{"date_created":"2021-07-07T11:13:47Z","user_id":"54556","citation":{"bibtex":"@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von Keudell_2013, title={Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}, DOI={10.1088/0022-3727/46/8/084009}, number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013} }","chicago":"Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 2013. https://doi.org/10.1088/0022-3727/46/8/084009.","short":"A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura, J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).","ieee":"A. Will et al., “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,” Journal of Physics D: Applied Physics, Art. no. 084009, 2013, doi: 10.1088/0022-3727/46/8/084009.","mla":"Will, Andreas, et al. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 084009, 2013, doi:10.1088/0022-3727/46/8/084009.","ama":"Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084009","apa":"Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura, P. D., Winter, J., & von Keudell, A. (2013). Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics, Article 084009. https://doi.org/10.1088/0022-3727/46/8/084009"},"_id":"22594","title":"Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum","publication_identifier":{"issn":["0022-3727","1361-6463"]},"department":[{"_id":"302"}],"author":[{"last_name":"Will","full_name":"Will, Andreas","first_name":"Andreas"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Corbella, Carles","last_name":"Corbella","first_name":"Carles"},{"last_name":"Hecimovic","full_name":"Hecimovic, Ante","first_name":"Ante"},{"last_name":"Machura","full_name":"Machura, Patrick D","first_name":"Patrick D"},{"first_name":"Jörg","full_name":"Winter, Jörg","last_name":"Winter"},{"first_name":"Achim","last_name":"von Keudell","full_name":"von Keudell, Achim"}],"extern":"1","year":"2013","status":"public","type":"journal_article","date_updated":"2023-01-24T08:23:28Z","publication":"Journal of Physics D: Applied Physics","doi":"10.1088/0022-3727/46/8/084009","article_number":"084009","publication_status":"published","language":[{"iso":"eng"}]}