A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.
","lang":"eng"}],"publication":"Journal of Materials Chemistry C","citation":{"mla":"Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, pp. 1057–65, doi:10.1039/c5tc03385c.","bibtex":"@article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos de Pedro_Awakowicz_Grundmeier_Devi_2016, title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}, DOI={10.1039/c5tc03385c}, journal={Journal of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz, P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} }","ama":"Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C. Published online 2016:1057-1065. doi:10.1039/c5tc03385c","ieee":"M. Gebhard et al., “An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor,” Journal of Materials Chemistry C, pp. 1057–1065, 2016, doi: 10.1039/c5tc03385c.","apa":"Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos de Pedro, M. T., Awakowicz, P., Grundmeier, G., & Devi, A. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C, 1057–1065. https://doi.org/10.1039/c5tc03385c","chicago":"Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, Maria Teresa de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, 1057–65. https://doi.org/10.1039/c5tc03385c.","short":"M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065."},"doi":"10.1039/c5tc03385c","user_id":"54556","page":"1057-1065","_id":"22577","language":[{"iso":"eng"}],"date_updated":"2023-01-24T08:18:08Z","publication_status":"published","status":"public","year":"2016","title":"An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor","publication_identifier":{"issn":["2050-7526","2050-7534"]},"author":[{"last_name":"Gebhard","first_name":"M.","full_name":"Gebhard, M."},{"first_name":"F.","last_name":"Mitschker","full_name":"Mitschker, F."},{"last_name":"Wiesing","first_name":"M.","full_name":"Wiesing, M."},{"full_name":"Giner, I.","last_name":"Giner","first_name":"I."},{"first_name":"B.","last_name":"Torun","full_name":"Torun, B."},{"full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556"},{"first_name":"P.","last_name":"Awakowicz","full_name":"Awakowicz, P."},{"full_name":"Grundmeier, G.","last_name":"Grundmeier","first_name":"G."},{"last_name":"Devi","first_name":"A.","full_name":"Devi, A."}]}]