A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.
"}],"publication_identifier":{"issn":["2046-2069"]},"language":[{"iso":"eng"}],"citation":{"bibtex":"@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={10.1039/c7ra13417g}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }","ama":"Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances. Published online 2018:4987-4994. doi:10.1039/c7ra13417g","apa":"Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., & Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances, 4987–4994. https://doi.org/10.1039/c7ra13417g","ieee":"L. Mai et al., “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” RSC Advances, pp. 4987–4994, 2018, doi: 10.1039/c7ra13417g.","short":"L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.","mla":"Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, pp. 4987–94, doi:10.1039/c7ra13417g.","chicago":"Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, 4987–94. https://doi.org/10.1039/c7ra13417g."},"year":"2018","_id":"22557","type":"journal_article","user_id":"54556","date_updated":"2023-01-24T08:39:45Z","title":"Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties","author":[{"last_name":"Mai","first_name":"Lukas","full_name":"Mai, Lukas"},{"first_name":"Nils","last_name":"Boysen","full_name":"Boysen, Nils"},{"first_name":"Ersoy","last_name":"Subaşı","full_name":"Subaşı, Ersoy"},{"full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa","id":"54556"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"id":"194","last_name":"Grundmeier","first_name":"Guido","full_name":"Grundmeier, Guido"},{"first_name":"Claudia","last_name":"Bock","full_name":"Bock, Claudia"},{"full_name":"Lu, Hong-Liang","last_name":"Lu","first_name":"Hong-Liang"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"status":"public","page":"4987-4994","publication_status":"published","department":[{"_id":"302"}],"doi":"10.1039/c7ra13417g"}