{"_id":"22597","citation":{"ama":"Banerjee M, Srinivasan NB, Zhu H, et al. Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. Crystal Growth & Design. Published online 2012:5079-5089. doi:10.1021/cg3010147","short":"M. Banerjee, N.B. Srinivasan, H. Zhu, S.J. Kim, K. Xu, M. Winter, H.-W. Becker, D. Rogalla, M.T. de los Arcos de Pedro, D. Bekermann, D. Barreca, R.A. Fischer, A. Devi, Crystal Growth & Design (2012) 5079–5089.","chicago":"Banerjee, Manish, Nagendra Babu Srinivasan, Huaizhi Zhu, Sun Ja Kim, Ke Xu, Manuela Winter, Hans-Werner Becker, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” Crystal Growth & Design, 2012, 5079–89. https://doi.org/10.1021/cg3010147.","ieee":"M. Banerjee et al., “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors,” Crystal Growth & Design, pp. 5079–5089, 2012, doi: 10.1021/cg3010147.","apa":"Banerjee, M., Srinivasan, N. B., Zhu, H., Kim, S. J., Xu, K., Winter, M., Becker, H.-W., Rogalla, D., de los Arcos de Pedro, M. T., Bekermann, D., Barreca, D., Fischer, R. A., & Devi, A. (2012). Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. Crystal Growth & Design, 5079–5089. https://doi.org/10.1021/cg3010147","bibtex":"@article{Banerjee_Srinivasan_Zhu_Kim_Xu_Winter_Becker_Rogalla_de los Arcos de Pedro_Bekermann_et al._2012, title={Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors}, DOI={10.1021/cg3010147}, journal={Crystal Growth & Design}, author={Banerjee, Manish and Srinivasan, Nagendra Babu and Zhu, Huaizhi and Kim, Sun Ja and Xu, Ke and Winter, Manuela and Becker, Hans-Werner and Rogalla, Detlef and de los Arcos de Pedro, Maria Teresa and Bekermann, Daniela and et al.}, year={2012}, pages={5079–5089} }","mla":"Banerjee, Manish, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” Crystal Growth & Design, 2012, pp. 5079–89, doi:10.1021/cg3010147."},"publication":"Crystal Growth & Design","page":"5079-5089","date_updated":"2023-01-24T08:24:20Z","doi":"10.1021/cg3010147","status":"public","extern":"1","date_created":"2021-07-07T11:14:37Z","publication_identifier":{"issn":["1528-7483","1528-7505"]},"title":"Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors","year":"2012","publication_status":"published","author":[{"first_name":"Manish","full_name":"Banerjee, Manish","last_name":"Banerjee"},{"full_name":"Srinivasan, Nagendra Babu","last_name":"Srinivasan","first_name":"Nagendra Babu"},{"first_name":"Huaizhi","last_name":"Zhu","full_name":"Zhu, Huaizhi"},{"first_name":"Sun Ja","full_name":"Kim, Sun Ja","last_name":"Kim"},{"last_name":"Xu","full_name":"Xu, Ke","first_name":"Ke"},{"last_name":"Winter","full_name":"Winter, Manuela","first_name":"Manuela"},{"first_name":"Hans-Werner","full_name":"Becker, Hans-Werner","last_name":"Becker"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","id":"54556"},{"first_name":"Daniela","full_name":"Bekermann, Daniela","last_name":"Bekermann"},{"full_name":"Barreca, Davide","last_name":"Barreca","first_name":"Davide"},{"first_name":"Roland A.","last_name":"Fischer","full_name":"Fischer, Roland A."},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"type":"journal_article","department":[{"_id":"302"}],"language":[{"iso":"eng"}],"user_id":"54556"}