---
_id: '22593'
author:
- first_name: N.B.
  full_name: Srinivasan, N.B.
  last_name: Srinivasan
- first_name: T.B.
  full_name: Thiede, T.B.
  last_name: Thiede
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: V.
  full_name: Gwildies, V.
  last_name: Gwildies
- first_name: M.
  full_name: Krasnopolski, M.
  last_name: Krasnopolski
- first_name: H.-W.
  full_name: Becker, H.-W.
  last_name: Becker
- first_name: D.
  full_name: Rogalla, D.
  last_name: Rogalla
- first_name: A.
  full_name: Devi, A.
  last_name: Devi
- first_name: R.A.
  full_name: Fischer, R.A.
  last_name: Fischer
citation:
  ama: Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal
    nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2]
    (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>. Published online
    2013:130-136. doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>
  apa: Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V.,
    Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., &#38; Fischer, R. A. (2013).
    Transition metal nitride thin films grown by MOCVD using amidinato based complexes
    [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>,
    130–136. <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>
  bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013,
    title={Transition metal nitride thin films grown by MOCVD using amidinato based
    complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>},
    journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede,
    T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski,
    M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013},
    pages={130–136} }'
  chicago: Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies,
    M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition
    Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2]
    (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, 130–36.
    <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>.
  ieee: 'N. B. Srinivasan <i>et al.</i>, “Transition metal nitride thin films grown
    by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as
    precursors,” <i>Surface and Coatings Technology</i>, pp. 130–136, 2013, doi: <a
    href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>.'
  mla: Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD
    Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.”
    <i>Surface and Coatings Technology</i>, 2013, pp. 130–36, doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>.
  short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M.
    Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings
    Technology (2013) 130–136.
date_created: 2021-07-07T11:13:33Z
date_updated: 2023-01-24T08:23:13Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2013.06.024
extern: '1'
language:
- iso: eng
page: 130-136
publication: Surface and Coatings Technology
publication_identifier:
  issn:
  - 0257-8972
publication_status: published
status: public
title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes
  [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
type: journal_article
user_id: '54556'
year: '2013'
...