{"publication_status":"published","date_updated":"2023-01-24T08:22:27Z","author":[{"last_name":"Srinivasan","full_name":"Srinivasan, Nagendra B.","first_name":"Nagendra B."},{"first_name":"Tobias B.","full_name":"Thiede, Tobias B.","last_name":"Thiede"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"first_name":"Hans-Werner","last_name":"Becker","full_name":"Becker, Hans-Werner"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"},{"first_name":"Roland A.","full_name":"Fischer, Roland A.","last_name":"Fischer"}],"status":"public","publication_identifier":{"issn":["1862-6300"]},"extern":"1","language":[{"iso":"eng"}],"_id":"22589","year":"2013","type":"journal_article","page":"260-266","publication":"physica status solidi (a)","title":"MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics","date_created":"2021-07-07T11:11:23Z","department":[{"_id":"302"}],"citation":{"short":"N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.","mla":"Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, pp. 260–66, doi:<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>.","bibtex":"@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013, title={MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>}, journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266} }","ama":"Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. <i>physica status solidi (a)</i>. Published online 2013:260-266. doi:<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>","ieee":"N. B. Srinivasan <i>et al.</i>, “MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics,” <i>physica status solidi (a)</i>, pp. 260–266, 2013, doi: <a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>.","chicago":"Srinivasan, Nagendra B., Tobias B. Thiede, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Hans-Werner Becker, Anjana Devi, and Roland A. Fischer. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, 260–66. <a href=\"https://doi.org/10.1002/pssa.201330127\">https://doi.org/10.1002/pssa.201330127</a>.","apa":"Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D., Becker, H.-W., Devi, A., &#38; Fischer, R. A. (2013). MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. <i>Physica Status Solidi (a)</i>, 260–266. <a href=\"https://doi.org/10.1002/pssa.201330127\">https://doi.org/10.1002/pssa.201330127</a>"},"user_id":"54556","doi":"10.1002/pssa.201330127"}