Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits Becker, Bernd Hellebrand, Sybille Polian, Ilia Straube, Bernd Vermeiren, Wolfgang Wunderlich, Hans-Joachim IEEE 2010 info:eu-repo/semantics/conferenceObject doc-type:conferenceObject text http://purl.org/coar/resource_type/c_5794 https://ris.uni-paderborn.de/record/12987 Becker B, Hellebrand S, Polian I, Straube B, Vermeiren W, Wunderlich H-J. Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits. In: <i>40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10)</i>. Chicago, IL, USA: IEEE; 2010. doi:<a href="https://doi.org/10.1109/dsnw.2010.5542612">10.1109/dsnw.2010.5542612</a> eng info:eu-repo/semantics/altIdentifier/doi/10.1109/dsnw.2010.5542612 info:eu-repo/semantics/closedAccess