{"publication_status":"published","language":[{"iso":"eng"}],"publication":"Plasma Processes and Polymers","date_updated":"2022-01-06T06:55:42Z","type":"journal_article","doi":"10.1002/ppap.201700209","article_number":"1700209","author":[{"full_name":"Gebhard, Maximilian","last_name":"Gebhard","first_name":"Maximilian"},{"full_name":"Mitschker, Felix","last_name":"Mitschker","first_name":"Felix"},{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"last_name":"Aghaee","full_name":"Aghaee, Morteza","first_name":"Morteza"},{"first_name":"Detlef","full_name":"Rogalla, Detlef","last_name":"Rogalla"},{"first_name":"Mariadriana","full_name":"Creatore, Mariadriana","last_name":"Creatore"},{"full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"status":"public","year":"2018","citation":{"mla":"Gebhard, Maximilian, et al. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” <i>Plasma Processes and Polymers</i>, 1700209, 2018, doi:<a href=\"https://doi.org/10.1002/ppap.201700209\">10.1002/ppap.201700209</a>.","bibtex":"@article{Gebhard_Mitschker_Hoppe_Aghaee_Rogalla_Creatore_Grundmeier_Awakowicz_Devi_2018, title={A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD}, DOI={<a href=\"https://doi.org/10.1002/ppap.201700209\">10.1002/ppap.201700209</a>}, number={1700209}, journal={Plasma Processes and Polymers}, author={Gebhard, Maximilian and Mitschker, Felix and Hoppe, Christian and Aghaee, Morteza and Rogalla, Detlef and Creatore, Mariadriana and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}, year={2018} }","ama":"Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. <i>Plasma Processes and Polymers</i>. 2018. doi:<a href=\"https://doi.org/10.1002/ppap.201700209\">10.1002/ppap.201700209</a>","ieee":"M. Gebhard <i>et al.</i>, “A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,” <i>Plasma Processes and Polymers</i>, 2018.","short":"M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).","apa":"Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore, M., … Devi, A. (2018). A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. <i>Plasma Processes and Polymers</i>. <a href=\"https://doi.org/10.1002/ppap.201700209\">https://doi.org/10.1002/ppap.201700209</a>","chicago":"Gebhard, Maximilian, Felix Mitschker, Christian Hoppe, Morteza Aghaee, Detlef Rogalla, Mariadriana Creatore, Guido Grundmeier, Peter Awakowicz, and Anjana Devi. “A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD.” <i>Plasma Processes and Polymers</i>, 2018. <a href=\"https://doi.org/10.1002/ppap.201700209\">https://doi.org/10.1002/ppap.201700209</a>."},"user_id":"194","date_created":"2021-07-27T14:13:38Z","publication_identifier":{"issn":["1612-8850"]},"title":"A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD","_id":"22838"}