{"author":[{"last_name":"Böke","full_name":"Böke, Frederik","first_name":"Frederik"},{"first_name":"Ignacio","full_name":"Giner, Ignacio","last_name":"Giner"},{"id":"48864","orcid":"0000-0001-7139-3110","first_name":"Adrian","last_name":"Keller","full_name":"Keller, Adrian"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido","id":"194"},{"first_name":"Horst","last_name":"Fischer","full_name":"Fischer, Horst"}],"status":"public","date_updated":"2022-01-06T06:55:38Z","publication_status":"published","year":"2016","_id":"22675","intvolume":"         8","publication_identifier":{"issn":["1944-8244","1944-8252"]},"language":[{"iso":"eng"}],"type":"journal_article","page":"17805-17816","date_created":"2021-07-08T12:51:40Z","title":"Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)","publication":"ACS Applied Materials & Interfaces","department":[{"_id":"302"}],"user_id":"48864","citation":{"short":"F. Böke, I. Giner, A. Keller, G. Grundmeier, H. Fischer, ACS Applied Materials &#38; Interfaces 8 (2016) 17805–17816.","ama":"Böke F, Giner I, Keller A, Grundmeier G, Fischer H. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD). <i>ACS Applied Materials &#38; Interfaces</i>. 2016;8:17805-17816. doi:<a href=\"https://doi.org/10.1021/acsami.6b04421\">10.1021/acsami.6b04421</a>","chicago":"Böke, Frederik, Ignacio Giner, Adrian Keller, Guido Grundmeier, and Horst Fischer. “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) Yields Better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics Compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).” <i>ACS Applied Materials &#38; Interfaces</i> 8 (2016): 17805–16. <a href=\"https://doi.org/10.1021/acsami.6b04421\">https://doi.org/10.1021/acsami.6b04421</a>.","bibtex":"@article{Böke_Giner_Keller_Grundmeier_Fischer_2016, title={Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)}, volume={8}, DOI={<a href=\"https://doi.org/10.1021/acsami.6b04421\">10.1021/acsami.6b04421</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Böke, Frederik and Giner, Ignacio and Keller, Adrian and Grundmeier, Guido and Fischer, Horst}, year={2016}, pages={17805–17816} }","mla":"Böke, Frederik, et al. “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) Yields Better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics Compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 8, 2016, pp. 17805–16, doi:<a href=\"https://doi.org/10.1021/acsami.6b04421\">10.1021/acsami.6b04421</a>.","apa":"Böke, F., Giner, I., Keller, A., Grundmeier, G., &#38; Fischer, H. (2016). Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD). <i>ACS Applied Materials &#38; Interfaces</i>, <i>8</i>, 17805–17816. <a href=\"https://doi.org/10.1021/acsami.6b04421\">https://doi.org/10.1021/acsami.6b04421</a>","ieee":"F. Böke, I. Giner, A. Keller, G. Grundmeier, and H. Fischer, “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD),” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 8, pp. 17805–17816, 2016."},"volume":8,"doi":"10.1021/acsami.6b04421"}