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Ein Forschungs- und Entwicklungsprojekt zur Implementation eines Lehrkonzepts für die erste und zweite Lehrer*innenausbildungsphase zu Deutsch als Zweitsprache und zur Durchgängigen Sprachbildung im naturwissenschaftlich-technischen Sachunterricht","citation":{"ama":"Blumberg E, Niederhaus C, Schnittker B, Schwind S, Havkic A, Settinieri J. „Fachdidaktik und DaZ united“. Ein Forschungs- und Entwicklungsprojekt zur Implementation eines Lehrkonzepts für die erste und zweite Lehrer*innenausbildungsphase zu Deutsch als Zweitsprache und zur Durchgängigen Sprachbildung im naturwissenschaftlich-technischen Sachunterricht. In: Hellmich F, Görel G, Löper MF, eds. <i>Inklusive Schul- und Unterrichtsentwicklung</i>. Kohlhammer; 2018:177-194.","ieee":"E. Blumberg, C. Niederhaus, B. Schnittker, S. Schwind, A. Havkic, and J. Settinieri, “„Fachdidaktik und DaZ united“. 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Zanders <i>et al.</i>, “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” <i>Advanced Materials Interfaces</i>, Art. no. 1801540, 2018, doi: <a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>.","ama":"Zanders D, Ciftyurek E, Hoppe C, et al. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>"},"year":"2018"},{"user_id":"54556","department":[{"_id":"302"}],"_id":"22550","language":[{"iso":"eng"}],"type":"journal_article","publication":"ACS Applied Materials & Interfaces","status":"public","author":[{"first_name":"Maximilian","full_name":"Gebhard, Maximilian","last_name":"Gebhard"},{"last_name":"Mai","full_name":"Mai, Lukas","first_name":"Lukas"},{"last_name":"Banko","full_name":"Banko, Lars","first_name":"Lars"},{"first_name":"Felix","last_name":"Mitschker","full_name":"Mitschker, Felix"},{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"full_name":"Jaritz, Montgomery","last_name":"Jaritz","first_name":"Montgomery"},{"last_name":"Kirchheim","full_name":"Kirchheim, Dennis","first_name":"Dennis"},{"first_name":"Christoph","last_name":"Zekorn","full_name":"Zekorn, Christoph"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"first_name":"Dario","full_name":"Grochla, Dario","last_name":"Grochla"},{"last_name":"Dahlmann","full_name":"Dahlmann, Rainer","first_name":"Rainer"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"date_created":"2021-07-07T08:59:20Z","date_updated":"2023-01-24T08:38:00Z","doi":"10.1021/acsami.7b14916","title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"citation":{"mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","short":"M. 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PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>"},"page":"7422-7434","year":"2018"},{"title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","doi":"10.1021/acsami.7b14916","date_updated":"2023-01-24T08:37:41Z","date_created":"2021-07-07T08:59:10Z","author":[{"first_name":"Maximilian","last_name":"Gebhard","full_name":"Gebhard, Maximilian"},{"last_name":"Mai","full_name":"Mai, Lukas","first_name":"Lukas"},{"last_name":"Banko","full_name":"Banko, Lars","first_name":"Lars"},{"first_name":"Felix","full_name":"Mitschker, Felix","last_name":"Mitschker"},{"last_name":"Hoppe","full_name":"Hoppe, Christian","first_name":"Christian"},{"first_name":"Montgomery","full_name":"Jaritz, Montgomery","last_name":"Jaritz"},{"first_name":"Dennis","last_name":"Kirchheim","full_name":"Kirchheim, Dennis"},{"first_name":"Christoph","full_name":"Zekorn, Christoph","last_name":"Zekorn"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Dario","full_name":"Grochla, Dario","last_name":"Grochla"},{"last_name":"Dahlmann","full_name":"Dahlmann, Rainer","first_name":"Rainer"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"last_name":"Ludwig","full_name":"Ludwig, Alfred","first_name":"Alfred"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"year":"2018","citation":{"chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. 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Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434.","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). 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Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. 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Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>. Published online 2018:377-383. doi:<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>","ieee":"J. Dietrich, C. Hoppe, M. T. de los Arcos de Pedro, and G. Grundmeier, “Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene,” <i>Contributions to Plasma Physics</i>, pp. 377–383, 2018, doi: <a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>.","chicago":"Dietrich, J., C. Hoppe, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO                            x                         on Polypropylene.” <i>Contributions to Plasma Physics</i>, 2018, 377–83. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>.","short":"J. Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. 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Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>, 377–383. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>"},"page":"377-383","publication_status":"published","publication_identifier":{"issn":["0863-1042"]},"title":"Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene","doi":"10.1002/ctpp.201700036","date_updated":"2023-01-24T08:37:20Z","author":[{"first_name":"J.","last_name":"Dietrich","full_name":"Dietrich, J."},{"first_name":"C.","full_name":"Hoppe, C.","last_name":"Hoppe"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"}],"date_created":"2021-07-07T08:57:20Z"},{"author":[{"full_name":"Budde, Maik","last_name":"Budde","first_name":"Maik"},{"last_name":"Corbella","full_name":"Corbella, Carles","first_name":"Carles"},{"last_name":"Große-Kreul","full_name":"Große-Kreul, Simon","first_name":"Simon"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"}],"date_created":"2021-07-07T08:50:38Z","date_updated":"2023-01-24T08:37:01Z","doi":"10.1002/ppap.201700230","title":"Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas","publication_identifier":{"issn":["1612-8850"]},"publication_status":"published","citation":{"ama":"Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. <i>Plasma Processes and Polymers</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>","chicago":"Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 2018. <a href=\"https://doi.org/10.1002/ppap.201700230\">https://doi.org/10.1002/ppap.201700230</a>.","ieee":"M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. 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Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).","bibtex":"@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}, DOI={<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>}, number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}, year={2018} }","mla":"Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 1700230, 2018, doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>."},"year":"2018","department":[{"_id":"302"}],"user_id":"54556","_id":"22547","language":[{"iso":"eng"}],"article_number":"1700230","publication":"Plasma Processes and Polymers","type":"journal_article","status":"public"},{"publication":"RSC Advances","type":"journal_article","abstract":[{"text":"<p>A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.</p>","lang":"eng"}],"status":"public","_id":"22557","department":[{"_id":"302"}],"user_id":"54556","language":[{"iso":"eng"}],"publication_identifier":{"issn":["2046-2069"]},"publication_status":"published","year":"2018","page":"4987-4994","citation":{"bibtex":"@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }","mla":"Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” <i>RSC Advances</i>, 2018, pp. 4987–94, doi:<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>.","short":"L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.","apa":"Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., &#38; Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>, 4987–4994. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>","ama":"Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>. Published online 2018:4987-4994. doi:<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>","ieee":"L. Mai <i>et al.</i>, “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” <i>RSC Advances</i>, pp. 4987–4994, 2018, doi: <a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>.","chicago":"Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” <i>RSC Advances</i>, 2018, 4987–94. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>."},"date_updated":"2023-01-24T08:39:45Z","author":[{"first_name":"Lukas","full_name":"Mai, Lukas","last_name":"Mai"},{"first_name":"Nils","last_name":"Boysen","full_name":"Boysen, Nils"},{"first_name":"Ersoy","last_name":"Subaşı","full_name":"Subaşı, Ersoy"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Detlef","full_name":"Rogalla, Detlef","last_name":"Rogalla"},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"},{"last_name":"Bock","full_name":"Bock, Claudia","first_name":"Claudia"},{"full_name":"Lu, Hong-Liang","last_name":"Lu","first_name":"Hong-Liang"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"date_created":"2021-07-07T09:02:26Z","title":"Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties","doi":"10.1039/c7ra13417g"},{"department":[{"_id":"302"}],"user_id":"54556","_id":"22558","language":[{"iso":"eng"}],"article_number":"235201","publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public","date_created":"2021-07-07T09:02:43Z","author":[{"first_name":"F","full_name":"Mitschker, F","last_name":"Mitschker"},{"first_name":"L","full_name":"Schücke, L","last_name":"Schücke"},{"first_name":"Ch","last_name":"Hoppe","full_name":"Hoppe, Ch"},{"first_name":"M","last_name":"Jaritz","full_name":"Jaritz, M"},{"first_name":"R","last_name":"Dahlmann","full_name":"Dahlmann, R"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Hopmann","full_name":"Hopmann, Ch","first_name":"Ch"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"first_name":"P","full_name":"Awakowicz, P","last_name":"Awakowicz"}],"date_updated":"2023-01-24T08:40:05Z","doi":"10.1088/1361-6463/aac0ab","title":"Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","citation":{"ieee":"F. Mitschker <i>et al.</i>, “Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO),” <i>Journal of Physics D: Applied Physics</i>, Art. no. 235201, 2018, doi: <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>.","chicago":"Mitschker, F, L Schücke, Ch Hoppe, M Jaritz, R Dahlmann, Maria Teresa de los Arcos de Pedro, Ch Hopmann, Guido Grundmeier, and P Awakowicz. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” <i>Journal of Physics D: Applied Physics</i>, 2018. <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">https://doi.org/10.1088/1361-6463/aac0ab</a>.","ama":"Mitschker F, Schücke L, Hoppe C, et al. Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>","bibtex":"@article{Mitschker_Schücke_Hoppe_Jaritz_Dahlmann_de los Arcos de Pedro_Hopmann_Grundmeier_Awakowicz_2018, title={Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Schücke, L and Hoppe, Ch and Jaritz, M and Dahlmann, R and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, Guido and Awakowicz, P}, year={2018} }","short":"F. Mitschker, L. Schücke, C. Hoppe, M. Jaritz, R. Dahlmann, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).","mla":"Mitschker, F., et al. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” <i>Journal of Physics D: Applied Physics</i>, 235201, 2018, doi:<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>.","apa":"Mitschker, F., Schücke, L., Hoppe, C., Jaritz, M., Dahlmann, R., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., &#38; Awakowicz, P. (2018). Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">https://doi.org/10.1088/1361-6463/aac0ab</a>"},"year":"2018"},{"date_created":"2021-07-07T09:03:03Z","author":[{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"last_name":"Wißing","full_name":"Wißing, J","first_name":"J"},{"first_name":"Ch","full_name":"Hoppe, Ch","last_name":"Hoppe"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"date_updated":"2023-01-24T08:40:21Z","doi":"10.1088/1361-6463/aab1dd","title":"Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"citation":{"apa":"Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. 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Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D: Applied Physics</i>, Article 145201. <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">https://doi.org/10.1088/1361-6463/aab1dd</a>","mla":"Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” <i>Journal of Physics D: Applied Physics</i>, 145201, 2018, doi:<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>.","bibtex":"@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018, title={Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>}, number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}, year={2018} }","short":"F. 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