pedro, A. Gonzalez Orive, G. Grundmeier, K. Brassat, J. Lindner, Advanced Materials Interfaces 9 (2022).","bibtex":"@article{Bürger_Venugopal_Kool_de los Arcos de Pedro_Gonzalez Orive_Grundmeier_Brassat_Lindner_2022, title={High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}, volume={9}, DOI={<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>}, number={262200962}, journal={Advanced Materials Interfaces}, publisher={Wiley}, author={Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos de Pedro, Maria Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg}, year={2022} }"},"intvolume":"         9","year":"2022","issue":"26","publication_status":"published","publication_identifier":{"issn":["2196-7350","2196-7350"]}},{"article_number":"141","_id":"34092","department":[{"_id":"15"},{"_id":"230"}],"user_id":"77496","status":"public","type":"journal_article","doi":"10.3390/nano10010141","date_updated":"2023-01-10T12:11:57Z","volume":10,"author":[{"id":"46952","full_name":"Bürger, Julius","last_name":"Bürger","first_name":"Julius"},{"last_name":"Kunnathully","full_name":"Kunnathully, Vinay","first_name":"Vinay"},{"first_name":"Daniel","full_name":"Kool, Daniel","id":"44586","last_name":"Kool"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"},{"id":"11305","full_name":"Brassat, Katharina","last_name":"Brassat","first_name":"Katharina"}],"intvolume":"        10","citation":{"chicago":"Bürger, Julius, Vinay Kunnathully, Daniel Kool, Jörg Lindner, and Katharina Brassat. “Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM.” <i>Nanomaterials</i> 10, no. 1 (2020). <a href=\"https://doi.org/10.3390/nano10010141\">https://doi.org/10.3390/nano10010141</a>.","ieee":"J. Bürger, V. Kunnathully, D. Kool, J. Lindner, and K. Brassat, “Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM,” <i>Nanomaterials</i>, vol. 10, no. 1, Art. no. 141, 2020, doi: <a href=\"https://doi.org/10.3390/nano10010141\">10.3390/nano10010141</a>.","ama":"Bürger J, Kunnathully V, Kool D, Lindner J, Brassat K. Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM. <i>Nanomaterials</i>. 2020;10(1). doi:<a href=\"https://doi.org/10.3390/nano10010141\">10.3390/nano10010141</a>","short":"J. Bürger, V. Kunnathully, D. Kool, J. Lindner, K. Brassat, Nanomaterials 10 (2020).","mla":"Bürger, Julius, et al. “Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM.” <i>Nanomaterials</i>, vol. 10, no. 1, 141, MDPI AG, 2020, doi:<a href=\"https://doi.org/10.3390/nano10010141\">10.3390/nano10010141</a>.","bibtex":"@article{Bürger_Kunnathully_Kool_Lindner_Brassat_2020, title={Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM}, volume={10}, DOI={<a href=\"https://doi.org/10.3390/nano10010141\">10.3390/nano10010141</a>}, number={1141}, journal={Nanomaterials}, publisher={MDPI AG}, author={Bürger, Julius and Kunnathully, Vinay and Kool, Daniel and Lindner, Jörg and Brassat, Katharina}, year={2020} }","apa":"Bürger, J., Kunnathully, V., Kool, D., Lindner, J., &#38; Brassat, K. (2020). Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM. <i>Nanomaterials</i>, <i>10</i>(1), Article 141. <a href=\"https://doi.org/10.3390/nano10010141\">https://doi.org/10.3390/nano10010141</a>"},"publication_identifier":{"issn":["2079-4991"]},"publication_status":"published","keyword":["General Materials Science","General Chemical Engineering"],"language":[{"iso":"eng"}],"abstract":[{"text":"<jats:p>Block copolymer (BCP) self-assembly is a promising tool for next generation lithography as microphase separated polymer domains in thin films can act as templates for surface nanopatterning with sub-20 nm features. The replicated patterns can, however, only be as precise as their templates. Thus, the investigation of the morphology of polymer domains is of great importance. Commonly used analytical techniques (neutron scattering, scanning force microscopy) either lack spatial information or nanoscale resolution. Using advanced analytical (scanning) transmission electron microscopy ((S)TEM), we provide real space information on polymer domain morphology and interfaces between polystyrene (PS) and polymethylmethacrylate (PMMA) in cylinder- and lamellae-forming BCPs at highest resolution. This allows us to correlate the internal structure of polymer domains with line edge roughnesses, interface widths and domain sizes. STEM is employed for high-resolution imaging, electron energy loss spectroscopy and energy filtered TEM (EFTEM) spectroscopic imaging for material identification and EFTEM thickness mapping for visualisation of material densities at defects. The volume fraction of non-phase separated polymer species can be analysed by EFTEM. These methods give new insights into the morphology of polymer domains the exact knowledge of which will allow to improve pattern quality for nanolithography.</jats:p>","lang":"eng"}],"publication":"Nanomaterials","title":"Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM","publisher":"MDPI AG","date_created":"2022-11-15T14:20:33Z","year":"2020","issue":"1"},{"language":[{"iso":"eng"}],"_id":"4444","department":[{"_id":"15"},{"_id":"286"}],"user_id":"55706","status":"public","publication":"To be submitted","type":"journal_article","title":"Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes","date_updated":"2022-01-06T07:01:04Z","date_created":"2018-09-18T11:42:30Z","author":[{"first_name":"Katharina","id":"11305","full_name":"Brassat, Katharina","last_name":"Brassat"},{"first_name":"Daniel","full_name":"Kool, Daniel","id":"44586","last_name":"Kool"},{"first_name":"Jörg","id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner"}],"year":"2018","citation":{"mla":"Brassat, Katharina, et al. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” <i>To Be Submitted</i>.","bibtex":"@article{Brassat_Kool_Lindner, title={Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes}, journal={To be submitted}, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg} }","short":"K. Brassat, D. Kool, J. Lindner, To Be Submitted (n.d.).","apa":"Brassat, K., Kool, D., &#38; Lindner, J. (n.d.). Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. <i>To Be Submitted</i>.","ieee":"K. Brassat, D. Kool, and J. Lindner, “Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes,” <i>To be submitted</i>.","chicago":"Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” <i>To Be Submitted</i>, n.d.","ama":"Brassat K, Kool D, Lindner J. Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. <i>To be submitted</i>."},"publication_status":"draft"},{"user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"3921","file_date_updated":"2018-08-16T12:59:56Z","article_type":"original","type":"journal_article","status":"public","author":[{"last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305","first_name":"Katharina"},{"id":"44586","full_name":"Kool, Daniel","last_name":"Kool","first_name":"Daniel"},{"id":"46952","full_name":"Bürger, Julius","last_name":"Bürger","first_name":"Julius"},{"full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner","first_name":"Jörg"}],"volume":10,"date_updated":"2022-01-06T06:59:55Z","doi":"10.1039/c8nr01397g","publication_status":"published","publication_identifier":{"issn":["2040-3364","2040-3372"]},"has_accepted_license":"1","citation":{"apa":"Brassat, K., Kool, D., Bürger, J., &#38; Lindner, J. (2018). Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. <i>Nanoscale</i>, <i>10</i>(21), 10005–10017. <a href=\"https://doi.org/10.1039/c8nr01397g\">https://doi.org/10.1039/c8nr01397g</a>","bibtex":"@article{Brassat_Kool_Bürger_Lindner_2018, title={Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography}, volume={10}, DOI={<a href=\"https://doi.org/10.1039/c8nr01397g\">10.1039/c8nr01397g</a>}, number={21}, journal={Nanoscale}, publisher={Royal Society of Chemistry (RSC)}, author={Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg}, year={2018}, pages={10005–10017} }","mla":"Brassat, Katharina, et al. “Hierarchical Nanopores Formed by Block Copolymer Lithography on the Surfaces of Different Materials Pre-Patterned by Nanosphere Lithography.” <i>Nanoscale</i>, vol. 10, no. 21, Royal Society of Chemistry (RSC), 2018, pp. 10005–17, doi:<a href=\"https://doi.org/10.1039/c8nr01397g\">10.1039/c8nr01397g</a>.","short":"K. Brassat, D. Kool, J. Bürger, J. Lindner, Nanoscale 10 (2018) 10005–10017.","ama":"Brassat K, Kool D, Bürger J, Lindner J. Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. <i>Nanoscale</i>. 2018;10(21):10005-10017. doi:<a href=\"https://doi.org/10.1039/c8nr01397g\">10.1039/c8nr01397g</a>","chicago":"Brassat, Katharina, Daniel Kool, Julius Bürger, and Jörg Lindner. “Hierarchical Nanopores Formed by Block Copolymer Lithography on the Surfaces of Different Materials Pre-Patterned by Nanosphere Lithography.” <i>Nanoscale</i> 10, no. 21 (2018): 10005–17. <a href=\"https://doi.org/10.1039/c8nr01397g\">https://doi.org/10.1039/c8nr01397g</a>.","ieee":"K. Brassat, D. Kool, J. Bürger, and J. Lindner, “Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography,” <i>Nanoscale</i>, vol. 10, no. 21, pp. 10005–10017, 2018."},"page":"10005-10017","intvolume":"        10","language":[{"iso":"eng"}],"ddc":["530"],"publication":"Nanoscale","file":[{"success":1,"relation":"main_file","content_type":"application/pdf","file_size":3875099,"access_level":"closed","file_name":"Hierarchical_nanopores_by_block_copolymer_lithography_on_surfaces_of_different_materials_pre-patterned_by_nanosphere_lithography_2018.pdf","file_id":"3922","date_updated":"2018-08-16T12:59:56Z","creator":"hclaudia","date_created":"2018-08-16T12:59:56Z"}],"abstract":[{"lang":"eng","text":"Bottom-up patterning techniques allow for the creation of surfaces with ordered arrays of nanoscale features\r\non large areas. Two bottom-up techniques suitable for the formation of regular nanopatterns on\r\ndifferent length scales are nanosphere lithography (NSL) and block copolymer (BCP) lithography. In this\r\npaper it is shown that NSL and BCP lithography can be combined to easily design hierarchically nanopatterned\r\nsurfaces of different materials. Nanosphere lithography is used for the pre-patterning of\r\nsurfaces with antidots, i.e. hexagonally arranged cylindrical holes in thin films of Au, Pt and TiO2 on SiO2,\r\nproviding a periodic chemical and topographical contrast on the surface suitable for templating in subsequent\r\nBCP lithography. PS-b-PMMA BCP is used in the second self-assembly step to form hexagonally\r\narranged nanopores with sub-20 nm diameter within the antidots upon microphase separation. To\r\nachieve this the microphase separation of BCP on planar surfaces is studied, too, and it is demonstrated\r\nfor the first time that vertical BCP nanopores can be formed on TiO2, Au and Pt films without using any\r\nneutralization layers. To explain this the influence of surface energy, polarity and roughness on the microphase\r\nseparation is investigated and discussed along with the wetting state of BCP on NSL-pre-patterned\r\nsurfaces. The presented novel route for the creation of advanced hierarchical nanopatterns is easily applicable\r\non large-area surfaces of different materials. This flexibility makes it suitable for a broad range of\r\napplications, from the morphological design of biocompatible surfaces for life science to complex\r\npre-patterns for nanoparticle placement in semiconductor technology."}],"date_created":"2018-08-16T12:59:02Z","publisher":"Royal Society of Chemistry (RSC)","title":"Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography","issue":"21","year":"2018"},{"user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"3929","status":"public","type":"conference","conference":{"end_date":"2018-09-20","location":"Warsaw, Poland","name":"EMRS-Fall Meeting 2018","start_date":"2018-09-17"},"title":"Hierarchical nanopore and nanoring arrays by self-assembly techniques","date_created":"2018-08-16T13:15:37Z","author":[{"full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat","first_name":"Katharina"},{"full_name":"Kool, Daniel","id":"44586","last_name":"Kool","first_name":"Daniel"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"date_updated":"2022-01-06T06:59:56Z","citation":{"chicago":"Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Hierarchical Nanopore and Nanoring Arrays by Self-Assembly Techniques,” 2018.","ieee":"K. Brassat, D. Kool, and J. Lindner, “Hierarchical nanopore and nanoring arrays by self-assembly techniques,” presented at the EMRS-Fall Meeting 2018, Warsaw, Poland, 2018.","ama":"Brassat K, Kool D, Lindner J. Hierarchical nanopore and nanoring arrays by self-assembly techniques. In: ; 2018.","mla":"Brassat, Katharina, et al. <i>Hierarchical Nanopore and Nanoring Arrays by Self-Assembly Techniques</i>. 2018.","bibtex":"@inproceedings{Brassat_Kool_Lindner_2018, title={Hierarchical nanopore and nanoring arrays by self-assembly techniques}, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg}, year={2018} }","short":"K. Brassat, D. Kool, J. Lindner, in: 2018.","apa":"Brassat, K., Kool, D., &#38; Lindner, J. (2018). Hierarchical nanopore and nanoring arrays by self-assembly techniques. Presented at the EMRS-Fall Meeting 2018, Warsaw, Poland."},"year":"2018"},{"type":"conference","citation":{"apa":"Brassat, K., Taube, A., Kool, D., Tasche, L., Hoyer, K. P., Schaper, M., &#38; Lindner, J. (2018). Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly. Presented at the EMRS-Fall Meeting 2018, Warsaw, Poland.","bibtex":"@inproceedings{Brassat_Taube_Kool_Tasche_Hoyer_Schaper_Lindner_2018, title={Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly}, author={Brassat, Katharina and Taube, A. and Kool, Daniel and Tasche, L. and Hoyer, K.P. and Schaper, Mirko and Lindner, Jörg}, year={2018} }","short":"K. Brassat, A. Taube, D. Kool, L. Tasche, K.P. Hoyer, M. Schaper, J. Lindner, in: 2018.","mla":"Brassat, Katharina, et al. <i>Ti-6Al-4V Alloy: 3D Printing of Lightweight Implants and Nanopatterning by Self-Assembly</i>. 2018.","chicago":"Brassat, Katharina, A. Taube, Daniel Kool, L. Tasche, K.P. Hoyer, Mirko Schaper, and Jörg Lindner. “Ti-6Al-4V Alloy: 3D Printing of Lightweight Implants and Nanopatterning by Self-Assembly,” 2018.","ieee":"K. Brassat <i>et al.</i>, “Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly,” presented at the EMRS-Fall Meeting 2018, Warsaw, Poland, 2018.","ama":"Brassat K, Taube A, Kool D, et al. Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly. In: ; 2018."},"status":"public","year":"2018","author":[{"full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat","first_name":"Katharina"},{"first_name":"A.","last_name":"Taube","full_name":"Taube, A."},{"first_name":"Daniel","last_name":"Kool","id":"44586","full_name":"Kool, Daniel"},{"first_name":"L.","full_name":"Tasche, L.","last_name":"Tasche"},{"first_name":"K.P.","full_name":"Hoyer, K.P.","last_name":"Hoyer"},{"full_name":"Schaper, Mirko","last_name":"Schaper","first_name":"Mirko"},{"first_name":"Jörg","id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner"}],"date_created":"2018-08-16T13:18:03Z","user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"date_updated":"2022-01-06T06:59:56Z","_id":"3930","conference":{"start_date":"2018-09-17","name":"EMRS-Fall Meeting 2018","location":"Warsaw, Poland","end_date":"2018-09-20"},"title":"Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly"},{"_id":"3943","department":[{"_id":"286"}],"user_id":"55706","language":[{"iso":"eng"}],"type":"conference","status":"public","date_updated":"2022-01-06T06:59:58Z","date_created":"2018-08-20T12:46:33Z","author":[{"first_name":"Katharina","id":"11305","full_name":"Brassat, Katharina","last_name":"Brassat"},{"id":"44586","full_name":"Kool, Daniel","last_name":"Kool","first_name":"Daniel"},{"full_name":"Taube, A.","last_name":"Taube","first_name":"A."},{"full_name":"Schaper, Mirko","last_name":"Schaper","first_name":"Mirko"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"}],"title":"Morphology investigation of nanopores by block copolymer lithography on different material surfaces","conference":{"location":"Straßburg, France","end_date":"2018-06-22","start_date":"2018-06-18","name":"EMRS Spring Meeting 2018"},"year":"2018","citation":{"bibtex":"@inproceedings{Brassat_Kool_Taube_Schaper_Lindner_2018, title={Morphology investigation of nanopores by block copolymer lithography on different material surfaces}, author={Brassat, Katharina and Kool, Daniel and Taube, A. and Schaper, Mirko and Lindner, Jörg}, year={2018} }","mla":"Brassat, Katharina, et al. <i>Morphology Investigation of Nanopores by Block Copolymer Lithography on Different Material Surfaces</i>. 2018.","short":"K. Brassat, D. Kool, A. Taube, M. Schaper, J. Lindner, in: 2018.","apa":"Brassat, K., Kool, D., Taube, A., Schaper, M., &#38; Lindner, J. (2018). Morphology investigation of nanopores by block copolymer lithography on different material surfaces. Presented at the EMRS Spring Meeting 2018, Straßburg, France.","ama":"Brassat K, Kool D, Taube A, Schaper M, Lindner J. Morphology investigation of nanopores by block copolymer lithography on different material surfaces. In: ; 2018.","ieee":"K. Brassat, D. Kool, A. Taube, M. Schaper, and J. Lindner, “Morphology investigation of nanopores by block copolymer lithography on different material surfaces,” presented at the EMRS Spring Meeting 2018, Straßburg, France, 2018.","chicago":"Brassat, Katharina, Daniel Kool, A. Taube, Mirko Schaper, and Jörg Lindner. “Morphology Investigation of Nanopores by Block Copolymer Lithography on Different Material Surfaces,” 2018."}},{"conference":{"location":"Warsaw (Poland)","end_date":"2017-09-21","start_date":"2017-09-18","name":"E-MRS Fall Meeting 2017"},"title":"Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques","date_created":"2018-08-20T13:24:15Z","author":[{"full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat","first_name":"Katharina"},{"first_name":"Daniel","last_name":"Kool","id":"44586","full_name":"Kool, Daniel"},{"first_name":"Julius","last_name":"Bürger","full_name":"Bürger, Julius","id":"46952"},{"first_name":"Jörg","last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg"}],"date_updated":"2022-01-06T06:59:59Z","citation":{"apa":"Brassat, K., Kool, D., Bürger, J., &#38; Lindner, J. (2017). Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. Presented at the E-MRS Fall Meeting 2017, Warsaw (Poland).","short":"K. Brassat, D. Kool, J. Bürger, J. Lindner, in: 2017.","bibtex":"@inproceedings{Brassat_Kool_Bürger_Lindner_2017, title={Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques}, author={Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg}, year={2017} }","mla":"Brassat, Katharina, et al. <i>Micro- and Nanopatterned Surfaces with Tailored Chemical and Topographical Contrast by Self-Assembly Techniques</i>. 2017.","ama":"Brassat K, Kool D, Bürger J, Lindner J. Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. In: ; 2017.","ieee":"K. Brassat, D. Kool, J. Bürger, and J. Lindner, “Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques,” presented at the E-MRS Fall Meeting 2017, Warsaw (Poland), 2017.","chicago":"Brassat, Katharina, Daniel Kool, Julius Bürger, and Jörg Lindner. “Micro- and Nanopatterned Surfaces with Tailored Chemical and Topographical Contrast by Self-Assembly Techniques,” 2017."},"year":"2017","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"3952","status":"public","type":"conference"},{"title":"Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography ","conference":{"name":"E-MRS Fall Meeting 2016","start_date":"2016-09-19","end_date":"2016-09-22","location":"Warsaw (Poland)"},"date_updated":"2022-01-06T07:00:06Z","date_created":"2018-08-21T12:25:04Z","author":[{"last_name":"Brassat","id":"11305","full_name":"Brassat, Katharina","first_name":"Katharina"},{"first_name":"Daniel","last_name":"Kool","id":"44586","full_name":"Kool, Daniel"},{"last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797","first_name":"Jörg"}],"year":"2016","citation":{"chicago":"Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Hierarchically Ordered Nanopore Structures Formed by Combined Nanosphere and Block Copolymer Lithography ,” 2016.","ieee":"K. Brassat, D. Kool, and J. Lindner, “Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","ama":"Brassat K, Kool D, Lindner J. Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography . In: ; 2016.","bibtex":"@inproceedings{Brassat_Kool_Lindner_2016, title={Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography }, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg}, year={2016} }","short":"K. Brassat, D. Kool, J. Lindner, in: 2016.","mla":"Brassat, Katharina, et al. <i>Hierarchically Ordered Nanopore Structures Formed by Combined Nanosphere and Block Copolymer Lithography </i>. 2016.","apa":"Brassat, K., Kool, D., &#38; Lindner, J. (2016). Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland)."},"language":[{"iso":"eng"}],"_id":"4007","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","status":"public","type":"conference"}]