{"doi":"10.1016/j.surfcoat.2013.06.024","page":"130-136","publication":"Surface and Coatings Technology","type":"journal_article","date_updated":"2023-01-24T08:23:13Z","language":[{"iso":"eng"}],"publication_status":"published","department":[{"_id":"302"}],"publication_identifier":{"issn":["0257-8972"]},"title":"Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors","_id":"22593","citation":{"chicago":"Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, 130–36. <a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>.","short":"N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136.","bibtex":"@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013, title={Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={<a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>}, journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013}, pages={130–136} }","apa":"Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V., Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., &#38; Fischer, R. A. (2013). Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>, 130–136. <a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>","ieee":"N. B. Srinivasan <i>et al.</i>, “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” <i>Surface and Coatings Technology</i>, pp. 130–136, 2013, doi: <a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>.","ama":"Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>. Published online 2013:130-136. doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>","mla":"Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, pp. 130–36, doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>."},"user_id":"54556","date_created":"2021-07-07T11:13:33Z","status":"public","year":"2013","extern":"1","author":[{"last_name":"Srinivasan","full_name":"Srinivasan, N.B.","first_name":"N.B."},{"first_name":"T.B.","last_name":"Thiede","full_name":"Thiede, T.B."},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"V.","last_name":"Gwildies","full_name":"Gwildies, V."},{"first_name":"M.","last_name":"Krasnopolski","full_name":"Krasnopolski, M."},{"last_name":"Becker","full_name":"Becker, H.-W.","first_name":"H.-W."},{"first_name":"D.","full_name":"Rogalla, D.","last_name":"Rogalla"},{"full_name":"Devi, A.","last_name":"Devi","first_name":"A."},{"first_name":"R.A.","full_name":"Fischer, R.A.","last_name":"Fischer"}]}