{"type":"journal_article","language":[{"iso":"eng"}],"user_id":"194","publication_status":"published","article_number":"204002","author":[{"last_name":"Hoppe","full_name":"Hoppe, Christian","first_name":"Christian","id":"27401"},{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"last_name":"Giner","full_name":"Giner, I","first_name":"I"},{"last_name":"de los Arcos","full_name":"de los Arcos, T","first_name":"T"},{"first_name":"P","full_name":"Awakowicz, P","last_name":"Awakowicz"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido","id":"194"}],"title":"Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms","publication_identifier":{"issn":["0022-3727","1361-6463"]},"year":"2017","date_created":"2021-07-27T14:19:04Z","date_updated":"2022-01-06T06:55:42Z","doi":"10.1088/1361-6463/aa69e5","status":"public","citation":{"chicago":"Hoppe, Christian, F Mitschker, I Giner, T de los Arcos, P Awakowicz, and Guido Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 2017. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>.","ieee":"C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms,” <i>Journal of Physics D: Applied Physics</i>, 2017.","apa":"Hoppe, C., Mitschker, F., Giner, I., de los Arcos, T., Awakowicz, P., &#38; Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>","ama":"Hoppe C, Mitschker F, Giner I, de los Arcos T, Awakowicz P, Grundmeier G. Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. 2017. doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>","bibtex":"@article{Hoppe_Mitschker_Giner_de los Arcos_Awakowicz_Grundmeier_2017, title={Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>}, number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, Christian and Mitschker, F and Giner, I and de los Arcos, T and Awakowicz, P and Grundmeier, Guido}, year={2017} }","short":"C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).","mla":"Hoppe, Christian, et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 204002, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>."},"_id":"22849","publication":"Journal of Physics D: Applied Physics"}