{"date_created":"2021-07-07T09:13:09Z","type":"journal_article","department":[{"_id":"302"}],"publication":"Journal of Materials Chemistry C","citation":{"mla":"Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” <i>Journal of Materials Chemistry C</i>, 2016, pp. 1057–65, doi:<a href=\"https://doi.org/10.1039/c5tc03385c\">10.1039/c5tc03385c</a>.","bibtex":"@article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos de Pedro_Awakowicz_Grundmeier_Devi_2016, title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}, DOI={<a href=\"https://doi.org/10.1039/c5tc03385c\">10.1039/c5tc03385c</a>}, journal={Journal of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz, P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} }","ama":"Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. <i>Journal of Materials Chemistry C</i>. Published online 2016:1057-1065. doi:<a href=\"https://doi.org/10.1039/c5tc03385c\">10.1039/c5tc03385c</a>","ieee":"M. Gebhard <i>et al.</i>, “An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor,” <i>Journal of Materials Chemistry C</i>, pp. 1057–1065, 2016, doi: <a href=\"https://doi.org/10.1039/c5tc03385c\">10.1039/c5tc03385c</a>.","apa":"Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos de Pedro, M. T., Awakowicz, P., Grundmeier, G., &#38; Devi, A. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. <i>Journal of Materials Chemistry C</i>, 1057–1065. <a href=\"https://doi.org/10.1039/c5tc03385c\">https://doi.org/10.1039/c5tc03385c</a>","chicago":"Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, Maria Teresa de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” <i>Journal of Materials Chemistry C</i>, 2016, 1057–65. <a href=\"https://doi.org/10.1039/c5tc03385c\">https://doi.org/10.1039/c5tc03385c</a>.","short":"M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065."},"abstract":[{"text":"<p>A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.</p>","lang":"eng"}],"page":"1057-1065","_id":"22577","language":[{"iso":"eng"}],"doi":"10.1039/c5tc03385c","user_id":"54556","year":"2016","status":"public","title":"An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor","publication_identifier":{"issn":["2050-7526","2050-7534"]},"author":[{"full_name":"Gebhard, M.","last_name":"Gebhard","first_name":"M."},{"full_name":"Mitschker, F.","last_name":"Mitschker","first_name":"F."},{"last_name":"Wiesing","first_name":"M.","full_name":"Wiesing, M."},{"last_name":"Giner","first_name":"I.","full_name":"Giner, I."},{"last_name":"Torun","first_name":"B.","full_name":"Torun, B."},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Awakowicz, P.","last_name":"Awakowicz","first_name":"P."},{"full_name":"Grundmeier, G.","last_name":"Grundmeier","first_name":"G."},{"first_name":"A.","last_name":"Devi","full_name":"Devi, A."}],"date_updated":"2023-01-24T08:18:08Z","publication_status":"published"}