{"title":"A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD","author":[{"full_name":"Gebhard, Maximilian","last_name":"Gebhard","first_name":"Maximilian"},{"full_name":"Mitschker, Felix","last_name":"Mitschker","first_name":"Felix"},{"last_name":"Hoppe","full_name":"Hoppe, Christian","first_name":"Christian"},{"last_name":"Aghaee","full_name":"Aghaee, Morteza","first_name":"Morteza"},{"full_name":"Rogalla, Detlef","last_name":"Rogalla","first_name":"Detlef"},{"first_name":"Mariadriana","full_name":"Creatore, Mariadriana","last_name":"Creatore"},{"first_name":"Guido","id":"194","last_name":"Grundmeier","full_name":"Grundmeier, Guido"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"type":"journal_article","publication":"Plasma Processes and Polymers","date_created":"2021-07-27T14:13:38Z","user_id":"194","doi":"10.1002/ppap.201700209","_id":"22838","article_number":"1700209","language":[{"iso":"eng"}],"status":"public","date_updated":"2022-01-06T06:55:42Z","publication_status":"published","publication_identifier":{"issn":["1612-8850"]},"year":"2018","citation":{"short":"M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).","apa":"Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore, M., … Devi, A. (2018). A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma Processes and Polymers. https://doi.org/10.1002/ppap.201700209","ama":"Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma Processes and Polymers. 2018. doi:10.1002/ppap.201700209","mla":"Gebhard, Maximilian, et al. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” Plasma Processes and Polymers, 1700209, 2018, doi:10.1002/ppap.201700209.","chicago":"Gebhard, Maximilian, Felix Mitschker, Christian Hoppe, Morteza Aghaee, Detlef Rogalla, Mariadriana Creatore, Guido Grundmeier, Peter Awakowicz, and Anjana Devi. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” Plasma Processes and Polymers, 2018. https://doi.org/10.1002/ppap.201700209.","ieee":"M. Gebhard et al., “A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,” Plasma Processes and Polymers, 2018.","bibtex":"@article{Gebhard_Mitschker_Hoppe_Aghaee_Rogalla_Creatore_Grundmeier_Awakowicz_Devi_2018, title={A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD}, DOI={10.1002/ppap.201700209}, number={1700209}, journal={Plasma Processes and Polymers}, author={Gebhard, Maximilian and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}, year={2018} }"}}