article published N.B. Srinivasan author T.B. Thiede author Maria Teresa de los Arcos de Pedro author 54556 V. Gwildies author M. Krasnopolski author H.-W. Becker author D. Rogalla author A. Devi author R.A. Fischer author 302 department 2013 eng 0257-897210.1016/j.surfcoat.2013.06.024 130-136 yes Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V., Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., &#38; Fischer, R. A. (2013). Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>, 130–136. <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a> N. B. Srinivasan <i>et al.</i>, “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” <i>Surface and Coatings Technology</i>, pp. 130–136, 2013, doi: <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>. N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136. Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, 130–36. <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>. Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, pp. 130–36, doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>. Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>. Published online 2013:130-136. doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a> @article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013, title={Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>}, journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013}, pages={130–136} } 225932021-07-07T11:13:33Z2023-01-24T08:23:13Z