---
_id: '22593'
author:
- first_name: N.B.
full_name: Srinivasan, N.B.
last_name: Srinivasan
- first_name: T.B.
full_name: Thiede, T.B.
last_name: Thiede
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: V.
full_name: Gwildies, V.
last_name: Gwildies
- first_name: M.
full_name: Krasnopolski, M.
last_name: Krasnopolski
- first_name: H.-W.
full_name: Becker, H.-W.
last_name: Becker
- first_name: D.
full_name: Rogalla, D.
last_name: Rogalla
- first_name: A.
full_name: Devi, A.
last_name: Devi
- first_name: R.A.
full_name: Fischer, R.A.
last_name: Fischer
citation:
ama: Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal
nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2]
(M=Mo, W) as precursors. Surface and Coatings Technology. Published online
2013:130-136. doi:10.1016/j.surfcoat.2013.06.024
apa: Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V.,
Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., & Fischer, R. A. (2013).
Transition metal nitride thin films grown by MOCVD using amidinato based complexes
[M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology,
130–136. https://doi.org/10.1016/j.surfcoat.2013.06.024
bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013,
title={Transition metal nitride thin films grown by MOCVD using amidinato based
complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={10.1016/j.surfcoat.2013.06.024},
journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede,
T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski,
M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013},
pages={130–136} }'
chicago: Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies,
M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition
Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2]
(M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, 130–36.
https://doi.org/10.1016/j.surfcoat.2013.06.024.
ieee: 'N. B. Srinivasan et al., “Transition metal nitride thin films grown
by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as
precursors,” Surface and Coatings Technology, pp. 130–136, 2013, doi: 10.1016/j.surfcoat.2013.06.024.'
mla: Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD
Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.”
Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024.
short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M.
Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings
Technology (2013) 130–136.
date_created: 2021-07-07T11:13:33Z
date_updated: 2023-01-24T08:23:13Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2013.06.024
extern: '1'
language:
- iso: eng
page: 130-136
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
status: public
title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes
[M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
type: journal_article
user_id: '54556'
year: '2013'
...