Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2(iPrN)2CMe2] (M=Mo, W) as precursors
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136.