{"doi":"10.1016/j.tsf.2011.12.007","language":[{"iso":"eng"}],"date_created":"2021-07-07T11:14:50Z","user_id":"54556","_id":"22598","page":"11-16","type":"journal_article","year":"2011","date_updated":"2023-01-24T08:26:47Z","extern":"1","publication_status":"published","department":[{"_id":"302"}],"publication":"Thin Solid Films","publication_identifier":{"issn":["0040-6090"]},"title":"Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition","author":[{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Stefan","last_name":"Cwik","full_name":"Cwik, Stefan"},{"first_name":"Andrian P.","last_name":"Milanov","full_name":"Milanov, Andrian P."},{"first_name":"Vanessa","last_name":"Gwildies","full_name":"Gwildies, Vanessa"},{"last_name":"Parala","full_name":"Parala, Harish","first_name":"Harish"},{"last_name":"Wagner","full_name":"Wagner, Tristan","first_name":"Tristan"},{"last_name":"Birkner","full_name":"Birkner, Alexander","first_name":"Alexander"},{"first_name":"Detlef","full_name":"Rogalla, Detlef","last_name":"Rogalla"},{"first_name":"Hans-Werner","last_name":"Becker","full_name":"Becker, Hans-Werner"},{"last_name":"Winter","full_name":"Winter, Jörg","first_name":"Jörg"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"first_name":"Roland A.","full_name":"Fischer, Roland A.","last_name":"Fischer"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"status":"public","citation":{"mla":"de los Arcos de Pedro, Maria Teresa, et al. “Influence of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films, 2011, pp. 11–16, doi:10.1016/j.tsf.2011.12.007.","chicago":"Arcos de Pedro, Maria Teresa de los, Stefan Cwik, Andrian P. Milanov, Vanessa Gwildies, Harish Parala, Tristan Wagner, Alexander Birkner, et al. “Influence of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films, 2011, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007.","apa":"de los Arcos de Pedro, M. T., Cwik, S., Milanov, A. P., Gwildies, V., Parala, H., Wagner, T., Birkner, A., Rogalla, D., Becker, H.-W., Winter, J., Ludwig, A., Fischer, R. A., & Devi, A. (2011). Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition. Thin Solid Films, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007","ieee":"M. T. de los Arcos de Pedro et al., “Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition,” Thin Solid Films, pp. 11–16, 2011, doi: 10.1016/j.tsf.2011.12.007.","short":"M.T. de los Arcos de Pedro, S. Cwik, A.P. Milanov, V. Gwildies, H. Parala, T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R.A. Fischer, A. Devi, Thin Solid Films (2011) 11–16.","bibtex":"@article{de los Arcos de Pedro_Cwik_Milanov_Gwildies_Parala_Wagner_Birkner_Rogalla_Becker_Winter_et al._2011, title={Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition}, DOI={10.1016/j.tsf.2011.12.007}, journal={Thin Solid Films}, author={de los Arcos de Pedro, Maria Teresa and Cwik, Stefan and Milanov, Andrian P. and Gwildies, Vanessa and Parala, Harish and Wagner, Tristan and Birkner, Alexander and Rogalla, Detlef and Becker, Hans-Werner and Winter, Jörg and et al.}, year={2011}, pages={11–16} }","ama":"de los Arcos de Pedro MT, Cwik S, Milanov AP, et al. Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition. Thin Solid Films. Published online 2011:11-16. doi:10.1016/j.tsf.2011.12.007"}}