{"volume":"175-176","language":[{"iso":"eng"}],"status":"public","date_updated":"2022-01-06T06:51:43Z","page":"769-776","publication_status":"published","publication_identifier":{"issn":["0169-4332"]},"citation":{"apa":"Hingerl, K., Balderas-Navarro, R. ., Bonanni, A., Tichopadek, P., &#38; Schmidt, W. (2002). On the origin of resonance features in reflectance difference data of silicon. <i>Applied Surface Science</i>, <i>175</i>–<i>176</i>, 769–776. <a href=\"https://doi.org/10.1016/s0169-4332(01)00114-3\">https://doi.org/10.1016/s0169-4332(01)00114-3</a>","ama":"Hingerl K, Balderas-Navarro R., Bonanni A, Tichopadek P, Schmidt W. On the origin of resonance features in reflectance difference data of silicon. <i>Applied Surface Science</i>. 2002;175-176:769-776. doi:<a href=\"https://doi.org/10.1016/s0169-4332(01)00114-3\">10.1016/s0169-4332(01)00114-3</a>","bibtex":"@article{Hingerl_Balderas-Navarro_Bonanni_Tichopadek_Schmidt_2002, title={On the origin of resonance features in reflectance difference data of silicon}, volume={175–176}, DOI={<a href=\"https://doi.org/10.1016/s0169-4332(01)00114-3\">10.1016/s0169-4332(01)00114-3</a>}, journal={Applied Surface Science}, author={Hingerl, K and Balderas-Navarro, R.E and Bonanni, A and Tichopadek, P and Schmidt, Wolf}, year={2002}, pages={769–776} }","ieee":"K. Hingerl, R. . Balderas-Navarro, A. Bonanni, P. Tichopadek, and W. Schmidt, “On the origin of resonance features in reflectance difference data of silicon,” <i>Applied Surface Science</i>, vol. 175–176, pp. 769–776, 2002.","chicago":"Hingerl, K, R.E Balderas-Navarro, A Bonanni, P Tichopadek, and Wolf Schmidt. “On the Origin of Resonance Features in Reflectance Difference Data of Silicon.” <i>Applied Surface Science</i> 175–176 (2002): 769–76. <a href=\"https://doi.org/10.1016/s0169-4332(01)00114-3\">https://doi.org/10.1016/s0169-4332(01)00114-3</a>.","mla":"Hingerl, K., et al. “On the Origin of Resonance Features in Reflectance Difference Data of Silicon.” <i>Applied Surface Science</i>, vol. 175–176, 2002, pp. 769–76, doi:<a href=\"https://doi.org/10.1016/s0169-4332(01)00114-3\">10.1016/s0169-4332(01)00114-3</a>.","short":"K. Hingerl, R.. Balderas-Navarro, A. Bonanni, P. Tichopadek, W. Schmidt, Applied Surface Science 175–176 (2002) 769–776."},"year":"2002","author":[{"first_name":"K","full_name":"Hingerl, K","last_name":"Hingerl"},{"last_name":"Balderas-Navarro","full_name":"Balderas-Navarro, R.E","first_name":"R.E"},{"first_name":"A","last_name":"Bonanni","full_name":"Bonanni, A"},{"full_name":"Tichopadek, P","last_name":"Tichopadek","first_name":"P"},{"first_name":"Wolf","full_name":"Schmidt, Wolf","last_name":"Schmidt"}],"department":[{"_id":"15"},{"_id":"170"},{"_id":"295"}],"title":"On the origin of resonance features in reflectance difference data of silicon","type":"journal_article","publication":"Applied Surface Science","date_created":"2019-10-10T12:20:46Z","user_id":"16199","doi":"10.1016/s0169-4332(01)00114-3","_id":"13752"}