A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.
","lang":"eng"}],"author":[{"full_name":"Gebhard, M.","last_name":"Gebhard","first_name":"M."},{"last_name":"Mitschker","full_name":"Mitschker, F.","first_name":"F."},{"full_name":"Wiesing, M.","last_name":"Wiesing","first_name":"M."},{"first_name":"I.","last_name":"Giner","full_name":"Giner, I."},{"first_name":"B.","full_name":"Torun, B.","last_name":"Torun"},{"first_name":"Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa"},{"last_name":"Awakowicz","full_name":"Awakowicz, P.","first_name":"P."},{"first_name":"G.","last_name":"Grundmeier","full_name":"Grundmeier, G."},{"first_name":"A.","full_name":"Devi, A.","last_name":"Devi"}],"year":"2016","status":"public","date_created":"2021-07-07T09:13:09Z","citation":{"apa":"Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos de Pedro, M. T., Awakowicz, P., Grundmeier, G., & Devi, A. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C, 1057–1065. https://doi.org/10.1039/c5tc03385c","short":"M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065.","chicago":"Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, Maria Teresa de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, 1057–65. https://doi.org/10.1039/c5tc03385c.","ieee":"M. Gebhard et al., “An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor,” Journal of Materials Chemistry C, pp. 1057–1065, 2016, doi: 10.1039/c5tc03385c.","bibtex":"@article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos de Pedro_Awakowicz_Grundmeier_Devi_2016, title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}, DOI={10.1039/c5tc03385c}, journal={Journal of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz, P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} }","ama":"Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C. Published online 2016:1057-1065. doi:10.1039/c5tc03385c","mla":"Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, pp. 1057–65, doi:10.1039/c5tc03385c."},"user_id":"54556","department":[{"_id":"302"}],"publication_identifier":{"issn":["2050-7526","2050-7534"]},"title":"An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor","_id":"22577","publication_status":"published","language":[{"iso":"eng"}],"publication":"Journal of Materials Chemistry C","type":"journal_article","date_updated":"2023-01-24T08:18:08Z","page":"1057-1065","doi":"10.1039/c5tc03385c"}