{"publication_identifier":{"issn":["0947-6539","1521-3765"]},"_id":"22831","title":"Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide","citation":{"bibtex":"@article{Mai_Boysen_Zanders_de los Arcos_Mitschker_Mallick_Grundmeier_Awakowicz_Devi_2019, title={Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide}, DOI={10.1002/chem.201900475}, journal={Chemistry – A European Journal}, author={Mai, Lukas and Boysen, Nils and Zanders, David and de los Arcos, Teresa and Mitschker, Felix and Mallick, Bert and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}, year={2019}, pages={7489–7500} }","chicago":"Mai, Lukas, Nils Boysen, David Zanders, Teresa de los Arcos, Felix Mitschker, Bert Mallick, Guido Grundmeier, Peter Awakowicz, and Anjana Devi. “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.” Chemistry – A European Journal, 2019, 7489–7500. https://doi.org/10.1002/chem.201900475.","short":"L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G. Grundmeier, P. Awakowicz, A. Devi, Chemistry – A European Journal (2019) 7489–7500.","ama":"Mai L, Boysen N, Zanders D, et al. Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chemistry – A European Journal. 2019:7489-7500. doi:10.1002/chem.201900475","mla":"Mai, Lukas, et al. “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.” Chemistry – A European Journal, 2019, pp. 7489–500, doi:10.1002/chem.201900475.","ieee":"L. Mai et al., “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide,” Chemistry – A European Journal, pp. 7489–7500, 2019.","apa":"Mai, L., Boysen, N., Zanders, D., de los Arcos, T., Mitschker, F., Mallick, B., … Devi, A. (2019). Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chemistry – A European Journal, 7489–7500. https://doi.org/10.1002/chem.201900475"},"user_id":"194","date_created":"2021-07-27T14:10:23Z","status":"public","year":"2019","author":[{"first_name":"Lukas","full_name":"Mai, Lukas","last_name":"Mai"},{"last_name":"Boysen","full_name":"Boysen, Nils","first_name":"Nils"},{"last_name":"Zanders","full_name":"Zanders, David","first_name":"David"},{"last_name":"de los Arcos","full_name":"de los Arcos, Teresa","first_name":"Teresa"},{"last_name":"Mitschker","full_name":"Mitschker, Felix","first_name":"Felix"},{"last_name":"Mallick","full_name":"Mallick, Bert","first_name":"Bert"},{"id":"194","last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"doi":"10.1002/chem.201900475","page":"7489-7500","publication":"Chemistry – A European Journal","type":"journal_article","date_updated":"2022-01-06T06:55:42Z","language":[{"iso":"eng"}],"publication_status":"published"}