@article{22577,
  abstract     = {{<p>A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.</p>}},
  author       = {{Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz, P. and Grundmeier, G. and Devi, A.}},
  issn         = {{2050-7526}},
  journal      = {{Journal of Materials Chemistry C}},
  pages        = {{1057--1065}},
  title        = {{{An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}}},
  doi          = {{10.1039/c5tc03385c}},
  year         = {{2016}},
}