--- _id: '22593' author: - first_name: N.B. full_name: Srinivasan, N.B. last_name: Srinivasan - first_name: T.B. full_name: Thiede, T.B. last_name: Thiede - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: V. full_name: Gwildies, V. last_name: Gwildies - first_name: M. full_name: Krasnopolski, M. last_name: Krasnopolski - first_name: H.-W. full_name: Becker, H.-W. last_name: Becker - first_name: D. full_name: Rogalla, D. last_name: Rogalla - first_name: A. full_name: Devi, A. last_name: Devi - first_name: R.A. full_name: Fischer, R.A. last_name: Fischer citation: ama: Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology. Published online 2013:130-136. doi:10.1016/j.surfcoat.2013.06.024 apa: Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V., Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., & Fischer, R. A. (2013). Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology, 130–136. https://doi.org/10.1016/j.surfcoat.2013.06.024 bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013, title={Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={10.1016/j.surfcoat.2013.06.024}, journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013}, pages={130–136} }' chicago: Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, 130–36. https://doi.org/10.1016/j.surfcoat.2013.06.024. ieee: 'N. B. Srinivasan et al., “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” Surface and Coatings Technology, pp. 130–136, 2013, doi: 10.1016/j.surfcoat.2013.06.024.' mla: Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024. short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136. date_created: 2021-07-07T11:13:33Z date_updated: 2023-01-24T08:23:13Z department: - _id: '302' doi: 10.1016/j.surfcoat.2013.06.024 extern: '1' language: - iso: eng page: 130-136 publication: Surface and Coatings Technology publication_identifier: issn: - 0257-8972 publication_status: published status: public title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors type: journal_article user_id: '54556' year: '2013' ...