{"year":"2018","author":[{"last_name":"Zanders","full_name":"Zanders, David","first_name":"David"},{"first_name":"Engin","last_name":"Ciftyurek","full_name":"Ciftyurek, Engin"},{"first_name":"Christian","full_name":"Hoppe, Christian","last_name":"Hoppe"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","id":"54556"},{"full_name":"Kostka, Aleksander","last_name":"Kostka","first_name":"Aleksander"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido","id":"194"},{"first_name":"Klaus Dieter","last_name":"Schierbaum","full_name":"Schierbaum, Klaus Dieter"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"publication_identifier":{"issn":["2196-7350","2196-7350"]},"user_id":"54556","doi":"10.1002/admi.201801540","date_created":"2021-07-07T08:50:07Z","publication_status":"published","_id":"22546","status":"public","department":[{"_id":"302"}],"type":"journal_article","article_number":"1801540","citation":{"ieee":"D. Zanders <i>et al.</i>, “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” <i>Advanced Materials Interfaces</i>, Art. no. 1801540, 2018, doi: <a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>.","bibtex":"@article{Zanders_Ciftyurek_Hoppe_de los Arcos de Pedro_Kostka_Rogalla_Grundmeier_Schierbaum_Devi_2018, title={Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties}, DOI={<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>}, number={1801540}, journal={Advanced Materials Interfaces}, author={Zanders, David and Ciftyurek, Engin and Hoppe, Christian and de los Arcos de Pedro, Maria Teresa and Kostka, Aleksander and Rogalla, Detlef and Grundmeier, Guido and Schierbaum, Klaus Dieter and Devi, Anjana}, year={2018} }","ama":"Zanders D, Ciftyurek E, Hoppe C, et al. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>","short":"D. Zanders, E. Ciftyurek, C. Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. Devi, Advanced Materials Interfaces (2018).","apa":"Zanders, D., Ciftyurek, E., Hoppe, C., de los Arcos de Pedro, M. T., Kostka, A., Rogalla, D., Grundmeier, G., Schierbaum, K. D., &#38; Devi, A. (2018). Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>, Article 1801540. <a href=\"https://doi.org/10.1002/admi.201801540\">https://doi.org/10.1002/admi.201801540</a>","chicago":"Zanders, David, Engin Ciftyurek, Christian Hoppe, Maria Teresa de los Arcos de Pedro, Aleksander Kostka, Detlef Rogalla, Guido Grundmeier, Klaus Dieter Schierbaum, and Anjana Devi. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” <i>Advanced Materials Interfaces</i>, 2018. <a href=\"https://doi.org/10.1002/admi.201801540\">https://doi.org/10.1002/admi.201801540</a>.","mla":"Zanders, David, et al. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” <i>Advanced Materials Interfaces</i>, 1801540, 2018, doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>."},"date_updated":"2023-01-24T08:36:44Z","language":[{"iso":"eng"}],"publication":"Advanced Materials Interfaces","title":"Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties"}