[{"status":"public","conference":{"location":"Bosten (MA)","start_date":"2013-12-01","name":"MRS Fall Meeting 2013","end_date":"2013-12-06"},"user_id":"55706","volume":1663,"_id":"4053","publisher":"Cambridge University Press (CUP)","citation":{"bibtex":"@article{Brassat_Lindner_2014, title={A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips}, volume={1663}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>}, number={mrsf13-1663-ww04-09}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Brassat, Katharina and Lindner, Jörg}, year={2014} }","ama":"Brassat K, Lindner J. A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips. <i>MRS Proceedings</i>. 2014;1663. doi:<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>","mla":"Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.” <i>MRS Proceedings</i>, vol. 1663, mrsf13-1663-ww04-09, Cambridge University Press (CUP), 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.265\">10.1557/opl.2014.265</a>.","short":"K. Brassat, J. Lindner, MRS Proceedings 1663 (2014).","chicago":"Brassat, Katharina, and Jörg Lindner. “A Template-Assisted Self-Organization Process for the Formation of a Linear Arrangement of Pairs of Metallic Tips.” <i>MRS Proceedings</i> 1663 (2014). <a href=\"https://doi.org/10.1557/opl.2014.265\">https://doi.org/10.1557/opl.2014.265</a>.","ieee":"K. Brassat and J. Lindner, “A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips,” <i>MRS Proceedings</i>, vol. 1663, 2014.","apa":"Brassat, K., &#38; Lindner, J. (2014). A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips. <i>MRS Proceedings</i>, <i>1663</i>. <a href=\"https://doi.org/10.1557/opl.2014.265\">https://doi.org/10.1557/opl.2014.265</a>"},"publication_status":"published","date_updated":"2022-01-06T07:00:10Z","article_type":"original","intvolume":"      1663","title":"A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips","year":"2014","publication_identifier":{"issn":["1946-4274"]},"author":[{"full_name":"Brassat, Katharina","last_name":"Brassat","first_name":"Katharina","id":"11305"},{"full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner","id":"20797"}],"doi":"10.1557/opl.2014.265","article_number":"mrsf13-1663-ww04-09","abstract":[{"text":"A novel process for the formation of pairs of opposing metallic nanotips within linear trenches on a silicon wafer is investigated in detail. The process is based on a spreading knife technique typically used in nanosphere lithography to generate monolayers of colloidal polystyrene beads. Here it is applied to initiate self-assembly of spheres in long linear trenches acting as a template for the sphere arrangement. The optimum blade velocity to deposit the spheres selectively and densely packed in the trench depends on the trench surface fraction and can be described by a modified Dimitrov model. It is demonstrated that the spheres can be used as a shadow mask to deposit metallic nanotips in a channel, which are electrically interconnected on each side of the trench, possibly enabling the control and manipulation of nanoobjects in the channel.","lang":"eng"}],"publication":"MRS Proceedings","type":"journal_article","department":[{"_id":"15"},{"_id":"286"}],"date_created":"2018-08-22T11:40:42Z"},{"date_updated":"2022-01-06T07:00:11Z","status":"public","title":"Template-assisted self-assembly process for the formation of nanogap electrodes","year":"2014","author":[{"full_name":"Brassat, Katharina","last_name":"Brassat","first_name":"Katharina","id":"11305"},{"full_name":"Wahle, M.","first_name":"M.","last_name":"Wahle"},{"id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner"}],"conference":{"location":"Porquerolles (France)","name":"Europhotonics Spring School 2014","start_date":"2014-03-31","end_date":"2014-04-03"},"user_id":"55706","language":[{"iso":"eng"}],"_id":"4054","citation":{"apa":"Brassat, K., Wahle, M., &#38; Lindner, J. (2014). Template-assisted self-assembly process for the formation of nanogap electrodes. Presented at the Europhotonics Spring School 2014, Porquerolles (France).","ieee":"K. Brassat, M. Wahle, and J. Lindner, “Template-assisted self-assembly process for the formation of nanogap electrodes,” presented at the Europhotonics Spring School 2014, Porquerolles (France), 2014.","short":"K. Brassat, M. Wahle, J. Lindner, in: 2014.","chicago":"Brassat, Katharina, M. Wahle, and Jörg Lindner. “Template-Assisted Self-Assembly Process for the Formation of Nanogap Electrodes,” 2014.","mla":"Brassat, Katharina, et al. <i>Template-Assisted Self-Assembly Process for the Formation of Nanogap Electrodes</i>. 2014.","ama":"Brassat K, Wahle M, Lindner J. Template-assisted self-assembly process for the formation of nanogap electrodes. In: ; 2014.","bibtex":"@inproceedings{Brassat_Wahle_Lindner_2014, title={Template-assisted self-assembly process for the formation of nanogap electrodes}, author={Brassat, Katharina and Wahle, M. and Lindner, Jörg}, year={2014} }"},"type":"conference","department":[{"_id":"15"},{"_id":"286"}],"date_created":"2018-08-22T11:46:02Z"},{"citation":{"short":"K. Brassat, C. Brodehl, J. Lindner, in: 2014.","chicago":"Brassat, Katharina, Christoph Brodehl, and Jörg Lindner. “Tuning the Distance between Opposing Metallic Nanotips Formed by a Template Assisted Self-Assembly Process,” 2014.","apa":"Brassat, K., Brodehl, C., &#38; Lindner, J. (2014). Tuning the distance between opposing metallic nanotips formed by a template assisted self-assembly process. Presented at the MRS Materials Research Society Spring Meeting 2014, San Francisco (USA).","ieee":"K. Brassat, C. Brodehl, and J. Lindner, “Tuning the distance between opposing metallic nanotips formed by a template assisted self-assembly process,” presented at the MRS Materials Research Society Spring Meeting 2014, San Francisco (USA), 2014.","ama":"Brassat K, Brodehl C, Lindner J. Tuning the distance between opposing metallic nanotips formed by a template assisted self-assembly process. In: ; 2014.","bibtex":"@inproceedings{Brassat_Brodehl_Lindner_2014, title={Tuning the distance between opposing metallic nanotips formed by a template assisted self-assembly process}, author={Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}, year={2014} }","mla":"Brassat, Katharina, et al. <i>Tuning the Distance between Opposing Metallic Nanotips Formed by a Template Assisted Self-Assembly Process</i>. 2014."},"date_created":"2018-08-22T11:48:00Z","department":[{"_id":"15"},{"_id":"286"}],"type":"conference","conference":{"end_date":"2014-04-25","location":"San Francisco (USA)","name":"MRS Materials Research Society Spring Meeting 2014","start_date":"2014-04-21"},"author":[{"last_name":"Brassat","first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305"},{"full_name":"Brodehl, Christoph","first_name":"Christoph","last_name":"Brodehl","id":"30380"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"status":"public","title":"Tuning the distance between opposing metallic nanotips formed by a template assisted self-assembly process","year":"2014","date_updated":"2022-01-06T07:00:11Z","language":[{"iso":"eng"}],"_id":"4055","user_id":"55706"},{"title":"Surface Patterning with Nanosphere Lithography","status":"public","year":"2014","author":[{"full_name":"Brassat, Katharina","last_name":"Brassat","first_name":"Katharina","id":"11305"},{"full_name":"Brodehl, Christoph","last_name":"Brodehl","first_name":"Christoph","id":"30380"},{"full_name":"Pauly, Johannes","last_name":"Pauly","first_name":"Johannes"},{"full_name":"Drude, Dennis","last_name":"Drude","first_name":"Dennis"},{"first_name":"Jörn ","last_name":"Achtelik","full_name":"Achtelik, Jörn "},{"full_name":"Riedl, Thomas","last_name":"Riedl","first_name":"Thomas","id":"36950"},{"full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner","id":"20797"}],"conference":{"location":"Paderborn (Germany)","name":"Workshop Ionenstrahlen und Nanostrukturen","start_date":"2014-07-20","end_date":"2014-07-22"},"date_updated":"2022-01-06T07:00:11Z","_id":"4056","language":[{"iso":"eng"}],"user_id":"55706","citation":{"bibtex":"@inproceedings{Brassat_Brodehl_Pauly_Drude_Achtelik_Riedl_Lindner_2014, title={Surface Patterning with Nanosphere Lithography}, author={Brassat, Katharina and Brodehl, Christoph and Pauly, Johannes and Drude, Dennis and Achtelik, Jörn  and Riedl, Thomas and Lindner, Jörg}, year={2014} }","ama":"Brassat K, Brodehl C, Pauly J, et al. Surface Patterning with Nanosphere Lithography. In: ; 2014.","mla":"Brassat, Katharina, et al. <i>Surface Patterning with Nanosphere Lithography</i>. 2014.","short":"K. Brassat, C. Brodehl, J. Pauly, D. Drude, J. Achtelik, T. Riedl, J. Lindner, in: 2014.","chicago":"Brassat, Katharina, Christoph Brodehl, Johannes Pauly, Dennis Drude, Jörn  Achtelik, Thomas Riedl, and Jörg Lindner. “Surface Patterning with Nanosphere Lithography,” 2014.","ieee":"K. Brassat <i>et al.</i>, “Surface Patterning with Nanosphere Lithography,” presented at the Workshop Ionenstrahlen und Nanostrukturen, Paderborn (Germany), 2014.","apa":"Brassat, K., Brodehl, C., Pauly, J., Drude, D., Achtelik, J., Riedl, T., &#38; Lindner, J. (2014). Surface Patterning with Nanosphere Lithography. Presented at the Workshop Ionenstrahlen und Nanostrukturen, Paderborn (Germany)."},"date_created":"2018-08-22T11:50:28Z","type":"conference","department":[{"_id":"15"},{"_id":"286"}]},{"date_created":"2018-08-22T11:52:33Z","type":"conference","department":[{"_id":"15"},{"_id":"286"}],"citation":{"apa":"Brassat, K., Brodehl, C., Wahle, M., &#38; Lindner, J. (2014). Self-assembly for the directed self-assembly of smaller objects in a microfluidic channel. Presented at the MRS Materials Research Society Fall Meeting 2014, Boston (USA).","ieee":"K. Brassat, C. Brodehl, M. Wahle, and J. Lindner, “Self-assembly for the directed self-assembly of smaller objects in a microfluidic channel,” presented at the MRS Materials Research Society Fall Meeting 2014, Boston (USA), 2014.","short":"K. Brassat, C. Brodehl, M. Wahle, J. Lindner, in: 2014.","chicago":"Brassat, Katharina, Christoph Brodehl, M. Wahle, and Jörg Lindner. “Self-Assembly for the Directed Self-Assembly of Smaller Objects in a Microfluidic Channel,” 2014.","mla":"Brassat, Katharina, et al. <i>Self-Assembly for the Directed Self-Assembly of Smaller Objects in a Microfluidic Channel</i>. 2014.","ama":"Brassat K, Brodehl C, Wahle M, Lindner J. Self-assembly for the directed self-assembly of smaller objects in a microfluidic channel. 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In: ; 2014."},"type":"conference","department":[{"_id":"286"}],"date_created":"2018-08-22T11:54:13Z","date_updated":"2022-01-06T07:00:11Z","title":"Double-Angle-Resolved Nanosphere Lithography","status":"public","year":"2014","conference":{"end_date":"2014-04-03","location":"Porquerolles (France)","start_date":"2014-03-31","name":"Europhotonics Spring School 2014"},"author":[{"id":"30380","first_name":"Christoph","last_name":"Brodehl","full_name":"Brodehl, Christoph"},{"full_name":"Greulich-Weber, Siegmund","last_name":"Greulich-Weber","first_name":"Siegmund"},{"last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797"}],"user_id":"55706","language":[{"iso":"eng"}],"_id":"4058"},{"citation":{"apa":"Brodehl, C., Greulich-Weber, S., &#38; Lindner, J. (2014). Nanosphere lithography for the creation of nanoparticle arrays with tailored shape. Presented at the European Materials Research Society Fall Meeting 2014, Warsaw (Poland).","mla":"Brodehl, Christoph, et al. <i>Nanosphere Lithography for the Creation of Nanoparticle Arrays with Tailored Shape</i>. 2014.","ieee":"C. Brodehl, S. Greulich-Weber, and J. Lindner, “Nanosphere lithography for the creation of nanoparticle arrays with tailored shape,” presented at the European Materials Research Society Fall Meeting 2014, Warsaw (Poland), 2014.","ama":"Brodehl C, Greulich-Weber S, Lindner J. Nanosphere lithography for the creation of nanoparticle arrays with tailored shape. In: ; 2014.","short":"C. Brodehl, S. Greulich-Weber, J. 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Fabrication of Arrays of Nanoparticles with Arbitrarily Designed Shape. In: ; 2014.","bibtex":"@inproceedings{Brodehl_Greulich-Weber_Lindner_2014, title={Fabrication of Arrays of Nanoparticles with Arbitrarily Designed Shape}, author={Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}, year={2014} }","mla":"Brodehl, Christoph, et al. <i>Fabrication of Arrays of Nanoparticles with Arbitrarily Designed Shape</i>. 2014.","chicago":"Brodehl, Christoph, Siegmund Greulich-Weber, and Jörg Lindner. “Fabrication of Arrays of Nanoparticles with Arbitrarily Designed Shape,” 2014.","short":"C. Brodehl, S. Greulich-Weber, J. Lindner, in: 2014.","apa":"Brodehl, C., Greulich-Weber, S., &#38; Lindner, J. (2014). Fabrication of Arrays of Nanoparticles with Arbitrarily Designed Shape. Presented at the MRS Materials Research Society Fall Meeting 2014, Boston (USA).","ieee":"C. Brodehl, S. Greulich-Weber, and J. 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J. (2014). Investigation of cubic GaN quantum dots grown by the Stranski-Krastanov process. Presented at the European Materials Research Society Spring Meeting 2014, Lille (France).","ieee":"M. Bürger, J. Lindner, D. Reuter, and D. J. As, “Investigation of cubic GaN quantum dots grown by the Stranski-Krastanov process,” presented at the European Materials Research Society Spring Meeting 2014, Lille (France), 2014.","short":"M. Bürger, J. Lindner, D. Reuter, D.J. As, in: 2014.","chicago":"Bürger, M., Jörg Lindner, Dirk Reuter, and D.J. As. “Investigation of Cubic GaN Quantum Dots Grown by the Stranski-Krastanov Process,” 2014.","mla":"Bürger, M., et al. <i>Investigation of Cubic GaN Quantum Dots Grown by the Stranski-Krastanov Process</i>. 2014.","ama":"Bürger M, Lindner J, Reuter D, As DJ. Investigation of cubic GaN quantum dots grown by the Stranski-Krastanov process. 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Lindner, “Numerical analysis of defects in colloidal nanosphere masks,” presented at the European Materials Research Society Fall Meeting 2014, Warsaw (Poland), 2014."},"date_created":"2018-08-22T12:13:23Z","department":[{"_id":"15"},{"_id":"286"}],"type":"conference"},{"status":"public","title":"Ag‐nanoparticles in PA-templates","year":"2014","author":[{"full_name":"Ezhova, A.","last_name":"Ezhova","first_name":"A."},{"last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797"},{"full_name":"Muldarisnur, M.","first_name":"M.","last_name":"Muldarisnur"},{"full_name":"Zentgraf, Thomas","last_name":"Zentgraf","orcid":"0000-0002-8662-1101","first_name":"Thomas","id":"30525"},{"full_name":"Huber, K.","first_name":"K.","last_name":"Huber"}],"conference":{"end_date":"2014-04-03","start_date":"2014-03-31","name":"Europhotonics Spring School 2014","location":"Porquerolles (France)"},"date_updated":"2022-01-06T07:00:11Z","language":[{"iso":"eng"}],"_id":"4063","user_id":"55706","citation":{"apa":"Ezhova, A., Lindner, J., Muldarisnur, M., Zentgraf, T., &#38; Huber, K. 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In: ; 2014.","bibtex":"@inproceedings{Ezhova_Lindner_Muldarisnur_Zentgraf_Huber_2014, title={Ag‐nanoparticles in PA-templates}, author={Ezhova, A. and Lindner, Jörg and Muldarisnur, M. and Zentgraf, Thomas and Huber, K.}, year={2014} }"},"date_created":"2018-08-22T12:16:17Z","type":"conference","department":[{"_id":"15"},{"_id":"286"},{"_id":"289"}]},{"citation":{"ieee":"R. M. Kemper <i>et al.</i>, “Influence of growth area reduction on cubic GaN heteroepitaxial layer growth on 3C-SiC(001),” presented at the European Materials Research Society Spring Meeting 2014, Lille (France), 2014.","apa":"Kemper, R. M., Kovacs, A., Riedl, T., Meertens, D., Tillmann, K., As, D., &#38; Lindner, J. (2014). Influence of growth area reduction on cubic GaN heteroepitaxial layer growth on 3C-SiC(001). Presented at the European Materials Research Society Spring Meeting 2014, Lille (France).","short":"R.M. Kemper, A. Kovacs, T. Riedl, D. Meertens, K. Tillmann, D. As, J. Lindner, in: 2014.","chicago":"Kemper, R.M., A.  Kovacs, Thomas Riedl, D. Meertens, K. Tillmann, D. As, and Jörg Lindner. “Influence of Growth Area Reduction on Cubic GaN Heteroepitaxial Layer Growth on 3C-SiC(001),” 2014.","mla":"Kemper, R. M., et al. <i>Influence of Growth Area Reduction on Cubic GaN Heteroepitaxial Layer Growth on 3C-SiC(001)</i>. 2014.","bibtex":"@inproceedings{Kemper_Kovacs_Riedl_Meertens_Tillmann_As_Lindner_2014, title={Influence of growth area reduction on cubic GaN heteroepitaxial layer growth on 3C-SiC(001)}, author={Kemper, R.M. and Kovacs, A.  and Riedl, Thomas and Meertens, D. and Tillmann, K. and As, D. and Lindner, Jörg}, year={2014} }","ama":"Kemper RM, Kovacs A, Riedl T, et al. Influence of growth area reduction on cubic GaN heteroepitaxial layer growth on 3C-SiC(001). In: ; 2014."},"date_created":"2018-08-22T12:24:45Z","department":[{"_id":"15"},{"_id":"286"}],"type":"conference","conference":{"location":"Lille (France)","name":"European Materials Research Society Spring Meeting 2014","start_date":"2014-05-26","end_date":"2014-05-30"},"author":[{"last_name":"Kemper","first_name":"R.M.","full_name":"Kemper, R.M."},{"first_name":"A. ","last_name":"Kovacs","full_name":"Kovacs, A. "},{"id":"36950","first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas"},{"full_name":"Meertens, D.","last_name":"Meertens","first_name":"D."},{"full_name":"Tillmann, K.","first_name":"K.","last_name":"Tillmann"},{"last_name":"As","first_name":"D.","full_name":"As, D."},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"title":"Influence of growth area reduction on cubic GaN heteroepitaxial layer growth on 3C-SiC(001)","year":"2014","status":"public","date_updated":"2022-01-06T07:00:12Z","_id":"4068","language":[{"iso":"eng"}],"user_id":"55706"},{"citation":{"ieee":"R. M. Kemper <i>et al.</i>, “STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells,” presented at the European Materials Research Society Spring Meeting 2014, Lille (France), 2014.","apa":"Kemper, R. M., Veit, P., Mietze, C., Dempewolf, A., Wecker, T., Christen, J., … Lindner, J. (2014). STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells. Presented at the European Materials Research Society Spring Meeting 2014, Lille (France).","short":"R.M. Kemper, P. Veit, C. Mietze, A. Dempewolf, T. Wecker, J. Christen, D. As, J. Lindner, in: 2014.","chicago":"Kemper, R.M., P. Veit, C.  Mietze, A. Dempewolf, T.  Wecker, J. Christen, D. As, and Jörg Lindner. “STEM-CL Investigations on the Influence of Stacking Faults on the Optical Emission of Cubic GaN Epilayers and Cubic GaN/AlN Multi-Quantum Wells,” 2014.","mla":"Kemper, R. M., et al. <i>STEM-CL Investigations on the Influence of Stacking Faults on the Optical Emission of Cubic GaN Epilayers and Cubic GaN/AlN Multi-Quantum Wells</i>. 2014.","bibtex":"@inproceedings{Kemper_Veit_Mietze_Dempewolf_Wecker_Christen_As_Lindner_2014, title={STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells}, author={Kemper, R.M. and Veit, P. and Mietze, C.  and Dempewolf, A. and Wecker, T.  and Christen, J. and As, D. and Lindner, Jörg}, year={2014} }","ama":"Kemper RM, Veit P, Mietze C, et al. STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells. In: ; 2014."},"date_created":"2018-08-22T12:26:49Z","type":"conference","department":[{"_id":"15"},{"_id":"286"}],"status":"public","title":"STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells","year":"2014","conference":{"end_date":"2014-05-30","location":"Lille (France)","name":"European Materials Research Society Spring Meeting 2014","start_date":"2014-05-26"},"author":[{"full_name":"Kemper, R.M.","first_name":"R.M.","last_name":"Kemper"},{"full_name":"Veit, P.","last_name":"Veit","first_name":"P."},{"first_name":"C. ","last_name":"Mietze","full_name":"Mietze, C. "},{"last_name":"Dempewolf","first_name":"A.","full_name":"Dempewolf, A."},{"full_name":"Wecker, T. ","last_name":"Wecker","first_name":"T. "},{"full_name":"Christen, J.","first_name":"J.","last_name":"Christen"},{"full_name":"As, D.","last_name":"As","first_name":"D."},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"}],"date_updated":"2022-01-06T07:00:12Z","_id":"4069","language":[{"iso":"eng"}],"user_id":"55706"},{"doi":"10.1145/2642937.2653470","ddc":["040"],"user_id":"15504","_id":"407","page":" 895--898","has_accepted_license":"1","date_updated":"2022-01-06T07:00:12Z","author":[{"full_name":"Mohr, Felix","last_name":"Mohr","first_name":"Felix"}],"title":"Issues of Automated Software Composition in AI Planning","status":"public","year":"2014","type":"conference","date_created":"2017-10-17T12:42:11Z","file":[{"creator":"florida","date_created":"2018-03-16T11:36:04Z","file_name":"407-ASE14.pdf","access_level":"closed","file_size":443283,"relation":"main_file","date_updated":"2018-03-16T11:36:04Z","file_id":"1365","success":1,"content_type":"application/pdf"}],"project":[{"_id":"1","name":"SFB 901"},{"name":"SFB 901 - Subprojekt B2","_id":"10"},{"name":"SFB 901 - Project Area B","_id":"3"}],"abstract":[{"lang":"eng","text":"Automated programming aims at automatically assembling a new software artifact from existing software modules. Although automated programming was revitalized through automated software composition in the last decade, the problem cannot be considered solved. Automated software composition is widely accepted as being a planning task, but the problem is that it has very special properties that other planning problems do not have and that are commonly overseen. These properties usually imply that the composition problem cannot be solved with standard planning tools. This paper gives a brief and intuitive description of the planning problem that most approaches are based on. It points out special properties of this problem and explains why it is not adequate to solve the problem with classical planning tools as done by most existing approaches."}],"citation":{"mla":"Mohr, Felix. “Issues of Automated Software Composition in AI Planning.” <i>Proceedings of the 29th International Conference on Automated Software Engineering (ASE)</i>, 2014, pp. 895--898, doi:<a href=\"https://doi.org/10.1145/2642937.2653470\">10.1145/2642937.2653470</a>.","bibtex":"@inproceedings{Mohr_2014, title={Issues of Automated Software Composition in AI Planning}, DOI={<a href=\"https://doi.org/10.1145/2642937.2653470\">10.1145/2642937.2653470</a>}, booktitle={Proceedings of the 29th International Conference on Automated Software Engineering (ASE)}, author={Mohr, Felix}, year={2014}, pages={895--898} }","ama":"Mohr F. Issues of Automated Software Composition in AI Planning. In: <i>Proceedings of the 29th International Conference on Automated Software Engineering (ASE)</i>. ; 2014:895--898. doi:<a href=\"https://doi.org/10.1145/2642937.2653470\">10.1145/2642937.2653470</a>","ieee":"F. Mohr, “Issues of Automated Software Composition in AI Planning,” in <i>Proceedings of the 29th International Conference on Automated Software Engineering (ASE)</i>, 2014, pp. 895--898.","apa":"Mohr, F. (2014). Issues of Automated Software Composition in AI Planning. In <i>Proceedings of the 29th International Conference on Automated Software Engineering (ASE)</i> (pp. 895--898). <a href=\"https://doi.org/10.1145/2642937.2653470\">https://doi.org/10.1145/2642937.2653470</a>","short":"F. Mohr, in: Proceedings of the 29th International Conference on Automated Software Engineering (ASE), 2014, pp. 895--898.","chicago":"Mohr, Felix. “Issues of Automated Software Composition in AI Planning.” In <i>Proceedings of the 29th International Conference on Automated Software Engineering (ASE)</i>, 895--898, 2014. <a href=\"https://doi.org/10.1145/2642937.2653470\">https://doi.org/10.1145/2642937.2653470</a>."},"publication":"Proceedings of the 29th International Conference on Automated Software Engineering (ASE)","file_date_updated":"2018-03-16T11:36:04Z"},{"_id":"4070","publisher":"Wiley","page":"265-268","volume":11,"ddc":["530"],"user_id":"55706","status":"public","has_accepted_license":"1","citation":{"bibtex":"@article{Kemper_Mietze_Hiller_Stauden_Pezoldt_Meertens_Luysberg_As_Lindner_2014, title={Cubic GaN/AlN multi-quantum wells grown on pre-patterned 3C-SiC/Si (001)}, volume={11}, DOI={<a href=\"https://doi.org/10.1002/pssc.201300292\">10.1002/pssc.201300292</a>}, number={2}, journal={physica status solidi (c)}, publisher={Wiley}, author={Kemper, R. M. and Mietze, C. and Hiller, L. and Stauden, T. and Pezoldt, J. and Meertens, D. and Luysberg, M. and As, D. J. and Lindner, Jörg}, year={2014}, pages={265–268} }","ama":"Kemper RM, Mietze C, Hiller L, et al. Cubic GaN/AlN multi-quantum wells grown on pre-patterned 3C-SiC/Si (001). <i>physica status solidi (c)</i>. 2014;11(2):265-268. doi:<a href=\"https://doi.org/10.1002/pssc.201300292\">10.1002/pssc.201300292</a>","mla":"Kemper, R. M., et al. “Cubic GaN/AlN Multi-Quantum Wells Grown on Pre-Patterned 3C-SiC/Si (001).” <i>Physica Status Solidi (C)</i>, vol. 11, no. 2, Wiley, 2014, pp. 265–68, doi:<a href=\"https://doi.org/10.1002/pssc.201300292\">10.1002/pssc.201300292</a>.","short":"R.M. Kemper, C. Mietze, L. Hiller, T. Stauden, J. Pezoldt, D. Meertens, M. Luysberg, D.J. As, J. Lindner, Physica Status Solidi (C) 11 (2014) 265–268.","chicago":"Kemper, R. M., C. Mietze, L. Hiller, T. Stauden, J. Pezoldt, D. Meertens, M. Luysberg, D. J. As, and Jörg Lindner. “Cubic GaN/AlN Multi-Quantum Wells Grown on Pre-Patterned 3C-SiC/Si (001).” <i>Physica Status Solidi (C)</i> 11, no. 2 (2014): 265–68. <a href=\"https://doi.org/10.1002/pssc.201300292\">https://doi.org/10.1002/pssc.201300292</a>.","ieee":"R. M. Kemper <i>et al.</i>, “Cubic GaN/AlN multi-quantum wells grown on pre-patterned 3C-SiC/Si (001),” <i>physica status solidi (c)</i>, vol. 11, no. 2, pp. 265–268, 2014.","apa":"Kemper, R. M., Mietze, C., Hiller, L., Stauden, T., Pezoldt, J., Meertens, D., … Lindner, J. (2014). Cubic GaN/AlN multi-quantum wells grown on pre-patterned 3C-SiC/Si (001). <i>Physica Status Solidi (C)</i>, <i>11</i>(2), 265–268. <a href=\"https://doi.org/10.1002/pssc.201300292\">https://doi.org/10.1002/pssc.201300292</a>"},"file_date_updated":"2018-08-22T12:30:12Z","language":[{"iso":"eng"}],"doi":"10.1002/pssc.201300292","publication_identifier":{"issn":["1862-6351"]},"author":[{"last_name":"Kemper","first_name":"R. M.","full_name":"Kemper, R. M."},{"full_name":"Mietze, C.","first_name":"C.","last_name":"Mietze"},{"last_name":"Hiller","first_name":"L.","full_name":"Hiller, L."},{"first_name":"T.","last_name":"Stauden","full_name":"Stauden, T."},{"full_name":"Pezoldt, J.","first_name":"J.","last_name":"Pezoldt"},{"last_name":"Meertens","first_name":"D.","full_name":"Meertens, D."},{"full_name":"Luysberg, M.","first_name":"M.","last_name":"Luysberg"},{"full_name":"As, D. J.","first_name":"D. J.","last_name":"As"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"year":"2014","title":"Cubic GaN/AlN multi-quantum wells grown on pre-patterned 3C-SiC/Si (001)","intvolume":"        11","article_type":"original","date_updated":"2022-01-06T07:00:13Z","publication_status":"published","date_created":"2018-08-22T12:28:15Z","file":[{"relation":"main_file","date_updated":"2018-08-22T12:30:12Z","file_name":"Cubic GaN-AlN multi-quantum wells grown on pre-patterned 3C SiC Si 001.pdf","file_size":3777577,"access_level":"closed","file_id":"4071","content_type":"application/pdf","success":1,"creator":"hclaudia","date_created":"2018-08-22T12:30:12Z"}],"department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article","publication":"physica status solidi (c)","issue":"2","abstract":[{"lang":"eng","text":"We report for the first time on the growth of cubic AlN/GaN multi‐quantum wells (MQWs) on pre‐patterned 3C‐SiC/Si (001) substrates. The sample structure consists of 10 periods of 2 nm c‐AlN barriers with a 4 nm c‐GaN layer in between, which were grown on 3C‐SiC post shaped structures by means of molecular beam epitaxy. Substrate patterning has been realized by electron beam lithography and a reactive ion etching process. The 3C‐SiC posts have a length of about 550 nm and a height of about 700 nm. (Scanning) transmission electron microscopy studies show that the morphology of the MQWs is clearly influenced by {111} stacking faults, modulating the local growth rate. Further, the growth at the edges of the surface pattern is investigated. The MQW layers cover the 90° edges by developing low‐index facets rather than by forming a conformal system of 90° angled layers. "}]},{"publication":"physica status solidi (a)","issue":"12","abstract":[{"text":"This paper presents a low‐cost procedure that allows for self‐organized fabrication of periodically arranged, sub‐50 nm diameter, vertical‐sidewall GaAs nanopillars on GaAs surfaces based on nanosphere lithography, and reactive ion etching (RIE). Monodispersed polystyrene (PS) sphere double layers are deposited from a colloidal suspension on pre‐treated, hydrophilized GaAs substrates. Ni is thermally evaporated to act as a hard mask for subsequent RIE. Scanning electron microscopy reveals that the Ni nanoparticles left on the substrate after PS sphere removal have polygon‐shaped in‐plane cross‐sections corresponding to the shape of the double layer mask openings. RIE using SiCl4 at low pressure and high power density leads to the formation of vertical nanopillars with circular to oval cross‐sections, whose diameters are reduced by ∼1/3 compared to those of the Ni nanoparticles. These findings can be explained by plasma‐enhanced surface diffusion and sputtering processes during RIE. The obtained GaAs nanopillars have an average diameter of only ∼23 nm, exhibit an excellent verticality with a sidewall angle of 88.9 ± 0.4° and planar top faces, as visible in transmission electron microscopy images. ","lang":"eng"}],"date_created":"2018-08-22T12:31:17Z","file":[{"creator":"hclaudia","date_created":"2018-08-22T12:32:42Z","date_updated":"2018-08-22T12:32:42Z","relation":"main_file","file_size":989885,"access_level":"closed","file_name":"Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces.pdf","content_type":"application/pdf","success":1,"file_id":"4073"}],"department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article","author":[{"full_name":"Riedl, Thomas","last_name":"Riedl","first_name":"Thomas","id":"36950"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"publication_identifier":{"issn":["1862-6300"]},"year":"2014","title":"Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces","article_type":"original","intvolume":"       211","publication_status":"published","date_updated":"2022-01-06T07:00:13Z","language":[{"iso":"eng"}],"doi":"10.1002/pssa.201431474","citation":{"mla":"Riedl, Thomas, and Jörg Lindner. “Self-Organized Fabrication of Periodic Arrays of Vertical, Ultra-Thin Nanopillars on GaAs Surfaces.” <i>Physica Status Solidi (A)</i>, vol. 211, no. 12, Wiley, 2014, pp. 2871–77, doi:<a href=\"https://doi.org/10.1002/pssa.201431474\">10.1002/pssa.201431474</a>.","bibtex":"@article{Riedl_Lindner_2014, title={Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces}, volume={211}, DOI={<a href=\"https://doi.org/10.1002/pssa.201431474\">10.1002/pssa.201431474</a>}, number={12}, journal={physica status solidi (a)}, publisher={Wiley}, author={Riedl, Thomas and Lindner, Jörg}, year={2014}, pages={2871–2877} }","ama":"Riedl T, Lindner J. Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces. <i>physica status solidi (a)</i>. 2014;211(12):2871-2877. doi:<a href=\"https://doi.org/10.1002/pssa.201431474\">10.1002/pssa.201431474</a>","ieee":"T. Riedl and J. Lindner, “Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces,” <i>physica status solidi (a)</i>, vol. 211, no. 12, pp. 2871–2877, 2014.","apa":"Riedl, T., &#38; Lindner, J. (2014). Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces. <i>Physica Status Solidi (A)</i>, <i>211</i>(12), 2871–2877. <a href=\"https://doi.org/10.1002/pssa.201431474\">https://doi.org/10.1002/pssa.201431474</a>","chicago":"Riedl, Thomas, and Jörg Lindner. “Self-Organized Fabrication of Periodic Arrays of Vertical, Ultra-Thin Nanopillars on GaAs Surfaces.” <i>Physica Status Solidi (A)</i> 211, no. 12 (2014): 2871–77. <a href=\"https://doi.org/10.1002/pssa.201431474\">https://doi.org/10.1002/pssa.201431474</a>.","short":"T. Riedl, J. Lindner, Physica Status Solidi (A) 211 (2014) 2871–2877."},"file_date_updated":"2018-08-22T12:32:42Z","status":"public","has_accepted_license":"1","_id":"4072","publisher":"Wiley","page":"2871-2877","volume":211,"user_id":"55706","ddc":["530"]},{"intvolume":"      1663","article_type":"original","date_updated":"2022-01-06T07:00:13Z","publication_status":"published","publication_identifier":{"issn":["1946-4274"]},"author":[{"id":"36950","first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas"},{"full_name":"Strake, Matthias","first_name":"Matthias","last_name":"Strake"},{"first_name":"Werner","last_name":"Sievers","full_name":"Sievers, Werner"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"title":"Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers","year":"2014","doi":"10.1557/opl.2014.312","language":[{"iso":"eng"}],"article_number":"mrsf13-1663-ww03-75","abstract":[{"lang":"eng","text":"An experimental analysis of the morphology changes of hexagonally close packed polystyrene sphere monolayers induced by annealing in air is presented. The triangular interstices between each triple of spheres, which are frequently used as nanoscale mask openings in colloidal lithography, are observed to gradually shrink in size and change in shape upon annealing. Top view scanning electron microscopy images reveal that different stages are involved in the closure of monolayer interstices at annealing temperatures in the range between 110°C and 120°C. In the early stages shrinkage of the triangular interstices is dominated by material transport to and thus shortening of their corners, in the late stages interstice area reduction via displacement of the triangle edges becomes significant. At intermediate annealing times the rate of interstice area reduction displays a maximum before a stabilized state characterized by a rounded isosceles triangular shape forms."}],"publication":"MRS Proceedings","department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article","date_created":"2018-08-22T12:34:02Z","conference":{"end_date":"2013-12-06","location":"Boston (USA)","name":"MRS Fall Meeting ","start_date":"2013-12-01"},"status":"public","volume":1663,"user_id":"55706","_id":"4074","publisher":"Cambridge University Press (CUP)","citation":{"bibtex":"@article{Riedl_Strake_Sievers_Lindner_2014, title={Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers}, volume={1663}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>}, number={mrsf13-1663-ww03-75}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Riedl, Thomas and Strake, Matthias and Sievers, Werner and Lindner, Jörg}, year={2014} }","chicago":"Riedl, Thomas, Matthias Strake, Werner Sievers, and Jörg Lindner. “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers.” <i>MRS Proceedings</i> 1663 (2014). <a href=\"https://doi.org/10.1557/opl.2014.312\">https://doi.org/10.1557/opl.2014.312</a>.","ama":"Riedl T, Strake M, Sievers W, Lindner J. Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers. <i>MRS Proceedings</i>. 2014;1663. doi:<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>","short":"T. Riedl, M. Strake, W. Sievers, J. Lindner, MRS Proceedings 1663 (2014).","ieee":"T. Riedl, M. Strake, W. Sievers, and J. Lindner, “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers,” <i>MRS Proceedings</i>, vol. 1663, 2014.","mla":"Riedl, Thomas, et al. “Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers.” <i>MRS Proceedings</i>, vol. 1663, mrsf13-1663-ww03-75, Cambridge University Press (CUP), 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.312\">10.1557/opl.2014.312</a>.","apa":"Riedl, T., Strake, M., Sievers, W., &#38; Lindner, J. (2014). Thermal Modification of Nanoscale Mask Openings in Polystyrene Sphere Layers. <i>MRS Proceedings</i>, <i>1663</i>. <a href=\"https://doi.org/10.1557/opl.2014.312\">https://doi.org/10.1557/opl.2014.312</a>"}},{"issue":"1664","publication":"Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties ","citation":{"mla":"Riedl, Thomas, and Jörg Lindner. “Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures.” <i>Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties </i>, no. 1664, MRS Online Proceedings, 2014, doi:<a href=\"https://doi.org/10.1557/opl.2014.325 \">10.1557/opl.2014.325 </a>.","bibtex":"@inproceedings{Riedl_Lindner_2014, title={Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures}, DOI={<a href=\"https://doi.org/10.1557/opl.2014.325 \">10.1557/opl.2014.325 </a>}, number={1664}, booktitle={Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties }, publisher={MRS Online Proceedings}, author={Riedl, Thomas and Lindner, Jörg}, year={2014} }","ama":"Riedl T, Lindner J. Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures. In: <i>Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties </i>. MRS Online Proceedings; 2014. doi:<a href=\"https://doi.org/10.1557/opl.2014.325 \">10.1557/opl.2014.325 </a>","ieee":"T. Riedl and J. Lindner, “Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures,” in <i>Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties </i>, Boston (USA), 2014, no. 1664.","apa":"Riedl, T., &#38; Lindner, J. (2014). Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures. In <i>Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties </i>. Boston (USA): MRS Online Proceedings. <a href=\"https://doi.org/10.1557/opl.2014.325 \">https://doi.org/10.1557/opl.2014.325 </a>","chicago":"Riedl, Thomas, and Jörg Lindner. “Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures.” In <i>Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties </i>. MRS Online Proceedings, 2014. <a href=\"https://doi.org/10.1557/opl.2014.325 \">https://doi.org/10.1557/opl.2014.325 </a>.","short":"T. Riedl, J. Lindner, in: Symposium YY – Elastic Strain Engineering for Unprecedented Materials Properties , MRS Online Proceedings, 2014."},"abstract":[{"text":"The formation of misfit dislocations is an important issue for the performance of heteroepitaxial micro- and optoelectronic devices. We analyze three approaches that quantify the stability of misfit dislocations in axial-heteroepitaxial nanowires with respect to applicability and predictions of critical nanowire dimensions. The “nanoheteroepitaxy” approach of Zubia and Hersee proves suitable for determination of strain partitioning in the presence of an elastic mismatch. Concerning the critical thickness and diameter however the descriptions of Ertekin et al. and Glas respectively yield more reliable results, owing to the consideration of the total coherent and dislocation related energies plus the residual strain energy. In contrast to the model of Ertekin et al., which refers to infinitely long nanowires, the other two mentioned approaches allow predictions of the critical thickness of mismatched deposits on the nanowire axial face.","lang":"eng"}],"date_created":"2018-08-22T12:43:39Z","type":"conference","department":[{"_id":"15"},{"_id":"286"}],"status":"public","year":"2014","title":"Comparison of Theoretical Approaches Predicting the Coherent-Semicoherent Transition in Nanoscale Axial Heterostructures","author":[{"full_name":"Riedl, Thomas","first_name":"Thomas","last_name":"Riedl","id":"36950"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"conference":{"start_date":"2013-12-01","name":"MRS Materials Research Society Fall Meeting 2014","location":"Boston (USA)","end_date":"2013-12-06"},"publication_status":"published","date_updated":"2022-01-06T07:00:13Z","language":[{"iso":"eng"}],"_id":"4075","publisher":"MRS Online Proceedings","user_id":"55706","doi":"10.1557/opl.2014.325 "},{"doi":"10.1002/crat.201300217","language":[{"iso":"eng"}],"intvolume":"        49","article_type":"original","date_updated":"2022-01-06T07:00:13Z","publication_status":"published","publication_identifier":{"issn":["0232-1300"]},"author":[{"full_name":"Riedl, Thomas","first_name":"Thomas","last_name":"Riedl","id":"36950"},{"first_name":"H.","last_name":"Wendrock","full_name":"Wendrock, H."}],"year":"2014","title":"Reliability of high-resolution electron backscatter diffraction determination of strain and rotation variations using phase-only and cross correlation","department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article","date_created":"2018-08-22T12:45:23Z","file":[{"relation":"main_file","date_updated":"2018-08-22T12:45:58Z","file_name":"Reliability of high-resolution electron backscatter diffraction determination of strain an totation variations using phase-only and cross correlation.pdf","access_level":"closed","file_size":1377255,"file_id":"4077","content_type":"application/pdf","success":1,"creator":"hclaudia","date_created":"2018-08-22T12:45:58Z"}],"abstract":[{"lang":"eng","text":"This contribution analyzes the reliability of strain and rotation variation determination using cross‐ as well as phase‐only correlation of experimental wide‐angle electron backscatter diffraction (EBSD) patterns. For both rotation and three‐point bending the resulting displacement gradient tensor components are examined in terms of magnitude and statistical scatter as a function of various correlation procedure parameters and signal‐to‐noise ratio. It is shown that on the one hand the Fourier filter width has a major impact on the strain results. At higher noise level a smaller filter width has to be applied for obtaining maximum precision. On the other hand, the influence of the degree of overlap of the regions of interest positioned in the patterns is less important. For both rotation and bending experiments the cross‐correlation variant yields a smaller standard deviation with respect to phase‐only correlation, in particular for elevated noise level. The difference is attributed to the stronger propagation of noise effects in the course of phase‐only correlation function calculation and fitting. In the rotation experiment a standard deviation of ∼1.0 × 10^−4, averaged over the displacement gradient tensor components, and a rotational precision of ∼1.5 × 10^−4 rad have been achieved by using optimized evaluation settings. "}],"issue":"4","publication":"Crystal Research and Technology","volume":49,"ddc":["530"],"user_id":"55706","_id":"4076","publisher":"Wiley","page":"195-203","has_accepted_license":"1","status":"public","citation":{"bibtex":"@article{Riedl_Wendrock_2014, title={Reliability of high-resolution electron backscatter diffraction determination of strain and rotation variations using phase-only and cross correlation}, volume={49}, DOI={<a href=\"https://doi.org/10.1002/crat.201300217\">10.1002/crat.201300217</a>}, number={4}, journal={Crystal Research and Technology}, publisher={Wiley}, author={Riedl, Thomas and Wendrock, H.}, year={2014}, pages={195–203} }","ama":"Riedl T, Wendrock H. Reliability of high-resolution electron backscatter diffraction determination of strain and rotation variations using phase-only and cross correlation. <i>Crystal Research and Technology</i>. 2014;49(4):195-203. doi:<a href=\"https://doi.org/10.1002/crat.201300217\">10.1002/crat.201300217</a>","mla":"Riedl, Thomas, and H. Wendrock. “Reliability of High-Resolution Electron Backscatter Diffraction Determination of Strain and Rotation Variations Using Phase-Only and Cross Correlation.” <i>Crystal Research and Technology</i>, vol. 49, no. 4, Wiley, 2014, pp. 195–203, doi:<a href=\"https://doi.org/10.1002/crat.201300217\">10.1002/crat.201300217</a>.","short":"T. Riedl, H. Wendrock, Crystal Research and Technology 49 (2014) 195–203.","chicago":"Riedl, Thomas, and H. Wendrock. “Reliability of High-Resolution Electron Backscatter Diffraction Determination of Strain and Rotation Variations Using Phase-Only and Cross Correlation.” <i>Crystal Research and Technology</i> 49, no. 4 (2014): 195–203. <a href=\"https://doi.org/10.1002/crat.201300217\">https://doi.org/10.1002/crat.201300217</a>.","ieee":"T. Riedl and H. Wendrock, “Reliability of high-resolution electron backscatter diffraction determination of strain and rotation variations using phase-only and cross correlation,” <i>Crystal Research and Technology</i>, vol. 49, no. 4, pp. 195–203, 2014.","apa":"Riedl, T., &#38; Wendrock, H. (2014). Reliability of high-resolution electron backscatter diffraction determination of strain and rotation variations using phase-only and cross correlation. <i>Crystal Research and Technology</i>, <i>49</i>(4), 195–203. <a href=\"https://doi.org/10.1002/crat.201300217\">https://doi.org/10.1002/crat.201300217</a>"},"file_date_updated":"2018-08-22T12:45:58Z"},{"conference":{"location":"Warsaw (Poland)","start_date":"2014-09-15","name":"European Materials Research Society Fall Meeting 2014","end_date":"2014-09-19"},"author":[{"id":"36950","full_name":"Riedl, Thomas","first_name":"Thomas","last_name":"Riedl"},{"full_name":"Kovács, A.","first_name":"A.","last_name":"Kovács"},{"full_name":"Meertens, D.","last_name":"Meertens","first_name":"D."},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"year":"2014","title":"Structure and surface chemistry analysis of ultra-thin reactive ion etched GaAs (111) nanopillars","status":"public","date_updated":"2022-01-06T07:00:13Z","language":[{"iso":"eng"}],"_id":"4078","user_id":"55706","citation":{"bibtex":"@inproceedings{Riedl_Kovács_Meertens_Lindner_2014, title={Structure and surface chemistry analysis of ultra-thin reactive ion etched GaAs (111) nanopillars}, author={Riedl, Thomas and Kovács, A. and Meertens, D. and Lindner, Jörg}, year={2014} }","chicago":"Riedl, Thomas, A. Kovács, D. Meertens, and Jörg Lindner. “Structure and Surface Chemistry Analysis of Ultra-Thin Reactive Ion Etched GaAs (111) Nanopillars,” 2014.","ama":"Riedl T, Kovács A, Meertens D, Lindner J. Structure and surface chemistry analysis of ultra-thin reactive ion etched GaAs (111) nanopillars. In: ; 2014.","short":"T. Riedl, A. Kovács, D. Meertens, J. Lindner, in: 2014.","ieee":"T. Riedl, A. Kovács, D. Meertens, and J. Lindner, “Structure and surface chemistry analysis of ultra-thin reactive ion etched GaAs (111) nanopillars,” presented at the European Materials Research Society Fall Meeting 2014, Warsaw (Poland), 2014.","mla":"Riedl, Thomas, et al. <i>Structure and Surface Chemistry Analysis of Ultra-Thin Reactive Ion Etched GaAs (111) Nanopillars</i>. 2014.","apa":"Riedl, T., Kovács, A., Meertens, D., &#38; Lindner, J. (2014). Structure and surface chemistry analysis of ultra-thin reactive ion etched GaAs (111) nanopillars. Presented at the European Materials Research Society Fall Meeting 2014, Warsaw (Poland)."},"date_created":"2018-08-22T12:48:37Z","department":[{"_id":"286"}],"type":"conference"}]