{"title":"Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors","date_created":"2021-09-01T09:48:56Z","publication":"Advanced Materials Interfaces","type":"journal_article","page":"1400238","year":"2014","language":[{"iso":"eng"}],"publication_identifier":{"issn":["2196-7350"]},"intvolume":"         1","_id":"23638","date_updated":"2022-01-06T06:55:57Z","status":"public","author":[{"last_name":"Khassanov","full_name":"Khassanov, Artoem","first_name":"Artoem"},{"first_name":"Thomas","full_name":"Schmaltz, Thomas","last_name":"Schmaltz"},{"last_name":"Steinrück","full_name":"Steinrück, Hans-Georg","orcid":"0000-0001-6373-0877","id":"84268","first_name":"Hans-Georg"},{"first_name":"Andreas","last_name":"Magerl","full_name":"Magerl, Andreas"},{"last_name":"Hirsch","full_name":"Hirsch, Andreas","first_name":"Andreas"},{"first_name":"Marcus","full_name":"Halik, Marcus","last_name":"Halik"}],"publication_status":"published","doi":"10.1002/admi.201400238","volume":1,"user_id":"84268","citation":{"mla":"Khassanov, Artoem, et al. “Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors.” <i>Advanced Materials Interfaces</i>, vol. 1, 2014, p. 1400238, doi:<a href=\"https://doi.org/10.1002/admi.201400238\">10.1002/admi.201400238</a>.","apa":"Khassanov, A., Schmaltz, T., Steinrück, H.-G., Magerl, A., Hirsch, A., &#38; Halik, M. (2014). Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors. <i>Advanced Materials Interfaces</i>, <i>1</i>, 1400238. <a href=\"https://doi.org/10.1002/admi.201400238\">https://doi.org/10.1002/admi.201400238</a>","ieee":"A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, and M. Halik, “Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors,” <i>Advanced Materials Interfaces</i>, vol. 1, p. 1400238, 2014, doi: <a href=\"https://doi.org/10.1002/admi.201400238\">10.1002/admi.201400238</a>.","short":"A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik, Advanced Materials Interfaces 1 (2014) 1400238.","ama":"Khassanov A, Schmaltz T, Steinrück H-G, Magerl A, Hirsch A, Halik M. Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors. <i>Advanced Materials Interfaces</i>. 2014;1:1400238. doi:<a href=\"https://doi.org/10.1002/admi.201400238\">10.1002/admi.201400238</a>","chicago":"Khassanov, Artoem, Thomas Schmaltz, Hans-Georg Steinrück, Andreas Magerl, Andreas Hirsch, and Marcus Halik. “Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors.” <i>Advanced Materials Interfaces</i> 1 (2014): 1400238. <a href=\"https://doi.org/10.1002/admi.201400238\">https://doi.org/10.1002/admi.201400238</a>.","bibtex":"@article{Khassanov_Schmaltz_Steinrück_Magerl_Hirsch_Halik_2014, title={Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors}, volume={1}, DOI={<a href=\"https://doi.org/10.1002/admi.201400238\">10.1002/admi.201400238</a>}, journal={Advanced Materials Interfaces}, author={Khassanov, Artoem and Schmaltz, Thomas and Steinrück, Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik, Marcus}, year={2014}, pages={1400238} }"},"department":[{"_id":"633"}]}