{"author":[{"first_name":"Carles","last_name":"Corbella","full_name":"Corbella, Carles"},{"first_name":"Adrian","last_name":"Marcak","full_name":"Marcak, Adrian"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"},{"full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556","first_name":"Maria Teresa"}],"status":"public","year":"2016","citation":{"mla":"Corbella, Carles, et al. “Electric Potential Screening on Metal Targets Submitted to Reactive Sputtering.” <i>Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films</i>, 021307, 2016, doi:<a href=\"https://doi.org/10.1116/1.4972566\">10.1116/1.4972566</a>.","ama":"Corbella C, Marcak A, von Keudell A, de los Arcos de Pedro MT. Electric potential screening on metal targets submitted to reactive sputtering. <i>Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films</i>. Published online 2016. doi:<a href=\"https://doi.org/10.1116/1.4972566\">10.1116/1.4972566</a>","ieee":"C. Corbella, A. Marcak, A. von Keudell, and M. T. de los Arcos de Pedro, “Electric potential screening on metal targets submitted to reactive sputtering,” <i>Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films</i>, Art. no. 021307, 2016, doi: <a href=\"https://doi.org/10.1116/1.4972566\">10.1116/1.4972566</a>.","apa":"Corbella, C., Marcak, A., von Keudell, A., &#38; de los Arcos de Pedro, M. T. (2016). Electric potential screening on metal targets submitted to reactive sputtering. <i>Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films</i>, Article 021307. <a href=\"https://doi.org/10.1116/1.4972566\">https://doi.org/10.1116/1.4972566</a>","bibtex":"@article{Corbella_Marcak_von Keudell_de los Arcos de Pedro_2016, title={Electric potential screening on metal targets submitted to reactive sputtering}, DOI={<a href=\"https://doi.org/10.1116/1.4972566\">10.1116/1.4972566</a>}, number={021307}, journal={Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films}, author={Corbella, Carles and Marcak, Adrian and von Keudell, Achim and de los Arcos de Pedro, Maria Teresa}, year={2016} }","chicago":"Corbella, Carles, Adrian Marcak, Achim von Keudell, and Maria Teresa de los Arcos de Pedro. “Electric Potential Screening on Metal Targets Submitted to Reactive Sputtering.” <i>Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films</i>, 2016. <a href=\"https://doi.org/10.1116/1.4972566\">https://doi.org/10.1116/1.4972566</a>.","short":"C. Corbella, A. Marcak, A. von Keudell, M.T. de los Arcos de Pedro, Journal of Vacuum Science &#38; Technology A: Vacuum, Surfaces, and Films (2016)."},"user_id":"54556","date_created":"2021-07-07T09:07:08Z","department":[{"_id":"302"}],"publication_identifier":{"issn":["0734-2101","1520-8559"]},"_id":"22565","title":"Electric potential screening on metal targets submitted to reactive sputtering","publication_status":"published","language":[{"iso":"eng"}],"publication":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","date_updated":"2023-01-24T08:16:05Z","type":"journal_article","doi":"10.1116/1.4972566","article_number":"021307"}