article published M. Gebhard author F. Mitschker author M. Wiesing author I. Giner author B. Torun author Maria Teresa de los Arcos de Pedro author 54556 P. Awakowicz author G. Grundmeier author A. Devi author 302 department <p>A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.</p> 2016 eng 2050-7526 2050-753410.1039/c5tc03385c 1057-1065 M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065. Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” <i>Journal of Materials Chemistry C</i>, 2016, pp. 1057–65, doi:<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>. @article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos de Pedro_Awakowicz_Grundmeier_Devi_2016, title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}, DOI={<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>}, journal={Journal of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz, P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} } Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos de Pedro, M. T., Awakowicz, P., Grundmeier, G., &#38; Devi, A. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. <i>Journal of Materials Chemistry C</i>, 1057–1065. <a href="https://doi.org/10.1039/c5tc03385c">https://doi.org/10.1039/c5tc03385c</a> M. Gebhard <i>et al.</i>, “An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor,” <i>Journal of Materials Chemistry C</i>, pp. 1057–1065, 2016, doi: <a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>. Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, Maria Teresa de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” <i>Journal of Materials Chemistry C</i>, 2016, 1057–65. <a href="https://doi.org/10.1039/c5tc03385c">https://doi.org/10.1039/c5tc03385c</a>. Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. <i>Journal of Materials Chemistry C</i>. Published online 2016:1057-1065. doi:<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a> 225772021-07-07T09:13:09Z2023-01-24T08:18:08Z