{"type":"conference","_id":"12987","doi":"10.1109/dsnw.2010.5542612","author":[{"first_name":"Bernd","full_name":"Becker, Bernd","last_name":"Becker"},{"id":"209","orcid":"0000-0002-3717-3939","last_name":"Hellebrand","full_name":"Hellebrand, Sybille","first_name":"Sybille"},{"last_name":"Polian","full_name":"Polian, Ilia","first_name":"Ilia"},{"full_name":"Straube, Bernd","first_name":"Bernd","last_name":"Straube"},{"first_name":"Wolfgang","full_name":"Vermeiren, Wolfgang","last_name":"Vermeiren"},{"last_name":"Wunderlich","full_name":"Wunderlich, Hans-Joachim","first_name":"Hans-Joachim"}],"user_id":"209","publication":"40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W'10)","date_created":"2019-08-28T09:22:53Z","citation":{"bibtex":"@inproceedings{Becker_Hellebrand_Polian_Straube_Vermeiren_Wunderlich_2010, place={Chicago, IL, USA}, title={Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits}, DOI={10.1109/dsnw.2010.5542612}, booktitle={40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10)}, publisher={IEEE}, author={Becker, Bernd and Hellebrand, Sybille and Polian, Ilia and Straube, Bernd and Vermeiren, Wolfgang and Wunderlich, Hans-Joachim}, year={2010} }","short":"B. Becker, S. Hellebrand, I. Polian, B. Straube, W. Vermeiren, H.-J. Wunderlich, in: 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), IEEE, Chicago, IL, USA, 2010.","mla":"Becker, Bernd, et al. “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits.” 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), IEEE, 2010, doi:10.1109/dsnw.2010.5542612.","ieee":"B. Becker, S. Hellebrand, I. Polian, B. Straube, W. Vermeiren, and H.-J. Wunderlich, “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits,” in 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), 2010.","chicago":"Becker, Bernd, Sybille Hellebrand, Ilia Polian, Bernd Straube, Wolfgang Vermeiren, and Hans-Joachim Wunderlich. “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits.” In 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE, 2010. https://doi.org/10.1109/dsnw.2010.5542612.","ama":"Becker B, Hellebrand S, Polian I, Straube B, Vermeiren W, Wunderlich H-J. Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits. In: 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE; 2010. doi:10.1109/dsnw.2010.5542612","apa":"Becker, B., Hellebrand, S., Polian, I., Straube, B., Vermeiren, W., & Wunderlich, H.-J. (2010). Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits. In 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE. https://doi.org/10.1109/dsnw.2010.5542612"},"publisher":"IEEE","status":"public","title":"Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits","department":[{"_id":"48"}],"place":"Chicago, IL, USA","date_updated":"2022-01-06T06:51:27Z","year":"2010","language":[{"iso":"eng"}]}