@article{66040,
  abstract     = {{<jats:p>Magnetron-sputtered CNx thin films are primarily employed as hard, low-friction protective and tribological coatings, as solar cells, and for catalytic applications. Lower growth rates and a reduced N content, favoring graphitic sp2 structures, hinder industrial scalability due to prolonged deposition times and produce softer, less dense films with inferior hardness, elasticity, and wear resistance. Carbon nitride films deposited by magnetron sputtering exhibit growth behavior strongly influenced by plasma–surface interactions. However, nitrogen resputtering and reduced film growth rates are commonly attributed to chemical etching by positive ions. We propose an additional, unreported power-dependent mechanism involving negative ions formed at the carbon target. These ions are accelerated through the plasma sheath, reaching the substrate with high kinetic energy and inducing both chemical and physical resputtering. This effect is localized to the geometrical projection of the target, as shown by spatially resolved analysis: ellipsometry reveals thickness reduction, and x-ray photoelectron spectroscopy and Raman spectroscopy indicate nitrogen depletion within this region. Correlation between stoichiometry and structural signatures confirms the decisive role of negative ions in modifying the film composition and microstructure. At the same time, the composition of the gas mixture exerts only a minor effect.</jats:p>}},
  author       = {{Wieschhoff, Christian and Theile-Rasche, Chantal and Wang, Fuzeng and Prib, Michael and Moldt, Viktoria Daniela Dorothea and Grundmeier, Guido and Salas, Nieves López and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{0021-8979}},
  journal      = {{Journal of Applied Physics}},
  number       = {{24}},
  publisher    = {{AIP Publishing}},
  title        = {{{Influence of negative ions on the stoichiometry and structure of carbon nitride films deposited by reactive magnetron sputtering}}},
  doi          = {{10.1063/5.0335780}},
  volume       = {{139}},
  year         = {{2026}},
}

@article{66041,
  author       = {{Voth, Sven and Zhao, Zhenyu and Baier, Dominik and Glass, Alexandra and Elgabarty, Hossam and Sandberg, Oskar J. and Grundmeier, Guido and Tiemann, Michael and Smått, Jan-Henrik and Anttu, Nicklas and de los Arcos de Pedro, Maria Teresa and Weinberger, Christian}},
  issn         = {{2379-3694}},
  journal      = {{ACS Sensors}},
  publisher    = {{American Chemical Society (ACS)}},
  title        = {{{Role of Irradiance in Light-Activated In                    <sub>2</sub>                    O                    <sub>3</sub>                    Gas Sensors: Why More Light Is Not Always Better}}},
  doi          = {{10.1021/acssensors.6c01100}},
  year         = {{2026}},
}

@article{66042,
  author       = {{Qudsia, Syeda and Weiss, Alexander and Sirkiä, Saara and Wang, Fuzeng and Rosqvist, Emil and de los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Halme, Janne and Kemell, Marianna and Smått, Jan-Henrik}},
  issn         = {{0169-4332}},
  journal      = {{Applied Surface Science}},
  publisher    = {{Elsevier BV}},
  title        = {{{Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance}}},
  doi          = {{10.1016/j.apsusc.2026.166755}},
  volume       = {{736}},
  year         = {{2026}},
}

@article{58613,
  abstract     = {{Self-assembled DNA origami lattices on silicon oxide surfaces have great potential to serve as masks in molecular lithography. However, silicon oxide surfaces come in many different forms and the type and history of the silicon oxide has a large effect on its physicochemical surface properties. Therefore, we here investigate DNA origami lattice formation on differently fabricated SiOx films on silicon wafers after wet-chemical oxidation by RCA1. Despite having similar oxide compositions and hydroxylation states, of all surfaces tested, only thermally grown SiOx performs similarly well as native oxide. For the other SiOx films deposited by plasma-enhanced chemical vapor deposition and magnetron sputtering, DNA origami adsorption is strongly suppressed. This is attributed to an increased surface roughness and a lower oxide density, respectively. Our results demonstrate that the employed SiOx surface may decide over the outcome of an experiment and should be considered as an additional parameter that may require optimization and fine-tuning before high-quality lattices can be assembled. In particular, our observations suggest that efficient DNA origami lattice assembly on SiOx surfaces requires a low surface roughness and a high oxide density.}},
  author       = {{Pothineni, Bhanu Kiran and Theile-Rasche, Chantal and Müller, Hendrik and Grundmeier, Guido and de los Arcos de Pedro, Maria Teresa and Keller, Adrian}},
  journal      = {{Chemistry – A European Journal}},
  pages        = {{e202404108}},
  title        = {{{DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces}}},
  doi          = {{10.1002/chem.202404108}},
  year         = {{2025}},
}

@article{62876,
  abstract     = {{<jats:title>ABSTRACT</jats:title>
                  <jats:p>Spin‐coated polylactide (PLA) thin films were exposed to nitrogen plasma for varying time intervals. The progressive etching of the PLA film in direct contact with the nitrogen plasma was monitored in situ using polarization modulated infrared reflection absorption spectroscopy (PM‐IRRAS). No appreciative changes in composition were seen with PM‐IRRAS, indicating that the etching did not significantly affect the bulk composition. Atomic force microscopy characterization of the plasma‐etched films showed that the PLA films are homogeneously etched. Subsequent ex situ XPS analysis of the treated surface revealed the presence of C‐N bonds in the surface‐near region that could be associated with amino and/or amide surface species. PLA films were also alternatively exposed to nitrogen ion beams produced by an electron‐cyclotron‐resonance (ECR) plasma source and were investigated in vacuo by XPS. This treatment revealed the partial substitution of surface oxygen species by nitrogen, resulting in a similar surface modification as in the plasma case. The comparison of XPS data and water contact angle studies suggest that the activated surfaces show a reorientation of macromolecular fragments in the surface‐near region depending on the polarity of the phase with which they are in contact. Under ultra‐high vacuum (UHV) conditions, the surface tends to lower its surface energy, while in contact with the aqueous phase, subsurface polar groups orientate outwards, which enables the formation of hydrogen bonds.</jats:p>}},
  author       = {{Gołębiowska, Sandra and Voigt, Markus and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}},
  issn         = {{0142-2421}},
  journal      = {{Surface and Interface Analysis}},
  number       = {{7}},
  pages        = {{499--509}},
  publisher    = {{Wiley}},
  title        = {{{In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films}}},
  doi          = {{10.1002/sia.7406}},
  volume       = {{57}},
  year         = {{2025}},
}

@article{62875,
  author       = {{Theile-Rasche, Chantal and Wang, Fuzeng and Prüßner, Tim and Huck, Marten and Steinrück, Hans-Georg and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}},
  issn         = {{0040-6090}},
  journal      = {{Thin Solid Films}},
  publisher    = {{Elsevier BV}},
  title        = {{{Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing}}},
  doi          = {{10.1016/j.tsf.2025.140676}},
  volume       = {{820}},
  year         = {{2025}},
}

@article{62874,
  abstract     = {{<jats:p>DNA origami adsorption at single-crystalline TiO<jats:sub>2</jats:sub> surfaces is investigated at different Mg<jats:sup>2+</jats:sup> concentrations. For TiO<jats:sub>2</jats:sub>(001), DNA origami adsorption is stronger at 5 mM than at 10 mM Mg<jats:sup>2+</jats:sup>, whereas the opposite is observed for TiO<jats:sub>2</jats:sub>(110) and TiO<jats:sub>2</jats:sub>(111).</jats:p>}},
  author       = {{Xu, Xiaodan and Gołębiowska, Sandra and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Keller, Adrian}},
  issn         = {{2755-3701}},
  journal      = {{RSC Applied Interfaces}},
  publisher    = {{Royal Society of Chemistry (RSC)}},
  title        = {{{DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces}}},
  doi          = {{10.1039/d5lf00109a}},
  year         = {{2025}},
}

@article{62873,
  abstract     = {{<jats:title>Abstract</jats:title><jats:p>Vapor phase infiltration (VPI) has emerged as a promising tool for fabrication of novel hybrid materials. In the field of polymeric gas separation membranes, a beneficial impact on stability and membrane performance is known for several polymers with differing functional groups. This study for the first time investigates VPI of trimethylaluminum (TMA) into poly(1‐trimethylsilyl‐1‐propyne) (PTMSP), featuring a carbon–carbon double bond as functional group. Saturation of the precursor inside the polymer is already attained after 60 s infiltration time leading to significant densification of the material. Depth profiling proves accumulation of aluminum in the polymer itself, but a significantly increased accumulation is visible in the gradient layer between polymer and SiO<jats:sub>2</jats:sub> substrate. A reaction pathway is proposed and supplemented by density‐functional theory (DFT) calculations. Infrared spectra derived from both experiments and simulation support the presented reaction pathway. In terms of permeance, a favorable impact on selectivity is observed for infiltration times up to 1 s. Longer infiltration times yield greatly reduced permeance values close or even below the detection limit of the measurement device. The present results of this study set a strong basis for the application of VPI on polymers for gas‐barrier and membrane applications in the future.</jats:p>}},
  author       = {{Jenderny, Jonathan and Boysen, Nils and Rubner, Jens and Zysk, Frederik and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Damerla, Varun Raj and Kostka, Aleksander and Franke, Jonas and Dahlmann, Rainer and Kühne, Thomas D. and Wessling, Matthias and Awakowicz, Peter and Devi, Anjana}},
  issn         = {{2196-7350}},
  journal      = {{Advanced Materials Interfaces}},
  number       = {{28}},
  publisher    = {{Wiley}},
  title        = {{{Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum}}},
  doi          = {{10.1002/admi.202400171}},
  volume       = {{11}},
  year         = {{2024}},
}

@article{58612,
  author       = {{Luis-Sunga, Maximina and González-Orive, Alejandro and Calderón, Juan Carlos and Gamba, Ilaria and Ródenas, Airán and de los Arcos de Pedro, Maria Teresa and Hernández-Creus, Alberto and Grundmeier, Guido and Pastor, Elena and García, Gonzalo}},
  issn         = {{2574-0970}},
  journal      = {{ACS Applied Nano Materials}},
  title        = {{{Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications}}},
  doi          = {{10.1021/acsanm.3c05949}},
  year         = {{2024}},
}

@article{58611,
  abstract     = {{AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode}},
  author       = {{Müller, Hendrik and Stadler, Hartmut and de los Arcos de Pedro, Maria Teresa and Keller, Adrian and Grundmeier, Guido}},
  issn         = {{2190-4286}},
  journal      = {{Beilstein Journal of Nanotechnology}},
  number       = {{1}},
  pages        = {{603–611}},
  title        = {{{AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode}}},
  doi          = {{10.3762/bjnano.15.51}},
  volume       = {{15}},
  year         = {{2024}},
}

@article{46480,
  author       = {{Müller, Hendrik and Weinberger, Christian and Grundmeier, Guido and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{0368-2048}},
  journal      = {{Journal of Electron Spectroscopy and Related Phenomena}},
  keywords     = {{Physical and Theoretical Chemistry, Spectroscopy, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Radiation, Electronic, Optical and Magnetic Materials}},
  publisher    = {{Elsevier BV}},
  title        = {{{UV-enhanced environmental charge compensation in near ambient pressure XPS}}},
  doi          = {{10.1016/j.elspec.2023.147317}},
  volume       = {{264}},
  year         = {{2023}},
}

@article{58608,
  abstract     = {{Interfacial reactions at the polycarbonate (PC)/FeCr-alloy interface during melt contact were studied as function of the Fe:Cr ratio within the alloy. Thin Fe/Cr films with lateral composition gradients were deposited by magnetron sputtering; the analysis of the films was done with microscopy and X-ray photoelectron spectroscopy (XPS). The local interfacial polymeric film formation could be therefore directly correlated with the Fe:Cr ratio. The local thickness and structure of the formed polycarbonate residue was analyzed by means of imaging ellipsometry, atomic force microscopy as well as Fourier-transform infrared spectroscopy under grazing incidence and XPS. Moreover, confocal fluorescence microscopy of the PC melt/alloy interface could reveal the formation of minor degradation products in the interphase region. The results show that already an Fe:Cr ratio of 2 : 1 leads to a strong inhibition of the thermal degradation in comparison to the unalloyed iron, and that in general, the enrichment of chromium in the passive film leads to an effective suppression of interfacial PC degradation. The data contributes to improving the mechanistic understanding of the role of iron during this process. Additionally, a critical concentration of chromium in the alloys used for PC processing can be deduced.}},
  author       = {{Theile-Rasche, Chantal and Meng, T. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}},
  issn         = {{2523-3971}},
  journal      = {{SN Applied Sciences}},
  number       = {{10}},
  pages        = {{1–12}},
  title        = {{{Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry}}},
  doi          = {{10.1007/s42452-023-05441-5}},
  volume       = {{5}},
  year         = {{2023}},
}

@article{58609,
  abstract     = {{Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary field of low temperature plasma science.}},
  author       = {{de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas and Gergs, Tobias and Jenderny, Jonathan and Kemaneci, Efe and Kühne, Thomas D. and Kusmierz, Simon and Mussenbrock, Thomas and Rubner, Jens and Trieschmann, Jan and Wessling, Matthias and Xie, Xiaofan and Zanders, David and Zysk, Frederik and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{PLASMA PROCESSES AND POLYMERS}},
  pages        = {{e2300186}},
  title        = {{{PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films}}},
  doi          = {{10.1002/ppap.202300186}},
  year         = {{2023}},
}

@article{58610,
  author       = {{de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Benedikt, Jan and Biskup, Beatrix and Böke, Marc and Boysen, Nils and Buschhaus, Rahel and Dahlmann, Rainer and Devi, Anjana and Gergs, Tobias and Jenderny, Jonathan and von Keudell, Achim and Kühne, Thomas D. and Kusmierz, Simon and Müller, Hendrik and Mussenbrock, Thomas and Trieschmann, Jan and Zanders, David and Zysk, Frederik and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{PLASMA PROCESSES AND POLYMERS}},
  pages        = {{e2300150}},
  title        = {{{PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth}}},
  doi          = {{10.1002/ppap.202300150}},
  year         = {{2023}},
}

@article{58607,
  author       = {{Xie, Xiaofan and Zanders, David and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Devi, Anjana and Grundmeier, Guido}},
  issn         = {{0142-2421}},
  journal      = {{Surface and Interface Analysis}},
  title        = {{{Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer deposition}}},
  doi          = {{10.1002/sia.7256}},
  year         = {{2023}},
}

@article{34086,
  author       = {{Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos de Pedro, Maria Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg}},
  issn         = {{2196-7350}},
  journal      = {{Advanced Materials Interfaces}},
  keywords     = {{General Medicine}},
  number       = {{26}},
  publisher    = {{Wiley}},
  title        = {{{High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}}},
  doi          = {{10.1002/admi.202200962}},
  volume       = {{9}},
  year         = {{2022}},
}

@article{35977,
  author       = {{Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{4}},
  publisher    = {{Wiley}},
  title        = {{{Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}}},
  doi          = {{10.1002/ppap.202100174}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{35976,
  author       = {{de los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Zysk, Frederik and Raj Damerla, Varun and Kollmann, Sabrina and Vieth, Pascal and Tiemann, Michael and Kühne, Thomas D. and Grundmeier, Guido}},
  issn         = {{0169-4332}},
  journal      = {{Applied Surface Science}},
  keywords     = {{Surfaces, Coatings and Films, Condensed Matter Physics, Surfaces and Interfaces, General Physics and Astronomy, General Chemistry}},
  publisher    = {{Elsevier BV}},
  title        = {{{Challenges in the interpretation of gas core levels for the determination of gas-solid interactions within dielectric porous films by ambient pressure XPS}}},
  doi          = {{10.1016/j.apsusc.2022.154525}},
  volume       = {{604}},
  year         = {{2022}},
}

@article{35974,
  author       = {{Xie, Xiaofan and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  keywords     = {{Polymers and Plastics, Condensed Matter Physics}},
  number       = {{11}},
  publisher    = {{Wiley}},
  title        = {{{Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation}}},
  doi          = {{10.1002/ppap.202200052}},
  volume       = {{19}},
  year         = {{2022}},
}

@article{46479,
  author       = {{Bobzin, K. and Kalscheuer, C. and Grundmeier, Guido and Kollmann, S. and Carlet, M. and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{0257-8972}},
  journal      = {{Surface and Coatings Technology}},
  keywords     = {{Materials Chemistry, Surfaces, Coatings and Films, Surfaces and Interfaces, Condensed Matter Physics, General Chemistry}},
  publisher    = {{Elsevier BV}},
  title        = {{{Oxidation stability of chromium aluminum oxynitride hard coatings}}},
  doi          = {{10.1016/j.surfcoat.2022.128927}},
  volume       = {{449}},
  year         = {{2022}},
}