{"status":"public","date_created":"2021-07-07T09:09:17Z","author":[{"last_name":"Mai","full_name":"Mai, Lukas","first_name":"Lukas"},{"first_name":"Maximilian","last_name":"Gebhard","full_name":"Gebhard, Maximilian"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Giner","full_name":"Giner, Ignacio","first_name":"Ignacio"},{"first_name":"Felix","full_name":"Mitschker, Felix","last_name":"Mitschker"},{"last_name":"Winter","full_name":"Winter, Manuela","first_name":"Manuela"},{"first_name":"Harish","last_name":"Parala","full_name":"Parala, Harish"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"},{"full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"_id":"22570","language":[{"iso":"eng"}],"type":"journal_article","page":"10768-10772","year":"2017","publication_status":"published","publication":"Chemistry - A European Journal","department":[{"_id":"302"}],"doi":"10.1002/chem.201702939","citation":{"apa":"Mai, L., Gebhard, M., de los Arcos de Pedro, M. T., Giner, I., Mitschker, F., Winter, M., Parala, H., Awakowicz, P., Grundmeier, G., &#38; Devi, A. (2017). Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development. <i>Chemistry - A European Journal</i>, 10768–10772. <a href=\"https://doi.org/10.1002/chem.201702939\">https://doi.org/10.1002/chem.201702939</a>","chicago":"Mai, Lukas, Maximilian Gebhard, Maria Teresa de los Arcos de Pedro, Ignacio Giner, Felix Mitschker, Manuela Winter, Harish Parala, Peter Awakowicz, Guido Grundmeier, and Anjana Devi. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development.” <i>Chemistry - A European Journal</i>, 2017, 10768–72. <a href=\"https://doi.org/10.1002/chem.201702939\">https://doi.org/10.1002/chem.201702939</a>.","ieee":"L. Mai <i>et al.</i>, “Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development,” <i>Chemistry - A European Journal</i>, pp. 10768–10772, 2017, doi: <a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>.","mla":"Mai, Lukas, et al. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development.” <i>Chemistry - A European Journal</i>, 2017, pp. 10768–72, doi:<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>.","ama":"Mai L, Gebhard M, de los Arcos de Pedro MT, et al. Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development. <i>Chemistry - A European Journal</i>. Published online 2017:10768-10772. doi:<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>","short":"L. Mai, M. Gebhard, M.T. de los Arcos de Pedro, I. Giner, F. Mitschker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi, Chemistry - A European Journal (2017) 10768–10772.","bibtex":"@article{Mai_Gebhard_de los Arcos de Pedro_Giner_Mitschker_Winter_Parala_Awakowicz_Grundmeier_Devi_2017, title={Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development}, DOI={<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>}, journal={Chemistry - A European Journal}, author={Mai, Lukas and Gebhard, Maximilian and de los Arcos de Pedro, Maria Teresa and Giner, Ignacio and Mitschker, Felix and Winter, Manuela and Parala, Harish and Awakowicz, Peter and Grundmeier, Guido and Devi, Anjana}, year={2017}, pages={10768–10772} }"},"user_id":"54556","date_updated":"2023-01-24T08:14:57Z","title":"Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development","publication_identifier":{"issn":["0947-6539"]}}