@article{22593,
  author       = {{Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}},
  issn         = {{0257-8972}},
  journal      = {{Surface and Coatings Technology}},
  pages        = {{130--136}},
  title        = {{{Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}}},
  doi          = {{10.1016/j.surfcoat.2013.06.024}},
  year         = {{2013}},
}