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Drumm, “Digitale Räume geben und nehmen: Unterrichtsinteraktion in DSH-Kursen während der COVID-19-Pandemie.,” Informationen Deutsch als Fremdsprache 48, vol. 48, no. 2021, pp. 496–515, 2021.","short":"N. Stenzel, M. Müller, S. Drumm, Informationen Deutsch Als Fremdsprache 48 48 (2021) 496–515.","mla":"Stenzel, Nadja, et al. “Digitale Räume Geben Und Nehmen: Unterrichtsinteraktion in DSH-Kursen Während Der COVID-19-Pandemie.” Informationen Deutsch Als Fremdsprache 48, vol. 48, no. 2021, 2021, pp. 496–515.","bibtex":"@article{Stenzel_Müller_Drumm_2021, title={Digitale Räume geben und nehmen: Unterrichtsinteraktion in DSH-Kursen während der COVID-19-Pandemie.}, volume={48}, number={2021}, journal={Informationen Deutsch als Fremdsprache 48}, author={Stenzel, Nadja and Müller, Mareike and Drumm, Sandra}, year={2021}, pages={496–515} }","apa":"Stenzel, N., Müller, M., & Drumm, S. (2021). Digitale Räume geben und nehmen: Unterrichtsinteraktion in DSH-Kursen während der COVID-19-Pandemie. 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Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks. Microscopy and Microanalysis. 2021;28(1):185-195. doi:10.1017/s1431927621013866","apa":"Riedl, T., & Lindner, J. (2021). Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks. Microscopy and Microanalysis, 28(1), 185–195. https://doi.org/10.1017/s1431927621013866","ieee":"T. Riedl and J. Lindner, “Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks,” Microscopy and Microanalysis, vol. 28, no. 1, pp. 185–195, 2021, doi: 10.1017/s1431927621013866.","short":"T. Riedl, J. Lindner, Microscopy and Microanalysis 28 (2021) 185–195."},"page":"185-195","abstract":[{"text":"AbstractColloidal nanosphere monolayers—used as a lithography mask for site-controlled material deposition or removal—offer the possibility of cost-effective patterning of large surface areas. In the present study, an automated analysis of scanning electron microscopy (SEM) images is described, which enables the recognition of the individual nanospheres in densely packed monolayers in order to perform a statistical quantification of the sphere size, mask opening size, and sphere-sphere separation distributions. Search algorithms based on Fourier transformation, cross-correlation, multiple-angle intensity profiling, and sphere edge point detection techniques allow for a sphere detection efficiency of at least 99.8%, even in the case of considerable sphere size variations. While the sphere positions and diameters are determined by fitting circles to the spheres edge points, the openings between sphere triples are detected by intensity thresholding. For the analyzed polystyrene sphere monolayers with sphere sizes between 220 and 600 nm and a diameter spread of around 3% coefficients of variation of 6.8–8.1% for the opening size are found. By correlating the mentioned size distributions, it is shown that, in this case, the dominant contribution to the opening size variation stems from nanometer-scale positional variations of the spheres.","lang":"eng"}],"user_id":"77496","publisher":"Cambridge University Press (CUP)","author":[{"full_name":"Riedl, Thomas","first_name":"Thomas","id":"36950","last_name":"Riedl"},{"id":"20797","last_name":"Lindner","full_name":"Lindner, Jörg","first_name":"Jörg"}],"keyword":["Instrumentation"],"publication":"Microscopy and Microanalysis","status":"public","date_created":"2022-11-10T14:13:19Z","volume":28,"date_updated":"2023-01-10T12:11:24Z","doi":"10.1017/s1431927621013866","language":[{"iso":"eng"}],"title":"Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks","department":[{"_id":"15"},{"_id":"230"}],"publication_identifier":{"issn":["1431-9276","1435-8115"]},"publication_status":"published"},{"department":[{"_id":"58"},{"_id":"230"}],"publication":"OSA Technical Digest","author":[{"first_name":"Dengyang","full_name":"Fang, Dengyang","last_name":"Fang"},{"first_name":"Andrea","full_name":"Zazzi, Andrea","last_name":"Zazzi"},{"last_name":"Müller","first_name":"Juliana","full_name":"Müller, Juliana"},{"first_name":"Drayß","full_name":"Daniel, Drayß","last_name":"Daniel"},{"last_name":"Füllner","first_name":"Christoph","full_name":"Füllner, Christoph"},{"last_name":"Marin-Palomo","full_name":"Marin-Palomo, Pablo","first_name":"Pablo"},{"first_name":"Ali Tabatabaei","full_name":"Mashayekh, Ali Tabatabaei","last_name":"Mashayekh"},{"first_name":"Arka Dipta","full_name":"Das, Arka Dipta","last_name":"Das"},{"first_name":"Maxim","orcid":"https://orcid.org/0000-0003-2699-9839","full_name":"Weizel, Maxim","last_name":"Weizel","id":"44271"},{"first_name":"Sergiy","full_name":"Gudyriev, Sergiy","last_name":"Gudyriev"},{"last_name":"Freude","first_name":"Wolfgang","full_name":"Freude, Wolfgang"},{"full_name":"Randel, Sebastian","first_name":"Sebastian","last_name":"Randel"},{"id":"37144","last_name":"Scheytt","orcid":"https://orcid.org/0000-0002-5950-6618","full_name":"Scheytt, J. Christoph","first_name":"J. Christoph"},{"first_name":"Jeremy","full_name":"Witzens, Jeremy","last_name":"Witzens"},{"full_name":"Koos, Christian","first_name":"Christian","last_name":"Koos"}],"date_created":"2022-01-10T14:29:23Z","status":"public","publication_identifier":{"isbn":["978-1-943580-86-6"]},"related_material":{"link":[{"url":"https://www.osapublishing.org/abstract.cfm?uri=OFC-2021-F2E.6","relation":"confirmation"}]},"user_id":"15931","title":"Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform","language":[{"iso":"eng"}],"year":"2021","type":"journal_article","citation":{"ama":"Fang D, Zazzi A, Müller J, et al. Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform. OSA Technical Digest. Published online 2021. doi:10.1109/JLT.2021.3130764","apa":"Fang, D., Zazzi, A., Müller, J., Daniel, D., Füllner, C., Marin-Palomo, P., Mashayekh, A. T., Das, A. D., Weizel, M., Gudyriev, S., Freude, W., Randel, S., Scheytt, J. C., Witzens, J., & Koos, C. (2021). Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform. OSA Technical Digest. https://doi.org/10.1109/JLT.2021.3130764","chicago":"Fang, Dengyang, Andrea Zazzi, Juliana Müller, Drayß Daniel, Christoph Füllner, Pablo Marin-Palomo, Ali Tabatabaei Mashayekh, et al. “Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform.” OSA Technical Digest, 2021. https://doi.org/10.1109/JLT.2021.3130764.","bibtex":"@article{Fang_Zazzi_Müller_Daniel_Füllner_Marin-Palomo_Mashayekh_Das_Weizel_Gudyriev_et al._2021, title={Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform}, DOI={10.1109/JLT.2021.3130764}, journal={OSA Technical Digest}, author={Fang, Dengyang and Zazzi, Andrea and Müller, Juliana and Daniel, Drayß and Füllner, Christoph and Marin-Palomo, Pablo and Mashayekh, Ali Tabatabaei and Das, Arka Dipta and Weizel, Maxim and Gudyriev, Sergiy and et al.}, year={2021} }","mla":"Fang, Dengyang, et al. “Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform.” OSA Technical Digest, 2021, doi:10.1109/JLT.2021.3130764.","short":"D. Fang, A. Zazzi, J. Müller, D. Daniel, C. Füllner, P. Marin-Palomo, A.T. Mashayekh, A.D. Das, M. Weizel, S. Gudyriev, W. Freude, S. Randel, J.C. Scheytt, J. Witzens, C. Koos, OSA Technical Digest (2021).","ieee":"D. Fang et al., “Optical Arbitrary Waveform Measurement (OAWM) on the Silicon Photonic Platform,” OSA Technical Digest, 2021, doi: 10.1109/JLT.2021.3130764."},"_id":"29212","date_updated":"2023-01-10T12:55:10Z","doi":"10.1109/JLT.2021.3130764"},{"department":[{"_id":"58"},{"_id":"230"}],"publication":"IEEE Photonics Technology Letters","author":[{"last_name":"De","full_name":"De, Souvaraj","first_name":"Souvaraj"},{"full_name":"Singh, Karanveer","first_name":"Karanveer","last_name":"Singh"},{"id":"13256","last_name":"Kress","full_name":"Kress, Christian","first_name":"Christian"},{"last_name":"Das","first_name":"Ranjan","full_name":"Das, Ranjan"},{"first_name":"Tobias","full_name":"Schwabe, Tobias","last_name":"Schwabe","id":"39217"},{"first_name":"Stefan","full_name":"Preußler, Stefan","last_name":"Preußler"},{"last_name":"Kleine-Ostmann","first_name":"Thomas","full_name":"Kleine-Ostmann, Thomas"},{"first_name":"J. Christoph","orcid":"https://orcid.org/0000-0002-5950-6618","full_name":"Scheytt, J. Christoph","last_name":"Scheytt","id":"37144"},{"full_name":"Schneider, Thomas","first_name":"Thomas","last_name":"Schneider"}],"date_created":"2022-01-10T11:51:46Z","status":"public","volume":33,"user_id":"15931","related_material":{"link":[{"relation":"confirmation","url":"https://ieeexplore.ieee.org/document/9536766"}]},"title":"Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator","language":[{"iso":"eng"}],"page":"1189-1192","type":"journal_article","year":"2021","citation":{"short":"S. De, K. Singh, C. Kress, R. Das, T. Schwabe, S. Preußler, T. Kleine-Ostmann, J.C. Scheytt, T. Schneider, IEEE Photonics Technology Letters 33 (2021) 1189–1192.","ieee":"S. De et al., “Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator,” IEEE Photonics Technology Letters, vol. 33, no. 21, pp. 1189–1192, 2021, doi: 10.1109/LPT.2021.3112485.","chicago":"De, Souvaraj, Karanveer Singh, Christian Kress, Ranjan Das, Tobias Schwabe, Stefan Preußler, Thomas Kleine-Ostmann, J. Christoph Scheytt, and Thomas Schneider. “Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator.” IEEE Photonics Technology Letters 33, no. 21 (2021): 1189–92. https://doi.org/10.1109/LPT.2021.3112485.","apa":"De, S., Singh, K., Kress, C., Das, R., Schwabe, T., Preußler, S., Kleine-Ostmann, T., Scheytt, J. C., & Schneider, T. (2021). Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator. IEEE Photonics Technology Letters, 33(21), 1189–1192. https://doi.org/10.1109/LPT.2021.3112485","ama":"De S, Singh K, Kress C, et al. Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator. IEEE Photonics Technology Letters. 2021;33(21):1189-1192. doi:10.1109/LPT.2021.3112485","bibtex":"@article{De_Singh_Kress_Das_Schwabe_Preußler_Kleine-Ostmann_Scheytt_Schneider_2021, title={Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator}, volume={33}, DOI={10.1109/LPT.2021.3112485}, number={21}, journal={IEEE Photonics Technology Letters}, author={De, Souvaraj and Singh, Karanveer and Kress, Christian and Das, Ranjan and Schwabe, Tobias and Preußler, Stefan and Kleine-Ostmann, Thomas and Scheytt, J. Christoph and Schneider, Thomas}, year={2021}, pages={1189–1192} }","mla":"De, Souvaraj, et al. “Roll-Off Factor Analysis of Optical Nyquist Pulses Generated by an On-Chip Mach-Zehnder Modulator.” IEEE Photonics Technology Letters, vol. 33, no. 21, 2021, pp. 1189–92, doi:10.1109/LPT.2021.3112485."},"_id":"29202","intvolume":" 33","date_updated":"2023-01-10T12:59:06Z","issue":"21","doi":"10.1109/LPT.2021.3112485"}]