{"doi":"10.1002/pssa.201330115","citation":{"apa":"Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser, E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland. A., &#38; Devi, A. (2013). Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>Physica Status Solidi (a)</i>, 416–424. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>","ama":"Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>physica status solidi (a)</i>. Published online 2013:416-424. doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>","bibtex":"@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>}, journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }","ieee":"V.-S. Dang <i>et al.</i>, “Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition,” <i>physica status solidi (a)</i>, pp. 416–424, 2013, doi: <a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>.","chicago":"Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan, Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, 416–24. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>.","mla":"Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, pp. 416–24, doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>.","short":"V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424."},"user_id":"54556","department":[{"_id":"302"}],"publication":"physica status solidi (a)","title":"Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition","date_created":"2021-07-07T11:09:32Z","page":"416-424","type":"journal_article","_id":"22584","language":[{"iso":"eng"}],"extern":"1","publication_identifier":{"issn":["1862-6300"]},"year":"2013","publication_status":"published","status":"public","author":[{"last_name":"Dang","full_name":"Dang, Van-Son","first_name":"Van-Son"},{"first_name":"Harish","full_name":"Parala, Harish","last_name":"Parala"},{"last_name":"Kim","full_name":"Kim, Jin Hyun","first_name":"Jin Hyun"},{"full_name":"Xu, Ke","last_name":"Xu","first_name":"Ke"},{"full_name":"Srinivasan, Nagendra B.","last_name":"Srinivasan","first_name":"Nagendra B."},{"last_name":"Edengeiser","full_name":"Edengeiser, Eugen","first_name":"Eugen"},{"first_name":"Martina","full_name":"Havenith, Martina","last_name":"Havenith"},{"full_name":"Wieck, Andreas D.","last_name":"Wieck","first_name":"Andreas D."},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Roland. A.","full_name":"Fischer, Roland. A.","last_name":"Fischer"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"date_updated":"2023-01-24T08:21:54Z"}