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[3]
2026 | Journal Article | LibreCat-ID: 65823
T. Prüßner, K.-P. Hoyer, N. Buitkamp, and G. Grundmeier, “Atmospheric Corrosion Protection of LPBF Manufactured AlSi10Mg by Combining SiO                    x                    ‐CVD and PDMS Grafting,” Materials and Corrosion, Art. no. maco. 70163, 2026, doi: 10.1002/maco.70163.
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[2]
2025 | Journal Article | LibreCat-ID: 62166
T. Prüßner, K.-P. Hoyer, N. Buitkamp, P. Vieth, and G. Grundmeier, “Surface functionalisation of additively manufactured AlSi10Mg by organophosphonic acid and PDMS grafting,” Materials Chemistry and Physics, vol. 349, Art. no. 131758, 2025, doi: 10.1016/j.matchemphys.2025.131758.
LibreCat | DOI
 
[1]
2014 | Journal Article | LibreCat-ID: 20945
C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water interface,” APPLIED SURFACE SCIENCE, vol. 290, pp. 207–214, 2014, doi: 10.1016/j.apsusc.2013.11.045.
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3 Publications

Mark all

[3]
2026 | Journal Article | LibreCat-ID: 65823
T. Prüßner, K.-P. Hoyer, N. Buitkamp, and G. Grundmeier, “Atmospheric Corrosion Protection of LPBF Manufactured AlSi10Mg by Combining SiO                    x                    ‐CVD and PDMS Grafting,” Materials and Corrosion, Art. no. maco. 70163, 2026, doi: 10.1002/maco.70163.
LibreCat | DOI
 
[2]
2025 | Journal Article | LibreCat-ID: 62166
T. Prüßner, K.-P. Hoyer, N. Buitkamp, P. Vieth, and G. Grundmeier, “Surface functionalisation of additively manufactured AlSi10Mg by organophosphonic acid and PDMS grafting,” Materials Chemistry and Physics, vol. 349, Art. no. 131758, 2025, doi: 10.1016/j.matchemphys.2025.131758.
LibreCat | DOI
 
[1]
2014 | Journal Article | LibreCat-ID: 20945
C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water interface,” APPLIED SURFACE SCIENCE, vol. 290, pp. 207–214, 2014, doi: 10.1016/j.apsusc.2013.11.045.
LibreCat | DOI | WoS
 

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Citation Style: IEEE

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